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1. 发明授权

US08921812B2 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle 有权
标题翻译：掩模版保护构件，掩模版承载装置，曝光装置和承载掩模版的方法
公开(公告)号：US08921812B2
公开(公告)日：2014-12-30
申请号：US13446436
申请日：2012-04-13
申请人： Motoko Suzuki , Yukiharu Okubo
发明人： Motoko Suzuki , Yukiharu Okubo
IPC分类号： H01L21/027 , G03F7/20 , G03F1/66 , G03F9/00 , H01L21/673
CPC分类号： H01L21/027 , G03F1/66 , G03F7/70741 , G03F9/7084 , H01L21/67353 , H01L21/67359
摘要： A position measurement device measures the position of a position measurement mark formed on the lower surface of a reticle, thereby measuring the position of the reticle. A position measurement device measures the position of the position measurement mark formed on the lower surface of a lower lid, thereby measuring the position of the lower lid. The relative displacement of the reticle and lower lid is known when the position of the reticle and the position of the lower lid are known. Therefore, when the lower lid having the reticle loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid is determined by taking this displacement into account. As a result, the reticle can be correctly set in the exposure device.
摘要翻译：位置测量装置测量形成在掩模版的下表面上的位置测量标记的位置，从而测量掩模版的位置。位置测量装置测量形成在下盖的下表面上的位置测量标记的位置，从而测量下盖的位置。当掩模版的位置和下盖的位置是已知的时，标线片和下盖的相对位移是已知的。因此，当将装载有掩模版的下盖带有承载装置并设置在曝光装置中时，通过考虑该位移来确定下盖的停止位置。结果，可以将掩模版正确地设置在曝光装置中。

2. 发明申请

US20090103061A1 Reticle Protection Member, Reticle Carrying Device, Exposure Device and Method for Carrying Reticle 有权
标题翻译：掩模保护构件，掩模载体装置，曝光装置和携带掩模的方法
公开(公告)号：US20090103061A1
公开(公告)日：2009-04-23
申请号：US12234913
申请日：2008-09-22
申请人： Motoko Suzuki , Yukiharu Okubo
发明人： Motoko Suzuki , Yukiharu Okubo
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： H01L21/027 , G03F1/66 , G03F7/70741 , G03F9/7084 , H01L21/67353 , H01L21/67359
摘要： A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the position of the position measurement mark 27 formed on the lower surface of a lower lid 2b, thereby measuring the position of the lower lid 2b. The relative displacement of the reticle 1 and lower lid 2b is known when the position of the reticle 1 and the position of the lower lid 2b are known. Therefore, when the lower lid 2b having the reticle 1 loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid 2b is determined by taking this displacement into account. As a result, the reticle 1 can be correctly set in the exposure device.
摘要翻译：位置测量装置29测量形成在标线片1的下表面上的位置测量标记26的位置，从而测量标线片1的位置。位置测量装置30测量形成在标线片1上的位置测量标记27的位置。下盖2b的下表面，从而测量下盖2b的位置。当掩模版1的位置和下盖2b的位置已知时，标线片1和下盖2b的相对位移是已知的。因此，当装载有标线片1的下盖2b携带携带装置并设置在曝光装置中时，通过考虑该位移来确定下盖2b的停止位置。结果，可以将掩模版1正确地设置在曝光装置中。

3. 发明申请

US20070206173A1 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle 失效
标题翻译：掩模版保护构件，掩模版承载装置，曝光装置和承载掩模版的方法
公开(公告)号：US20070206173A1
公开(公告)日：2007-09-06
申请号：US11235198
申请日：2005-09-27
申请人： Motoko Suzuki , Yukiharu Okubo
发明人： Motoko Suzuki , Yukiharu Okubo
IPC分类号： G03B27/62
CPC分类号： H01L21/027 , G03F1/66 , G03F7/70741 , G03F9/7084 , H01L21/67353 , H01L21/67359
摘要： A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the position of the position measurement mark 27 formed on the lower surface of a lower lid 2b, thereby measuring the position of the lower lid 2b. The relative displacement of the reticle 1 and lower lid 2b is known when the position of the reticle 1 and the position of the lower lid 2b are known. Therefore, when the lower lid 2b having the reticle 1 loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid 2b is determined by taking this displacement into account. As a result, the reticle 1 can be correctly set in the exposure device.
摘要翻译：位置测量装置29测量形成在标线片1的下表面上的位置测量标记26的位置，从而测量标线1的位置。位置测量装置30测量形成在下盖2b的下表面上的位置测量标记27的位置，从而测量下盖2b的位置。当标线片1的位置和下盖2b的位置已知时，标线片1和下盖2b的相对位移是已知的。因此，当装载有掩模版1的下盖2b被携带携带装置并设置在曝光装置中时，通过考虑该位移来确定下盖2b的停止位置。结果，可以将掩模版1正确地设置在曝光装置中。

4. 发明申请

US20070166134A1 Substrate transfer method, substrate transfer apparatus and exposure apparatus 审中-公开
标题翻译：基板转印方法，基板转印装置和曝光装置
公开(公告)号：US20070166134A1
公开(公告)日：2007-07-19
申请号：US11637181
申请日：2006-12-12
申请人： Motoko Suzuki
发明人： Motoko Suzuki
IPC分类号： H01L21/677
CPC分类号： H01L21/67225 , H01L21/67109 , H01L21/67745
摘要： The present invention relates to a substrate transporting method that transports substrates such as wafers or reticles, a substrate transport apparatus, and an exposure apparatus for use in lithography of, for example, semiconductor integrated circuits, and it is an object of the present invention to efficiently heat a substrate. Furthermore, a substrate transporting method that, after transporting a substrate disposed in the ambient atmosphere into a vacuum chamber and drawing a vacuum therein, transports the substrate to a stage apparatus disposed in a vacuum atmosphere, comprises the step of: transporting the substrate, which is disposed in the ambient atmosphere, to the stage apparatus in a state wherein the substrate is held by a holding means, which can regulate the temperature of the substrate.
摘要翻译：本发明涉及输送诸如晶片或掩模版的基板，基板输送装置和用于例如半导体集成电路的光刻中的曝光装置的基板输送方法，本发明的目的是有效地加热基板。此外，一种基板传送方法，其将设置在周围大气中的基板输送到真空室中并在其中抽真空之后，将基板输送到设置在真空气氛中的载物台装置，包括以下步骤：将基板在通过保持装置保持基板的状态下设置在环境气氛中的台架装置，该保持装置可以调节基板的温度。

5. 发明授权

US5055469A Quaternary pyridinium salts useful for ulcer treatment 失效
标题翻译：季铵盐治疗有效的季铵盐
公开(公告)号：US5055469A
公开(公告)日：1991-10-08
申请号：US394080
申请日：1989-08-15
申请人： Naomichi Mitsumori , Yasuhiro Nishimura , Keiko Yokota , Shiro Okuno , Motoko Suzuki
发明人： Naomichi Mitsumori , Yasuhiro Nishimura , Keiko Yokota , Shiro Okuno , Motoko Suzuki
IPC分类号： A61K31/165 , A61K31/415 , A61K31/425 , A61K31/426 , A61K31/435 , A61K31/44 , A61K31/4425 , A61P1/04 , C07C231/02 , C07C231/12 , C07C237/04 , C07C237/10 , C07D213/04 , C07D213/20 , C07D213/75 , C07D233/61 , C07D277/22 , C07D277/24 , C07D295/14 , C07D295/15 , C07D453/02
CPC分类号： C07D213/20 , C07C237/04 , C07D295/15
摘要： There are provided quaternary ammonium compounds of the formula: ##STR1## wherein R.sub.1 and R.sub.2, each independently represents a hydrogen atom, a C.sub.1 to C.sub.8 lower alkyl or alkenyl group, or C.sub.3 to C.sub.8 lower cycloalkyl, cycloalkenyl, aralkyl or aryl group; or R.sub.1 and R.sub.2 combine with each other in combination with the adjacent N and carbon atoms or further with at least one of nitrogen, oxygen and sulfur atoms to represent a 3- to 8- membered heterocyclic ring group: R.sub.3, R.sub.4 and R.sub.5, each independently represents a C.sub.1 to C.sub.8 lower alkyl or alkenyl group, C.sub.3 to C.sub.8 lower cycloalkyl, cycloalkenyl, aralkyl or aryl group; or either two of R.sub.3, R.sub.4 and R.sub.5 combine with each other in combination with the adjacent N and carbon atoms or further with at least one of nitrogen, oxygen and sulfur atoms to represent a 3- or 8-membered heterocyclic ring group, with the remaining being the same as defined in the above; or R.sub.3, R.sub.4 and R.sub.5 combine with one another in combination with the adjacent N to represent a nitrogen-containing bicyclo ring or nitrogen-containing aromatic ring group: n is an integer of 1 to 8; and x.sup.- represents an anion being capable of forming a quaternary ammonium group.The compounds are useful in treatment of ulcer in mammals.

6. 发明授权

US4996200A Use of Zn-protoporphyrin for hepatitis treatment 失效
标题翻译：使用锌原卟啉进行肝炎治疗
公开(公告)号：US4996200A
公开(公告)日：1991-02-26
申请号：US423700
申请日：1989-10-18
申请人： Yasuhiro Nishimura , Motoko Suzuki , Yozo Fukuda
发明人： Yasuhiro Nishimura , Motoko Suzuki , Yozo Fukuda
IPC分类号： C07D487/22 , A61K31/40 , A61K31/555 , A61K33/30 , A61P1/16
CPC分类号： A61K33/30 , A61K31/40 , Y10S514/894
摘要： There is provided an oral antihepatopathic composition comprising protoporphyrin IX-Zn(II) complex. By oral administration, the complex can suppress the elevation of GPT and GOT as well as the increase of liver weight in a living body suffering from hapatic disorder, which contributes to prevention or relief of the disease.

7. 发明授权

US08168959B2 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle 有权
标题翻译：掩模版保护构件，掩模版承载装置，曝光装置和承载掩模版的方法
公开(公告)号：US08168959B2
公开(公告)日：2012-05-01
申请号：US12234913
申请日：2008-09-22
申请人： Motoko Suzuki , Yukiharu Okubo
发明人： Motoko Suzuki , Yukiharu Okubo
IPC分类号： H01L21/027
CPC分类号： H01L21/027 , G03F1/66 , G03F7/70741 , G03F9/7084 , H01L21/67353 , H01L21/67359
摘要： A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the position of the position measurement mark 27 formed on the lower surface of a lower lid 2b, thereby measuring the position of the lower lid 2b. The relative displacement of the reticle 1 and lower lid 2b is known when the position of the reticle 1 and the position of the lower lid 2b are known. Therefore, when the lower lid 2b having the reticle 1 loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid 2b is determined by taking this displacement into account. As a result, the reticle 1 can be correctly set in the exposure device.
摘要翻译：位置测量装置29测量形成在标线片1的下表面上的位置测量标记26的位置，从而测量标线片1的位置。位置测量装置30测量形成在标线片1上的位置测量标记27的位置。下盖2b的下表面，从而测量下盖2b的位置。当掩模版1的位置和下盖2b的位置已知时，标线片1和下盖2b的相对位移是已知的。因此，当装载有标线片1的下盖2b携带携带装置并设置在曝光装置中时，通过考虑该位移来确定下盖2b的停止位置。结果，可以将掩模版1正确地设置在曝光装置中。

8. 发明申请

US20120200835A1 RETICLE PROTECTION MEMBER, RETICLE CARRYING DEVICE, EXPOSURE DEVICE AND METHOD FOR CARRYING RETICLE 审中-公开
标题翻译：防伪部件，携带装置，曝光装置及其携带方法
公开(公告)号：US20120200835A1
公开(公告)日：2012-08-09
申请号：US13446436
申请日：2012-04-13
申请人： Motoko SUZUKI , Yukiharu Okubo
发明人： Motoko SUZUKI , Yukiharu Okubo
IPC分类号： G03B27/52
CPC分类号： H01L21/027 , G03F1/66 , G03F7/70741 , G03F9/7084 , H01L21/67353 , H01L21/67359
摘要： A position measurement device measures the position of a position measurement mark formed on the lower surface of a reticle, thereby measuring the position of the reticle. A position measurement device measures the position of the position measurement mark formed on the lower surface of a lower lid, thereby measuring the position of the lower lid. The relative displacement of the reticle and lower lid is known when the position of the reticle and the position of the lower lid are known. Therefore, when the lower lid having the reticle loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid is determined by taking this displacement into account. As a result, the reticle can be correctly set in the exposure device.
摘要翻译：位置测量装置测量形成在掩模版的下表面上的位置测量标记的位置，从而测量掩模版的位置。位置测量装置测量形成在下盖的下表面上的位置测量标记的位置，从而测量下盖的位置。当掩模版的位置和下盖的位置是已知的时，标线片和下盖的相对位移是已知的。因此，当将装载有掩模版的下盖带有承载装置并设置在曝光装置中时，通过考虑该位移来确定下盖的停止位置。结果，可以将掩模版正确地设置在曝光装置中。

9. 发明授权

US07453549B2 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle 失效
标题翻译：掩模版保护构件，掩模版承载装置，曝光装置和承载掩模版的方法
公开(公告)号：US07453549B2
公开(公告)日：2008-11-18
申请号：US11235198
申请日：2005-09-27
申请人： Motoko Suzuki , Yukiharu Okubo
发明人： Motoko Suzuki , Yukiharu Okubo
IPC分类号： H01L21/027
CPC分类号： H01L21/027 , G03F1/66 , G03F7/70741 , G03F9/7084 , H01L21/67353 , H01L21/67359
摘要： A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the position of the position measurement mark 27 formed on the lower surface of a lower lid 2b, thereby measuring the position of the lower lid 2b. The relative displacement of the reticle 1 and lower lid 2b is known when the position of the reticle 1 and the position of the lower lid 2b are known. Therefore, when the lower lid 2b having the reticle 1 loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid 2b is determined by taking this displacement into account. As a result, the reticle 1 can be correctly set in the exposure device.
摘要翻译：位置测量装置29测量形成在标线片1的下表面上的位置测量标记26的位置，从而测量标线1的位置。位置测量装置30测量形成在下盖2b的下表面上的位置测量标记27的位置，从而测量下盖2b的位置。当标线片1的位置和下盖2b的位置已知时，标线片1和下盖2b的相对位移是已知的。因此，当装载有掩模版1的下盖2b被携带携带装置并设置在曝光装置中时，通过考虑该位移来确定下盖2b的停止位置。结果，可以将掩模版1正确地设置在曝光装置中。

10. 发明授权

US4950667A Pyridinyl acetamide compounds useful in treating ulcers 失效
标题翻译：可用于治疗溃疡的吡啶基乙酰胺化合物
公开(公告)号：US4950667A
公开(公告)日：1990-08-21
申请号：US394565
申请日：1989-08-16
申请人： Naomichi Mitsumori , Yasuhiro Nishimura , Katsuhiro Ibata , Shiro Okuno , Motoko Suzuki
发明人： Naomichi Mitsumori , Yasuhiro Nishimura , Katsuhiro Ibata , Shiro Okuno , Motoko Suzuki
IPC分类号： A61K31/44 , A61K31/4409 , A61P1/04 , C07D213/74
CPC分类号： C07D213/74
摘要： There are provided acetamide compounds represented by the following formula; ##STR1## wherein R.sub.1 and R.sub.2 each independently represents a hydrogen atom, a C.sub.1 to C.sub.6 straight- or branched-chain alkyl or alkenyl group, a C.sub.3 to C.sub.6 cycloalkyl or cycloalkenyl group, or a C.sub.6 to C.sub.10 aromatic group; or R.sub.1 and R.sub.2 combine with each other in combination with the adjacent N and carbon atoms or further with at least one of nitrogen, oxygen and sulfur atoms to represent a 5- to 6-membered heterocyclic ring group; R.sub.3 represents hydrogen atom, a C.sub.1 to C.sub.6 straight- or branched-chain alkyl or alkenyl group, a C.sub.3 to C.sub.6 cycloalkyl or cycloalkenyl group, a halogen atom, a C.sub.1 to C.sub.6 straight- or branched-chain alkyloxy group, or a C.sub.3 to C.sub.6 cycloalkyloxy or cycloalkenyloxy group; and n is an integer of 1 to 4, and their pharmaceutically acceptable salts.The compounds and the salts exhibit potent anti-ulcer activity and are useful for treating ulcer in mammals.

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