会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明申请
    • BARRIER FILM AND LAMINATED MATERIAL, CONTAINER FOR WRAPPING AND IMAGE DISPLAY MEDIUM USING THE SAME, AND MANUFACTURING METHOD FOR BARRIER FILM
    • 遮蔽膜和层压材料,用于包装的容器和使用其的图像显示介质以及用于遮蔽膜的制造方法
    • US20090280266A1
    • 2009-11-12
    • US12509601
    • 2009-07-27
    • Minoru KOMADA
    • Minoru KOMADA
    • C23C14/14C23C14/22
    • B32B27/08C23C14/10Y10T428/31663Y10T428/31667
    • An object of the present invention is to provide a barrier film having the extremely high barrier property and the better transparency, a method for manufacturing the same, and a laminated material, a container for wrapping and an image displaying medium using the barrier film. According to the present invention, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, wherein the barrier layer is a silicon oxide film having an atomic ratio in a range of Si:O:C=100:160 to 190:30 to 50, a peak position of infrared-ray absorption due to Si—O—Si stretching vibration between 1030 to 1060 cm−1, a film density in a range of 2.5 to 2.7 g/cm3, and a distance between grains of 30 nm or shorter. Still more, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, wherein the barrier layer is a silicon oxi-nitride film having an atomic ratio in a range of Si:O:N:C=100:80 to 110:40 to 70:30 to 50, a maximum peak of infrared-ray absorption due to Si—O stretching vibration and Si—N stretching vibration in a range of 900 to 1000 cm−1, a film density in a range of 2.7 to 3.0 g/cm3, and a distance between grains of 30 nm or shorter.
    • 本发明的目的是提供一种具有极高的阻隔性和更好的透明度的阻挡膜及其制造方法,以及叠层材料,用于包装的容器和使用阻挡膜的图像显示介质。 根据本发明,提供了一种在基材膜的至少一个表面上设置有阻挡层的阻挡膜,其中阻挡层是原子比在Si:O:C = 100:160〜190:30〜50,由于Si-O-Si伸缩振动在1030〜1060cm -1之间的红外线吸收的峰值位置,膜密度在2.5〜2.7g / cm 3的范围内, 颗粒之间的距离为30nm或更短。 另外,在衬底膜的至少一个表面上设置有阻挡层的阻挡膜,其中阻挡层是原子比在Si:O:N:C的范围内的氧化硅氮化物膜 = 100:80〜110:40〜70:30〜50,由于Si-O伸缩振动和Si-N伸缩振动在900〜1000cm -1范围内的红外线吸收的最大峰值,膜密度 在2.7〜3.0g / cm 3的范围内,粒子间的距离为30nm以下。
    • 3. 发明授权
    • Barrier film
    • 屏障电影
    • US07288311B2
    • 2007-10-30
    • US10774709
    • 2004-02-09
    • Sayaka KawashimaMinoru KomadaShinya Satou
    • Sayaka KawashimaMinoru KomadaShinya Satou
    • B32B7/02B32B9/04B32B19/00
    • C23C16/30Y10T428/24942Y10T428/2495Y10T428/24992Y10T428/31504
    • A barrier film is provided having extremely high barrier properties and a good transparency as part of a laminated material having use as a packaging container which may possess an image display medium, the high barrier properties and good transparency which are achieved with a barrier film comprised of a base material film and a barrier layer deposited on at least one side surface of the base material film, with the barrier layer comprising a water repellent layer and a dense layer, the water repellent layer being a silicon oxide carbide film having the atomic percent of Si:O:C in a range of 100:40 to 120:80 to 160, and the thickness in a range of 2 to 300 nm, and the dense layer being a silicon oxide carbide film having the atomic percent of Si:O:C in a range of 100:100 to 200:5 to 100, and the thickness in a range of 5 to 300 nm.
    • 提供了具有非常高的阻隔性和良好透明性的阻挡膜,作为可以具有图像显示介质的包装容器的层压材料的一部分,高阻隔性和良好的透明性,其通过由 基材膜和阻挡层,其沉积在所述基材膜的至少一个侧表面上,所述阻挡层包含防水层和致密层,所述防水层为氧化硅碳化物膜,所述氧化硅碳化物膜的原子百分比为 Si:O:C在100:40至120:80至160的范围内,厚度在2至300nm的范围内,致密层是具有Si:O原子百分比的氧化硅碳化物膜, C在100:100至200:5至100的范围内,厚度在5至300nm的范围内。
    • 8. 发明申请
    • Organic EL display panel
    • 有机EL显示面板
    • US20050084708A1
    • 2005-04-21
    • US10755931
    • 2004-01-13
    • Daisaku HaotoKenji TanakaMinoru Komada
    • Daisaku HaotoKenji TanakaMinoru Komada
    • G02B5/20H01L27/32H01L51/50H01L51/52H05B33/00H05B33/04H05B33/12H05B33/14
    • H01L51/5256H01L27/322Y10T428/24942
    • The main object is to provide an organic EL display panel capable of achieving the electromagnetic wave blocking effect without providing newly an electromagnetic wave blocking layer, and to provide an organic EL display panel having a barrier film with an uniform composition even in the case it is produced using an in line type device, capable of preventing the light emission deterioration of the organic EL due to the gas outputted from the base member, such as the oxygen and the moisture. The organic EL display panel comprises a base member, an organic EL element, and a barrier layer provided between the base member and the organic EL element, wherein the barrier layer comprises two kinds of laminated inorganic films, the inorganic film on the base member side out of the two kinds of the inorganic films is an inorganic oxide film having the conductivity, and the inorganic film on the organic EL element side is an inorganic film having the gas barrier property and the insulation property.
    • 主要目的是提供一种能够实现电磁波阻挡效果而不提供电磁波阻挡层的有机EL显示面板,并且提供具有均匀组成的阻挡膜的有机EL显示面板,即使在它是 使用在线型装置制造的,能够防止由于基底部件输出的气体(例如氧气和水分)引起的有机EL的发光劣化。 有机EL显示面板包括基底构件,有机EL元件和设置在基底构件和有机EL元件之间的阻挡层,其中阻挡层包括两种层叠无机膜,基底构件侧的无机膜 两种无机膜中的两种是具有导电性的无机氧化物膜,有机EL元件侧的无机膜是具有阻气性和绝缘性的无机膜。
    • 9. 发明授权
    • Barrier film and laminated material, container for wrapping and image display medium using the same, and manufacturing method for barrier film
    • 阻隔膜和层压材料,用于包装的容器和使用其的图像显示介质,以及阻挡膜的制造方法
    • US08673404B2
    • 2014-03-18
    • US12509601
    • 2009-07-27
    • Minoru Komada
    • Minoru Komada
    • C23C16/10C23C16/08C23C16/24B32B27/08H05H1/24
    • B32B27/08C23C14/10Y10T428/31663Y10T428/31667
    • An object of the present invention is to provide a barrier film having the extremely high barrier property and the better transparency, a method for manufacturing the same, and a laminated material, a container for wrapping and an image displaying medium using the barrier film. According to the present invention, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, wherein the barrier layer is a silicon oxide film having an atomic ratio in a range of Si:O:C=100:160 to 190:30 to 50, a peak position of infrared-ray absorption due to Si—O—Si stretching vibration between 1030 to 1060 cm−1, a film density in a range of 2.5 to 2.7 g/cm3, and a distance between grains of 30 nm or shorter. Still more, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, wherein the barrier layer is a silicon oxi-nitride film having an atomic ratio in a range of Si:O:N:C=100:80 to 110:40 to 70:30 to 50, a maximum peak of infrared-ray absorption due to Si—O stretching vibration and Si—N stretching vibration in a range of 900 to 1000 cm−1, a film density in a range of 2.7 to 3.0 g/cm3, and a distance between grains of 30 nm or shorter.
    • 本发明的目的是提供一种具有极高的阻隔性和更好的透明度的阻挡膜及其制造方法,以及叠层材料,用于包装的容器和使用阻挡膜的图像显示介质。 根据本发明,提供了一种在基材膜的至少一个表面上设置有阻挡层的阻挡膜,其中阻挡层是原子比在Si:O:C = 100:160〜190:30〜50,由于Si-O-Si伸缩振动在1030〜1060cm -1之间的红外线吸收的峰值位置,膜密度在2.5〜2.7g / cm 3的范围内, 颗粒之间的距离为30nm或更短。 另外,在衬底膜的至少一个表面上设置有阻挡层的阻挡膜,其中阻挡层是原子比在Si:O:N:C的范围内的氧化硅氮化物膜 = 100:80〜110:40〜70:30〜50,由于Si-O伸缩振动和Si-N伸缩振动在900〜1000cm -1范围内的红外线吸收的最大峰值,膜密度 在2.7〜3.0g / cm 3的范围内,粒子间的距离为30nm以下。
    • 10. 发明申请
    • BARRIER FILM AND LAMINATED MATERIAL, CONTAINER FOR WRAPPING AND IMAGE DISPLAY MEDIUM USING THE SAME, AND MANUFACTURING METHOD FOR BARRIER FILM
    • 遮蔽膜和层压材料,用于包装的容器和使用其的图像显示介质以及用于遮蔽膜的制造方法
    • US20100075082A1
    • 2010-03-25
    • US12631991
    • 2009-12-07
    • Minoru KOMADAYoshihiro KISHIMOTO
    • Minoru KOMADAYoshihiro KISHIMOTO
    • B32B1/02B32B27/06C23C14/34C23C14/35C23C14/36
    • C23C14/10B32B27/00B32B33/00B32B2307/7244B32B2553/00C23C14/0676H01L21/02126H01L21/02266H01L21/3143H01L21/31633Y10T428/1064Y10T428/1334Y10T428/1352Y10T428/265Y10T428/28Y10T428/31667
    • An object of the present invention is to provide a barrier film having the extremely high barrier property and the better transparency, a method for manufacturing the same, and a laminated material, a container for wrapping and an image displaying medium using the barrier film. According to the present invention, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, wherein the barrier layer is a silicon oxide film having an atomic ratio in a range of Si:O:C=100:140 to 170:20 to 40, peak position of infrared-ray absorption due to Si—O—Si stretching vibration between 1060 to 1090 cm−1, a film density in a range of 2.6 to 2.8 g/cm3, and a distance between grains of 30 nm or shorter. Still more, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, has a composition wherein the barrier layer is a silicon oxi-nitride film, and the silicon oxi-nitride film has an atomic ratio in a range of Si:O:N:C=100:60 to 90:60 to 90:20 to 40, a maximum peak of infrared-ray absorption due to Si—O stretching vibration and Si—N stretching vibration is in a range of 820 to 930 cm−1, a film density is in a range of 2.9 to 3.2 g/cm3, and a distance between grains is 30 nm or shorter.
    • 本发明的目的是提供一种具有极高的阻隔性和更好的透明度的阻挡膜及其制造方法,以及叠层材料,用于包装的容器和使用阻挡膜的图像显示介质。 根据本发明,提供了一种在基材膜的至少一个表面上设置有阻挡层的阻挡膜,其中阻挡层是原子比在Si:O:C = 100:140〜170:20〜40,由于Si-O-Si伸长振动在1060〜1090cm -1之间的红外线吸收的峰值位置,膜密度在2.6〜2.8g / cm 3范围内, 颗粒之间的距离为30nm或更短。 另外,提供了在基板薄膜的至少一个表面上设置有阻挡层的阻挡膜,具有其中阻挡层为硅氧化氮膜的组成,硅氧化氮膜具有原子比 在Si:O:N:C = 100:60至90:60至90:20至40的范围内,由于Si-O伸缩振动和Si-N伸缩振动导致的红外线吸收的最大峰值为 范围为820〜930cm -1,膜密度为2.9〜3.2g / cm 3,晶粒间距离为30nm以下。