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1. 发明申请

WO2008042581A2 OFFSET CORRECTION METHODS AND ARRANGEMENT FOR POSITIONING AND INSPECTING SUBSTRATES 审中-公开
标题翻译：偏移校正方法和定位和检查基板的安排
公开(公告)号：WO2008042581A2
公开(公告)日：2008-04-10
申请号：PCT/US2007/078578
申请日：2007-09-14
申请人： LAM RESEARCH CORPORATION , CHEN, Jack , BAILEY, Andrew, D., III , MOORING, Ben , CAIN, Stephen J.
发明人： CHEN, Jack , BAILEY, Andrew, D., III , MOORING, Ben , CAIN, Stephen J.
IPC分类号： G03B15/02
CPC分类号： H01L21/681 , H01L21/67259 , H01L21/67288
摘要： A bevel inspection module for capturing images of a substrate is provided. The module includes a rotational motor, which is attached to a substrate chuck and is configured to rotate the substrate chuck thereby allowing the substrate to revolve. The module further includes a camera and an optic enclosure, which is attached to the camera and is configured to rotate, enabling light to be directed toward the substrate. The camera is mounted from a camera mount, which is configured to enable the camera to rotate on a 180 degree plane allowing the camera to capture images of at least one of a top view, a bottom view, and a side view of the substrate. The module yet also includes a backlight arrangement, which is configured to provide illumination to the substrate, thereby enabling the camera to capture the images, which shows contrast between the substrate and a background.
摘要翻译：提供了用于捕获基板的图像的斜面检查模块。该模块包括旋转马达，该旋转马达连接到衬底卡盘并且被配置为旋转衬底卡盘从而允许衬底旋转。该模块还包括照相机和光学外壳，该照相机和光学外壳连接到照相机并且被配置成旋转，使得光被引导朝向基板。照相机从照相机安装架安装，照相机安装架被配置成使照相机能够在180度平面上旋转，从而允许照相机捕获衬底的顶视图，底视图和侧视图中的至少一个的图像。该模块还包括背光装置，该背光装置被配置为向基板提供照明，由此使得该照相机能够捕获图像，该图像显示基板和背景之间的对比。

2. 发明申请

WO2008042580A3 OFFSET CORRECTION TECHNIQUES FOR POSITIONING SUBSTRATES 审中-公开
公开(公告)号：WO2008042580A3
公开(公告)日：2008-04-10
申请号：PCT/US2007/078576
申请日：2007-09-14
申请人： LAM RESEARCH CORPORATION , CHEN, Jack , BAILEY, Andrew, D., III , MOORING, Ben , CAIN, Stephen J.
发明人： CHEN, Jack , BAILEY, Andrew, D., III , MOORING, Ben , CAIN, Stephen J.
IPC分类号： G01L21/30 , G05B15/00 , B44C1/22 , H01L21/00
摘要： A method for calculating a process center for a chuck in a processing chamber is provided. The method includes generating pre-processing and post-processing measurement data points, which is perform by measuring thickness of a film substrate at a set of orientations and a set of distances from a geometric center of the substrate. The method also includes comparing the pre-processing and post-processing measurement data points to calculate a set of etch depth numbers. The method further includes generating etch profiles for the set of orientations. The method yet also includes extrapolating a set of radiuses, which is associated with a first etch depth, from the etch profiles. The method yet further includes generating an off-centered plot, which is a graphical representation of the set of radiuses versus the set of orientations. The method more over includes calculating the process center by applying a curve-fitting equation to the off-centered plot.

3. 发明申请

WO2009043018A2 OFFSET CORRECTION TECHNIQUES FOR POSITIONING SUBSTRATES WITHIN A PROCESSING CHAMBER 审中-公开
标题翻译：在加工室内定位衬底的偏移校正技术
公开(公告)号：WO2009043018A2
公开(公告)日：2009-04-02
申请号：PCT/US2008/078145
申请日：2008-09-29
申请人： LAM RESEARCH CORPORATION , CHEN, Jack , BAILEY III, Andrew D. , MOORING, Ben , CAIN, Stephen J.
发明人： CHEN, Jack , BAILEY III, Andrew D. , MOORING, Ben , CAIN, Stephen J.
IPC分类号： H01L21/68 , H01L21/67 , H01L21/30
CPC分类号： H01L21/681 , H01L21/68
摘要： A method for aligning a substrate to a process center of a support mechanism is provided. The method includes determining substrate thickness after substrate processing at a plurality of orientations and at a plurality of radial distances from a geometric center of the substrate. The method also includes deriving a set of process rate values from substrate thickness and process duration. The method further includes creating for a process rate an off-centered plot, which represents a substantially concentric circle whose points are a circumference of the off-centered plot having substantially the first process rate. The method yet also includes applying a curve-fitting equation to the off-centered plot to determine a set of parameters. The method yet further includes teaching a set of robot arms the set of parameters, thereby enabling the set of robot arms to align another substrate that is supported by the support mechanism with the process center.
摘要翻译：提供了一种用于将衬底对准支撑机构的处理中心的方法。该方法包括在多个方位和离衬底的几何中心的多个径向距离处确定衬底处理之后的衬底厚度。该方法还包括从衬底厚度和处理持续时间导出一组处理速率值。该方法还包括为处理速率创建偏心绘图，该偏心绘图表示基本上同心的圆，其点是基本上具有第一处理速率的偏心绘图的圆周。该方法还包括将曲线拟合方程应用于偏心绘图以确定一组参数。该方法还包括向一组机器人手臂传递一组参数，由此使该组机器人手臂能够将由支撑机构支撑的另一基板与处理中心对准。

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