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1. 发明专利

JP2010017096A Excrement-treating material for animal 审中-公开
标题翻译：动物处理材料
公开(公告)号：JP2010017096A
公开(公告)日：2010-01-28
申请号：JP2008178447
申请日：2008-07-08
申请人： Shinichi Kato , 真一加藤
发明人： KATO SHINICHI
IPC分类号： A01K1/015
摘要： PROBLEM TO BE SOLVED: To provide an epoch-making, wood powder-based excrement-treating material for animals, solving the problems of conventional wood powder-based excrement-treating material for animals, and regulated so that (1) granules are hard and hardly broken, (2) a powder is hardly caused and dust is hardly dispersed, (3) granules are hardly scattered because of being properly heavy, and (4) the material is economical because the absorption of urine is very good to form small particles, and the amount of use is small.
SOLUTION: The excrement-treating material for animals is the wood powder-based treating material for animals, and is obtained by using a wood powder as a main raw material and allowing the wood powder to contain dried bean-curd refuse and at least one kind of each of an adhesive and an inorganic filler.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供用于动物的划时代的基于木粉的排泄物处理材料，解决了用于动物的常规木粉基排泄物处理材料的问题，并且被调节为使得（1）颗粒难以破碎，（2）几乎不引起粉末，灰尘难以分散，（3）由于适当的重量，颗粒难以分散，（4）由于吸收尿液非常好，所以材料经济形成小颗粒，使用量小。解决方案：动物粪便处理材料是用于动物的基于木粉的处理材料，通过使用木粉作为主要原料并使木粉含有干豆腐垃圾和至少一种粘合剂和无机填料。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2009044992A Urination treating material for animal 审中-公开
标题翻译：动物处理材料
公开(公告)号：JP2009044992A
公开(公告)日：2009-03-05
申请号：JP2007213384
申请日：2007-08-20
申请人： Shinichi Kato , 真一加藤
发明人： KATO SHINICHI
IPC分类号： A01K1/015
摘要： PROBLEM TO BE SOLVED: To readily discriminate used states of a urination treating material for an animal by simple constitution.
SOLUTION: The coloring urination treating material 12 for the animal is made from a water-absorbing material as a main raw material and comprises a non-colored water-soluble dye material. Furthermore, the dye material can be colored by contact with urination moisture.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：通过简单的结构容易地区分用于动物的排尿处理材料的使用状态。解决方案：用于动物的排尿处理材料12由吸水材料作为主要原料制成，并且包含无色水溶性染料。此外，染料可以与尿尿水接触而着色。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2004000133A Animal droppings and urine treating material 有权
公开(公告)号：JP2004000133A
公开(公告)日：2004-01-08
申请号：JP2002365933
申请日：2002-12-17
申请人： Shinichi Kato , 加藤真一
发明人： KATO SHINICHI
IPC分类号： A01K1/015
摘要： PROBLEM TO BE SOLVED: To provide an animal droppings and urine treating material with high degree of deodorization of absorbed droppings or urine and with good discarding processability at a low cost.
SOLUTION: (1) The animal droppings and urine treating material includes rice bran and defatted rice bran. (2) The treating material comprises the rice bran and the defatted rice bran as main components and a vegetable adhesive, an inorganic filler, and a dry bean curd refuse as supplements.
COPYRIGHT: (C)2004,JPO

4. 发明专利

JP2006082680A Safety device for automobile in reversing 审中-公开
标题翻译：汽车安全装置反转
公开(公告)号：JP2006082680A
公开(公告)日：2006-03-30
申请号：JP2004269200
申请日：2004-09-16
申请人： Shinichi Kato , 伸一加藤
发明人： KATO SHINICHI
IPC分类号： B60J1/00 , B60R11/02
摘要： PROBLEM TO BE SOLVED: To provide a safety device for an automobile in reversing, allowing easy perception of the extra-car state (indication, situation, etc.) when an automobile is reversing.
SOLUTION: The safety device for the automobile 1 in reversing is equipped with a sensing means 22 to sense that the shift lever 14 is in the reverse position and an external sound hearing means to facilitate perception of the state outside the automobile, whereby the external sound hearing means is actuated upon receiving a sensing signal from the sensing means 22 to indicate that the shift lever 14 is in the reversing position, to allow the driver to easily have perception of the external state, and thereby the safety is enhanced for the automobile in reversing.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种用于车辆的倒车的安全装置，允许在汽车倒车时容易看到超车状态（指示，情况等）。解决方案：用于反转的汽车1的安全装置配备有感测换档杆14处于相反位置的感测装置22和用于促进汽车外部状态的外部声音听觉装置，由此外部声音听觉装置在从感测装置22接收到感测信号时被启动以指示变速杆14处于反转位置，以允许驾驶员容易地感知到外部状态，从而提高了安全性汽车倒车。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2006045931A Device for preventing door left ajar on automobile 审中-公开
标题翻译：用于在汽车上预防门左手的装置
公开(公告)号：JP2006045931A
公开(公告)日：2006-02-16
申请号：JP2004229072
申请日：2004-08-05
申请人： Shinichi Kato , 伸一加藤
发明人： KATO SHINICHI
IPC分类号： E05F15/16 , B60J1/17 , B60J5/00
摘要： PROBLEM TO BE SOLVED: To provide a device capable of preventing a door of an automobile left ajar. SOLUTION: Upon receiving a detection signal of opening a door of an automobile 1, a control circuit 34 of a power window device performs control of driving a motor 26 of the predetermined door 3 to open a window 10 to a predetermined height, and upon receiving a detection signal of closing the open door, the control circuit 34 performs control of driving the motor 26 of the predetermined door 3 to close the open window 10. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够防止汽车的门离开的装置。解决方案：当接收到打开汽车1的门的检测信号时，电动车窗装置的控制电路34执行驱动预定门3的电动机26以将窗10打开到预定高度的控制，并且在接收到关闭打开的门的检测信号时，控制电路34执行驱动预定门3的马达26的控制以关闭打开的窗口10.版权所有（C）2006，JPO＆NCIPI

6. 发明授权

US09434005B2 Pb-free copper-alloy sliding material, and plain bearing 有权
标题翻译：无铅铜合金滑动材料和滑动轴承
公开(公告)号：US09434005B2
公开(公告)日：2016-09-06
申请号：US13493617
申请日：2012-06-11
申请人： Hiromi Yokota , Ryo Mukai , Shinichi Kato , Nahomi Hamaguchi
发明人： Hiromi Yokota , Ryo Mukai , Shinichi Kato , Nahomi Hamaguchi
IPC分类号： B22F7/08 , C22C1/04 , C22C9/00 , C22C9/02 , F16C33/12 , C22C9/04 , C22C9/08
CPC分类号： B22F7/08 , B22F2998/00 , C22C1/0425 , C22C9/00 , C22C9/02 , C22C9/04 , C22C9/08 , F16C33/121 , F16C2204/12 , Y02T10/865 , B22F3/10
摘要： A method of producing a Pb-free copper-alloy sliding material containing 1.0 to 15.0% of Sn, 0.5 to 15.0% of Bi and 0.05 to 5.0% of Ag, and Ag and Bi from an Ag—Bi eutectic. If necessary, at least one of 0.1 to 5.0% of Ni, 0.02 to 0.2% P, 0.5 to 30.0% of Zn, and 1.0 to 10.0 mass % of at least one of a group consisting of Fe3P, Fe2P, FeB, NiB and AlN may be added.
摘要翻译：制备含有Sn：1.0〜15.0％，Bi：0.5〜15.0％，Ag：0.05〜5.0％，Ag-Bi共晶的Ag，Bi的无铅铜合金滑动材料的制造方法。如果需要，可以使用0.1〜5.0％的Ni，0.02〜0.2％的P，0.5〜30.0％的Zn和1.0〜10.0质量％的Fe 3 P，Fe 2 P，FeB，NiB和可以添加AlN。

7. 发明授权

US08963050B2 Apparatus for and method of heat-treating thin film on surface of substrate 有权
标题翻译：薄膜表面热处理设备及方法
公开(公告)号：US08963050B2
公开(公告)日：2015-02-24
申请号：US13272657
申请日：2011-10-13
申请人： Shinichi Kato , Hiroki Kiyama
发明人： Shinichi Kato , Hiroki Kiyama
IPC分类号： F27D11/00 , H05B7/18 , H05B3/68 , F26B3/30 , F27B17/00 , F27D7/02 , H01L21/67
CPC分类号： F27B17/0025 , F27D7/02 , H01L21/67109 , H01L21/67115
摘要： A semiconductor wafer having a surface with a thin film formed thereon is transported into a chamber and held by a holder. After an atmosphere provided in the chamber is replaced, flashes of light are directed from flash lamps in a light irradiation part toward the semiconductor wafer to perform a baking process on the thin film. The irradiation of the semiconductor wafer with light from halogen lamps in the light irradiation part also starts at the same time as the irradiation thereof with the flashes of light. The flashes of light emitted for an extremely short period of time and having a high intensity allow the surface temperature of the thin film to rise momentarily. This prevents the occurrence of abnormal grain growth resulting from prolonged baking in the film.
摘要翻译：将其上形成有薄膜的表面的半导体晶片输送到室中并由保持器保持。在更换室内提供的气氛之后，将闪光灯从光照射部分中的闪光灯朝向半导体晶片引导，以对薄膜进行烘烤处理。用光照射部分的卤素灯的光照射半导体晶片也是在与闪光的照射的同时开始的。在非常短的时间内发射的光并且具有高强度的闪光使得薄膜的表面温度瞬间上升。这防止了由于膜中长时间烘烤而导致的异常晶粒生长的发生。

8. 发明授权

US08852966B2 Heat treatment method and heat treatment apparatus of thin film 有权
标题翻译：薄膜的热处理方法和热处理装置
公开(公告)号：US08852966B2
公开(公告)日：2014-10-07
申请号：US13609947
申请日：2012-09-11
申请人： Hiroki Kiyama , Kazuhiko Fuse , Shinichi Kato
发明人： Hiroki Kiyama , Kazuhiko Fuse , Shinichi Kato
IPC分类号： H01L21/26 , H01L21/02 , H01L21/268 , H01L21/67
CPC分类号： H01L21/2686 , H01L21/02181 , H01L21/0228 , H01L21/02337 , H01L21/02356 , H01L21/67109 , H01L21/67115
摘要： A semiconductor wafer, on the surface of which a silicon dioxide base material and an amorphous silicon thin film are formed in this order, is carried into a chamber. An insulated gate bipolar transistor (IGBT) is connected with a power supply circuit to a flash lamp, and the IGBT makes an energization period to the flash lamp to be 0.01 millisecond or more and 1 millisecond or less, consequently making a flash light irradiation time to be 0.01 millisecond or more and 1 millisecond or less. Since a flash heat treatment is performed with a remarkably short flash light irradiation time, the excessive heating of the thin film of amorphous silicon is suppressed and harmful influence such as the exfoliation of the film is prevented.
摘要翻译：在其表面上依次形成二氧化硅基底材料和非晶硅薄膜的半导体晶片被携带到腔室中。绝缘栅双极晶体管（IGBT）与电源电路连接到闪光灯，并且IGBT使闪光灯的通电周期为0.01毫秒以上且1毫秒以下，从而使闪光灯照射时间为0.01毫秒以上且1毫秒以下。由于以明显短的闪光照射时间进行闪光热处理，因此能够抑制非晶硅薄膜的过度加热，并且防止了膜的剥离等有害影响。

9. 发明授权

US08623750B2 Heat treatment method for promoting crystallization of high dielectric constant film 有权
标题翻译：促进高介电常数膜结晶的热处理方法
公开(公告)号：US08623750B2
公开(公告)日：2014-01-07
申请号：US13607892
申请日：2012-09-10
申请人： Kazuhiko Fuse , Shinichi Kato
发明人： Kazuhiko Fuse , Shinichi Kato
IPC分类号： H01L21/3205 , H01L21/31 , H01L21/469
CPC分类号： H01L21/02356 , H01L21/2686 , H01L21/28176 , H01L21/67115 , H01L21/68707 , H01L21/68735 , H01L29/513 , H01L29/517 , H01L29/7848
摘要： A film of silicon dioxide is formed on the silicon-germanium layer, and a high dielectric constant film is further formed on the film of silicon dioxide. First irradiation from a flash lamp is performed on the semiconductor wafer to increase the temperature of a front surface of the semiconductor wafer from a preheating temperature to a target temperature for a time period in the range of 3 milliseconds to 1 second. Subsequently, second irradiation from the flash lamp is performed to maintain the temperature of the front surface of the semiconductor wafer within a ±25° C. range around the target temperature for a time period in the range of 3 milliseconds to 1 second. This promotes the crystallization of the high dielectric constant film while suppressing the alleviation of distortion in the silicon-germanium layer.
摘要翻译：在硅 - 锗层上形成二氧化硅膜，并且在二氧化硅膜上进一步形成高介电常数膜。在半导体晶片上进行来自闪光灯的第一次照射，将半导体晶片的正面的温度从预热温度升温至目标温度，时间范围为3毫秒〜1秒。随后，执行从闪光灯的第二次照射，以将半导体晶片的前表面的温度保持在目标温度的±25℃范围内，持续3毫秒至1秒的时间段。这促进了高介电常数膜的结晶，同时抑制了硅 - 锗层中的变形的减轻。

10. 发明申请

US20130148948A1 HEAT TREATMENT APPARATUS AND METHOD FOR HEATING SUBSTRATE BY LIGHT-IRRADIATION 有权
标题翻译：热处理装置和通过光照射加热底板的方法
公开(公告)号：US20130148948A1
公开(公告)日：2013-06-13
申请号：US13759658
申请日：2013-02-05
申请人： Shinichi KATO
发明人： Shinichi KATO
IPC分类号： F27D11/12
CPC分类号： F27D11/12 , F27D19/00 , F27D99/0006 , H01L21/67115 , H01L21/67248
摘要： A light-emission output of a flash lamp for performing a light-irradiation heat treatment on a substrate in which impurities are implanted is increased up to a target value L1 over a period of time from 1 to 100 milliseconds, is kept for 5 to 100 milliseconds within a fluctuation range of plus or minus 30% from the target value L1, and is then attenuated from the target value L1 to zero over a period of time from 1 to 100 milliseconds. That is, compared with conventional flash lamp annealing, the light-emission output of the flash lamp is increased more gradually, is kept to be constant for a certain period of time, and is then decreased more gradually. As a result, a total heat amount of a surface of the substrate increases compared with the conventional case, but a surface temperature thereof rises more gradually and then drops more gradually compared with the conventional case.
摘要翻译：用于对其中注入杂质的衬底进行光照射热处理的闪光灯的发光输出在1至100毫秒的时间段内增加到目标值L1，保持为5至100 在距离目标值L1的正或负30％的波动范围内的毫秒，然后在1至100毫秒的时间段内从目标值L1衰减到零。也就是说，与传统的闪光灯退火相比，闪光灯的发光输出逐渐增加，保持恒定一段时间，然后逐渐减小。结果，与常规情况相比，基板表面的总热量增加，但是与常规情况相比，表面温度逐渐上升，然后逐渐下降。

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