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1. 发明授权

US07675604B2 Hood for immersion lithography 有权
标题翻译：用于浸没光刻的罩
公开(公告)号：US07675604B2
公开(公告)日：2010-03-09
申请号：US11427434
申请日：2006-06-29
申请人： Li-Jui Chen , Tzung-Chi Fu , Ching-Yu Chang , Fu-Jye Liang , Lin-Hung Shiu , Chun-Kuang Chen , Tsai-Sheng Gau
发明人： Li-Jui Chen , Tzung-Chi Fu , Ching-Yu Chang , Fu-Jye Liang , Lin-Hung Shiu , Chun-Kuang Chen , Tsai-Sheng Gau
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70341
摘要： A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; a fluid retaining module configured to hold a fluid in a space between the imaging lens module and a substrate on the substrate stage; and a heating element configured in the fluid retaining module and adjacent to the space. The heating element includes at least two of following: a sealant insoluble to the fluid for sealing the heating element in the fluid retaining module; a sealed opening configured in one of top portion and side portion of the fluid retaining module for sealing the heating element in the fluid retaining module; and/or a non-uniform temperature compensation device configured with the heating element.
摘要翻译：光刻设备包括成像透镜模块; 位于所述成像透镜模块下方且被配置为保持基板的基板台; 流体保持模块，被配置为将流体保持在所述成像透镜模块和所述基板载台上的基板之间的空间中; 以及配置在所述流体保持模块中且与所述空间相邻的加热元件。所述加热元件包括以下至少两个：对所述流体不溶的密封剂，用于密封所述流体保持模块中的所述加热元件; 密封开口，其构造在流体保持模块的顶部和侧部之一中，用于密封流体保持模块中的加热元件; 和/或配置有加热元件的不均匀的温度补偿装置。

2. 发明申请

US20070258060A1 HOOD FOR IMMERSION LITHOGRAPHY 有权
标题翻译：假设沉默
公开(公告)号：US20070258060A1
公开(公告)日：2007-11-08
申请号：US11427434
申请日：2006-06-29
申请人： Li-Jui CHEN , Tzung-Chi FU , Ching-Yu CHANG , Fu-Jye LIANG , Lin-Hung SHIU , Chun-Kuang CHEN , Tsai-Sheng GAU
发明人： Li-Jui CHEN , Tzung-Chi FU , Ching-Yu CHANG , Fu-Jye LIANG , Lin-Hung SHIU , Chun-Kuang CHEN , Tsai-Sheng GAU
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; a fluid retaining module configured to hold a fluid in a space between the imaging lens module and a substrate on the substrate stage; and a heating element configured in the fluid retaining module and adjacent to the space. The heating element includes at least one of following: a sealant insoluble to the fluid for sealing the heating element in the fluid retaining module; a sealed opening configured in one of top portion and side portion of the fluid retaining module for sealing the heating element in the fluid retaining module; and/or a non-uniform temperature compensation device configured with the heating element.
摘要翻译：光刻设备包括成像透镜模块; 位于所述成像透镜模块下方且被配置为保持基板的基板台; 流体保持模块，被配置为将流体保持在所述成像透镜模块和所述基板载台上的基板之间的空间中; 以及配置在所述流体保持模块中且与所述空间相邻的加热元件。所述加热元件包括以下至少一种：不溶于所述流体以密封所述流体保持模块中的所述加热元件的密封剂; 密封开口，其构造在流体保持模块的顶部和侧部之一中，用于密封流体保持模块中的加热元件; 和/或配置有加热元件的不均匀的温度补偿装置。

3. 发明授权

US07666576B2 Exposure scan and step direction optimization 有权
标题翻译：曝光扫描和步进方向优化
公开(公告)号：US07666576B2
公开(公告)日：2010-02-23
申请号：US11461234
申请日：2006-07-31
申请人： Fu-Jye Liang , Lin-Hung Shiu , Chun-Kuang Chen , Tsai-Sheng Gau , Burn Jeng Lin
发明人： Fu-Jye Liang , Lin-Hung Shiu , Chun-Kuang Chen , Tsai-Sheng Gau , Burn Jeng Lin
IPC分类号： G03F7/20
CPC分类号： G03B27/42 , G03F7/70466
摘要： A lithography process to pattern a plurality of fields on a substrate is disclosed. The process includes scanning a first field along a first direction using a radiation beam. Thereafter, the processes steps to a second field adjacent the first field and located behind the first field when the first and second fields are viewed along the first direction. The second field is then scanned along the first direction using the radiation beam.
摘要翻译：公开了一种用于对衬底上的多个场进行图案化的光刻工艺。该过程包括使用辐射束沿第一方向扫描第一场。此后，当沿着第一方向观察第一和第二场时，处理步骤到与第一场相邻并位于第一场后面的第二场。然后使用辐射束沿着第一方向扫描第二场。

4. 发明申请

US20080020324A1 IMMERSION LITHOGRAPHY DEFECT REDUCTION WITH TOP COATER REMOVAL 审中-公开
标题翻译：倾斜切割缺陷减少与顶部去除
公开(公告)号：US20080020324A1
公开(公告)日：2008-01-24
申请号：US11458621
申请日：2006-07-19
申请人： Lin-Hung SHIU , Fu-Jye LIANG , Chun-Kuang CHEN
发明人： Lin-Hung SHIU , Fu-Jye LIANG , Chun-Kuang CHEN
IPC分类号： G03F7/26
CPC分类号： G03F7/26 , G03F7/11 , G03F7/2041
摘要： A method for photolithography processing includes providing a substrate coated with a photosensitive layer thereon and a top coater overlying the photosensitive layer; exposing the photosensitive layer to a radiation energy; removing the top coater; and baking the photosensitive layer after the removing of the top coater layer.
摘要翻译：一种用于光刻处理的方法包括提供其上涂覆感光层的基材和覆盖在感光层上的顶涂层; 将感光层暴露于辐射能; 去除顶涂层; 并且在去除顶涂层之后烘烤感光层。

5. 发明申请

US20070285639A1 EXPOSURE SCAN AND STEP DIRECTION OPTIMIZATION 有权
标题翻译：曝光扫描和步进方向优化
公开(公告)号：US20070285639A1
公开(公告)日：2007-12-13
申请号：US11461234
申请日：2006-07-31
申请人： Fu-Jye LIANG , Lin-Hung SHIU , Chun-Kuang CHEN , Tsai-Sheng GAU , Burn Jeng LIN
发明人： Fu-Jye LIANG , Lin-Hung SHIU , Chun-Kuang CHEN , Tsai-Sheng GAU , Burn Jeng LIN
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70466
摘要： A lithography process to pattern a plurality of fields on a substrate is disclosed. The process includes scanning a first field along a first direction using a radiation beam. Thereafter, the processes steps to a second field adjacent the first field and located behind the first field when the first and second fields are viewed along the first direction. The second field is then scanned along the first direction using the radiation beam.
摘要翻译：公开了一种用于对衬底上的多个场进行图案化的光刻工艺。该过程包括使用辐射束沿第一方向扫描第一场。此后，当沿着第一方向观察第一和第二场时，处理步骤到与第一场相邻并位于第一场后面的第二场。然后使用辐射束沿着第一方向扫描第二场。

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