专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20070171391A1 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US20070171391A1
公开(公告)日：2007-07-26
申请号：US11709856
申请日：2007-02-23
申请人： Nobutaka Magome , Hiroaki Takaiwa , Dai Arai
发明人： Nobutaka Magome , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03F7/26 , G03B27/42
CPC分类号： G03F7/70991 , G03F7/70341 , G03F7/7075 , Y10S430/146
摘要： An exposure system includes an exposure section for irradiating a formed resist film with exposing light through a mask with an immersion liquid provided on the resist film, and a drying section for drying a surface of the resist film after irradiation.
摘要翻译：曝光系统包括曝光部分，用于用设置在抗蚀剂膜上的浸渍液体通过掩模曝光光照射形成的抗蚀剂膜;以及干燥部，用于在照射后干燥抗蚀剂膜的表面。

2. 发明授权

US08034539B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US08034539B2
公开(公告)日：2011-10-11
申请号：US11709856
申请日：2007-02-23
申请人： Nobutaka Magome , Hiroaki Takaiwa , Dai Arai
发明人： Nobutaka Magome , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03C5/00
CPC分类号： G03F7/70991 , G03F7/70341 , G03F7/7075 , Y10S430/146
摘要： An exposure system includes an exposure section for irradiating a formed resist film with exposing light through a mask with an immersion liquid provided on the resist film, and a drying section for drying a surface of the resist film after irradiation.
摘要翻译：曝光系统包括曝光部分，用于用设置在抗蚀剂膜上的浸渍液体通过掩模曝光光照射形成的抗蚀剂膜;以及干燥部，用于在照射后干燥抗蚀剂膜的表面。

3. 发明申请

US20050225735A1 Exposure apparatus and method for producing device 审中-公开
标题翻译：曝光装置及其制造方法
公开(公告)号：US20050225735A1
公开(公告)日：2005-10-13
申请号：US11147356
申请日：2005-06-08
申请人： Nobutaka Magome , Hiroaki Takaiwa , Dai Arai
发明人： Nobutaka Magome , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： G03F7/70991 , G03F7/70341 , G03F7/7075 , Y10S430/146
摘要： An exposure apparatus which performs an exposure while filling a space between a projection optical system and a substrate with liquid, and in which deterioration of a device caused by adherent liquid on the substrate is suppressed is provided. A device manufacturing system (SYS) includes a main body of an exposure apparatus (EX) which fills a space between a projection optical system (PL) and a substrate (P) with a liquid (50) and projects an image of a pattern onto the substrate (P) via the projection optical system (PL) and the liquid (50); an interface section (IF) arranged between the exposure apparatus main body (EX) and a coater/developer main body (C/D) which processes the substrate (P) after exposure; and a liquid-removing unit (100) which removes the liquid (50) adhering to the substrate (P) before the exposed substrate (P) is transferred into the coater/developer main body (C/D) through the interface section (IF).
摘要翻译：提供了一种曝光装置，其在用液体填充投影光学系统和基板之间的空间的同时进行曝光，并且其中抑制了由基板上的粘附液体引起的装置的劣化。装置制造系统（SYS）包括曝光装置（EX）的主体，其用液体（50）填充投影光学系统（PL）和基板（P）之间的空间，并将图案的图像投影到所述基板（P）经由所述投影光学系统（PL）和所述液体（50）; 布置在曝光装置主体（EX）和曝光后处理基板的涂布机/显影剂主体（C / D）之间的接口部分（IF）以及在暴露的基板（P）通过界面部分（IF）传送到涂布机/显影剂主体（C / D）之前，去除粘附到基板（P）上的液体（50）的液体去除单元（100））。

4. 发明授权

US09041901B2 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method 有权
公开(公告)号：US09041901B2
公开(公告)日：2015-05-26
申请号：US12318574
申请日：2008-12-31
申请人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
发明人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70533 , G03F7/70866 , G03F7/70933 , G03F7/70991
摘要： A lithographic projection apparatus includes a substrate table by which a substrate is held, a projection system via which a patterned beam is projected onto the substrate to expose the substrate through liquid, and a liquid supply system. The liquid supply system includes a supply flow path, and supplies the liquid via the supply flow path during the exposure. The liquid supply system also includes a device by which the supply flow path is connected with a vacuum system to prevent liquid in the supply flow path from leaking.

5. 发明授权

US07826031B2 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method 有权
公开(公告)号：US07826031B2
公开(公告)日：2010-11-02
申请号：US11606935
申请日：2006-12-01
申请人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
发明人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03B27/32
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70533 , G03F7/70866 , G03F7/70933 , G03F7/70991
摘要： An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section powered by electric power supplied from a commercial power source and an uninterruptible power source separate from the commercial power source. When the commercial power source has a failure, the supply of electric power to the drive section is switched to the uninterruptible power source.

6. 发明申请

US20110013161A1 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：液体回收装置，曝光装置，曝光方法及装置制造方法
公开(公告)号：US20110013161A1
公开(公告)日：2011-01-20
申请号：US12923568
申请日：2010-09-28
申请人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
发明人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70533 , G03F7/70866 , G03F7/70933 , G03F7/70991
摘要： An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a space between the projection optical system and the substrate. The exposure apparatus has a liquid supply system having a supply path that supplies liquid to the space between the projection optical system and the substrate. A liquid recovery system having a recovery path recovers the liquid from the space during the exposure. The apparatus also includes a suction path with which at least part of the supply path of the liquid supply system is connected when the exposure apparatus functions abnormally.
摘要翻译：曝光装置通过投影光学系统和填充投影光学系统和基板之间的空间的液体将图案的图像投影到基板上来曝光基板。曝光装置具有液体供应系统，该液体供应系统具有向投影光学系统和基板之间的空间供应液体的供给路径。具有恢复路径的液体回收系统在曝光期间从空间中恢复液体。该装置还包括吸入路径，当曝光装置异常地起作用时，至少部分供液系统的供应路径被连接到该吸入路径。

7. 发明申请

US20070076183A1 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：液体回收装置，曝光装置，曝光方法及装置制造方法
公开(公告)号：US20070076183A1
公开(公告)日：2007-04-05
申请号：US11606935
申请日：2006-12-01
申请人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
发明人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70533 , G03F7/70866 , G03F7/70933 , G03F7/70991
摘要： An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section powered by electric power supplied from a commercial power source and an uninterruptible power source separate from the commercial power source. When the commercial power source has a failure, the supply of electric power to the drive section is switched to the uninterruptible power source.
摘要翻译：曝光装置通过投影光学系统和填充投影光学系统和基板之间的间隙的液体将图案的图像投影到基板上来曝光基板。曝光装置具有液体回收机构，其具有由商用电源提供的电力供电的驱动部分和与商用电源分离的不间断电源。当商用电源发生故障时，将驱动部分的电力供应切换到不间断电源。

8. 发明授权

US08854599B2 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：液体回收装置，曝光装置，曝光方法及装置制造方法
公开(公告)号：US08854599B2
公开(公告)日：2014-10-07
申请号：US12923568
申请日：2010-09-28
申请人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
发明人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70533 , G03F7/70866 , G03F7/70933 , G03F7/70991
摘要： An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a space between the projection optical system and the substrate. The exposure apparatus has a liquid supply system having a supply path that supplies liquid to the space between the projection optical system and the substrate. A liquid recovery system having a recovery path recovers the liquid from the space during the exposure. The apparatus also includes a suction path with which at least part of the supply path of the liquid supply system is connected when the exposure apparatus functions abnormally.
摘要翻译：曝光装置通过投影光学系统和填充投影光学系统和基板之间的空间的液体将图案的图像投影到基板上来曝光基板。曝光装置具有液体供应系统，该液体供应系统具有向投影光学系统和基板之间的空间供应液体的供给路径。具有恢复路径的液体回收系统在曝光期间从空间中恢复液体。该装置还包括吸入路径，当曝光装置异常地起作用时，至少部分供液系统的供应路径被连接到该吸入路径。

9. 发明申请

US20090128793A1 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method 审中-公开
标题翻译：液体回收装置，曝光装置，曝光方法及装置制造方法
公开(公告)号：US20090128793A1
公开(公告)日：2009-05-21
申请号：US12318574
申请日：2008-12-31
申请人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
发明人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70533 , G03F7/70866 , G03F7/70933 , G03F7/70991
摘要： A lithographic projection apparatus includes a substrate table by which a substrate is held, a projection system via which a patterned beam is projected onto the substrate to expose the substrate through liquid, and a liquid supply system. The liquid supply system includes a supply flow path, and supplies the liquid via the supply flow path during the exposure. The liquid supply system also includes a device by which the supply flow path is connected with a vacuum system to prevent liquid in the supply flow path from leaking.
摘要翻译：光刻投影装置包括：基板，通过该基板被保持，投影系统，图案化的光束通过该投影系统投影到基板上以通过液体曝光基板;以及液体供应系统。液体供给系统包括供给流路，并且在曝光期间经由供给流路供给液体。液体供给系统还包括供给流路与真空系统连接以防止供给流路中的液体泄漏的装置。

10. 发明申请

US20050243293A1 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：液体回收装置，曝光装置，曝光方法及装置制造方法
公开(公告)号：US20050243293A1
公开(公告)日：2005-11-03
申请号：US11171243
申请日：2005-07-01
申请人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
发明人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03B27/42 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70533 , G03F7/70866 , G03F7/70933 , G03F7/70991
摘要： An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section powered by electric power supplied from a commercial power source and an uninterruptible power source separate from the commercial power source. When the commercial power source has a failure, the supply of electric power to the drive section is switched to the uninterruptible power source.
摘要翻译：曝光装置通过投影光学系统和填充投影光学系统和基板之间的间隙的液体将图案的图像投影到基板上来曝光基板。曝光装置具有液体回收机构，其具有由商用电源提供的电力供电的驱动部分和与商用电源分离的不间断电源。当商用电源发生故障时，将驱动部分的电力供应切换到不间断电源。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式