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1. 发明授权

US07421110B2 Image processing unit for wafer inspection tool 失效
标题翻译：晶圆检测工具图像处理单元
公开(公告)号：US07421110B2
公开(公告)日：2008-09-02
申请号：US10780752
申请日：2004-02-19
申请人： Michio Nakano , Shigeya Tanaka , Yoshiyuki Momiyama , Takashi Hiroi , Kazuya Hayashi , Dai Fujii , Takako Fujisawa , Atsushi Ichige , Ichiro Kawashima
发明人： Michio Nakano , Shigeya Tanaka , Yoshiyuki Momiyama , Takashi Hiroi , Kazuya Hayashi , Dai Fujii , Takako Fujisawa , Atsushi Ichige , Ichiro Kawashima
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2200/28 , G06T2207/30148
摘要： An image processing apparatus for wafer inspection tool that is able to perform continuously cell to cell comparison inspection, die to die comparison inspection, and cell-to-cell and die-to-die hybrid comparison inspection, employing a plurality of processors. This image processing apparatus for wafer inspection tool comprises a plurality of processors for performing parallel processing, means for cutting out image data including a forward end overlap and a rear end overlap at partition boundaries in order to cut serial data into a predetermined image size, means for distributing the cutout image data to the plurality of processors, and means for assembling results of processing performed by the plurality of processors. The forward end overlap is set greater than a pitch of the cell subject to cell to cell comparison inspection.
摘要翻译：一种用于晶片检查工具的图像处理装置，其能够执行连续的单元到单元比较检查，管芯到管芯比较检查，以及使用多个处理器的单元到单元和管芯到管芯的混合比较检查。这种晶片检查工具的图像处理装置包括用于执行并行处理的多个处理器，用于在分区边界处切出包括前端重叠和后端重叠的图像数据的装置，以便将串行数据切割成预定图像尺寸用于将剪切图像数据分配给多个处理器，以及用于组装由多个处理器执行的处理结果的装置。前端重叠被设定为大于细胞对细胞比较检查的细胞的间距。

2. 发明授权

US07889911B2 Image processing unit for wafer inspection tool 有权
标题翻译：晶圆检测工具图像处理单元
公开(公告)号：US07889911B2
公开(公告)日：2011-02-15
申请号：US12170532
申请日：2008-07-10
申请人： Michio Nakano , Shigeya Tanaka , Yoshiyuki Momiyama , Takashi Hiroi , Kazuya Hayashi , Dai Fujii , Takako Fujisawa , Atsushi Ichige , Ichiro Kawashima
发明人： Michio Nakano , Shigeya Tanaka , Yoshiyuki Momiyama , Takashi Hiroi , Kazuya Hayashi , Dai Fujii , Takako Fujisawa , Atsushi Ichige , Ichiro Kawashima
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2200/28 , G06T2207/30148
摘要： An image processing apparatus for wafer inspection tool that is able to perform continuously cell to cell comparison inspection, die to die comparison inspection, and cell-to-cell and die-to-die hybrid comparison inspection, employing a plurality of processors. This image processing apparatus for wafer inspection tool comprises a plurality of processors for performing parallel processing, means for cutting out image data including a forward end overlap and a rear end overlap at partition boundaries in order to cut serial data into a predetermined image size, means for distributing the cutout image data to the plurality of processors, and means for assembling results of processing performed by the plurality of processors. The forward end overlap is set greater than a pitch of the cell subject to cell to cell comparison inspection.
摘要翻译：一种用于晶片检查工具的图像处理装置，其能够执行连续的单元到单元比较检查，管芯到管芯比较检查，以及使用多个处理器的单元到单元和管芯到管芯之间的混合比较检查。这种晶片检查工具的图像处理装置包括用于执行并行处理的多个处理器，用于在分区边界处切出包括前端重叠和后端重叠的图像数据的装置，以便将串行数据切割成预定图像尺寸用于将剪切图像数据分配给多个处理器，以及用于组装由多个处理器执行的处理结果的装置。前端重叠被设定为大于细胞对细胞比较检查的细胞的间距。

3. 发明授权

US5273810A Polybutylene terephthalate molding composition and molded thin-walled articles therefrom 失效
标题翻译：聚对苯二甲酸丁二醇酯模塑组合物及其成型薄壁制品
公开(公告)号：US5273810A
公开(公告)日：1993-12-28
申请号：US792521
申请日：1991-11-15
申请人： Michio Nakano , Osamu Kanoto , Kazuya Goshima , Nobuyuki Matsunaga
发明人： Michio Nakano , Osamu Kanoto , Kazuya Goshima , Nobuyuki Matsunaga
IPC分类号： C08J5/00 , C08K3/40 , C08K5/09 , C08K5/098 , C08K7/00 , C08L67/00 , C08L67/02 , B32B5/16 , B32B27/06
CPC分类号： C08K3/40 , C08K5/098 , Y10S264/53 , Y10T428/24967 , Y10T428/254 , Y10T428/258 , Y10T428/259 , Y10T428/31533 , Y10T428/3154 , Y10T428/31721 , Y10T428/31725 , Y10T428/31786 , Y10T428/31935
摘要： Thin-walled molded articles (i.e., molded articles where at least 70% of the wall thickness is 0.8 mm or less) are formed of a polybutylene terephthalate (PBT) molding composition having improved fluidity characteristics and desirable mechanical strength properties. The PBT molding composition includes (A) 100 parts by weight of a polybutylene terephthalate base resin having a melt index of between 40 and 200 as measured at 235.degree. C. under a load of 2160 grams according to ASTM D-1238; (B) between 1 to 60 parts by weight of plate-like glass flakes having an average flake dimension of between 10 to 200 .mu.m; and (C) between 0.01 to 5 parts by weight of a fatty acid metal salt.

4. 发明申请

US20100008564A1 INSPECTION APPARATUS FOR INSPECTING PATTERNS OF A SUBSTRATE 失效
标题翻译：检查基板图案的检查装置
公开(公告)号：US20100008564A1
公开(公告)日：2010-01-14
申请号：US12564567
申请日：2009-09-22
申请人： Koichi HAYAKAWA , Hiroshi Miyai , Masaaki Nojiri , Michio Nakano , Takako Fujisawa , Dai Fujii
发明人： Koichi HAYAKAWA , Hiroshi Miyai , Masaaki Nojiri , Michio Nakano , Takako Fujisawa , Dai Fujii
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： A pattern inspection apparatus has a setting unit of a plurality of cell areas A and B of different cell comparison pitches and inspects the plurality of cell areas of the different cell comparison pitches in accordance with settings of the setting unit. As information to read out image data for an inspection image and a reference image from an image memory, in addition to position information of a defective image, identification information showing either a cell comparison or a die comparison and relative position information of the reference image can be set. The apparatus also has a unit for setting a plurality of inspection threshold values every inspection area and inspects a plurality of inspection areas by the plurality of inspection threshold values.
摘要翻译：图案检查装置具有不同的单元比较间距的多个单元区域A和B的设置单元，并且根据设置单元的设置检查不同单元比较间距的多个单元区域。作为用于从图像存储器读出检查图像和参考图像的图像数据的信息，除了缺陷图像的位置信息之外，还可以显示小区比较或者模具比较的标识信息以及参考图像的相对位置信息被设置。该设备还具有用于在每个检查区域设置多个检查阈值的单元，并且通过多个检查阈值检查多个检查区域。

5. 发明授权

US08036447B2 Inspection apparatus for inspecting patterns of a substrate 失效
标题翻译：用于检查基板图案的检查装置
公开(公告)号：US08036447B2
公开(公告)日：2011-10-11
申请号：US12564567
申请日：2009-09-22
申请人： Koichi Hayakawa , Hiroshi Miyai , Masaaki Nojiri , Michio Nakano , Takako Fujisawa , Dai Fujii
发明人： Koichi Hayakawa , Hiroshi Miyai , Masaaki Nojiri , Michio Nakano , Takako Fujisawa , Dai Fujii
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： A pattern inspection apparatus has a setting unit of a plurality of cell areas A and B of different cell comparison pitches and inspects the plurality of cell areas of the different cell comparison pitches in accordance with settings of the setting unit. As information to read out image data for an inspection image and a reference image from an image memory, in addition to position information of a defective image, identification information showing either a cell comparison or a die comparison and relative position information of the reference image can be set. The apparatus also has a unit for setting a plurality of inspection threshold values every inspection area and inspects a plurality of inspection areas by the plurality of inspection threshold values.
摘要翻译：图案检查装置具有不同的单元比较间距的多个单元区域A和B的设置单元，并且根据设置单元的设置来检查不同单元比较间距的多个单元区域。作为用于从图像存储器读出检查图像和参考图像的图像数据的信息，除了缺陷图像的位置信息之外，还可以显示小区比较或者模具比较的标识信息以及参考图像的相对位置信息被设置。该设备还具有用于在每个检查区域设置多个检查阈值的单元，并且通过多个检查阈值检查多个检查区域。

6. 发明申请

US20080285841A1 IMAGE PROCESSING UNIT FOR WAFER INSPECTION TOOL 有权
标题翻译：用于检测工具的图像处理单元
公开(公告)号：US20080285841A1
公开(公告)日：2008-11-20
申请号：US12170532
申请日：2008-07-10
申请人： Michio NAKANO , Shigeya Tanaka , Yoshiyuki Momiyama , Takashi Hiroi , Kazuya Hayashi , Dai Fujii , Takako Fujisawa , Atsushi Ichige , Ichiro Kawashima
发明人： Michio NAKANO , Shigeya Tanaka , Yoshiyuki Momiyama , Takashi Hiroi , Kazuya Hayashi , Dai Fujii , Takako Fujisawa , Atsushi Ichige , Ichiro Kawashima
IPC分类号： G06K9/46
CPC分类号： G06T7/001 , G06T2200/28 , G06T2207/30148
摘要： An image processing apparatus for wafer inspection tool that is able to perform continuously cell to cell comparison inspection, die to die comparison inspection, and cell-to-cell and die-to-die hybrid comparison inspection, employing a plurality of processors. This image processing apparatus for wafer inspection tool comprises a plurality of processors for performing parallel processing, means for cutting out image data including a forward end overlap and a rear end overlap at partition boundaries in order to cut serial data into a predetermined image size, means for distributing the cutout image data to the plurality of processors, and means for assembling results of processing performed by the plurality of processors. The forward end overlap is set greater than a pitch of the cell subject to cell to cell comparison inspection.
摘要翻译：一种用于晶片检查工具的图像处理装置，其能够执行连续的单元到单元比较检查，管芯到管芯比较检查，以及使用多个处理器的单元到单元和管芯到管芯之间的混合比较检查。这种晶片检查工具的图像处理装置包括用于执行并行处理的多个处理器，用于在分区边界处切出包括前端重叠和后端重叠的图像数据的装置，以便将串行数据切割成预定图像尺寸用于将剪切图像数据分配给多个处理器，以及用于组装由多个处理器执行的处理结果的装置。前端重叠被设定为大于细胞对细胞比较检查的细胞的间距。

7. 发明申请

US20080099675A1 Inspection apparatus and an inspection method 审中-公开
标题翻译：检验仪器和检验方法
公开(公告)号：US20080099675A1
公开(公告)日：2008-05-01
申请号：US11976965
申请日：2007-10-30
申请人： Takashi Hiroi , Hiroshi Miyai , Hirokazu Ito , Michio Nakano
发明人： Takashi Hiroi , Hiroshi Miyai , Hirokazu Ito , Michio Nakano
IPC分类号： G21K5/04
CPC分类号： G06T7/001 , G06T2200/24 , G06T2207/10061 , G06T2207/30148 , H01J2237/2817
摘要： An inspection apparatus includes an irradiation optical system for irradiating an inspection target with an electron beam, a scanning unit for scanning an irradiation position in the X direction and the Y direction, an electrification control electrode for controlling secondary electrons or reflected electrons generated on the inspection target by the irradiation with the electron beam, a sensor for detecting the secondary electrons or the reflected electrons, an A/D converter for sequentially converting the signals into digital image signals from an irradiation start point-in-time of the electron beam, an addition circuit for creating a detection image by adding the digital image signals from a first set point-in-time to a second set point-in-time on each pixel basis, and an image processing circuit for judging a defect by comparing the detection image with a reference image of a circuit pattern formed on the inspection target.
摘要翻译：一种检查装置，包括：用于用电子束照射检查对象的照射光学系统，用于扫描X方向和Y方向的照射位置的扫描单元，用于控制在检查中产生的二次电子或反射电子的带电控制电极通过用电子束照射的目标，用于检测二次电子或反射电子的传感器，用于从电子束的照射开始时间点将信号顺序地转换成数字图像信号的A / D转换器，用于通过在每个像素的基础上将来自第一设定时刻的数字图像信号与第二设定时间点相加来创建检测图像的加法电路，以及用于通过比较检测图像来判断缺陷的图像处理电路具有形成在检查对象上的电路图案的参照图像。

8. 发明申请

US20060171593A1 Inspection apparatus for inspecting patterns of a substrate 审中-公开
标题翻译：用于检查基板图案的检查装置
公开(公告)号：US20060171593A1
公开(公告)日：2006-08-03
申请号：US11344101
申请日：2006-02-01
申请人： Koichi Hayakawa , Hiroshi Miyai , Masaaki Nojiri , Michio Nakano , Takako Fujisawa , Dai Fujii
发明人： Koichi Hayakawa , Hiroshi Miyai , Masaaki Nojiri , Michio Nakano , Takako Fujisawa , Dai Fujii
IPC分类号： G06K9/62 , G06K9/64 , G06K9/68
CPC分类号： G06T7/001 , G06T2207/30148
摘要： A pattern inspection apparatus has a setting unit of a plurality of cell areas A and B of different cell comparison pitches and inspects the plurality of cell areas of the different cell comparison pitches in accordance with settings of the setting unit. As information to read out image data for an inspection image and a reference image from an image memory, in addition to position information of a defective image, identification information showing either a cell comparison or a die comparison and relative position information of the reference image can be set. The apparatus also has a unit for setting a plurality of inspection threshold values every inspection area and inspects a plurality of inspection areas by the plurality of inspection threshold values.
摘要翻译：图案检查装置具有不同的单元比较间距的多个单元区域A和B的设置单元，并且根据设置单元的设置检查不同单元比较间距的多个单元区域。作为用于从图像存储器读出检查图像和参考图像的图像数据的信息，除了缺陷图像的位置信息之外，还可以显示小区比较或者模具比较的标识信息以及参考图像的相对位置信息被设置。该设备还具有用于在每个检查区域设置多个检查阈值的单元，并且通过多个检查阈值检查多个检查区域。

9. 发明授权

US5043371A Flame-retardant polybutylene terephthalate resin composition and molded article for electrical component 失效
标题翻译：阻燃聚对苯二甲酸丁二醇酯树脂组合物和电子部件用成型体
公开(公告)号：US5043371A
公开(公告)日：1991-08-27
申请号：US309867
申请日：1989-02-14
申请人： Michio Nakano , Hirouki Amono , Hiroshi Nakatsuji
发明人： Michio Nakano , Hirouki Amono , Hiroshi Nakatsuji
IPC分类号： C08K5/34 , C08K5/3412 , C08L67/00 , C08L67/02 , H01B3/42
CPC分类号： H01B3/422 , C08K5/3412 , C08L67/02
摘要： A resin composition comprises a polybutylene terephthalate, a halogenated bisimide having the formula (1) and a polytetrafluoroethylene resin and is improved in flame retardancy and at the same time moulding properties. It is useful for parts of electric instruments. ##STR1##

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