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1. 发明授权

US5682226A Photomask, an exposure method and a projection exposure apparatus 失效
标题翻译：光掩模，曝光方法和投影曝光装置
公开(公告)号：US5682226A
公开(公告)日：1997-10-28
申请号：US731917
申请日：1996-10-22
申请人： Satoru Anzai , Masaya Komatsu
发明人： Satoru Anzai , Masaya Komatsu
IPC分类号： G03F7/20 , G03B27/42 , G03B27/52 , G03B27/72
CPC分类号： G03F7/703 , G03F7/70241
摘要： A photomask is provided having a stepped portion formed on at least one of a first and second areas corresponding to a stepped structure within an exposure area on the sensitive substrate onto which the pattern is to be exposed to make different height positions of the first and second areas of the pattern forming surface of the transparent substrate in the optical axis direction of the projection optical system. Also provided is an exposure method involving the step of shifting an image forming surface of a projection optical system in an optical axis direction corresponding to a stepped structure of an exposure area on a sensitive substrate, The image forming surface of the projection optical system coincides with the exposure area surface when exposing the pattern on an original substrate onto the sensitive substrate through the projection optical system. A projection exposure apparatus is also provided including a projection optical system for projecting and forming an image of a pattern on the original substrate on the sensitive substrate, and a stage for retaining the sensitive substrate so that the surface of the sensitive substrate is disposed close to the image forming surface, The exposure apparatus also has an image surface compensating member for shifting the image forming surface in the optical axis direction corresponding to the stepped structure.
摘要翻译：提供了一种光掩模，其具有形成在与敏感基板上的曝光区域内的阶梯状结构对应的第一和第二区域中的至少一个上的阶梯部分，在该曝光区域上将要暴露图案以使第一和第二图案的不同高度位置在投影光学系统的光轴方向上的透明基板的图案形成面的区域。还提供了一种曝光方法，其包括将投影光学系统的图像形成表面沿对应于敏感基板上的曝光区域的阶梯状结构的光轴方向移动的步骤。投影光学系统的图像形成表面与当通过投影光学系统将原始基板上的图案曝光到敏感基板上时的曝光区域表面。还提供了一种投影曝光装置，包括投影光学系统，用于在敏感基板上的原始基板上投射和形成图案的图像;以及台，用于保持敏感基板，使得敏感基板的表面设置成靠近图像形成表面。曝光装置还具有用于使图像形成表面沿对应于阶梯状结构的光轴方向移动的图像表面补偿构件。

2. 发明授权

US5592259A Photomask, an exposure method and a projection exposure apparatus 失效
标题翻译：光掩模，曝光方法和投影曝光装置
公开(公告)号：US5592259A
公开(公告)日：1997-01-07
申请号：US573760
申请日：1995-12-18
申请人： Satoru Anzai , Masaya Komatsu
发明人： Satoru Anzai , Masaya Komatsu
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： G03F7/703 , G03F7/70241
摘要： A photomask is provided having a stepped portion formed on at least one of a first and second areas corresponding to a stepped structure within an exposure area on the sensitive substrate onto which the pattern is to be exposed to make different height positions of the first and second areas of the pattern forming surface of the transparent substrate in the optical axis direction of the projection optical system. Also provides is an exposure method involving the step of shifting an image forming surface of a projection optical system in an optical axis direction corresponding to a stepped structure of an exposure area on a sensitive substrate. The image forming surface of the projection optical system coincides with the exposure area surface when exposing the pattern on an original substrate onto the sensitive substrate through the projection optical system. A projection exposure apparatus is also provided including a projection optical system for projecting and forming an image of a pattern on the original substrate on the sensitive substrate, and a stage for retaining the sensitive substrate so that the surface of the sensitive substrate is disposed close to the image forming surface. The exposure apparatus also has an image surface compensating member for shifting the image forming surface in the optical axis direction corresponding to the stepped structure.
摘要翻译：提供一种光掩模，其具有形成在与敏感基板上的曝光区域内的阶梯状结构对应的第一和第二区域中的至少一个上的阶梯部分，图案将暴露在其上以使第一和第二部分的不同高度位置在投影光学系统的光轴方向上的透明基板的图案形成面的区域。还提供了一种曝光方法，其涉及将投影光学系统的图像形成表面沿对应于敏感基板上的曝光区域的阶梯状结构的光轴方向移位的步骤。当通过投影光学系统将原始基板上的图案曝光到敏感基板上时，投影光学系统的图像形成表面与曝光区域表面重合。还提供了一种投影曝光装置，包括投影光学系统，用于在敏感基板上的原始基板上投射和形成图案的图像;以及台，用于保持敏感基板，使得敏感基板的表面设置成靠近图像形成表面。曝光装置还具有用于使图像形成面沿与阶梯状结构对应的光轴方向移动的图像面补偿部件。

3. 发明授权

US4666273A Automatic magnification correcting system in a projection optical apparatus 失效
标题翻译：投影光学装置中的自动放大校正系统
公开(公告)号：US4666273A
公开(公告)日：1987-05-19
申请号：US844263
申请日：1986-03-25
申请人： Hisayuki Shimizu , Satoru Anzai , Hiroshi Tanaka , Kyoichi Suwa
发明人： Hisayuki Shimizu , Satoru Anzai , Hiroshi Tanaka , Kyoichi Suwa
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/70241 , G03F7/70858 , G03F7/70883 , G03F7/70891
摘要： An apparatus for projecting the image of an object onto a substrate comprises light source means for supplying light energy for illuminating the object, optical means for forming the image of the object on the substrate, the image magnification of the optical means being heated and varied by the light energy from the light source means, means for monitoring the manner in which the light energy is applied to the optical means, means for determining the variation in the image magnification of the optical means in response to the monitor means, and means for adjusting the size of the image formed on the substrate in response to the determining means.
摘要翻译：用于将物体的图像投影到基板上的装置包括用于提供用于照射物体的光能的光源装置，用于在基板上形成物体的图像的光学装置，光学装置的图像放大率被加热和变化来自光源的光能意味着，用于监视光能被施加到光学装置的方式的装置，用于响应于监视装置确定光学装置的图像放大率的变化的装置，以及用于调节装置响应于确定装置在基板上形成的图像的尺寸。

4. 发明授权

US4734746A Exposure method and system for photolithography 失效
标题翻译：用于光刻的曝光方法和系统
公开(公告)号：US4734746A
公开(公告)日：1988-03-29
申请号：US51236
申请日：1987-05-12
申请人： Kazuo Ushida , Satoru Anzai , Kazuaki Suzuki , Toshio Matsuura , Kyoichi Suwa , Koichi Matsumoto
发明人： Kazuo Ushida , Satoru Anzai , Kazuaki Suzuki , Toshio Matsuura , Kyoichi Suwa , Koichi Matsumoto
IPC分类号： G03F7/20 , G03B27/32 , G03B27/42
CPC分类号： G03F7/70066 , G03F7/2022 , G03F7/70241 , G03F7/70458
摘要： An exposure method for photolithography comprises the steps of forming a pattern on a substrate by the use of a first exposure apparatus including a first imaging optical system having a reduction magnification 1/.beta.1 and an image circle of a diameter .phi.1, and forming a second pattern on the substrate on which the first pattern has been formed, by the use of a second exposure apparatus including a second imaging optical system having a reduction magnification 1/.beta.2 different from the reduction magnification 1/.beta.1 and an image circle of a diameter .phi.2, wherein when N is an integer, the conditions that .beta.1.times..phi.1=.beta.2.times..phi.2 and .phi.1=N.times..phi.2 are satisfied.
摘要翻译：用于光刻的曝光方法包括以下步骤：通过使用包括具有缩小倍率1 /β1的第一成像光学系统和直径φ1的图像圆的第一曝光装置在基板上形成图案，并且形成通过使用包括具有不同于缩小倍率1 /β1的缩小倍率1 /β2的第二成像光学系统的第二曝光装置和形成第一图案的图像圆的第二图案，直径phi 2，其中当N是整数时，满足β1 phi 1 =β2 ph 2和ph 1 = N x ph 2的条件。

5. 发明授权

US4624551A Light irradiation control method for projection exposure apparatus 失效
标题翻译：投影曝光装置的光照射控制方法
公开(公告)号：US4624551A
公开(公告)日：1986-11-25
申请号：US793474
申请日：1985-10-28
申请人： Satoru Anzai , Masashi Okada
发明人： Satoru Anzai , Masashi Okada
IPC分类号： G03F7/20 , G03B27/42 , G03B27/72
CPC分类号： G03F7/70058 , G03F7/70241 , G03F7/70891
摘要： A control method for the projection optical system of a projection exposure apparatus used in the fabrication of LSIs. The amount of energy incident to the projection optical system during each unit time is maintained constant at all times including each projection and the intervals between the projection operations. This has the effect of cancelling any error in the projected image, particularly any variation of the magnification error with time due to any variation of the optical performance of the projection optical system caused by the illuminating energy.
摘要翻译：用于制造LSI的投影曝光装置的投影光学系统的控制方法。在每个单位时间内入射到投影光学系统的能量的量始终保持恒定，包括每个投影和投影操作之间的间隔。这具有消除投影图像中的任何误差的效果，特别是由于由照明能量引起的投影光学系统的光学性能的任何变化，放大误差随时间的任何变化。

6. 发明授权

US4883345A Projection optical apparatus 失效
标题翻译：投影光学仪器
公开(公告)号：US4883345A
公开(公告)日：1989-11-28
申请号：US291324
申请日：1988-12-28
申请人： Satoru Anzai , Hiroshi Tanaka
发明人： Satoru Anzai , Hiroshi Tanaka
IPC分类号： G02B3/14 , G02B7/02 , G02B13/24 , G02B21/02 , G03F7/20
CPC分类号： G03F7/70241 , G02B13/24 , G02B21/02 , G02B3/14 , G02B7/021 , G03F7/70825 , G03F7/70858 , G03F7/70883
摘要： An apparatus for projecting a pattern on a first plane onto a second plane comprises a projection lens system disposed between the first plane and the second plane and including a plurality of lens elements disposed at intervals, a plurality of spaces defined by the plurality of lens elements being formed, and means for isolating at least one of the plurality of spaces from the atmosphere. The at least one space is determined so that the variation in magnification of the projection lens system when the pressure in the at least one space varies with the atmospheric pressure is substantially equal to the variation in magnification of the projection lens system when all of the pressure in the space formed between the first plane and the projection lens system, the pressures in the plurality of spaces of the projection lens system and the pressure in the space formed between the projection lens system and the second plane vary with the atmospheric pressure.
摘要翻译：用于将第一平面上的图案投影到第二平面上的装置包括设置在第一平面和第二平面之间的投影透镜系统，并且包括间隔设置的多个透镜元件，由多个透镜元件限定的多个空间以及用于将多个空间中的至少一个与大气隔离的装置。确定至少一个空间，使得当至少一个空间中的压力随着大气压力而变化时投影透镜系统的放大率的变化基本上等于投影透镜系统的全部压力的变化在形成在第一平面和投影透镜系统之间的空间中，投影透镜系统的多个空间中的压力和在投影透镜系统和第二平面之间形成的空间中的压力随大气压力而变化。

7. 发明授权

US4871237A Method and apparatus for adjusting imaging performance of projection optical apparatus 失效
标题翻译：用于调整投影光学装置成像性能的方法和装置
公开(公告)号：US4871237A
公开(公告)日：1989-10-03
申请号：US120232
申请日：1987-11-12
申请人： Satoru Anzai , Koichi Ohno
发明人： Satoru Anzai , Koichi Ohno
IPC分类号： G02B7/04 , G03F7/20
CPC分类号： G03F7/70241 , G02B7/04 , G03F7/70825 , G03F7/70858 , G03F7/70883 , Y10S359/90
摘要： In a method and apparatus for highly precisely adjusting the optical performance including the imaging plane and the magnification factor of a projection lens in a projection optical apparatus, adjustment of the projection lens is achieved by changing the barometric pressure, i.e., the refractive index of at least one space which is located on an optical path and which is shielded from the outer atmosphere is changed by changing the barometric pressure therein. At this space, a space or gap present between any two adjacent elements of a plurality of lens elements or a group of lenses constituting a projection lens is preferably selected. The selected space is independent from and is shielded from the outer atmosphere by the lenses defining itself and a housing supporting these lenses, and is filled with air or a gas. The pressure of the air or gas inside the independent space is controlled by a barometric controller.
摘要翻译：在用于在投影光学装置中高精度地调整包括成像平面和投影透镜的放大倍数的光学性能的方法和装置中，通过改变大气压（即，通过改变其中的大气压来改变位于光路上并且被外部大气屏蔽的至少一个空间。在该空间中，优选地选择存在于多个透镜元件的任意两个相邻元件之间的空间或间隙或构成投影透镜的一组透镜。所选择的空间与限定自身的透镜和支撑这些透镜的壳体独立于外部空气并被外部空间屏蔽，并且被空气或气体填充。独立空间内的空气或气体的压力由气压控制器控制。

8. 发明授权

US4037943A Reflection type image forming optical system having a large angle of view 失效
标题翻译：反射型图像形成具有大角度视角的光学系统
公开(公告)号：US4037943A
公开(公告)日：1977-07-26
申请号：US557185
申请日：1975-03-10
申请人： Satoru Anzai
发明人： Satoru Anzai
IPC分类号： G02B17/00 , A47G1/04 , G02B17/06
CPC分类号： G02B17/0615
摘要： A reflection type image forming optical system having a large angle of view comprises a convex mirror for reflecting incident light and a concave mirror. The concave mirror is disposed with the reflecting surface thereof facing the reflecting surface of the convex mirror so that light reflected by the convex mirror at a large angle with respect to the normal thereof enters the concave mirror at a large angle and that light reflected by the convex mirror at a small angle with respect to the normal thereof enters the concave mirror at a small angle. The concave mirror is arranged so that the distance between the center of curvature of the convex mirror and that of the concave mirror is greater than half the radius of curvature of the concave mirror.

9. 发明授权

US4592625A Double-conjugate maintaining optical system 失效
标题翻译：双共轭保持光学系统
公开(公告)号：US4592625A
公开(公告)日：1986-06-03
申请号：US469015
申请日：1983-02-23
申请人： Makoto Uehara , Satoru Anzai , Kyoichi Suwa
发明人： Makoto Uehara , Satoru Anzai , Kyoichi Suwa
IPC分类号： G02B13/22 , G02B19/00 , G02B21/08 , G02B27/00 , G03F7/20 , G01B11/00
CPC分类号： G03F7/70241 , G02B13/22
摘要： A double-conjugate maintaining optical system for maintaining the conjugate relation between an object and its image even if the distance between the object and the image varies and also maintaining another set of conjugate relation in a predetermined condition includes an afocal system comprising a plurality of lens units, a first positive lens unit disposed on the object side of the afocal system, and a second positive lens unit disposed on the image side of the afocal system. The first positive lens unit is movable relative to the second positive lens unit so that the object is positioned on the focal plane of the first positive lens unit opposite to the afocal system. The afocal system is movable along the optical axis thereof in a predetermined relation with the first positive lens unit.
摘要翻译：即使物体与图像之间的距离发生变化并且在预定条件下也保持另一组共轭关系的双重共轭维持光学系统，用于保持物体与其图像之间的共轭关系，包括包括多个透镜的无焦点系统设置在无焦点系统的物体侧的第一正透镜单元和设置在无焦系统的像侧上的第二正透镜单元。第一正透镜单元可相对于第二正透镜单元移动，使得物体位于与无焦系统相对的第一正透镜单元的焦平面上。无焦点系统可以沿其光轴以与第一正透镜单元预定的关系移动。

10. 发明授权

US4498762A Projection type exposure apparatus 失效
标题翻译：投影式曝光装置
公开(公告)号：US4498762A
公开(公告)日：1985-02-12
申请号：US451394
申请日：1982-12-20
申请人： Makoto Uehara , Satoru Anzai
发明人： Makoto Uehara , Satoru Anzai
IPC分类号： H01L21/30 , G01B11/00 , G03F7/22 , G03F9/00 , H01L21/027 , G03B27/52
CPC分类号： G03F9/7049
摘要： A projection type exposure apparatus has a projection objective lens, a projection negative having a predetermined shape pattern and an alignment mark, and a photosensitive plate having an alignment mark. The shape pattern of the projection negative is projected upon the photosensitive plate by the projection objective lens. Main illuminating optical means illuminates the projection negative with a first wavelength light to which the photosensitive plate is sensitive, and alignment optical means illuminates the projection negative with a second wavelength light to which the photosensitive plate is insensitive. The positional relation between the projection negative and the photosensitive plate is detected using the second wavelength light through the projection objective lens. One of the alignment mark on the projection negative and the alignment mark on the photosensitive plate has a zone pattern which forms a light-condensing point at a position spaced apart by a predetermined amount from the surface on which said one mark is formed, and said predetermined amount corresponds to the amount of chromatic aberration of the projection objective lens, at the side thereof adjacent to said zone pattern, for the second wavelength light relative to the first wavelength light.
摘要翻译：投影型曝光装置具有投影物镜，具有预定形状图案的投影阴极和对准标记，以及具有对准标记的感光板。投影阴影的形状图案通过投影物镜投影在感光板上。主照明光学装置用感光板敏感的第一波长光照亮投影阴极，并且对准光学装置用感光板不敏感的第二波长光照射投影负片。使用通过投影物镜的第二波长光来检测投影负片和感光片之间的位置关系。投影负极上的对准标记和感光板上的对准标记之一具有区域图案，该区域图案在与形成有所述一个标记的表面间隔开预定量的位置处形成聚光点，并且所述区域图案预定量对应于相对于第一波长光的第二波长光的投影物镜的与所述区域图案相邻的一侧的色差量。

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