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1. 发明授权

US06245190B1 Plasma processing system and plasma processing method 失效
标题翻译：等离子体处理系统和等离子体处理方法
公开(公告)号：US06245190B1
公开(公告)日：2001-06-12
申请号：US09048075
申请日：1998-03-26
申请人： Toshio Masuda , Katsuhiko Mitani , Tetsunori Kaji , Jun'ichi Tanaka , Katsuya Watanabe , Shigeru Shirayone , Toru Otsubo , Ichiro Sasaki , Hideshi Fukumoto , Makoto Koizumi
发明人： Toshio Masuda , Katsuhiko Mitani , Tetsunori Kaji , Jun'ichi Tanaka , Katsuya Watanabe , Shigeru Shirayone , Toru Otsubo , Ichiro Sasaki , Hideshi Fukumoto , Makoto Koizumi
IPC分类号： H05H146
CPC分类号： H01J37/32091 , H01J37/32082 , H01J37/32165 , H01J37/32623 , H01J37/3266 , H01J37/32678
摘要： A plasma processing apparatus and a method therefor which can achieve a preferred process rate, a fine pattern process capability, a selectivity and uniformity of processing at the same time compatibly for a large size wafer, which effects are achieved by controlling the plasma state and the dissociation state of etching gas through control of the electron resonance through application of a magnetic field thereto. A high frequency power at 20-300 MHz is applied across a pair of electrodes in a vacuum process chamber, and a magnetic field is formed parallel to the plane of the electrodes in the space between the electrodes. By controlling the intensity of the magnetic field in a range of 100 gauss or smaller, formation of electron cyclotron resonance and electron sheath resonance occurring from interaction between the electrical field and the magnetic field in the electrode sheath portion is controlled. Thereby, the plasma state, i.e., the electron density, electron energy distribution and dissociation state of the process gas in the plasma, can be controlled. The magnetic field is generated by a plurality of coils, an outer shield, and pendant yoke to form magnetic field parallel to the plane of the electrodes in the space between the upper and the bottom electrodes.
摘要翻译：一种等离子体处理装置及其方法，其能够通过控制等离子体状态和等离子体状态来实现对于大尺寸晶片同时实现优选的处理速率，精细图案处理能力，同时处理的选择性和均匀性，通过对其施加磁场来控制电子共振来蚀刻气体的解离状态。在真空处理室中的一对电极上施加20-300MHz的高频功率，并且在电极之间的空间中形成平行于电极平面的磁场。通过控制100高斯或更小范围内的磁场的强度，控制由电场鞘部分中的电场和磁场之间的相互作用产生的电子回旋共振和电子鞘共振的形成。由此，可以控制等离子体状态，即等离子体中的处理气体的电子密度，电子能量分布和解离状态。磁场由多个线圈，外屏蔽和悬挂磁轭产生，以在上电极和下电极之间的空间中形成平行于电极平面的磁场。

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