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    • 3. 发明授权
    • Method for detecting defects in a substrate having a semiconductor device thereon
    • 用于检测其上具有半导体器件的衬底中的缺陷的方法
    • US08055057B2
    • 2011-11-08
    • US12007680
    • 2008-01-14
    • Moon-Shik KangJong-An KimMyung-Sub LeeYu-Sin YangJi-Hye Kim
    • Moon-Shik KangJong-An KimMyung-Sub LeeYu-Sin YangJi-Hye Kim
    • G06K9/00
    • G01N21/95607G01N21/9501G06T7/0006G06T2207/30148
    • An inspection apparatus and a method for detecting defects in a substrate having a semiconductor device thereon are provided. The method includes establishing a first inspection region including first patterns repeatedly formed in a first direction and a second inspection region including second patterns repeatedly formed in a second direction on the substrate, determining a first unit inspection size of the first inspection region and a second unit inspection size of the second inspection region, obtaining images of the first and second patterns by moving the substrate in the first direction, and detecting defects in the first and second inspection regions by comparing the obtained images of portions of the first and second inspection regions, respectively, with each other. The first inspection size and second inspection size function as comparison units if defects are detected. The substrate may face an image receiving member.
    • 提供一种用于检测其上具有半导体器件的衬底中的缺陷的检查装置和方法。 该方法包括建立包括在第一方向上重复形成的第一图案的第一检查区域和包括在基板上沿第二方向重复形成的第二图案的第二检查区域,确定第一检查区域的第一单位检查尺寸和第二单元检查区域 第二检查区域的检查尺寸,通过沿第一方向移动基板获得第一图案和第二图案的图像,并且通过比较获得的第一和第二检查区域的部分的图像来检测第一和第二检查区域中的缺陷, 分别彼此。 如果检测到缺陷,则第一检查尺寸和第二检查尺寸用作比较单元。 基板可面向图像接收部件。
    • 4. 发明申请
    • METHOD OF ANALYZING A WAFER SAMPLE
    • 分析样品的方法
    • US20080219547A1
    • 2008-09-11
    • US12041127
    • 2008-03-03
    • Jong-An KimYu-Sin YangChung-Sam JunMoon-Shik KangJi-Hye Kim
    • Jong-An KimYu-Sin YangChung-Sam JunMoon-Shik KangJi-Hye Kim
    • G06K9/00
    • G06T7/001G01N21/95607G06T2207/10061G06T2207/30148
    • In a method of analyzing a wafer sample, a first defect of a photoresist pattern on the wafer sample having shot regions exposed with related exposure conditions is detected. A first portion of the pattern includes the shot regions exposed with an exposure condition corresponding to a reference exposure condition and a tolerance error range of the reference exposure condition. The first defect repeatedly existing in at least two of the shot regions in a second portion of the pattern is set up as a second defect of the pattern. A first reference image displaying the second defect is obtained. The first defect of the shot regions in the first portion corresponding to the second defect is set up as a third defect corresponding to weak points of the pattern. The exposure conditions of the shot region having no weak points are set up as an exposure margin of an exposure process.
    • 在分析晶片样品的方法中,检测具有用相关曝光条件曝光的拍摄区域的晶片样品上的光致抗蚀剂图案的第一缺陷。 图案的第一部分包括用与参考曝光条件相对应的曝光条件和参考曝光条件的公差误差范围暴露的照射区域。 在图案的第二部分中的至少两个拍摄区域中重复存在的第一缺陷被设置为图案的第二缺陷。 获得显示第二缺陷的第一参考图像。 对应于第二缺陷的第一部分中的拍摄区域的第一缺陷被设置为对应于图案的弱点的第三缺陷。 没有弱点的照射区域的曝光条件被设置为曝光处理的曝光余量。
    • 5. 发明申请
    • LAMP DRIVING CIRCUIT AND DISPLAY APPARATUS HAVING THE SAME
    • 灯具驱动电路及其显示装置
    • US20080137385A1
    • 2008-06-12
    • US11933006
    • 2007-10-31
    • Moon-Shik KANG
    • Moon-Shik KANG
    • H02M7/5387
    • H05B41/2827G09G3/3406G09G2320/064H05B41/2828
    • A lamp driving circuit includes: a first voltage generator which receives a direct current power voltage and outputs a first square wave voltage in response to a first switching signal and a second switching signal having a phase inverted with respect to the first switching signal; a second voltage generator which outputs a second square wave voltage in response to a third switching signal having a phase shifted by a predetermined time with respect to the phase of the first switching signal and a fourth switching signal having a phase inverted with respect to the phase of the third switching signal; and a transformer which receives the first square wave voltage and the second square wave voltage and boosts a first driving voltage defined by an electric potential difference therebetween to a second driving voltage and applies the second driving voltage to a lamp.
    • 灯驱动电路包括:第一电压发生器,其接收直流电源电压并响应于第一开关信号输出第一方波电压,并输出相对于第一开关信号相位反相的第二开关信号; 第二电压发生器,其响应于相对于第一开关信号的相位相移了预定时间的第三开关信号输出第二方波电压,以及相对于相位相位反相的第四开关信号 的第三开关信号; 以及变压器,其接收第一方波电压和第二方波电压,并将由其间的电位差限定的第一驱动电压提升到第二驱动电压,并将第二驱动电压施加到灯。
    • 8. 发明申请
    • POWER SUPPLY APPARATUS, BACKLIGHT ASSEMBLY AND LIQUID CRYSTAL DISPLAY APPARATUS HAVING THE SAME
    • 电源装置,背光组件和液晶显示装置
    • US20080094001A1
    • 2008-04-24
    • US11958013
    • 2007-12-17
    • Hyeong-Suk YOOMoon-Shik KANG
    • Hyeong-Suk YOOMoon-Shik KANG
    • H05B41/24G05F1/00H05B41/36
    • H05B41/02G09G3/3406H02M3/33569H05B41/2851H05B41/2855H05B41/392H05B41/3927Y02B20/186
    • A power supply apparatus includes an inverter controller, a power transforming part and a connecting part. The power transforming part converts a direct current supplied from the inverter controller into an alternating current to output first and second polarity currents. The connecting part outputs the first and second polarity currents to first and second end portions of a load through first and second terminals, respectively and has a third terminal to receive a sensed signal in response to the first or second polarity currents so as to output the sensed signal. The first terminal is spaced apart from the second terminal by a first insulating distance, and the third terminal is spaced apart from the first or second terminals adjacent to the third terminal by a second insulating distance. Therefore, the sensed signal is independent of the output power, thereby increasing the sensing efficiency.
    • 电源装置包括逆变器控制器,功率变换部分和连接部分。 功率变换部分将从逆变器控制器提供的直流电转换为交流电流,以输出第一和第二极性电流。 连接部分将第一和第二极性电流分别通过第一和第二端子输出到负载的第一和第二端部,并且具有响应于第一或第二极性电流接收感测信号的第三端子,以便输出 感测信号。 第一端子与第二端子隔开第一绝缘距离,并且第三端子与第三端子相邻的第一端子或第二端子间隔开第二绝缘距离。 因此,感测到的信号与输出功率无关,从而提高感测效率。