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1. 发明申请

WO2009028811A8 APPARATUS FOR MEASURING THREE-DIMENSIONAL PROFILE USING LCD 审中-公开
标题翻译：用于使用LCD测量三维轮廓的装置
公开(公告)号：WO2009028811A8
公开(公告)日：2010-04-08
申请号：PCT/KR2008004652
申请日：2008-08-11
申请人： SNU PRECISION CO LTD , PARK HEUI JAE , LEE IL HWAN , CHOI SOON MIN , LEE JEONG HO
发明人： PARK HEUI JAE , LEE IL HWAN , CHOI SOON MIN , LEE JEONG HO
IPC分类号： G01B11/24
CPC分类号： G01B11/2518
摘要： Provided is an apparatus for measuring a three-dimensional profile using a LCD in which a sine wave pattern is formed on a measurement object, whereby image information of the measurement object is obtained using the sine wave pattern and a camera, and the image information is analyzed to measure a profile of the measurement object, the apparatus including a LCD projector including: a light source irradiating light forward; a LCD panel disposed at a front side of the light source, generating a sine wave pattern having a plurality of phases and a plurality of periods; polarization plates respectively disposed on front and rear sides of the LCD panel; a first focusing lens disposed apart from a front side of the LCD panel, focusing the sine wave pattern generated by the LCD panel on the measurement object; and a housing supporting the light source, the LCD panel, the polarization plates and the first focusing lens.
摘要翻译：本发明提供一种使用在测量对象上形成正弦波图案的LCD来测量三维轮廓的装置，由此利用正弦波图形和照相机获得测量对象的图像信息，并且图像信息是分析以测量测量对象的轮廓，该装置包括一个LCD投影仪，其包括：向前照射光的光源; 设置在所述光源的前侧的LCD面板，产生具有多个相位和多个周期的正弦波图案; 分别设置在LCD面板的前侧和后侧的偏振板; 第一聚焦透镜，其与LCD面板的前侧分离，将由LCD面板产生的正弦波图案聚焦在测量对象上; 以及支撑光源，LCD面板，偏振板和第一聚焦透镜的壳体。

2. 发明申请

WO2003060594A1 MACHINE AND METHOD FOR INSPECTING FERRULE OF OPTICAL CONNECTOR 审中-公开
标题翻译：检测光连接器的机器和方法
公开(公告)号：WO2003060594A1
公开(公告)日：2003-07-24
申请号：PCT/KR2003/000111
申请日：2003-01-17
申请人： PAHK, Heui-Jae , LEE, Il-Hwan , LEE, Hwa-Kyun , LEE, Dong-Sung
发明人： PAHK, Heui-Jae , LEE, Il-Hwan , LEE, Hwa-Kyun , LEE, Dong-Sung
IPC分类号： G02B27/00
CPC分类号： G01B11/08 , G01B11/12
摘要： Provided is a machine for inspecting ferrules of an optical connector and a method thereof. A fixture arranges the ferrules on a rectangular system to inspect the ferrules. A robot centers first ferrule on a optical system and focuses the first ferrule on the optical system. The optical system includes two cameras for photographing inside diameter image data and outside diameter image data of the ferrule. While the robot moves sequentially the optical system and remaining ferrules, all the inside and outside diameter image data of the ferrules are in sequence obtained by the optical system. Each inside and outside diameter and eccentricity of the ferrules are calculated by the obtained inside and outside diameter image data via a computer program.
摘要翻译：提供一种用于检查光连接器的套圈的机器及其方法。夹具将套管布置在矩形系统上以检查套圈。机器人将光学系统上的第一套圈中心并将第一套圈聚焦在光学系统上。光学系统包括用于拍摄内径图像数据和套圈的外径图像数据的两个相机。当机器人顺序地移动光学系统和剩余的套圈时，套圈的所有内外径图像数据依次由光学系统获得。通过计算机程序通过获得的内外图像数据计算套圈的内外径和偏心度。

3. 发明申请

WO2013005945A2 METHOD FOR MANUFACTURING SUBSTRATE FOR SURFACE-ENHANCED RAMAN SCATTERING SPECTROSCOPY AND SUBSTRATE MANUFACTURED USING THE METHOD 审中-公开
标题翻译：用于制造表面增强拉曼散射光谱的基板的方法和使用该方法制造的基板
公开(公告)号：WO2013005945A2
公开(公告)日：2013-01-10
申请号：PCT/KR2012005124
申请日：2012-06-28
申请人： POSTECH ACAD IND FOUND , LEE JONG LAM , SON JUN HO , LEE IL HWAN
发明人： LEE JONG LAM , SON JUN HO , LEE IL HWAN
CPC分类号： G01N21/658 , B82Y40/00
摘要： The present invention relates to a substrate for surface-enhanced Raman scattering spectroscopy and a manufacturing method thereof. The manufacturing method for a substrate for surface-enhanced Raman scattering spectroscopy, according to the present invention, comprises: a nano-pattern formation step for plasma-treating the surface of a polymer substrate and then forming a nano-pattern on the surface thereof; and a metal film formation step for forming a metal film on the nano-pattern of the polymer substrate. Thus, the present invention can provide a substrate for surface-enhanced Raman scattering spectroscopy and a manufacturing method thereof, which exhibit high reproducibility as well as low manufacturing costs, and effectively induce hot spots, thereby improving the detection sensitivity of the substance.
摘要翻译：本发明涉及用于表面增强拉曼散射光谱的基板及其制造方法。根据本发明的用于表面增强拉曼散射光谱的基板的制造方法包括：纳米图案形成步骤，用于等离子体处理聚合物基材的表面，然后在其表面上形成纳米图案; 以及用于在聚合物基板的纳米图案上形成金属膜的金属膜形成步骤。因此，本发明可以提供一种表面增强拉曼散射光谱用基板及其制造方法，其再现性高，制造成本低，有效地诱发热点，提高物质的检测灵敏度。

4. 发明申请

WO2009104876A3 OPTICAL INSPECTION SYSTEM, AND AN INSPECTION METHOD FOR INSPECTING OBJECTS IN WHICH THE SAID SYSTEM IS USED 审中-公开
标题翻译：光学检测系统和用于检查使用该系统的对象的检查方法
公开(公告)号：WO2009104876A3
公开(公告)日：2009-11-05
申请号：PCT/KR2009000602
申请日：2009-02-10
申请人： SNU PRECISION CO LTD , PARK HEUI JAE , LEE IL HWAN , KANG SUNG BUM
发明人： PARK HEUI JAE , LEE IL HWAN , KANG SUNG BUM
IPC分类号： G01B11/24
CPC分类号： G01B11/245 , G01N21/89
摘要： The present invention concerns an optical inspection system for inspecting diverse inspection objects, and it concerns an inspection method for inspection objects in which the said system is used. The system of the present invention comprises: a work-piece stage having a table on which is placed an inspection object; a plurality of linescan cameras; and a computer for processing scanned images of inspection objects. The upper surface of the table is provided with a plurality of markings having marking stage coordinate values in such a way as to allow the acquisition of a scanned image by means of the linescan cameras. Among the markings, two markings which are adjacent to each other are located within the respective fields of vision of the linescan cameras. Among the markings, the markings between the first marking and the final marking are respectively located in such a way as to overlap within the fields of vision of two linescan cameras which are adjacent to each other among the plurality of linescan cameras. When the inspection method of the present invention is employed, markings image coordinate values and work-piece image coordinate values are used to calculate work-piece image - stage coordinate values from work-piece image coordinate values, and a decision is made that the inspection object is acceptable if the work-piece image - stage coordinate values satisfy the permissible error with respect to the work-piece stage coordinate values.
摘要翻译：本发明涉及用于检查各种检查对象的光学检查系统，并且涉及其中使用所述系统的检查对象的检查方法。本发明的系统包括：工件台，具有在其上放置检查对象的工作台; 多个线扫描相机; 和用于处理检查对象的扫描图像的计算机。桌子的上表面设置有多个具有标记台坐标值的标记，以允许借助线扫描相机获取扫描图像。在这些标记中，彼此相邻的两个标记位于线扫描相机的相应视野内。在这些标记中，第一标记和最终标记之间的标记分别位于在多个线扫描相机中彼此相邻的两个线扫描相机的视场内重叠的位置。当采用本发明的检查方法时，使用标记图像坐标值和工件图像坐标值从工件图像坐标值计算工件图像阶段坐标值，并且做出检查如果工件图像 - 阶段坐标值满足相对于工件阶段坐标值的允许误差，则该目标是可接受的。

5. 发明申请

WO2009104871A3 DARK-FIELD EXAMINATION DEVICE 审中-公开
标题翻译：暗场检测装置
公开(公告)号：WO2009104871A3
公开(公告)日：2009-10-22
申请号：PCT/KR2009000249
申请日：2009-01-16
申请人： SNU PRECISION CO LTD , KIM TAI WOOK , PARK HEUI JAE , LEE IL HWAN
发明人： KIM TAI WOOK , PARK HEUI JAE , LEE IL HWAN
IPC分类号： G02F1/13
CPC分类号： G01N21/956 , G01N2021/8822 , G01N2021/9513 , G02F1/1303
摘要： The present invention relates to a dark-field examination device. The dark-field examination device according to the present invention is characterised in that it comprises: an illumination unit for irradiating light towards an examination object on a base; a reflection unit for reflecting, back towards the examination object, incident light which has been reflected by means of the examination object or incident light which has passed through the base; and an imaging unit for imaging the examination object by receiving light which has been scattered by means of the examination object, and in that the illumination unit, the reflection unit and the imaging unit are arranged in such a way that part of the light which has been irradiated from the illumination unit is scattered by means of the examination object and falls incident upon the imaging unit while another part of the light which has been irradiated from the illumination unit falls incident upon the reflection unit, and the light reflected back towards the examination object by means of the reflection unit is scattered by means of the examination object and falls incident upon the imaging unit.
摘要翻译：本发明涉及一种暗视野检查装置。根据本发明的暗视野检查装置的特征在于，它包括：照明单元，用于向基座上的检查对象照射光; 反射单元，用于向检查对象反射已经通过检查对象反射的入射光或已经穿过基座的入射光; 以及成像单元，用于通过接收通过检查对象散射的光来对检查对象进行成像，并且照明单元，反射单元和成像单元被布置成使得具有从照明单元照射的照射单元通过检查对象物散射并入射到成像单元上，而从照明单元照射的另一部分光入射到反射单元上，并且将光反射回检查通过反射单元的物体通过检查对象散射并落在成像单元上。

6. 发明申请

WO2009028811A1 APPARATUS FOR MEASURING THREE-DIMENSIONAL PROFILE USING LCD 审中-公开
标题翻译：用于使用LCD测量三维轮廓的装置
公开(公告)号：WO2009028811A1
公开(公告)日：2009-03-05
申请号：PCT/KR2008/004652
申请日：2008-08-11
申请人： SNU PRECISION CO., LTD. , PARK, Heui Jae , LEE, Il Hwan , CHOI, Soon Min , LEE, Jeong Ho , PARK, Yong-Seok , LEE, Won-Sik , LEE, Jae-Won
发明人： PARK, Heui Jae , LEE, Il Hwan , CHOI, Soon Min , LEE, Jeong Ho , PARK, Yong-Seok , LEE, Won-Sik , LEE, Jae-Won
IPC分类号： G01B11/24
CPC分类号： G01B11/2518
摘要： Provided is an apparatus for measuring a three-dimensional profile using a LCD in which a sine wave pattern is formed on a measurement object, whereby image information of the measurement object is obtained using the sine wave pattern and a camera, and the image information is analyzed to measure a profile of the measurement object, the apparatus including a LCD projector including: a light source irradiating light forward; a LCD panel disposed at a front side of the light source, generating a sine wave pattern having a plurality of phases and a plurality of periods; polarization plates respectively disposed on front and rear sides of the LCD panel; a first focusing lens disposed apart from a front side of the LCD panel, focusing the sine wave pattern generated by the LCD panel on the measurement object; and a housing supporting the light source, the LCD panel, the polarization plates and the first focusing lens.
摘要翻译：本发明提供一种使用在测量对象上形成正弦波图案的LCD来测量三维轮廓的装置，由此利用正弦波图形和照相机获得测量对象的图像信息，并且图像信息是分析以测量测量对象的轮廓，该装置包括一个LCD投影仪，其包括：向前照射光的光源; 设置在所述光源的前侧的LCD面板，产生具有多个相位和多个周期的正弦波图案; 分别设置在LCD面板的前侧和后侧的偏振板; 第一聚焦透镜，其与LCD面板的前侧分离，将由LCD面板产生的正弦波图案聚焦在测量对象上; 以及支撑光源，LCD面板，偏振板和第一聚焦透镜的壳体。

7. 发明申请

WO2008133418A1 DETECTING MATERIALS ON WAFER AND REPAIR SYSTEM AND METHOD THEREOF 审中-公开
标题翻译：检测材料的波浪和维修系统及其方法
公开(公告)号：WO2008133418A1
公开(公告)日：2008-11-06
申请号：PCT/KR2008/002161
申请日：2008-04-17
申请人： SNU PRECISION CO., LTD. , PARK, Heui Jae , SHIN, Heung Hyun , LEE, Il Hwan
发明人： PARK, Heui Jae , SHIN, Heung Hyun , LEE, Il Hwan
IPC分类号： H01L21/66
CPC分类号： G01N21/9501 , G01N21/94 , G01N21/95607
摘要： Disclosed is a system and a method for detecting and repairing alien materials on a semiconductor wafer. The system includes a transfer arm for transferring and aligning a wafer, an inspection unit, on which the wafer is seated, and which obtains an image of the wafer surface, an analysis module for analyzing the alien material appearing in the image obtained by the inspection unit, and a repair unit for repairing the alien material according to information regarding the analyzed alien material. The method includes the steps of transferring and aligning the wafer, emitting light to the aligned wafer to obtain a surface image of the wafer, reading the surface image to create information (position, height, diameter) of the alien material, comparing the information regarding the alien material with reference data, transmitting information regarding the alien material, which has been confirmed as a repair target as a result of the comparison, to the repair unit, and repairing the alien material according to the received information. The simple construction of the system and method for detecting and repairing alien materials on a wafer reduces the manufacturing cost, avoids the loss of manufacturing cost, and increases the semiconductor chip yield ratio.
摘要翻译：公开了一种用于检测和修复半导体晶片上的异物的系统和方法。该系统包括用于传送和对准晶片的传送臂，其上放置晶片的检查单元，并且获得晶片表面的图像;分析模块，用于分析通过检查获得的图像中出现的外来材料单位和维修单位，根据有关外来资料分析的资料修复异物。该方法包括以下步骤：转移和对准晶片，向对准的晶片发射光以获得晶片的表面图像，读取表面图像以创建外来材料的信息（位置，高度，直径），比较关于具有参考数据的外星材料，将作为比较的结果被确认为修复目标的外来材料的信息传送到修理单元，以及根据接收的信息修复外来材料。用于在晶圆上检测和修复外来材料的系统和方法的简单构造降低了制造成本，避免了制造成本的损失，并且提高了半导体芯片的屈服比。

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