会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Methods of making magnetic write heads with use of linewidth shrinkage techniques
    • 使用线宽收缩技术制造磁头的方法
    • US07343666B2
    • 2008-03-18
    • US10881782
    • 2004-06-30
    • Kim Y. LeeJyh-Shuey Jerry LoDennis Richard McKean
    • Kim Y. LeeJyh-Shuey Jerry LoDennis Richard McKean
    • G11B5/127H04R31/00
    • G11B5/3163G11B5/3116Y10T29/49043Y10T29/49046Y10T29/49048Y10T29/49052
    • In one illustrative example, a method for use in making a magnetic write head includes the steps of forming a first pole piece layer of a first pole piece; forming a patterned resist over the first pole piece layer; electroplating a pedestal over the first pole piece layer within a channel of the patterned resist; electroplating a metal gap layer over the pedestal within the channel of the patterned resist; forming a resist channel shrinking film over the patterned resist; baking the resist channel shrinking film over the patterned to thereby reduce a width of the channel; removing the resist channel shrinking film; electroplating a second pole piece within the reduced-width channel of the patterned resist; removing the patterned resist; and milling the pedestal, using the second pole piece as a mask, to form a central notched pedestal having side walls with angled slopes.
    • 在一个说明性示例中,用于制造磁写头的方法包括以下步骤:形成第一极片的第一极片层; 在所述第一极片层上形成图案化抗蚀剂; 在图案化的抗蚀剂的通道内的第一极片层上电镀一个基座; 在图案化的抗蚀剂的通道内的基座上方电镀金属间隙层; 在图案化的抗蚀剂上形成抗蚀剂通道收缩膜; 在图案上烘烤抗蚀剂通道收缩膜,从而减小通道的宽度; 去除抗蚀剂通道收缩膜; 在图案化的抗蚀剂的减小宽度的通道内电镀第二极片; 去除图案化的抗蚀剂; 并使用第二极片作为掩模铣削基座,以形成具有倾斜斜面的侧壁的中心凹口底座。
    • 3. 发明授权
    • Methods of making magnetic write heads using electron beam lithography
    • 使用电子束光刻制作磁写头的方法
    • US07086139B2
    • 2006-08-08
    • US10836136
    • 2004-04-30
    • Kim Y. LeeJyh-Shuey Jerry Lo
    • Kim Y. LeeJyh-Shuey Jerry Lo
    • G11B5/127G11B5/187
    • G11B5/1878Y10T29/49021Y10T29/49032Y10T29/49039Y10T29/49041Y10T29/49043Y10T29/49046Y10T29/49052
    • A pedestal is formed over a first pole piece layer and insulator materials are formed to surround it. A gap layer made of a non-magnetic insulator or metal is then formed over the pedestal and the insulator, followed by the optional formation of a seed layer. A second pole piece is formed over the gap layer with or without the seed layer by forming a patterned resist using E-beam lithography and electroplating second pole piece materials within the patterned resist. After milling to remove side portions of the gap layer and the optional seed layer, a chemical etch is performed to remove a top portion of the insulator materials. The pedestal is then notched and trimmed by ion milling using the second pole piece as a mask to form a central notched structure. Since the second pole piece is precisely centered over the pedestal prior to notching, the pedestal is notched symmetrically to form a notched structure having side walls with angled slopes.
    • 在第一极片层上形成基座,并且形成绝缘体材料以围绕它。 然后在基座和绝缘体上形成由非磁性绝缘体或金属制成的间隙层,随后可选地形成种子层。 通过在图案化的抗蚀剂内使用电子束光刻和电镀第二极片材料形成图案化的抗蚀剂,形成具有或不具有种子层的间隙层上的第二极片。 在研磨以除去间隙层和任选种子层的侧面部分之后,进行化学蚀刻以去除绝缘体材料的顶部。 然后通过使用第二极片作为掩模的离子铣削将基座切口并修整以形成中心的切口结构。 由于第二极靴在开槽之前精确地位于基座上方,因此基座被对称地切口以形成具有斜边的侧壁的凹口结构。
    • 5. 发明授权
    • Notching the first pole piece of a write head with a notching layer in a
combined magnetic head
    • US6119331A
    • 2000-09-19
    • US889258
    • 1997-07-08
    • Thomas Young ChangEdward Hinpong LeeJhy-Shuey Jerry Lo
    • Thomas Young ChangEdward Hinpong LeeJhy-Shuey Jerry Lo
    • G11B5/31G11B5/39G11B5/127
    • G11B5/3967G11B5/3116G11B5/3163Y10T29/49044Y10T29/49048
    • In the manufacture of a combined magnetic head, milling time for notching a first pole piece of the head's write element is reduced by constructing the first pole piece with a notching layer on a first pole piece layer, the notching layer having first and second corners adjacent first and second side walls of the second pole tip. The first pole piece layer has a wide lateral expanse, and the notching layer has a narrow lateral expanse. The width of the notching layer is preferably 0.2 .mu.m to 2.0 .mu.m wider than a target track width of the second pole tip. With this arrangement, the notching layer has first and second side walls that project 0.10 .mu.m to 1.0 .mu.m, laterally, beyond first and second side walls, respectively, of the second pole tip. The thickness of the notching layer is preferably between 0.1 .mu.m to 1.0 .mu.m. Accordingly, full notching of the notching layer can be achieved by milling a small corner in a range of 0.10 .mu.m by 0.10 .mu.m to 1.0 .mu.m by 1.0 .mu.m, as seen in an ABS view. The gap layer is formed on the notching layer, followed by forming the second pole tip on the gap layer. Milling at an angle is then employed to mill through the gap layer and notch the notching layer. In comparison to milling a prior art large lateral expanse of the first pole piece to achieve notching, milling the small corner of the notching layer requires a very short milling time. This results in less consumption of the second pole tip, so that better control of a final track width can be accomplished. Also, since there is less consumption of the top of the second pole tip, the aspect ratio of photoresist employed to construct the second pole tip is reduced, so as to enhance the line width of the second pole tip. Further, there is less redeposited material to clean up after the milling cycle. All of these factors reduce the process time and increase manufacturing throughput.
    • 6. 发明授权
    • Method of making inverted merged MR head with track width defining first
pole tip component constructed on a side wall
    • 制造具有轨道宽度的反向合并MR头的方法,其限定在侧壁上构造的第一极尖部分
    • US6054023A
    • 2000-04-25
    • US361392
    • 1999-07-26
    • Thomas Young ChangJyh-Shuey Jerry Lo
    • Thomas Young ChangJyh-Shuey Jerry Lo
    • G11B5/012G11B5/31G11B5/39C23C14/34G11B5/127H04R31/00
    • G11B5/3967G11B5/3116G11B5/313G11B5/3163G11B5/012Y10T29/49043
    • A method of making provides an inverted merged MR head wherein frame plating is not required for forming a highly defined submicron track width of a top first pole tip portion. A forming structure is formed on a bottom first pole tip portion with a vertical wall located at a site where one of the edges of the top first pole tip is to be located. The top first pole tip is sputtered or plated on the vertical wall of the forming structure with a thickness that defines the track width of the write head. A mask with a recessed portion may be employed for forming the top first pole tip with a back wall that defines a zero throat height of the head. In a preferred embodiment a forming layer is formed adjacent an opposite edge of the top first pole tip and then the top surfaces of the top first pole tip, the forming layer and the forming structure are lapped until these top surfaces are flush with one another. The material of the top first pole tip has an ion milling rate that is greater than the ion milling rates of the forming layer and the forming structure. Ion milling is then employed to ion mill the top of the top first pole tip at a greater rate than the other layers causing a recess which is centered above the top surface of the top first pole tip. After depositing a write gap layer and a seedlayer in the recess the second pole tip is deposited in the recess causing the base of the second pole tip to be substantially aligned with the top surface of the top first pole tip. Sloping surfaces extending from the base of the second pole tip are similar to notching of a first pole piece in the prior art which promotes flux transfer between the pole tips and minimizes stray flux from the second pole tip to the bottom first pole tip.
    • 一种制造方法提供反向合并的MR头,其中不需要框架电镀以形成顶部第一极尖端部分的高度限定的亚微米轨道宽度。 形成结构形成在底部第一极尖端部分上,其中垂直壁位于顶部第一极尖端的一个边缘将被定位的位置处。 顶部的第一极尖被溅射或镀在成形结构的垂直壁上,其厚度限定了写入头的轨道宽度。 可以采用具有凹陷部分的掩模来形成具有限定头部的零喉部高度的后壁的顶部第一极尖端。 在优选实施例中,形成层邻近顶部第一极尖端的相对边缘形成,然后上顶部第一极尖端,成形层和成形结构的顶表面被研磨直到这些顶部表面彼此齐平。 顶部第一极尖的材料的离子研磨速率大于成形层和成形结构的离子研磨速率。 然后使用离子铣削以比其它层更大的速率将顶部第一极尖的顶部离子磨,从而形成位于顶部第一极尖顶部顶部的中心的凹部。 在凹槽中沉积写间隙层和种子层之后,第二极尖沉积在凹槽中,使得第二极尖的基部与顶部第一极尖的顶表面基本上对准。 从第二极尖的基部延伸的斜面类似于现有技术中的第一极靴的切口,其促进极尖之间的磁通传递并使从第二极尖到底部第一极尖的杂散磁通最小化。