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    • 3. 发明授权
    • Dental magnetic attachment and its fixing method including spacer
    • 牙科磁性附件及其固定方法包括间隔
    • US06203325B1
    • 2001-03-20
    • US09381977
    • 1999-10-05
    • Yoshinobu HonkuraKazuo AraiKazunari Kimura
    • Yoshinobu HonkuraKazuo AraiKazunari Kimura
    • A61C1312
    • A61C13/235
    • A dental magnetic attachment having good cushioning properties against a compressing pressure which makes a denture sink appropriately on biting. The dental magnetic attachment embedded in the denture base for holding the denture in the oral cavity by a magnetic attractive force working with the magnetic assembly and a soft magnetic keeper embedded in the top of the root surface includes a magnetic assembly and a cap covering the top of the magnetic assembly. The magnetic assembly has a hollow in the center of its top. The cap with a button is placed on the magnetic assembly, inserting the button into the hollow to contact to its bottom. On biting, the button is compressed, to be deformed with a shorter thickness and at this time a sleeve formed as a body around the core slides down along the side of the magnetic assembly to reduce the thickness of the dental magnetic attachment. This sliding makes the denture sink uniformly and appropriately. The dental magnetic attachment has good cushioning properties and offers a good feeling to a patient when biting with the denture.
    • 牙科磁性附件具有抵抗压缩压力的良好缓冲性能,这使得义齿在咬合时适当地下沉。 嵌入在义齿基座中的牙科磁性附件通过与磁性组件一起工作的磁性吸引力和嵌入根表面顶部的软磁保持器将义齿保持在口腔中,包括磁性组件和覆盖顶部的帽 的磁性组件。 磁性组件在其顶部的中心具有中空部分。 带有按钮的盖子放置在磁性组件上,将按钮插入空腔中以接触其底部。 在咬住时,按钮被压缩,以更短的厚度变形,此时,作为主体围绕芯部形成的套筒沿着磁性组件的侧面向下滑动以减小牙齿磁性附件的厚度。 这种滑动使得义齿沉没均匀和适当。 牙齿磁性附件具有良好的缓冲性能,并且在与义齿咬合时对患者提供良好的感觉。
    • 5. 发明申请
    • DESIGNING DEVICE FOR SEMICONDUCTOR INTEGRATED CIRCUIT AND DESIGNING METHOD FOR SEMICONDUCTOR INTEGRATED CIRCUIT
    • 用于半导体集成电路的设计器件和半导体集成电路的设计方法
    • US20130074027A1
    • 2013-03-21
    • US13422236
    • 2012-03-16
    • Kazunari KIMURA
    • Kazunari KIMURA
    • G06F17/50
    • G06F17/5077
    • A designing device for a semiconductor integrated circuit of an embodiment includes a low-order hierarchy wiring design portion configured to design a first wiring; and a high-order hierarchy wiring design portion configured to design a second wiring. The low-order hierarchy wiring design portion divides the first functional block into a plurality of small regions, calculates a number of wiring layers required for wiring in the functional block for each of the plurality of small regions and sets the number as the number of low-order hierarchy wiring layers, sets wiring layers in the number of the low-order hierarchy wiring layers from the wiring layer located on the lowermost part as a low-order hierarchy wiring region for each of the plurality of small regions, and places the first wiring in the low-order hierarchy wiring region.
    • 实施例的半导体集成电路的设计装置包括被配置为设计第一布线的低阶层布线设计部分; 以及配置为设计第二布线的高阶层布线设计部分。 低级布线设计部将第一功能块分割为多个小区域,计算多个小区域中的每一个的功能块中布线所需的布线层数,并将该数量设定为低 将位于最下部的布线层的低层布线层的数量的布线层设置为多个小区域中的每一个的低层布线区域的布线层,并且将第一层布线层 布线在低层布线区域。
    • 8. 发明申请
    • Method and apparatus for fluid polishing
    • 流体抛光方法和装置
    • US20070049178A1
    • 2007-03-01
    • US11509749
    • 2006-08-24
    • Yasuhito OokaShinichi KatoKazunari KimuraShigeya Kato
    • Yasuhito OokaShinichi KatoKazunari KimuraShigeya Kato
    • B24B1/00
    • B24B31/116B24B1/00
    • In a fluid polishing method for processing a fine aperture by slurry 7, the slurry is supplied from a cylinder 2a in a slurry flow rate target process until the flow rate increases to a target value of a slurry feed flow rate. When the flow rate reaches the target flow-rate, the cylinder is stopped and switched to another cylinder 2b and the operation fluid flow rate of the fine aperture is thereafter measured. In a metering process, to be executed next, a necessary processing time is calculated on the basis of the operation fluid flow rate and polishing is carried out for a necessary processing time by another cylinder 2b. Another cylinder is then stopped and switched and the operation fluid flow rate is measured. In this way, the metering process is repeated until the operation fluid flow rate reaches a predetermined value. In each process, the supply of the slurry is not interrupted.
    • 在通过浆料7处理细孔的流体研磨方法中,浆料从浆料流量目标工艺中的气缸2a供给,直到流量增加到浆料进料流量的目标值。 当流量达到目标流量时,停止气缸并切换到另一气缸2b,然后测量微孔的操作流体流量。 在接下来执行的计量过程中,基于操作流体流量计算必要的处理时间,并且通过另一个气缸bb对所需的处理时间进行抛光。 然后停止并切换另一个气缸并测量操作流体流量。 以这种方式,重复计量过程,直到操作流体流量达到预定值。 在每个过程中,浆料的供应不会中断。