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1. 发明申请

WO2008042580A2 OFFSET CORRECTION TECHNIQUES FOR POSITIONING SUBSTRATES 审中-公开
标题翻译：用于定位基板的偏移校正技术
公开(公告)号：WO2008042580A2
公开(公告)日：2008-04-10
申请号：PCT/US2007078576
申请日：2007-09-14
申请人： LAM RES CORP , CHEN JACK , BAILEY ANDREW D III , MOORING BEN , CAIN STEPHEN J
发明人： CHEN JACK , BAILEY ANDREW D III , MOORING BEN , CAIN STEPHEN J
IPC分类号： H01L21/66 , G06F19/00
CPC分类号： G05B19/41875 , G05B2219/37398 , G05B2219/45031 , G05B2219/50057 , Y02P90/22
摘要： A method for calculating a process center for a chuck in a processing chamber is provided. The method includes generating pre-processing and post-processing measurement data points, which is perform by measuring thickness of a film substrate at a set of orientations and a set of distances from a geometric center of the substrate. The method also includes comparing the pre-processing and post-processing measurement data points to calculate a set of etch depth numbers. The method further includes generating etch profiles for the set of orientations. The method yet also includes extrapolating a set of radiuses, which is associated with a first etch depth, from the etch profiles. The method yet further includes generating an off-centered plot, which is a graphical representation of the set of radiuses versus the set of orientations. The method more over includes calculating the process center by applying a curve-fitting equation to the off-centered plot.
摘要翻译：提供了一种用于计算处理室中的卡盘的处理中心的方法。该方法包括产生预处理和后处理测量数据点，其通过以一组取向和距离基板的几何中心的一组距离测量薄膜基板的厚度来执行。该方法还包括比较预处理和后处理测量数据点以计算一组蚀刻深度数。该方法还包括产生该组取向的蚀刻轮廓。该方法还包括从蚀刻轮廓推断与第一蚀刻深度相关联的一组半径。该方法还包括生成偏心图，其是该组半径与该组取向的图形表示。更多的方法包括通过对偏心图应用曲线拟合方程来计算过程中心。

2. 发明申请

WO2006065532A3 WAFER HEATING AND TEMPERATURE CONTROL BY BACKSIDE FLUID INJECTION 审中-公开
标题翻译：背面流体注射的加热和温度控制
公开(公告)号：WO2006065532A3
公开(公告)日：2007-04-19
申请号：PCT/US2005043256
申请日：2005-11-29
申请人： LAM RES CORP , MOORING BEN , PARKS JOHN , HYMES DIANE J
发明人： MOORING BEN , PARKS JOHN , HYMES DIANE J
IPC分类号： C23C16/00 , C23F1/00
CPC分类号： H01L21/67109
摘要： In one of the many embodiments, an apparatus for processing a substrate is provided which includes a substrate processing chamber where the substrate is positioned within the substrate processing chamber so the substrate at least partially separates the substrate processing chamber into a first chamber and a second chamber. The apparatus further includes a first chamber inlet configured to input a first fluid of a first temperature into the first chamber at a first pressure and a second chamber inlet configured to input a second fluid of a second temperature into the second chamber at a second pressure wherein the first pressure and the second pressure are substantially equal. The second temperature is capable of being utilized to manage substrate temperature.
摘要翻译：在许多实施例中的一个实施例中，提供了一种用于处理衬底的装置，其包括衬底处理室，其中衬底位于衬底处理室内，使得衬底至少部分地将衬底处理室分离成第一腔室和第二腔室。该装置还包括第一室入口，其构造成在第一压力下将第一温度的第一流体输入到第一室中，并且第二室入口构造成在第二压力下将第二温度的第二流体输入到第二室中，第一压力和第二压力基本相等。第二个温度可以用来管理衬底温度。

3. 发明申请

WO2008042581B1 OFFSET CORRECTION METHODS AND ARRANGEMENT FOR POSITIONING AND INSPECTING SUBSTRATES 审中-公开
标题翻译：偏移校正方法和布置定位和检查基板
公开(公告)号：WO2008042581B1
公开(公告)日：2008-12-11
申请号：PCT/US2007078578
申请日：2007-09-14
申请人： LAM RES CORP , CHEN JACK , BAILEY ANDREW D III , MOORING BEN , CAIN STEPHEN J
发明人： CHEN JACK , BAILEY ANDREW D III , MOORING BEN , CAIN STEPHEN J
IPC分类号： G03B15/00 , B08B7/00 , B41B17/00 , G01B11/00 , G01B11/02 , G01N21/00 , G01R31/26 , G03B15/02 , G03B15/03
CPC分类号： H01L21/681 , H01L21/67259 , H01L21/67288
摘要： A bevel inspection module for capturing images of a substrate is provided. The module includes a rotational motor, which is attached to a substrate chuck and is configured to rotate the substrate chuck thereby allowing the substrate to revolve. The module further includes a camera and an optic enclosure, which is attached to the camera and is configured to rotate, enabling light to be directed toward the substrate. The camera is mounted from a camera mount, which is configured to enable the camera to rotate on a 180 degree plane allowing the camera to capture images of at least one of a top view, a bottom view, and a side view of the substrate. The module yet also includes a backlight arrangement, which is configured to provide illumination to the substrate, thereby enabling the camera to capture the images, which shows contrast between the substrate and a background.
摘要翻译：提供了一种用于捕获基板的图像的斜面检查模块。模块包括旋转马达，其连接到基板卡盘并且构造成旋转基板卡盘，从而允许基板旋转。该模块还包括照相机和光学外壳，其附接到相机并且被配置为旋转，使得光能够被引向基板。照相机从照相机安装座安装，照相机安装件被配置为使照相机能够在180度平面上旋转，允许照相机拍摄基板的俯视图，底视图和侧视图中的至少一个的图像。该模块还包括背光布置，其被配置为向基板提供照明，从而使得相机能够捕获显示基板和背景之间的对比度的图像。

4. 发明申请

WO2009043018A3 OFFSET CORRECTION TECHNIQUES FOR POSITIONING SUBSTRATES WITHIN A PROCESSING CHAMBER 审中-公开
标题翻译：用于在加工室中定位基板的偏移校正技术
公开(公告)号：WO2009043018A3
公开(公告)日：2009-09-11
申请号：PCT/US2008078145
申请日：2008-09-29
申请人： LAM RES CORP , CHEN JACK , BAILEY III ANDREW D , MOORING BEN , CAIN STEPHEN J
发明人： CHEN JACK , BAILEY III ANDREW D , MOORING BEN , CAIN STEPHEN J
IPC分类号： H01L21/68 , H01L21/3065 , H01L21/677 , H01L21/683 , H01L21/687
CPC分类号： H01L21/681 , H01L21/68
摘要： A method for aligning a substrate to a process center of a support mechanism is provided. The method includes determining substrate thickness after substrate processing at a plurality of orientations and at a plurality of radial distances from a geometric center of the substrate. The method also includes deriving a set of process rate values from substrate thickness and process duration. The method further includes creating for a process rate an off-centered plot, which represents a substantially concentric circle whose points are a circumference of the off-centered plot having substantially the first process rate. The method yet also includes applying a curve-fitting equation to the off-centered plot to determine a set of parameters. The method yet further includes teaching a set of robot arms the set of parameters, thereby enabling the set of robot arms to align another substrate that is supported by the support mechanism with the process center.
摘要翻译：提供了一种将基板对准支撑机构的处理中心的方法。该方法包括在基板处理之后确定基板厚度，该基板在多个取向并且距离基板的几何中心的多个径向距离处。该方法还包括从衬底厚度和工艺持续时间导出一组工艺速率值。该方法还包括为处理速率创建偏心图，其表示基本上同心的圆，其点是具有基本上第一处理速率的偏心图的圆周。该方法还包括将曲线拟合方程应用于偏心图以确定一组参数。该方法还包括向一组机器人手臂提供该组参数，从而使得该组机器人臂将由支撑机构支撑的另一基板与处理中心对准。

5. 发明申请

WO2009043018A2 OFFSET CORRECTION TECHNIQUES FOR POSITIONING SUBSTRATES WITHIN A PROCESSING CHAMBER 审中-公开
标题翻译：在加工室内定位衬底的偏移校正技术
公开(公告)号：WO2009043018A2
公开(公告)日：2009-04-02
申请号：PCT/US2008/078145
申请日：2008-09-29
申请人： LAM RESEARCH CORPORATION , CHEN, Jack , BAILEY III, Andrew D. , MOORING, Ben , CAIN, Stephen J.
发明人： CHEN, Jack , BAILEY III, Andrew D. , MOORING, Ben , CAIN, Stephen J.
IPC分类号： H01L21/68 , H01L21/67 , H01L21/30
CPC分类号： H01L21/681 , H01L21/68
摘要： A method for aligning a substrate to a process center of a support mechanism is provided. The method includes determining substrate thickness after substrate processing at a plurality of orientations and at a plurality of radial distances from a geometric center of the substrate. The method also includes deriving a set of process rate values from substrate thickness and process duration. The method further includes creating for a process rate an off-centered plot, which represents a substantially concentric circle whose points are a circumference of the off-centered plot having substantially the first process rate. The method yet also includes applying a curve-fitting equation to the off-centered plot to determine a set of parameters. The method yet further includes teaching a set of robot arms the set of parameters, thereby enabling the set of robot arms to align another substrate that is supported by the support mechanism with the process center.
摘要翻译：提供了一种用于将衬底对准支撑机构的处理中心的方法。该方法包括在多个方位和离衬底的几何中心的多个径向距离处确定衬底处理之后的衬底厚度。该方法还包括从衬底厚度和处理持续时间导出一组处理速率值。该方法还包括为处理速率创建偏心绘图，该偏心绘图表示基本上同心的圆，其点是基本上具有第一处理速率的偏心绘图的圆周。该方法还包括将曲线拟合方程应用于偏心绘图以确定一组参数。该方法还包括向一组机器人手臂传递一组参数，由此使该组机器人手臂能够将由支撑机构支撑的另一基板与处理中心对准。

6. 发明申请

WO2008042581A2 OFFSET CORRECTION METHODS AND ARRANGEMENT FOR POSITIONING AND INSPECTING SUBSTRATES 审中-公开
标题翻译：偏移校正方法和定位和检查基板的安排
公开(公告)号：WO2008042581A2
公开(公告)日：2008-04-10
申请号：PCT/US2007/078578
申请日：2007-09-14
申请人： LAM RESEARCH CORPORATION , CHEN, Jack , BAILEY, Andrew, D., III , MOORING, Ben , CAIN, Stephen J.
发明人： CHEN, Jack , BAILEY, Andrew, D., III , MOORING, Ben , CAIN, Stephen J.
IPC分类号： G03B15/02
CPC分类号： H01L21/681 , H01L21/67259 , H01L21/67288
摘要： A bevel inspection module for capturing images of a substrate is provided. The module includes a rotational motor, which is attached to a substrate chuck and is configured to rotate the substrate chuck thereby allowing the substrate to revolve. The module further includes a camera and an optic enclosure, which is attached to the camera and is configured to rotate, enabling light to be directed toward the substrate. The camera is mounted from a camera mount, which is configured to enable the camera to rotate on a 180 degree plane allowing the camera to capture images of at least one of a top view, a bottom view, and a side view of the substrate. The module yet also includes a backlight arrangement, which is configured to provide illumination to the substrate, thereby enabling the camera to capture the images, which shows contrast between the substrate and a background.
摘要翻译：提供了用于捕获基板的图像的斜面检查模块。该模块包括旋转马达，该旋转马达连接到衬底卡盘并且被配置为旋转衬底卡盘从而允许衬底旋转。该模块还包括照相机和光学外壳，该照相机和光学外壳连接到照相机并且被配置成旋转，使得光被引导朝向基板。照相机从照相机安装架安装，照相机安装架被配置成使照相机能够在180度平面上旋转，从而允许照相机捕获衬底的顶视图，底视图和侧视图中的至少一个的图像。该模块还包括背光装置，该背光装置被配置为向基板提供照明，由此使得该照相机能够捕获图像，该图像显示基板和背景之间的对比。

7. 发明申请

WO2006065532A2 WAFER HEATING AND TEMPERATURE CONTROL BY BACKSIDE FLUID INJECTION 审中-公开
标题翻译：背面流体注射的加热和温度控制
公开(公告)号：WO2006065532A2
公开(公告)日：2006-06-22
申请号：PCT/US2005/043256
申请日：2005-11-29
申请人： LAM RESEARCH CORPORATION , MOORING, Ben , PARKS, John , HYMES, Diane, J.
发明人： MOORING, Ben , PARKS, John , HYMES, Diane, J.
IPC分类号： C23C16/00
CPC分类号： H01L21/67109
摘要： In one of the many embodiments, an apparatus for processing a substrate is provided which includes a substrate processing chamber where the substrate is positioned within the substrate processing chamber so the substrate at least partially separates the substrate processing chamber into a first chamber and a second chamber. The apparatus further includes a first chamber inlet configured to input a first fluid of a first temperature into the first chamber at a first pressure and a second chamber inlet configured to input a second fluid of a second temperature into the second chamber at a second pressure wherein the first pressure and the second pressure are substantially equal. The second temperature is capable of being utilized to manage substrate temperature.
摘要翻译：在许多实施例中的一个实施例中，提供了一种用于处理衬底的装置，其包括衬底处理室，其中衬底位于衬底处理室内，使得衬底至少部分地将衬底处理室分离成第一腔室和第二腔室。该装置还包括第一室入口，其构造成在第一压力下将第一温度的第一流体输入到第一室中，并且第二室入口被配置成在第二压力下将第二温度的第二流体输入到第二室中，第一压力和第二压力基本相等。第二个温度可以用来管理衬底温度。

8. 发明申请

WO2008042581A3 OFFSET CORRECTION METHODS AND ARRANGEMENT FOR POSITIONING AND INSPECTING SUBSTRATES 审中-公开
标题翻译：偏移校正方法和定位和检查基板的安排
公开(公告)号：WO2008042581A3
公开(公告)日：2008-10-09
申请号：PCT/US2007078578
申请日：2007-09-14
申请人： LAM RES CORP , CHEN JACK , BAILEY ANDREW D III , MOORING BEN , CAIN STEPHEN J
发明人： CHEN JACK , BAILEY ANDREW D III , MOORING BEN , CAIN STEPHEN J
IPC分类号： G03B15/00 , B08B7/00 , B41B17/00 , G01B11/00 , G01B11/02 , G01N21/00 , G01R31/26 , G03B15/02 , G03B15/03
CPC分类号： H01L21/681 , H01L21/67259 , H01L21/67288
摘要： A bevel inspection module for capturing images of a substrate is provided. The module includes a rotational motor, which is attached to a substrate chuck and is configured to rotate the substrate chuck thereby allowing the substrate to revolve. The module further includes a camera and an optic enclosure, which is attached to the camera and is configured to rotate, enabling light to be directed toward the substrate. The camera is mounted from a camera mount, which is configured to enable the camera to rotate on a 180 degree plane allowing the camera to capture images of at least one of a top view, a bottom view, and a side view of the substrate. The module yet also includes a backlight arrangement, which is configured to provide illumination to the substrate, thereby enabling the camera to capture the images, which shows contrast between the substrate and a background.
摘要翻译：提供了用于捕获衬底图像的斜角检查模块。该模块包括旋转马达，该旋转马达连接到衬底卡盘并且被配置为旋转衬底卡盘从而允许衬底旋转。该模块还包括照相机和光学外壳，该照相机和光学外壳连接到照相机并且被配置成旋转，使得光被引导朝向基板。照相机从照相机安装架安装，照相机安装架被配置成使照相机能够在180度平面上旋转，从而允许照相机捕获衬底的顶视图，底视图和侧视图中的至少一个的图像。该模块还包括背光装置，该背光装置被配置为向基板提供照明，由此使得照相机能够捕捉图像，该图像示出了基板与背景之间的对比。

9. 发明申请

WO2008042580A3 OFFSET CORRECTION TECHNIQUES FOR POSITIONING SUBSTRATES 审中-公开
公开(公告)号：WO2008042580A3
公开(公告)日：2008-04-10
申请号：PCT/US2007/078576
申请日：2007-09-14
申请人： LAM RESEARCH CORPORATION , CHEN, Jack , BAILEY, Andrew, D., III , MOORING, Ben , CAIN, Stephen J.
发明人： CHEN, Jack , BAILEY, Andrew, D., III , MOORING, Ben , CAIN, Stephen J.
IPC分类号： G01L21/30 , G05B15/00 , B44C1/22 , H01L21/00
摘要： A method for calculating a process center for a chuck in a processing chamber is provided. The method includes generating pre-processing and post-processing measurement data points, which is perform by measuring thickness of a film substrate at a set of orientations and a set of distances from a geometric center of the substrate. The method also includes comparing the pre-processing and post-processing measurement data points to calculate a set of etch depth numbers. The method further includes generating etch profiles for the set of orientations. The method yet also includes extrapolating a set of radiuses, which is associated with a first etch depth, from the etch profiles. The method yet further includes generating an off-centered plot, which is a graphical representation of the set of radiuses versus the set of orientations. The method more over includes calculating the process center by applying a curve-fitting equation to the off-centered plot.

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