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    • 3. 发明授权
    • Radiation-sensitive polymer and radiation-sensitive composition
containing the same
    • 辐射敏感聚合物和含有它的辐射敏感组合物
    • US5100762A
    • 1992-03-31
    • US549736
    • 1990-07-09
    • Youko TanakaShigeru KubotaHideo HoribeHiroshi KoezukaTeruhiko Kumada
    • Youko TanakaShigeru KubotaHideo HoribeHiroshi KoezukaTeruhiko Kumada
    • C08L43/00G03F7/004G03F7/075
    • G03F7/075C08L43/00G03F7/0042
    • A radiation-sensitive polymer is capable of resistance to the dry etching when it is applied to form very fine patterns in VLSIs and other semiconductor devices, wherein the polymer is a radiation-sensitive polymer that contains at least one unit represented by the general formula (I): ##STR1## (where X is an alkyl group, a halogen atom or a halogenated alkyl group; R.sup.1 is an alkyl group, an alkoxy or an aryl group; R.sup.2 is carbon monoxide; M is Si, Ge, Sn, Ti, Mo or W; k is a number defined by the valence of (M minus 1); and l is zero or a positive integer), and which optionally contains at least one unit represented by the general formula (II): ##STR2## (where Y is an alkyl group, a halogen atom or a halogenated alkyl group; R.sup.3 is an alkyl group or an aryl group) and/or at least one unit represented by the general formula (III):--SO.sub.2 --R.sup.4 (III)(where R.sup.4 is a divalent alkyl or aryl group).
    • 当辐射敏感聚合物被施加以在VLSI和其它半导体器件中形成非常精细的图案时,能够耐干蚀刻,其中该聚合物是含有至少一个由通式表示的单元的辐射敏感性聚合物 I):其中X是烷基,卤原子或卤代烷基; R 1是烷基,烷氧基或芳基; R 2是一氧化碳; M是Si,Ge, Sn,Ti,Mo或W; k是由(M-1)的化合价定义的数字; l是0或正整数),并且任选地含有至少一个由通式(II)表示的单元: (II)(其中Y是烷基,卤原子或卤代烷基; R3是烷基或芳基)和/或至少一个由通式(III)表示的单元: - SO 2 -R 4(III)(其中R 4是二价烷基或芳基)。
    • 5. 发明授权
    • Method of making a liquid crystal display including a field effect
transistor
    • 制造包括场效应晶体管的液晶显示器的方法
    • US06060333A
    • 2000-05-09
    • US228937
    • 1999-01-12
    • Toshihiko TanakaSyuji DoiHiroshi KoezukaAkira TsumuraHiroyuki Fuchigami
    • Toshihiko TanakaSyuji DoiHiroshi KoezukaAkira TsumuraHiroyuki Fuchigami
    • G02F1/1333G02F1/1368H01L27/28H01L51/30H01L35/24
    • H01L51/0036G02F1/1368H01L27/283H01L51/002H01L51/0035H01L51/0038H01L51/0508H01L51/0545H01L51/0558G02F2001/133302H01L51/0015H01L51/0541
    • A method of fabricating a liquid crystal display device including a field effect transistor includes forming a gate electrode on an electrically insulating substrate, the gate electrode being located in a transistor region of the substrate; forming an electrically insulating film on the substrate and covering the gate electrode; forming source and drain electrodes on the electrically insulating film on opposite sides of the gate electrode in the transistor region; forming a display electrode on the electrically insulating substrate in a display region of the substrate, adjacent the transistor region, the drain electrode being electrically connected to the display electrode; and forming, in the transistor region, a semiconductor film of a .pi.-conjugated polymer on the source and drain electrodes and on the electrically insulating film between the source and drain electrodes in the transistor region; arranging a transparent plate, including a transparent electrode, opposite and spaced from the .pi.-conjugated polymer film and the display electrode with the transparent electrode opposite the display electrode; and injecting a liquid crystal material between the transparent and display electrodes and between the transparent plate and the .pi.-conjugated polymer film.
    • 制造包括场效应晶体管的液晶显示装置的方法包括在电绝缘基板上形成栅电极,栅电极位于基板的晶体管区域中; 在基板上形成电绝缘膜并覆盖栅电极; 在晶体管区域中的栅电极的相对侧的电绝缘膜上形成源电极和漏电极; 在所述基板的显示区域中的所述电绝缘基板上形成与所述晶体管区域相邻的显示电极,所述漏极电极与所述显示电极连接; 以及在所述晶体管区域中在所述晶体管区域中在所述源极和漏极以及所述源极和漏极之间的所述电绝缘膜上形成π共轭聚合物的半导体膜; 布置透明板,包括透明电极,与透明电极相对并且与p1共轭聚合物膜和显示电极间隔开,透明电极与显示电极相对; 以及在所述透明显示电极之间以及所述透明板和所述π共轭聚合物膜之间注入液晶材料。