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    • 4. 发明申请
    • Substrate transfer method, substrate transfer apparatus and exposure apparatus
    • 基板转印方法,基板转印装置和曝光装置
    • US20070166134A1
    • 2007-07-19
    • US11637181
    • 2006-12-12
    • Motoko Suzuki
    • Motoko Suzuki
    • H01L21/677
    • H01L21/67225H01L21/67109H01L21/67745
    • The present invention relates to a substrate transporting method that transports substrates such as wafers or reticles, a substrate transport apparatus, and an exposure apparatus for use in lithography of, for example, semiconductor integrated circuits, and it is an object of the present invention to efficiently heat a substrate. Furthermore, a substrate transporting method that, after transporting a substrate disposed in the ambient atmosphere into a vacuum chamber and drawing a vacuum therein, transports the substrate to a stage apparatus disposed in a vacuum atmosphere, comprises the step of: transporting the substrate, which is disposed in the ambient atmosphere, to the stage apparatus in a state wherein the substrate is held by a holding means, which can regulate the temperature of the substrate.
    • 本发明涉及输送诸如晶片或掩模版的基板,基板输送装置和用于例如半导体集成电路的光刻中的曝光装置的基板输送方法,本发明的目的是 有效地加热基板。 此外,一种基板传送方法,其将设置在周围大气中的基板输送到真空室中并在其中抽真空之后,将基板输送到设置在真空气氛中的载物台装置,包括以下步骤:将基板 在通过保持装置保持基板的状态下设置在环境气氛中的台架装置,该保持装置可以调节基板的温度。
    • 7. 发明授权
    • Reticle protection member, reticle carrying device, exposure device and method for carrying reticle
    • 掩模版保护构件,掩模版承载装置,曝光装置和承载掩模版的方法
    • US08168959B2
    • 2012-05-01
    • US12234913
    • 2008-09-22
    • Motoko SuzukiYukiharu Okubo
    • Motoko SuzukiYukiharu Okubo
    • H01L21/027
    • H01L21/027G03F1/66G03F7/70741G03F9/7084H01L21/67353H01L21/67359
    • A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the position of the position measurement mark 27 formed on the lower surface of a lower lid 2b, thereby measuring the position of the lower lid 2b. The relative displacement of the reticle 1 and lower lid 2b is known when the position of the reticle 1 and the position of the lower lid 2b are known. Therefore, when the lower lid 2b having the reticle 1 loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid 2b is determined by taking this displacement into account. As a result, the reticle 1 can be correctly set in the exposure device.
    • 位置测量装置29测量形成在标线片1的下表面上的位置测量标记26的位置,从而测量标线片1的位置。位置测量装置30测量形成在标线片1上的位置测量标记27的位置。 下盖2b的下表面,从而测量下盖2b的位置。 当掩模版1的位置和下盖2b的位置已知时,标线片1和下盖2b的相对位移是已知的。 因此,当装载有标线片1的下盖2b携带携带装置并设置在曝光装置中时,通过考虑该位移来确定下盖2b的停止位置。 结果,可以将掩模版1正确地设置在曝光装置中。
    • 9. 发明授权
    • Reticle protection member, reticle carrying device, exposure device and method for carrying reticle
    • 掩模版保护构件,掩模版承载装置,曝光装置和承载掩模版的方法
    • US07453549B2
    • 2008-11-18
    • US11235198
    • 2005-09-27
    • Motoko SuzukiYukiharu Okubo
    • Motoko SuzukiYukiharu Okubo
    • H01L21/027
    • H01L21/027G03F1/66G03F7/70741G03F9/7084H01L21/67353H01L21/67359
    • A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the position of the position measurement mark 27 formed on the lower surface of a lower lid 2b, thereby measuring the position of the lower lid 2b. The relative displacement of the reticle 1 and lower lid 2b is known when the position of the reticle 1 and the position of the lower lid 2b are known. Therefore, when the lower lid 2b having the reticle 1 loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid 2b is determined by taking this displacement into account. As a result, the reticle 1 can be correctly set in the exposure device.
    • 位置测量装置29测量形成在标线片1的下表面上的位置测量标记26的位置,从而测量标线1的位置。 位置测量装置30测量形成在下盖2b的下表面上的位置测量标记27的位置,从而测量下盖2b的位置。 当标线片1的位置和下盖2b的位置已知时,标线片1和下盖2b的相对位移是已知的。 因此,当装载有掩模版1的下盖2b被携带携带装置并设置在曝光装置中时,通过考虑该位移来确定下盖2b的停止位置。 结果,可以将掩模版1正确地设置在曝光装置中。