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    • 1. 发明授权
    • Electrophoretic display device
    • 电泳显示装置
    • US08749476B2
    • 2014-06-10
    • US11140850
    • 2005-05-31
    • Nam-Seok RohMun-Pyo Hong
    • Nam-Seok RohMun-Pyo Hong
    • G09G3/34G06F3/042
    • G02F1/167G09G3/344G09G2300/0809G09G2360/14
    • A electrophoretic display device is provided, which includes: a thin film transistor array panel including a substrate, gate and data lines formed on the substrate and crossing each other, switching thin film transistors electrically connected to the gate and data lines, a photo sensor formed on the substrate, and pixel electrodes electrically connected to the switching thin film transistors; a common electrode panel facing the thin film transistor array panel and having a common electrode; and a display layer disposed between the thin film transistor array panel and the common electrode panel. The display layer includes micro capsules containing negative and positive pigment particles.
    • 提供了一种电泳显示装置,其包括:薄膜晶体管阵列面板,包括形成在基板上并彼此交叉的基板,栅极和数据线,开关电连接到栅极和数据线的薄膜晶体管,形成的光电传感器 和与开关薄膜晶体管电连接的像素电极; 面对薄膜晶体管阵列面板并具有公共电极的公共电极面板; 以及设置在薄膜晶体管阵列面板和公共电极面板之间的显示层。 显示层包括含有负性和正性颜料颗粒的微胶囊。
    • 2. 发明授权
    • Display device and manufacturing method thereof
    • 显示装置及其制造方法
    • US08258004B2
    • 2012-09-04
    • US12561218
    • 2009-09-16
    • Joon-hak OhMun-pyo HongBo-sung KimYong-uk Lee
    • Joon-hak OhMun-pyo HongBo-sung KimYong-uk Lee
    • H01L21/00
    • H01L51/0545B82Y30/00H01L27/3244H01L51/0005H01L51/0016H01L51/0558
    • According to an embodiment of the present invention, a manufacturing method of a display device includes forming a plurality of gate wires comprising a gate electrode on an insulating substrate, forming an electrode layer comprising a source electrode and a drain electrode spaced apart from each other to define a channel region on the gate electrode interposed therebetween, forming a first barrier wall having a first opening for exposing the channel region, a portion of the source electrode, and a portion of the drain electrode on the electrode layer where the first barrier wall has a surface, forming a shielding film to cover the channel region inside the first opening, treating the surface of the first barrier wall, removing the shielding film, and forming an organic semiconductor layer inside the first opening.
    • 根据本发明的实施例,显示装置的制造方法包括在绝缘基板上形成包括栅电极的多条栅极线,形成包括彼此间隔开的源电极和漏极的电极层, 在所述栅极电极之间限定沟道区,形成第一阻挡壁,所述第一阻挡壁具有用于暴露所述沟道区的第一开口,所述源极的一部分以及所述第一阻挡壁具有的所述电极层上的所述漏电极的一部分 形成屏蔽膜以覆盖第一开口内的沟道区域,处理第一阻挡壁的表面,去除屏蔽膜,以及在第一开口内部形成有机半导体层。
    • 8. 发明授权
    • Wire for a display device, a method for manufacturing the same, a thin film transistor array panel including the wire, and a method for manufacturing the same
    • 用于显示装置的线,其制造方法,包括该线的薄膜晶体管阵列面板及其制造方法
    • US07638800B2
    • 2009-12-29
    • US10501597
    • 2002-07-29
    • Seung-Hee YuMun-Pyo HongSoo-Guy RhoNam-Seok RhoKeun-Kyu SongHee-Hwan ChoeBo-Sung KimSang-Gab KimSung-Chul KangHong-Sick Park
    • Seung-Hee YuMun-Pyo HongSoo-Guy RhoNam-Seok RhoKeun-Kyu SongHee-Hwan ChoeBo-Sung KimSang-Gab KimSung-Chul KangHong-Sick Park
    • H01L21/84
    • G02F1/136286G02F2001/136295
    • First, a Cr film and a CrOx film are deposited and patterned using an etchant including 8-12% Ce(NH4)2(NO3)6, 10-20% NH3 and remaining ultra pure water to form a gate wire including a plurality of gate lines, a plurality of gate electrodes and a plurality of gate pads. Next, a gate insulating film, a semiconductor layer and an ohmic contact layer are formed in sequence. A Cr film and CrOx film are deposited in sequence and patterned using an etchant including 8-12% Ce(NH4)2(NO3)6, 10-20% NH3 and remaining ultra pure water to form a data wire including a plurality of data lines, a plurality of source electrodes, a plurality of drain electrodes and a plurality of data pads. A passivation layer is deposited and patterned to form a plurality of contact holes respectively exposing the drain electrodes, the gate pads and the data pads. A transparent conductive material or a reflective conductive material is deposited and patterned to form a plurality of pixel electrodes, a plurality of subsidiary gate pads and a plurality of subsidiary data pads electrically connected to the drain electrodes, the gate pads and the data pads, respectively. The gate lines and the data lines with low reflectance are used as a light-blocking film for blocking the light leakage between the pixel areas, and do not increase the black brightness. Accordingly, a separate black matrix need not be provided on the color filter panel, thereby securing both aperture ratio of the pixel and high contrast ratio.
    • 首先,使用包括8-12%Ce(NH 4)2(NO 3)6,10-20%NH 3和剩余的超纯水的蚀刻剂沉积和图案化Cr膜和CrOx膜,以形成包括多个 栅极线,多个栅电极和多个栅极焊盘。 接下来,依次形成栅极绝缘膜,半导体层和欧姆接触层。 依次沉积Cr膜和CrOx膜,并使用包括8-12%Ce(NH 4)2(NO 3)6,10-20%NH 3和剩余的超纯水的蚀刻剂进行图案化以形成包括多个数据的数据线 线,多个源电极,多个漏电极和多个数据焊盘。 钝化层被沉积并图案化以形成分别暴露漏电极,栅极焊盘和数据焊盘的多个接触孔。 沉积透明导电材料或反射导电材料以形成多个像素电极,分别与漏电极,栅极焊盘和数据焊盘电连接的多个辅助栅极焊盘和多个辅助数据焊盘 。 栅极线和低反射率的数据线被用作阻挡像素区域之间的漏光的遮光膜,并且不增加黑色亮度。 因此,不需要在滤色器面板上设置单独的黑矩阵,从而确保像素的开口率和高对比度。
    • 9. 发明授权
    • Display device and manufacturing method thereof
    • 显示装置及其制造方法
    • US07638358B2
    • 2009-12-29
    • US11601086
    • 2006-11-17
    • Joon-hak OhMun-pyo HongBo-sung KimYong-uk Lee
    • Joon-hak OhMun-pyo HongBo-sung KimYong-uk Lee
    • H01L21/00
    • H01L51/0545B82Y30/00H01L27/3244H01L51/0005H01L51/0016H01L51/0558
    • According to an embodiment of the present invention, a manufacturing method of a display device includes forming a plurality of gate wires comprising a gate electrode on an insulating substrate, forming an electrode layer comprising a source electrode and a drain electrode spaced apart from each other to define a channel region on the gate electrode interposed therebetween, forming a first barrier wall having a first opening for exposing the channel region, a portion of the source electrode, and a portion of the drain electrode on the electrode layer where the first barrier wall has a surface, forming a shielding film to cover the channel region inside the first opening, treating the surface of the first barrier wall, removing the shielding film, and forming an organic semiconductor layer inside the first opening.
    • 根据本发明的实施例,显示装置的制造方法包括在绝缘基板上形成包括栅电极的多条栅极线,形成包括彼此间隔开的源电极和漏极的电极层, 在所述栅极电极之间限定沟道区,形成第一阻挡壁,所述第一阻挡壁具有用于暴露所述沟道区的第一开口,所述源极的一部分以及所述第一阻挡壁具有的所述电极层上的所述漏电极的一部分 形成屏蔽膜以覆盖第一开口内的沟道区域,处理第一阻挡壁的表面,去除屏蔽膜,以及在第一开口内部形成有机半导体层。