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1. 发明授权

US08373086B2 Plasma processing apparatus and method for plasma processing 有权
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：US08373086B2
公开(公告)日：2013-02-12
申请号：US12936671
申请日：2009-04-06
申请人： Hyoung Won Kim , Young Soo Seo , Chi Kug Yoon , Jun Hyeok Lee , Young Ki Han , Jae Chul Choi
发明人： Hyoung Won Kim , Young Soo Seo , Chi Kug Yoon , Jun Hyeok Lee , Young Ki Han , Jae Chul Choi
IPC分类号： B23K10/00
CPC分类号： H01J37/32568 , H01J37/32009 , H01J2237/334 , H01L21/67069 , H01L21/67751 , H01L21/68742
摘要： Provided are a plasma processing apparatus and method. The plasma processing apparatus includes a chamber, an upper electrode, a lower electrode, a substrate support, and a movement member. The upper electrode is disposed at an inner upper portion of the chamber. The lower electrode faces the upper electrode at an inner lower portion of the chamber to support a substrate such that a bevel of the substrate is exposed in a substrate level etching process. The substrate support is disposed between the upper electrode and the lower electrode to support the substrate such that a central region of a bottom surface of the substrate is exposed in a substrate backside etching process. The movement member is configured to move the substrate support to separate the substrate from the substrate support in the substrate backside etching process.
摘要翻译：提供了一种等离子体处理装置和方法。等离子体处理装置包括室，上电极，下电极，基板支撑件和移动构件。上电极设置在室的内部上部。下电极在室的内下部面对上电极以支撑衬底，使得衬底的斜面在衬底级蚀刻工艺中暴露。衬底支撑件设置在上电极和下电极之间以支撑衬底，使得衬底的底表面的中心区域在衬底背面蚀刻工艺中暴露。移动构件被构造成移动衬底支撑件以在衬底背面蚀刻工艺中将衬底与衬底支撑件分离。

2. 发明申请

US20080247986A1 Hyaluronidase Inhibitor Containing Poly-Gamma-Glutamic Acid as an Effective Component 有权
标题翻译：含有多糖 - 谷氨酸作为有效成分的透明质酸酶抑制剂
公开(公告)号：US20080247986A1
公开(公告)日：2008-10-09
申请号：US12090678
申请日：2005-10-31
申请人： Moon Hee Sung , Chung Park , Jae Chul Choi , Hiroshi Uyama , So Lim Park
发明人： Moon Hee Sung , Chung Park , Jae Chul Choi , Hiroshi Uyama , So Lim Park
IPC分类号： A61K31/785 , A61P17/00
CPC分类号： A61Q19/08 , A61K8/88 , A61K2800/782 , A61Q5/02 , A61Q19/00 , A61Q19/10
摘要： The present invention relates to a hyaluronidase inhibitor containing poly-gamma-glutamic acid (PGA) as an active ingredient, a composition for maintaining skin elasticity and a composition for improving allergy, wherein each of the compositions contains PGA as an active ingredient. The inventive compositions containing PGA are effective in maintaining skin moisturization and skin elasticity by effectively inhibiting the activity of hyaluronidase which is an enzyme that degrades hyaluronic acid present in the skin dermis. Also, the compositions can relieve allergic symptoms by inhibiting the permeability of inflammatory cells.
摘要翻译：本发明涉及含有聚-γ-谷氨酸（PGA）作为活性成分的透明质酸酶抑制剂，用于保持皮肤弹性的组合物和用于改善过敏的组合物，其中每种组合物含有PGA作为活性成分。含有PGA的本发明组合物通过有效地抑制透明质酸酶的活性来保持皮肤的保湿和皮肤弹性，其是使皮肤真皮中存在的透明质酸降解的酶。此外，组合物可以通过抑制炎性细胞的通透性来缓解过敏症状。

3. 发明授权

US06796565B2 Cart for transportation 失效
公开(公告)号：US06796565B2
公开(公告)日：2004-09-28
申请号：US10264056
申请日：2002-10-02
申请人： Jae Chul Choi , Choon Yong Choi
发明人： Jae Chul Choi , Choon Yong Choi
IPC分类号： B62B300
CPC分类号： B62B3/02 , B62B2205/006 , B62B2205/10 , B62B2205/32 , Y10T403/55
摘要： There is disclosed a cart for transportation, which includes a plurality of trays, a support for supporting the trays, a handle provided to the uppermost tray, and a wheel provided to the lowermost tray, which comprises a connecting pipe 112 attached to each corner of each of the trays 110, a supporting member 120 provided between upper and lower trays, a connecting member 130 for joining the supporting member 120 and the connecting pipe of the tray 110 with each other, a handle connecting member 140 for joining the handle 150 with the connecting pipe of the uppermost tray, and a wheel connecting member 160 for joining the wheel 170 with the connecting pipe of the lowermost tray. The invention can be assembled easily without using coupling devices and shipping charges can reduced as the volume of the components is minimized before the cart is assembled.

4. 发明授权

US08916141B2 Hyaluronidase inhibitor containing poly-gamma-glutamic acid as an effective component 有权
标题翻译：含有聚-γ-谷氨酸作为有效成分的透明质酸酶抑制剂
公开(公告)号：US08916141B2
公开(公告)日：2014-12-23
申请号：US12090678
申请日：2005-10-31
申请人： Moon Hee Sung , Chung Park , Jae Chul Choi , Hiroshi Uyama , So Lim Park
发明人： Moon Hee Sung , Chung Park , Jae Chul Choi , Hiroshi Uyama , So Lim Park
IPC分类号： A61K31/74 , A61Q19/00 , A61Q19/10 , A61Q5/02 , A61Q19/08 , A61K8/88
CPC分类号： A61Q19/08 , A61K8/88 , A61K2800/782 , A61Q5/02 , A61Q19/00 , A61Q19/10
摘要： The present invention relates to a hyaluronidase inhibitor containing poly-gamma-glutamic acid (PGA) as an active ingredient, a composition for maintaining skin elasticity and a composition for improving allergy, wherein each of the compositions contains PGA as an active ingredient. The inventive compositions containing PGA are effective in maintaining skin moisturization and skin elasticity by effectively inhibiting the activity of hyaluronidase which is an enzyme that degrades hyaluronic acid present in the skin dermis. Also, the compositions can relieve allergic symptoms by inhibiting the permeability of inflammatory cells.
摘要翻译：本发明涉及含有聚-γ-谷氨酸（PGA）作为活性成分的透明质酸酶抑制剂，用于保持皮肤弹性的组合物和用于改善过敏的组合物，其中每种组合物含有PGA作为活性成分。含有PGA的本发明组合物通过有效地抑制透明质酸酶的活性来保持皮肤的保湿和皮肤弹性，其是使皮肤真皮中存在的透明质酸降解的酶。此外，组合物可以通过抑制炎性细胞的通透性来缓解过敏症状。

5. 发明授权

US08888950B2 Apparatus for plasma processing and method for plasma processing 有权
标题翻译：等离子体处理装置及等离子体处理方法
公开(公告)号：US08888950B2
公开(公告)日：2014-11-18
申请号：US12528326
申请日：2008-03-13
申请人： Kyung Ho Lee , Jae Ho Guahk , Jae Chul Choi , Young Ki Han , Hee Se Lee , Yong Hwan Lim , Kwan Goo Rha , Seng Hyun Chung , Sun Q Jeon , Jung Hee Lee
发明人： Kyung Ho Lee , Jae Ho Guahk , Jae Chul Choi , Young Ki Han , Hee Se Lee , Yong Hwan Lim , Kwan Goo Rha , Seng Hyun Chung , Sun Q Jeon , Jung Hee Lee
IPC分类号： C23F1/00 , H01L21/306 , H01L21/687 , H01J37/32 , H01L21/67 , H01L21/02
CPC分类号： H01L21/67069 , H01J37/32431 , H01J2237/20 , H01L21/0209 , H01L21/68735 , H01L21/68742
摘要： There is provided a substrate supporter capable of securely supporting a substrate such as a wafer on which a device having a predetermined thin film pattern is formed to remove various impurities formed on the rear surface of the substrate, and a plasma processing apparatus having the same. The plasma processing apparatus includes: at least one arm; and a supporting portion extending from the arm toward a substrate seating position of the substrate, so that the plasma processing apparatus can reduce the likelihood of arc discharges compared with conventional dry etching to increase process yield and product reliability, and ensure stable mounting of a substrate.
摘要翻译：提供了一种能够可靠地支撑诸如其上形成有预定薄膜图案的装置的基板的基板的基板支撑件，以去除形成在基板的后表面上的各种杂质，以及具有该基板的等离子体处理装置。等离子体处理装置包括：至少一个臂; 以及从臂朝向基板的基板安置位置延伸的支撑部，使得与常规干蚀刻相比，等离子体处理装置可以减少电弧放电的可能性，以提高工艺成品率和产品可靠性，并且确保基板的稳定安装。

6. 发明授权

US06715430B2 Sectional table with gusset 失效
标题翻译：带有角撑板的剖面表
公开(公告)号：US06715430B2
公开(公告)日：2004-04-06
申请号：US10199796
申请日：2002-07-19
申请人： Jae Chul Choi , Choon Yong Choi
发明人： Jae Chul Choi , Choon Yong Choi
IPC分类号： A47B1300
CPC分类号： A47B13/06 , A47B13/02
摘要： Disclosed is a sectional table with gussets, in which a table top and legs thereof can be easily assembled in a simple manner by virtue of a gusset mechanism. The sectional table with gussets includes a table top; an inverted hat-shaped channel frame having cylindrical parts on the central portion thereof and flanges on both ends thereof, the cylindrical parts being formed through a deep-drawing process and the flanges being fixedly secured to the underside of the table top; cylindrical gussets inserted into the cylindrical parts of the channel frame at the upper end thereof to be fixedly secured to the cylindrical parts; and table legs secured to the underside of the table top by the gussets by being inserted into openings of the gussets.
摘要翻译：公开了一种具有角撑板的剖视图，其中桌面和腿部可以通过角撑板机构以简单的方式容易地组装。带角撑板的剖面图包括桌面; 一个倒置的帽形通道框架，在其中心部分具有圆柱形部分，其两端具有凸缘，圆柱形部分通过深拉伸工艺形成，凸缘固定地固定在台面的下侧; 在其上端插入通道框架的圆柱形部件的圆柱形角撑板固定地固定到圆柱形部件上; 并且桌腿通过插入角撑板的开口而被角撑板固定到桌面的下侧。

7. 发明申请

US20130296459A1 MEDICAL ADHESIVE COMPOSITION 审中-公开
标题翻译：医用粘合剂组合物
公开(公告)号：US20130296459A1
公开(公告)日：2013-11-07
申请号：US13884912
申请日：2011-11-10
申请人： Moon-Hee Sung , Hiroshi Uyama , Iwamoto Mie , Jae-Chul Choi , Haryoung Poo , Chul Joong Kim
发明人： Moon-Hee Sung , Hiroshi Uyama , Iwamoto Mie , Jae-Chul Choi , Haryoung Poo , Chul Joong Kim
IPC分类号： A61L24/04 , C08K5/1545 , C08K5/053
CPC分类号： A61L24/046 , A61L15/58 , C08K5/053 , C08K5/1545 , C09J177/04 , C08L77/04
摘要： The present invention provides a medical adhesive composition containing poly-gamma-glutamic acid or its salt; and sugar or sugar alcohol, which is edible, water-soluble, anionic and biodegradable. The invention also provides a thickener composition containing poly-gamma-glutamic acid, which can be used as a moisture-absorbing agent, a moisturizing agent and a raw material for cosmetic products.
摘要翻译：本发明提供含有聚-γ-谷氨酸或其盐的医用粘合剂组合物; 和糖或糖醇，其是可食用的，水溶性的，阴离子的和可生物降解的。本发明还提供含有聚-γ-谷氨酸的增稠剂组合物，其可以用作吸湿剂，保湿剂和化妆品的原料。

8. 发明申请

US20110024399A1 PLASMA PROCESSING APPARATUS AND METHOD FOR PLASMA PROCESSING 有权
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：US20110024399A1
公开(公告)日：2011-02-03
申请号：US12936671
申请日：2009-04-06
申请人： Hyoung Won Kim , Young Soo Seo , Chi Kug Yoon , Jun Hyeok Lee , Young Ki Han , Jae Chul Choi
发明人： Hyoung Won Kim , Young Soo Seo , Chi Kug Yoon , Jun Hyeok Lee , Young Ki Han , Jae Chul Choi
IPC分类号： B23K10/00
CPC分类号： H01J37/32568 , H01J37/32009 , H01J2237/334 , H01L21/67069 , H01L21/67751 , H01L21/68742
摘要： Provided are a plasma processing apparatus and method. The plasma processing apparatus includes a chamber, an upper electrode, a lower electrode, a substrate support, and a movement member. The upper electrode is disposed at an inner upper portion of the chamber. The lower electrode faces the upper electrode at an inner lower portion of the chamber to support a substrate such that a bevel of the substrate is exposed in a substrate level etching process. The substrate support is disposed between the upper electrode and the lower electrode to support the substrate such that a central region of a bottom surface of the substrate is exposed in a substrate backside etching process. The movement member is configured to move the substrate support to separate the substrate from the substrate support in the substrate backside etching process.
摘要翻译：提供了一种等离子体处理装置和方法。等离子体处理装置包括室，上电极，下电极，基板支撑件和移动构件。上电极设置在室的内部上部。下电极在室的内下部面对上电极以支撑衬底，使得衬底的斜面在衬底级蚀刻工艺中暴露。衬底支撑件设置在上电极和下电极之间以支撑衬底，使得衬底的底表面的中心区域在衬底背面蚀刻工艺中暴露。移动构件被构造成移动衬底支撑件以在衬底背面蚀刻工艺中将衬底与衬底支撑件分离。

9. 发明申请

US20080053695A1 Electromagnetic wave absorber and method of constructing the same 审中-公开
标题翻译：电磁波吸收体及其构造方法
公开(公告)号：US20080053695A1
公开(公告)日：2008-03-06
申请号：US11895166
申请日：2007-08-23
申请人： Jae-Chul Choi
发明人： Jae-Chul Choi
IPC分类号： H05K9/00
CPC分类号： H05K9/009
摘要： Disclosed is an electromagnetic wave absorber, which is obtained by attaching a three-dimensional open-cell type metal porous body to an electromagnetic wave-reflecting surface and filling the pores of the three-dimensional open-cell type metal porous body with an electromagnetic wave-absorbing material.
摘要翻译：公开了一种电磁波吸收体，其通过将三维开放式金属多孔体附着在电磁波反射面上并用电磁波填充三维开放式金属多孔体的孔而得到吸收材料。

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