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1. 发明授权

US07690557B2 System and method for displaying received data using separate device 有权
标题翻译：使用单独设备显示接收到的数据的系统和方法
公开(公告)号：US07690557B2
公开(公告)日：2010-04-06
申请号：US11324585
申请日：2006-01-04
申请人： Jae-hak Kim
发明人： Jae-hak Kim
IPC分类号： G06F17/00
CPC分类号： H04L51/14
摘要： A method and apparatus for displaying received data using a separate device that makes a user's receiving terminal, that has received only a unique code of data, transmit the unique code to a separate display device connected to the Internet, and which makes the display device access a server, in which the data is stored, and display the data corresponding to the unique code. The apparatus displays received data using a code generation unit for generating a first unique code that matches metadata received from a data server that stores the data and the metadata, a first communication unit for transmitting the first unique code to a receiving terminal, and a second communication unit for receiving a second unique code from a display device and transmitting the stored metadata that matches the first unique code to the display device if the first unique code corresponds to the second unique code.
摘要翻译：一种用于使用仅接收唯一的数据代码的用户接收终端的独立设备来显示接收的数据的方法和装置，将唯一的代码发送到连接到因特网的单独的显示设备，并且使显示设备访问存储数据的服务器，并显示对应于唯一代码的数据。该装置使用代码生成单元显示接收到的数据，该代码生成单元用于生成与从存储数据和元数据的数据服务器接收的元数据相匹配的第一唯一码，用于将第一唯一码发送到接收终端的第一通信单元，通信单元，用于从显示设备接收第二唯一代码，并且如果所述第一唯一码对应于所述第二唯一码，则将与所述第一唯一码匹配的所存储的元数据发送到所述显示设备。

2. 发明申请

US20100069630A1 NAPHTHALENYLOXYPROPENYL DERIVATIVES HAVING INHIBITORY ACTIVITY AGAINST HISTONE DEACETYLASE AND PHARMACEUTICAL COMPOSITION COMPRISING THE SAME 有权
标题翻译：具有抗组胺脱乙酰酶的抑制活性的萘并戊烯衍生物和包含其的药物组合物
公开(公告)号：US20100069630A1
公开(公告)日：2010-03-18
申请号：US12513021
申请日：2007-11-01
申请人： Cheol Hae Lee , Hee Jung Jung , Jae Hak Kim , Won Jang Jeong , Joong Myung Cho , Seong Gu Ro , Young Lan Hyun , Cheol Soon Lee
发明人： Cheol Hae Lee , Hee Jung Jung , Jae Hak Kim , Won Jang Jeong , Joong Myung Cho , Seong Gu Ro , Young Lan Hyun , Cheol Soon Lee
IPC分类号： C07D295/00 , C07D211/98 , C07D233/44 , C07C233/00 , C07D307/02 , C07D207/46 , C07D333/20
CPC分类号： C07C259/10 , C07C259/06 , C07C2601/14 , C07C2601/16 , C07D207/27 , C07D207/335 , C07D211/10 , C07D211/58 , C07D233/64 , C07D295/13 , C07D307/14 , C07D307/52 , C07D333/20
摘要： The present invention discloses novel naphthalenyloxypropenyl derivatives useful for inhibiting the enzyme activity of histone deacetylase, leading effective suppression of cancer cell proliferation.
摘要翻译：本发明公开了用于抑制组蛋白脱乙酰酶的酶活性的新型萘氧基丙烯基衍生物，有效抑制癌细胞增殖。

3. 发明授权

US07541276B2 Methods for forming dual damascene wiring for semiconductor devices using protective via capping layer 有权
标题翻译：使用保护性通孔覆盖层形成用于半导体器件的双镶嵌布线的方法
公开(公告)号：US07541276B2
公开(公告)日：2009-06-02
申请号：US11223311
申请日：2005-09-09
申请人： Jae Hak Kim , Sun Jung Lee , Seung Jin Lee
发明人： Jae Hak Kim , Sun Jung Lee , Seung Jin Lee
IPC分类号： H01L21/4763
CPC分类号： H01L21/76843 , H01L21/31144 , H01L21/76808 , H01L21/76844 , H01L21/76849 , H01L21/7685
摘要： Exemplary embodiments of the invention generally include methods for forming multilayer metal interconnect structures using dual damascene methods that incorporate a via capping process to protect lower interconnection lines from etching damage or oxidation, for example, that may be caused by inadvertent exposure of lower interconnection lines to etching atmospheres.
摘要翻译：本发明的示例性实施例通常包括使用双镶嵌方法形成多层金属互连结构的方法，该方法包括通孔封盖工艺以保护较低的互连线免受蚀刻损伤或氧化，例如可能由于下层互连线的无意曝光而引起蚀刻气氛。

4. 发明授权

US07323407B2 Method of fabricating dual damascene interconnections of microelectronic device using diffusion barrier layer against base material 有权
标题翻译：使用扩散阻挡层对基材的微电子器件的双镶嵌互连的方法
公开(公告)号：US07323407B2
公开(公告)日：2008-01-29
申请号：US11195404
申请日：2005-08-02
申请人： Kyoung-woo Lee , Jae-yeol Maeng , Jae-hak Kim , Il-whan Oh , Hong-jae Shin
发明人： Kyoung-woo Lee , Jae-yeol Maeng , Jae-hak Kim , Il-whan Oh , Hong-jae Shin
IPC分类号： H01L21/311 , H01L23/52
CPC分类号： H01L21/76808 , H01L21/02134 , H01L21/3124 , H01L21/76826
摘要： Methods of fabricating dual damascene interconnections suitable for use in microelectronic devices and similar applications using a diffusion barrier layer to protect against base materials during processing are provided. The methods include the steps of: filling a via with a hydrogen silsesquioxane (HSQ)-based filler as expressed by the general chemical formula: (RSiO3/2)x(HSiO3/2)y, wherein x and y satisfy the relationships x+y=1 and 0
摘要翻译：提供了适用于微电子器件的双镶嵌互连的方法和使用扩散阻挡层在加工期间防止基底材料的类似应用。所述方法包括以下步骤：用以通式（RSiO 3/2/2）x（HSiO 3/2/2）表示的氢倍半硅氧烷（HSQ））填料填充通孔 y，其中x和y满足关系x + y = 1和0

5. 发明授权

US07183195B2 Method of fabricating dual damascene interconnections of microelectronic device using hybrid low k-dielectric and carbon-free inorganic filler 有权
标题翻译：使用混合低k电介质和无碳无机填料制造微电子器件的双镶嵌互连的方法
公开(公告)号：US07183195B2
公开(公告)日：2007-02-27
申请号：US10625007
申请日：2003-07-23
申请人： Kyoung-woo Lee , Soo-geun Lee , Wan-jae Park , Jae-hak Kim , Hong-jae Shin
发明人： Kyoung-woo Lee , Soo-geun Lee , Wan-jae Park , Jae-hak Kim , Hong-jae Shin
IPC分类号： H01L21/4763
CPC分类号： H01L21/76808
摘要： A method of fabricating dual damascene interconnections is provided. A dual damascene region is formed in a hybrid dielectric layer having a dielectric constant of 3.3 or less, and a carbon-free inorganic material is used as a via filler. The present invention improves electrical properties of dual damascene interconnections and minimizes defects.
摘要翻译：提供了一种制造双镶嵌互连的方法。在具有3.3或更小的介电常数的混合电介质层中形成双镶嵌区域，并且使用无碳无机材料作为通孔填料。本发明改进了双镶嵌互连的电性能并使缺陷最小化。

6. 发明授权

US06815331B2 Method for forming metal wiring layer of semiconductor device 有权
标题翻译：用于形成半导体器件的金属布线层的方法
公开(公告)号：US06815331B2
公开(公告)日：2004-11-09
申请号：US10392710
申请日：2003-03-20
申请人： Kyoung-woo Lee , Hong-jae Shin , Jae-hak Kim , Soo-geun Lee
发明人： Kyoung-woo Lee , Hong-jae Shin , Jae-hak Kim , Soo-geun Lee
IPC分类号： H01L214163
CPC分类号： H01L21/76808 , H01L21/76813
摘要： Methods for forming a metal wiring layer in a semiconductor device using a dual damascene process. In one aspect, a method for forming metal wiring in a semiconductor device comprises: forming a stopper layer on a semiconductor substrate that has a conductive layer formed thereon; forming an interlayer dielectric layer on the stopper layer; forming a hard mask layer on the interlayer dielectric layer; forming a first photoresist pattern on the hard mask layer, the first photoresist pattern having a first opening corresponding to the conductive layer; etching the hard mask layer and the interlayer dielectric layer using the first photoresist pattern as an etching mask to form a via hole in the interlayer dielectric layer through which a portion of the stopper layer is exposed; removing the first photoresist pattern; filling the via hole with an intermediary material layer; etching a portion of the hard mask layer to form a hard mask pattern that defines a wiring region, wherein the hard mask pattern comprises a second opening that overlaps the entire via hole or at least a portion of the via hole; removing the intermediary material layer from the via hole; forming the wiring region by etching a portion of the interlayer dielectric layer using the hard mask pattern as an etching mask; removing a portion of the stopper layer exposed by the via hole; and filling the via hole and the wiring region with a conductive material.
摘要翻译：使用双镶嵌工艺在半导体器件中形成金属布线层的方法。一方面，在半导体器件中形成金属布线的方法包括：在其上形成有导电层的半导体衬底上形成阻挡层; 在所述阻挡层上形成层间绝缘层; 在所述层间介质层上形成硬掩模层; 在所述硬掩模层上形成第一光致抗蚀剂图案，所述第一光致抗蚀剂图案具有对应于所述导电层的第一开口; 使用第一光致抗蚀剂图案作为蚀刻掩模蚀刻硬掩模层和层间电介质层，以在阻挡层的一部分暴露的层间绝缘层中形成通孔; 去除第一光致抗蚀剂图案; 用中间材料层填充通孔; 蚀刻硬掩模层的一部分以形成限定布线区域的硬掩模图案，其中硬掩模图案包括与整个通孔或通孔的至少一部分重叠的第二开口; 从所述通孔中去除所述中间材料层; 通过使用硬掩模图案作为蚀刻掩模蚀刻层间电介质层的一部分来形成布线区域; 去除由通孔露出的阻挡层的一部分; 以及用导电材料填充所述通孔和所述布线区域。

7. 发明授权

US5869477A .beta.-methylcarbapenem derivatives, process for the preparation thereof and pharmaceutical composition comprising same 失效
标题翻译： β-甲基碳青霉烯衍生物，其制备方法和包含其的药物组合物
公开(公告)号：US5869477A
公开(公告)日：1999-02-09
申请号：US760431
申请日：1996-12-04
申请人： Cheol-Hae Lee , Dong-Ha Lee , Kyung-Sook Kim , Jae-Hak Kim , Young-Sook Kim , Yu-Sung Jun , Sung-Su Lim , Eun-Mi Bae , Bong-Jin Kim
发明人： Cheol-Hae Lee , Dong-Ha Lee , Kyung-Sook Kim , Jae-Hak Kim , Young-Sook Kim , Yu-Sung Jun , Sung-Su Lim , Eun-Mi Bae , Bong-Jin Kim
IPC分类号： C07D477/00 , A61K31/397 , A61K31/40 , A61K31/407 , A61P31/04 , C07D477/14
CPC分类号： C07D477/14
摘要： A .beta.-methylcarbapenem compound of formula (I), a salt or an ester thereof, a process for the preparation thereof and a anti-bacterial composition containing same: ##STR1## wherein: R.sup.1 is a C.sub.1-6 alkyl, C.sub.2-6 alkenyl, cycloalkyl, aryl or heterocyclic aryl group.
摘要翻译：式（I）的β-碳代青霉烯化合物，其盐或酯，其制备方法和含有其的抗菌组合物：其中：R 1是C 1-6烷基，C 2 -6-烯基，环烷基，芳基或杂环芳基。

8. 发明申请

US20150197641A1 CAVITATION RESISTANT POLYURETHANE COMPOSITIONS AND METHODS OF FORMING COATING FILMS USING THE SAME 有权
标题翻译：耐腐蚀聚氨酯组合物及其形成涂膜的方法
公开(公告)号：US20150197641A1
公开(公告)日：2015-07-16
申请号：US14204291
申请日：2014-03-11
申请人： Jun-Young Choi , Ja-Min Gu , Jae-Hak Kim
发明人： Jun-Young Choi , Ja-Min Gu , Jae-Hak Kim
IPC分类号： C09D5/00
CPC分类号： C09D5/00 , B05D1/02 , B05D2202/00 , B82Y30/00 , C08G18/10 , C08G18/227 , C08G18/40 , C08G18/4018 , C08G18/4236 , C08G18/4277 , C08G18/44 , C08G18/48 , C08G18/4825 , C08G18/725 , C08G18/7671 , C08G18/797 , C08K3/04 , C08K3/22 , C08K3/34 , C08K3/38 , C08K5/36 , C08K5/43 , C08L75/06 , C08L75/08 , C09D7/67 , C09D175/04 , C08G18/42 , C08G18/12 , C08L75/04
摘要： A cavitation resistant polyurethane composition includes a first solution comprising a urethane prepolymer and a second solution. The urethane prepolymer is synthesized by a polymerization of about 60 to about 70 weight percent of an isocynate compound and about 30 to about 40 weight percent of a polyol. An average functional group number of the isocyanate compound is at least 2. The second solution includes about 90 to about 95 weight percent of a polyol having an average functional group number of at least 4, about 1 to about 3 weight percent of a nano-carbon, about 1 to about 3 weight percent of a colorant, about 1 to about 3 weight percent of a moisture absorbent, about 1 to about 3 weight percent of an anti-wear agent, and about 1 to about 3 weight percent of a defoaming agent.
摘要翻译：抗气蚀性聚氨酯组合物包括包含氨基甲酸酯预聚物和第二溶液的第一溶液。氨基甲酸酯预聚物通过约60至约70重量％的异氰酸酯化合物和约30至约40重量％的多元醇的聚合合成。异氰酸酯化合物的平均官能团数为至少2.第二溶液包含约90-约95重量％的平均官能团数为至少4，约1至约3重量％的纳米 - 碳，约1至约3重量％的着色剂，约1至约3重量％的吸湿剂，约1至约3重量％的抗磨剂和约1至约3重量％的消泡剂代理商

9. 发明授权

US08053435B2 Naphthalenyloxypropenyl derivatives having inhibitory activity against histone deacetylase and pharmaceutical composition comprising the same 有权
标题翻译：对组蛋白脱乙酰酶具有抑制活性的萘氧基丙烯基衍生物及其组合物
公开(公告)号：US08053435B2
公开(公告)日：2011-11-08
申请号：US12513021
申请日：2007-11-01
申请人： Cheol Hae Lee , Hee Jung Jung , Jae Hak Kim , Won Jang Jeong , Joong Myung Cho , Seong Gu Ro , Young Lan Hyun , Cheol Soon Lee , Dongkyu Shin
发明人： Cheol Hae Lee , Hee Jung Jung , Jae Hak Kim , Won Jang Jeong , Joong Myung Cho , Seong Gu Ro , Young Lan Hyun , Cheol Soon Lee , Dongkyu Shin
IPC分类号： A61K31/165 , A61K31/341 , A61K31/381 , A61K31/4164 , A61K31/4166 , A61K31/40 , A61K31/4468 , A61K31/5375 , C07D207/50 , C07D233/88 , C07D295/027 , C07D211/98 , C07D307/66 , C07D333/36
CPC分类号： C07C259/10 , C07C259/06 , C07C2601/14 , C07C2601/16 , C07D207/27 , C07D207/335 , C07D211/10 , C07D211/58 , C07D233/64 , C07D295/13 , C07D307/14 , C07D307/52 , C07D333/20
摘要： The present invention discloses novel naphthalenyloxypropenyl derivatives useful for inhibiting the enzyme activity of histone deacetylase, leading effective suppression of cancer cell proliferation.
摘要翻译：本发明公开了用于抑制组蛋白脱乙酰酶的酶活性的新型萘氧基丙烯基衍生物，有效抑制癌细胞增殖。

10. 发明授权

US07993565B2 Folding and shape-forming apparatus and method for prepreg 有权
标题翻译：折边和成型装置及预浸料的方法
公开(公告)号：US07993565B2
公开(公告)日：2011-08-09
申请号：US12411309
申请日：2009-03-25
申请人： Jae Hak Kim , Joong Won Han , Jae Hwan Lee , Do Young Lee , Jin Hyun Kim
发明人： Jae Hak Kim , Joong Won Han , Jae Hwan Lee , Do Young Lee , Jin Hyun Kim
IPC分类号： B29C70/44 , B29C51/10 , B32B31/00
CPC分类号： B29C70/44 , B29C53/025 , B29C2791/006 , B29L2031/003 , Y10T156/1028
摘要： Disclosed is a folding and shape-forming apparatus for a prepreg which includes a vacuum chamber which can generate a vacuum pressure in the inside thereof, an expanding portion disposed inside the vacuum chamber, provided with a prepreg thereon, and expanding because of the vacuum pressure inside the vacuum chamber, a heating portion disposed inside the vacuum chamber for heating the prepreg, a mandrel loaded at a portion of an upper surface of the prepreg, a first pressing portion which is brought into contact with an upper surface of the mandrel to press the mandrel, and a second pressing portion which simultaneously presses both another portion of the upper surface of the prepreg and the expanding portion.
摘要翻译：公开了一种用于预浸料的折叠和成形装置，其包括可在其内部产生真空压力的真空室，设置在真空室内的膨胀部分，在其上设置有预浸料，并且由于真空压力而膨胀在真空室内部，设置在真空室内用于加热预浸料的加热部分，装在预浸料坯上表面部分的芯棒，与心轴上表面接触的第一按压部分心轴以及同时按压预浸料坯的上表面的另一部分和膨胀部的第二挤压部。

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