专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06610460B2 Exposure method 失效
公开(公告)号：US06610460B2
公开(公告)日：2003-08-26
申请号：US10195394
申请日：2002-07-16
申请人： Masaya Komatsu , Kyoichi Suwa , Kazuo Ushida
发明人： Masaya Komatsu , Kyoichi Suwa , Kazuo Ushida
IPC分类号： G03F720
CPC分类号： G03F7/70466 , G03F1/50 , G03F1/70 , G03F7/2022
摘要： An exposure method comprises the steps of: providing a resist-coated substrate; providing a first mask including first and second regions having respective patterns formed therein; conducting a first exposure process in which the patterns in the first and second regions of the first mask are projected onto the substrate so as to expose first and second regions of the substrate which correspond to the patterns, respectively; and conducting a second exposure process after completion of said first exposure process so as to make an additional exposure of the second region of the substrate. By virtue of the incorporation of the second exposure process so as to make an additional exposure of the second region of the substrate, the resist linewidth which would be otherwise produced in the second region of the substrate by the first exposure process can be compensated through the second exposure process.

2. 发明授权

US5739898A Exposure method and apparatus 失效
标题翻译：曝光方法和装置
公开(公告)号：US5739898A
公开(公告)日：1998-04-14
申请号：US312241
申请日：1994-09-26
申请人： Toshihiko Ozawa , Masaya Komatsu , Masato Shibuya , Hiroshi Ooki , Masaomi Kameyama , Yoshifumi Tokoyoda
发明人： Toshihiko Ozawa , Masaya Komatsu , Masato Shibuya , Hiroshi Ooki , Masaomi Kameyama , Yoshifumi Tokoyoda
IPC分类号： G03F7/20 , G03B27/32 , G03B27/42
CPC分类号： G03F7/70566 , G03F7/70125 , G03F7/70475 , G03F7/70583
摘要： The present invention relates to a projection exposure method and an exposure apparatus for projecting a pattern on a photo-mask through a projection optical system onto a predetermined photosensitive material. The photosensitive material is a nonlinear photosensitive material in which the effective light intensity distribution is nonlinear to the intensity of incident exposure light. Further, multiple exposure is made with plural patterns having a certain lateral shift therebetween, or multiple exposure is made with shifting the position of an identical pattern, whereby multiple exposure is effected with patterns different in intensity distribution on the photosensitive material. A high-resolution pattern can be formed over the resolution limit of projection optical system by the above arrangement.
摘要翻译：本发明涉及一种用于通过投影光学系统将光掩模上的图案投影到预定感光材料上的投影曝光方法和曝光装置。感光材料是非线性感光材料，其中有效光强度分布对入射曝光光的强度是非线性的。此外，通过在其间具有一定的横向偏移的多个图案进行多次曝光，或者通过移位相同图案的位置进行多次曝光，由此通过感光材料上的强度分布不同的图案来实现多次曝光。通过上述布置，可以在投影光学系统的分辨率极限上形成高分辨率图案。

3. 发明授权

US5682226A Photomask, an exposure method and a projection exposure apparatus 失效
标题翻译：光掩模，曝光方法和投影曝光装置
公开(公告)号：US5682226A
公开(公告)日：1997-10-28
申请号：US731917
申请日：1996-10-22
申请人： Satoru Anzai , Masaya Komatsu
发明人： Satoru Anzai , Masaya Komatsu
IPC分类号： G03F7/20 , G03B27/42 , G03B27/52 , G03B27/72
CPC分类号： G03F7/703 , G03F7/70241
摘要： A photomask is provided having a stepped portion formed on at least one of a first and second areas corresponding to a stepped structure within an exposure area on the sensitive substrate onto which the pattern is to be exposed to make different height positions of the first and second areas of the pattern forming surface of the transparent substrate in the optical axis direction of the projection optical system. Also provided is an exposure method involving the step of shifting an image forming surface of a projection optical system in an optical axis direction corresponding to a stepped structure of an exposure area on a sensitive substrate, The image forming surface of the projection optical system coincides with the exposure area surface when exposing the pattern on an original substrate onto the sensitive substrate through the projection optical system. A projection exposure apparatus is also provided including a projection optical system for projecting and forming an image of a pattern on the original substrate on the sensitive substrate, and a stage for retaining the sensitive substrate so that the surface of the sensitive substrate is disposed close to the image forming surface, The exposure apparatus also has an image surface compensating member for shifting the image forming surface in the optical axis direction corresponding to the stepped structure.
摘要翻译：提供了一种光掩模，其具有形成在与敏感基板上的曝光区域内的阶梯状结构对应的第一和第二区域中的至少一个上的阶梯部分，在该曝光区域上将要暴露图案以使第一和第二图案的不同高度位置在投影光学系统的光轴方向上的透明基板的图案形成面的区域。还提供了一种曝光方法，其包括将投影光学系统的图像形成表面沿对应于敏感基板上的曝光区域的阶梯状结构的光轴方向移动的步骤。投影光学系统的图像形成表面与当通过投影光学系统将原始基板上的图案曝光到敏感基板上时的曝光区域表面。还提供了一种投影曝光装置，包括投影光学系统，用于在敏感基板上的原始基板上投射和形成图案的图像;以及台，用于保持敏感基板，使得敏感基板的表面设置成靠近图像形成表面。曝光装置还具有用于使图像形成表面沿对应于阶梯状结构的光轴方向移动的图像表面补偿构件。

4. 发明授权

US5592259A Photomask, an exposure method and a projection exposure apparatus 失效
标题翻译：光掩模，曝光方法和投影曝光装置
公开(公告)号：US5592259A
公开(公告)日：1997-01-07
申请号：US573760
申请日：1995-12-18
申请人： Satoru Anzai , Masaya Komatsu
发明人： Satoru Anzai , Masaya Komatsu
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： G03F7/703 , G03F7/70241
摘要： A photomask is provided having a stepped portion formed on at least one of a first and second areas corresponding to a stepped structure within an exposure area on the sensitive substrate onto which the pattern is to be exposed to make different height positions of the first and second areas of the pattern forming surface of the transparent substrate in the optical axis direction of the projection optical system. Also provides is an exposure method involving the step of shifting an image forming surface of a projection optical system in an optical axis direction corresponding to a stepped structure of an exposure area on a sensitive substrate. The image forming surface of the projection optical system coincides with the exposure area surface when exposing the pattern on an original substrate onto the sensitive substrate through the projection optical system. A projection exposure apparatus is also provided including a projection optical system for projecting and forming an image of a pattern on the original substrate on the sensitive substrate, and a stage for retaining the sensitive substrate so that the surface of the sensitive substrate is disposed close to the image forming surface. The exposure apparatus also has an image surface compensating member for shifting the image forming surface in the optical axis direction corresponding to the stepped structure.
摘要翻译：提供一种光掩模，其具有形成在与敏感基板上的曝光区域内的阶梯状结构对应的第一和第二区域中的至少一个上的阶梯部分，图案将暴露在其上以使第一和第二部分的不同高度位置在投影光学系统的光轴方向上的透明基板的图案形成面的区域。还提供了一种曝光方法，其涉及将投影光学系统的图像形成表面沿对应于敏感基板上的曝光区域的阶梯状结构的光轴方向移位的步骤。当通过投影光学系统将原始基板上的图案曝光到敏感基板上时，投影光学系统的图像形成表面与曝光区域表面重合。还提供了一种投影曝光装置，包括投影光学系统，用于在敏感基板上的原始基板上投射和形成图案的图像;以及台，用于保持敏感基板，使得敏感基板的表面设置成靠近图像形成表面。曝光装置还具有用于使图像形成面沿与阶梯状结构对应的光轴方向移动的图像面补偿部件。

5. 发明授权

US5508132A Photo mask 失效
标题翻译：照片面具
公开(公告)号：US5508132A
公开(公告)日：1996-04-16
申请号：US272861
申请日：1994-07-08
申请人： Masaya Komatsu
发明人： Masaya Komatsu
IPC分类号： G03F1/68 , G03F1/26 , G03F1/30 , G03F1/80 , H01L21/027 , G03F9/00
CPC分类号： G03F1/26
摘要： A phase-shifted photo mask capable of discrimination between phase shifting portions and a transparent portion (a bare surface portion of a substrate) by microscope observation with visible light. An SOG (spin-on-glass) layer mixed with inorganic colored ions (Co.sup.2+, Mn.sup.3+, Ni.sup.2+ or the like) having an absorption characteristic to the visible light is formed on the surface of the substrate which is substantially transparent to an exposure light (ultraviolet light) and the undesired portions of the SOG layer excluding the portions which are to form the phase shifting portions are removed.
摘要翻译：通过用可见光显微镜观察，能够区分相移部分和透明部分（基板的裸露表面部分）之间的相移光掩膜。在对曝光光基本上透明的基板的表面上形成有与可见光具有吸收特性的无机着色离子（Co2 +，Mn3 +，Ni2 +等）混合的SOG（旋涂玻璃）层紫外光），除去除了形成相移部分的部分之外的SOG层的不希望的部分。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式