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1. 发明授权

US08709946B2 Method for forming contact hole 有权
标题翻译：形成接触孔的方法
公开(公告)号：US08709946B2
公开(公告)日：2014-04-29
申请号：US13364252
申请日：2012-02-01
申请人： Meng-Feng Tsai , Yi-Shiang Chang , Chia-Chi Lin , I-Hsin Chen , Chia-Ming Wu
发明人： Meng-Feng Tsai , Yi-Shiang Chang , Chia-Chi Lin , I-Hsin Chen , Chia-Ming Wu
IPC分类号： H01L21/44
CPC分类号： H01L21/76816 , H01L21/0273 , H01L21/0337 , H01L21/0338 , H01L21/31144
摘要： A method for forming contact holes includes following steps. A substrate including a dense region and an isolation region is provided. A material layer is formed on the substrate. Sacrificed patterns are formed on the material layer in the dense region, wherein there is a first opening between the two adjacent sacrificed patterns. A spacer is formed on each of two sides of each of the sacrificed patterns, wherein the spacers are separated from each other. The sacrificed patterns are removed to form a second opening between two adjacent spacers. A planar layer is formed to fill up the second openings. A first slit is formed in the planar layer, wherein the first slit exposes a portion of the material layer under the second openings. The portion of the material layer exposed by the first slit is removed to form third openings in the material layer.
摘要翻译：形成接触孔的方法包括以下步骤。提供了包括密集区域和隔离区域的衬底。在基板上形成材料层。牺牲图案形成在致密区域的材料层上，其中在两个相邻的牺牲图案之间存在第一开口。在每个牺牲图案的两侧的每一侧上形成间隔件，其中间隔件彼此分离。去除牺牲的图案以在两个相邻间隔物之间形成第二开口。形成平面层以填充第二开口。第一狭缝形成在平面层中，其中第一狭缝暴露第二开口下方的材料层的一部分。去除由第一狭缝暴露的材料层的部分以在材料层中形成第三开口。

2. 发明申请

US20130137270A1 METHOD FOR FORMING CONTACT HOLE 有权
标题翻译：形成接触孔的方法
公开(公告)号：US20130137270A1
公开(公告)日：2013-05-30
申请号：US13364252
申请日：2012-02-01
申请人： Meng-Feng Tsai , Yi-Shiang Chang , Chia-Chi Lin , I-Hsin Chen , Chia-Ming Wu
发明人： Meng-Feng Tsai , Yi-Shiang Chang , Chia-Chi Lin , I-Hsin Chen , Chia-Ming Wu
IPC分类号： H01L21/32
CPC分类号： H01L21/76816 , H01L21/0273 , H01L21/0337 , H01L21/0338 , H01L21/31144
摘要： A method for forming contact holes includes following steps. A substrate including a dense region and an isolation region is provided. A material layer is formed on the substrate. Sacrificed patterns are formed on the material layer in the dense region, wherein there is a first opening between the two adjacent sacrificed patterns. A spacer is formed on each of two sides of each of the sacrificed patterns, wherein the spacers are separated from each other. The sacrificed patterns are removed to form a second opening between two adjacent spacers. A planar layer is formed to fill up the second openings. A first slit is formed in the planar layer, wherein the first slit exposes a portion of the material layer under the second openings. The portion of the material layer exposed by the first slit is removed to form third openings in the material layer.
摘要翻译：形成接触孔的方法包括以下步骤。提供了包括密集区域和隔离区域的衬底。在基板上形成材料层。牺牲图案形成在致密区域的材料层上，其中在两个相邻的牺牲图案之间存在第一开口。在每个牺牲图案的两侧的每一侧上形成间隔件，其中间隔件彼此分离。去除牺牲的图案以在两个相邻间隔物之间形成第二开口。形成平面层以填充第二开口。第一狭缝形成在平面层中，其中第一狭缝暴露第二开口下方的材料层的一部分。去除由第一狭缝暴露的材料层的部分以在材料层中形成第三开口。

3. 发明授权

US06736650B1 Electrical connector with terminal retention mechanism 失效
标题翻译：带端子保持机构的电连接器
公开(公告)号：US06736650B1
公开(公告)日：2004-05-18
申请号：US10420107
申请日：2003-04-21
申请人： I-Hsin Chen , Chien-Sen Huang , Zhi-Kai Guo
发明人： I-Hsin Chen , Chien-Sen Huang , Zhi-Kai Guo
IPC分类号： H01K1200
CPC分类号： H01R13/4368 , H01R12/716
摘要： An electrical connector (1) includes a dielectric housing (10), a plurality of terminals (13) received in the housing, and a retention mechanism (12) pivotally attached to the housing. The housing defines a plurality of terminal-passages (108) and first mating members (103). Each of terminals includes a bent portion (134). The retention mechanism has an elongate stopper member (120). A pair of cantilevers (122) depends from the stopper member. A second mating member (1222) is formed on each of the cantilevers, for engaging one of the first mating members. Thus the stopper member is rotatable between a first position in which the stopper is protected from thermal warp or deformation, and a second position in which the terminals are secured in the corresponding terminal-passages.
摘要翻译：电连接器（1）包括绝缘壳体（10），容纳在壳体中的多个端子（13）和枢转地附接到壳体的保持机构（12）。壳体限定多个端子通道（108）和第一配合构件（103）。每个端子包括弯曲部分（134）。保持机构具有细长的止动件（120）。一对悬臂（122）由止动件构成。第二配合构件（1222）形成在每个悬臂上，用于接合第一配合构件中的一个。因此，止动件可以在第一位置和第二位置之间转动，在该第一位置中止动件不受热翘曲或变形，其中端子固定在相应的端子通道中。

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