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1. 发明授权

US06928750B2 Membrane dryer 有权
标题翻译：膜干燥机
公开(公告)号：US06928750B2
公开(公告)日：2005-08-16
申请号：US10951009
申请日：2004-09-27
申请人： Ismail Kashkoush , Richard Novak , Larry Myland
发明人： Ismail Kashkoush , Richard Novak , Larry Myland
IPC分类号： B01D61/36 , B01D71/32 , B01D71/34 , B01D71/36 , B01F3/02 , B01F3/04 , F26B21/00
CPC分类号： B01F3/022 , B01F3/04021
摘要： A system, method, and apparatus for supplying a gas-liquid vapor to a process tank for performing semiconductor manufacturing. In one aspect, the invention is a method of supplying a gas-liquid vapor to a process tank comprising: supplying a gas stream through at least one hydrophobic tube; exposing the outside surface of the hydrophobic tube to a liquid so that a vapor of the liquid permeates the hydrophobic tube and enters the gas stream, forming a gas-liquid vapor inside the tube; and transporting the gas-liquid vapor to the process tank. In another aspect, the invention is an apparatus for supplying a gas-liquid vapor to a process tank comprising: at least one hydrophobic tube adapted to carry a gas; and a housing forming a chamber that surrounds the tube, the chamber adapted to receive a liquid that can permeate the tube, forming a gas-liquid vapor. In yet another aspect, the invention is a system for supplying a gas-liquid vapor to a process tank comprising: the apparatus of the present invention; gas supply means adapted to supply the gas to the tube; liquid supply means adapted to supply the liquid to the chamber; and gas-liquid transport means adapted to carry the gas-fluid vapor from the apparatus to the process tank.
摘要翻译：一种用于将气液蒸气供给到用于进行半导体制造的处理罐的系统，方法和装置。一方面，本发明是一种将气液蒸气供应到处理罐的方法，包括：通过至少一个疏水管供应气流; 将疏水管的外表面暴露于液体，使得液体的蒸气渗透疏水管并进入气流，在管内形成气液蒸汽; 并将气液蒸气输送到处理罐。在另一方面，本发明是一种用于将气液蒸气供应到处理罐的装置，包括：至少一个适于承载气体的疏水管; 以及壳体，其形成围绕所述管的室，所述室适于接收可渗透到所述管的液体，形成气液蒸气。在另一方面，本发明是一种用于将气液蒸气供应到处理罐的系统，包括：本发明的装置; 适于将气体供应到管的气体供应装置; 适于将液体供应到所述室的液体供应装置; 以及适于将气体 - 液体蒸气从设备运送到处理罐的气液输送装置。

2. 发明授权

US06732749B2 Particle barrier drain 失效
标题翻译：颗粒屏障排水
公开(公告)号：US06732749B2
公开(公告)日：2004-05-11
申请号：US10014121
申请日：2001-12-11
申请人： Larry Myland
发明人： Larry Myland
IPC分类号： B08B304
CPC分类号： B08B3/102 , Y10S134/902
摘要： A system and method for reducing the amount of contaminants that come into contact with wafer substrates during the production of integrated circuit devices. The system allows for uniform overflow of processing liquid from a process tank while preventing contaminants from reentering the process tank and contacting the wafers. The system in one aspect comprises an inner weir with a top surface, and overflow wall with at least one recess having a bottom, and a structure, the structure connecting the overflow wall and the inner weir to form a drainage basin with at least one drain hole; wherein the top surface of the inner weir is below the bottom of the at least one recess.
摘要翻译：一种用于在集成电路器件生产期间减少与晶片衬底接触的污染物的量的系统和方法。该系统允许来自处理罐的处理液体的均匀溢出，同时防止污染物重新进入处理罐并接触晶片。该系统在一个方面包括具有顶表面的内堰和具有至少一个具有底部的凹部的溢流壁，以及结构，连接溢流壁和内堰的结构，以形成具有至少一个排水管孔; 其中所述内堰的顶表面在所述至少一个凹部的底部之下。

3. 发明授权

US06842998B2 Membrane dryer 失效
标题翻译：膜干燥机
公开(公告)号：US06842998B2
公开(公告)日：2005-01-18
申请号：US10117739
申请日：2002-04-05
申请人： Ismail Kashkoush , Richard Novak , Larry Myland
发明人： Ismail Kashkoush , Richard Novak , Larry Myland
IPC分类号： B01D61/36 , B01D71/32 , B01D71/34 , B01D71/36 , B01F3/02 , B01F3/04 , F26B21/00
CPC分类号： B01F3/022 , B01F3/04021
摘要： A system, method, and apparatus for supplying a gas-liquid vapor to a process tank for performing semiconductor manufacturing. In one aspect, the invention is a method of supplying a gas-liquid vapor to a process tank comprising: supplying a gas stream through at least one hydrophobic tube; exposing the outside surface of the hydrophobic tube to a liquid so that the liquid permeates the hydrophobic tube and enters the gas stream, forming a gas-liquid vapor inside the tube; and transporting the gas-liquid vapor to the process tank. In another aspect, the invention is an apparatus for supplying a gas-liquid vapor to a process tank comprising: at least one hydrophobic tube adapted to carry a gas; and a housing forming a chamber that surrounds the tube, the chamber adapted to receive a liquid that can permeate the tube, forming a gas-liquid vapor. In yet another aspect, the invention is a system for supplying a gas-liquid vapor to a process tank comprising: the apparatus of the present invention; gas supply means adapted to supply the gas to the tube; liquid supply means adapted to supply the liquid to the chamber; and gas-liquid transport means adapted to carry the gas-fluid vapor from the apparatus to the process tank.
摘要翻译：一种用于将气液蒸气供给到用于进行半导体制造的处理罐的系统，方法和装置。一方面，本发明是一种将气液蒸气供应到处理罐的方法，包括：通过至少一个疏水管供应气流; 将疏水管的外表面暴露于液体，使得液体渗透疏水管并进入气流，在管内形成气液蒸气; 并将气液蒸气输送到处理罐。在另一方面，本发明是一种用于将气液蒸气供应到处理罐的装置，包括：至少一个适于承载气体的疏水管; 以及壳体，其形成围绕所述管的室，所述室适于接收可渗透到所述管的液体，形成气液蒸气。在另一方面，本发明是一种用于将气液蒸气供应到处理罐的系统，包括：本发明的装置; 适于将气体供应到管的气体供应装置; 适于将液体供应到所述室的液体供应装置; 以及适于将气体 - 液体蒸气从设备运送到处理罐的气液输送装置。

4. 发明申请

US20050087303A1 Membrane dryer 有权
公开(公告)号：US20050087303A1
公开(公告)日：2005-04-28
申请号：US10951009
申请日：2004-09-27
申请人： Ismail Kashkoush , Richard Novak , Larry Myland
发明人： Ismail Kashkoush , Richard Novak , Larry Myland
IPC分类号： B01D61/36 , B01D71/32 , B01D71/34 , B01D71/36 , B01F3/02 , B01F3/04 , C23F1/00
CPC分类号： B01F3/022 , B01F3/04021
摘要： A system, method, and apparatus for supplying a gas-liquid vapor to a process tank for performing semiconductor manufacturing. In one aspect, the invention is a method of supplying a gas-liquid vapor to a process tank comprising: supplying a gas stream through at least one hydrophobic tube; exposing the outside surface of the hydrophobic tube to a liquid so that a vapor of the liquid permeates the hydrophobic tube and enters the gas stream, forming a gas-liquid vapor inside the tube; and transporting the gas-liquid vapor to the process tank. In another aspect, the invention is an apparatus for supplying a gas-liquid vapor to a process tank comprising: at least one hydrophobic tube adapted to carry a gas; and a housing forming a chamber that surrounds the tube, the chamber adapted to receive a liquid that can permeate the tube, forming a gas-liquid vapor. In yet another aspect, the invention is a system for supplying a gas-liquid vapor to a process tank comprising: the apparatus of the present invention; gas supply means adapted to supply the gas to the tube; liquid supply means adapted to supply the liquid to the chamber; and gas-liquid transport means adapted to carry the gas-fluid vapor from the apparatus to the process tank.

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