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    • 1. 发明申请
    • MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME
    • 存储器件及其制造方法
    • US20110180864A1
    • 2011-07-28
    • US12691964
    • 2010-01-22
    • YU-FONG HUANGMiao-Chih HsuKuan-Fu ChenTzung-Ting Han
    • YU-FONG HUANGMiao-Chih HsuKuan-Fu ChenTzung-Ting Han
    • H01L27/115H01L21/8246
    • H01L27/11568H01L29/66833H01L29/7926
    • A memory device is provided, including a substrate, a conductive layer, a charge storage layer, a plurality of isolation structures, a plurality of first doped regions, and a plurality of second doped regions. The substrate has a plurality of trenches. The conductive layer is disposed on the substrate and fills the trenches. The charge storage layer is disposed between the substrate and the conductive layer. The isolation structures are disposed in the substrate between two adjacent trenches, respectively. The first doped regions are disposed in an upper portion of the substrate between each isolation structure and each trench, respectively. The second doped regions are disposed in the substrate under a bottom portion of the trenches, in which each isolation structure is disposed between two adjacent second doped regions.
    • 提供了一种存储器件,包括衬底,导电层,电荷存储层,多个隔离结构,多个第一掺杂区和多个第二掺杂区。 衬底具有多个沟槽。 导电层设置在基板上并填充沟槽。 电荷存储层设置在基板和导电层之间。 隔离结构分别设置在两个相邻沟槽之间的衬底中。 第一掺杂区域分别设置在每个隔离结构和每个沟槽之间的衬底的上部。 第二掺杂区域设置在沟槽的底部下方的衬底中,其中每个隔离结构设置在两个相邻的第二掺杂区域之间。
    • 4. 发明授权
    • Modularly configurable memory system for LCD TV system
    • 用于液晶电视系统的模块化可配置存储系统
    • US07515158B2
    • 2009-04-07
    • US11158872
    • 2005-06-22
    • Peter ChangKuan Fu Chen
    • Peter ChangKuan Fu Chen
    • G06T1/60
    • H04N21/44004G09G5/001G09G5/39G09G2360/12H04N19/423H04N21/42692H04N21/443
    • A configurable memory system provides a high bandwidth, low latency, no wait state data path to a memory system functioning as a frame buffer for a digital video processing system. The configurable memory system has configurable channels that are programmable to control the access pattern of the memory controller. Once the configurable channels are programmed, the memory controller can generate the necessary address, timing, and control signals for selectively writing the data to and reading the data from the selected blocks of the array of memory devices continuously access the memory and move the data to the channel buffers. The channel buffer receives, retains, and transfers a defined segment of the data as defined by the segment pattern between the processing system and the array of memory devices, such that the processing system is able to transfer and receive the data continuously according to data requirements of the processing system.
    • 可配置的存储器系统提供高带宽,低等待时间,无等待状态数据路径到用作数字视频处理系统的帧缓冲器的存储器系统。 可配置存储器系统具有可编程的可配置通道,以控制存储器控制器的访问模式。 一旦可配置的通道被编程,存储器控制器可以产生必要的地址,定时和控制信号,用于选择性地将数据写入存储器件阵列的所选块并从其中读取数据,并持续访问存储器并将数据移动到 通道缓冲区。 信道缓冲器接收,保留和传送由处理系统和存储器件阵列之间的段模式定义的数据的定义段,使得处理系统能够根据数据要求连续地传送和接收数据 的处理系统。
    • 7. 发明申请
    • MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME
    • 存储器件及其制造方法
    • US20110220986A1
    • 2011-09-15
    • US12724053
    • 2010-03-15
    • Yu-Fong HuangI-Shen TsaiShang-Wei LinMiao-Chih HsuKuan-Fu Chen
    • Yu-Fong HuangI-Shen TsaiShang-Wei LinMiao-Chih HsuKuan-Fu Chen
    • H01L29/792H01L21/336
    • H01L29/792H01L27/11568
    • A memory device including a substrate, a conductive layer, a charge storage layer, first and second dopant regions and first and second cell dopant regions is provided. A plurality of trenches is deployed in the substrate. The conductive layer is disposed on the substrate and fills the trenches. The charge storage layer is disposed between the substrate and the conductive layer. The first and second dopant regions having a first conductive type are configured in the substrate under bottoms of the trenches and in an upper portion of the substrate between two adjacent trenches, respectively. The first and second cell dopant regions having a second conductive type are configured in the substrate between lower portions of side surfaces of the trenches and in the substrate adjacent to the bottoms of the second dopant regions, respectively. The first and the second conductive types are different dopant types.
    • 提供了包括基板,导电层,电荷存储层,第一和第二掺杂剂区以及第一和第二单元掺杂区的存储器件。 多个沟槽部署在基板中。 导电层设置在基板上并填充沟槽。 电荷存储层设置在基板和导电层之间。 具有第一导电类型的第一和第二掺杂剂区域分别在沟槽的底部和衬底的上部分别配置在衬底中。 具有第二导电类型的第一和第二单元掺杂区域分别配置在沟槽的侧表面的下部和与第二掺杂区的底部相邻的衬底中的衬底中。 第一和第二导电类型是不同的掺杂剂类型。