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1. 发明申请

US20120276481A1 METHOD OF FORMING RESIST PATTERN AND NEGATIVE TONE-DEVELOPMENT RESIST COMPOSITION 有权
标题翻译：形成电阻图案和负极色调发展电阻组合物的方法
公开(公告)号：US20120276481A1
公开(公告)日：2012-11-01
申请号：US13456768
申请日：2012-04-26
申请人： Hiroaki Shimizu , Hideto Nito
发明人： Hiroaki Shimizu , Hideto Nito
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/325 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： A method of forming a resist pattern, the method including: forming a resist film on a substrate using a resist composition containing a base component (A) that exhibits reduced solubility in an organic solvent under the action of acid, an acid generator component (B) that generates acid upon exposure and a fluorine-containing polymeric compound (F), exposing the resist film, and patterning the resist film by negative tone development using a developing solution containing the organic solvent, thereby forming a resist pattern, wherein the base component (A) contains a resin component (A1) containing a structural unit (a1) derived from an acrylate ester, the dissolution rates of (A1) and (F) in the developing solution are each at least 10 nm/s, and the absolute value of the difference in the dissolution rates of (A1) and (F) in the developing solution is not more than 80 nm/s.
摘要翻译：一种形成抗蚀剂图案的方法，该方法包括：使用含有在酸作用下在有机溶剂中显示降低的溶解度的碱成分（A）的抗蚀剂组合物在基材上形成抗蚀剂膜，酸产生剂组分（B ），暴露出含氟聚合物（F），曝光抗蚀剂膜，并使用含有有机溶剂的显影溶液通过负色调显影对抗蚀剂膜进行图案化，从而形成抗蚀剂图案，其中基础组分（A）含有含有由丙烯酸酯衍生的结构单元（a1）的树脂成分（A1），显影液中（A1）和（F）的溶解速度分别为10nm / s以上，绝对值显影液中（A1）和（F）的溶解速度差的值不大于80nm / s。

2. 发明申请

US20090317743A1 Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound 有权
标题翻译：用于浸渍曝光的抗蚀剂组合物，形成抗蚀剂图案的方法和含有氟化物的聚合物
公开(公告)号：US20090317743A1
公开(公告)日：2009-12-24
申请号：US12457705
申请日：2009-06-18
申请人： Daiju Shiono , Tomoyuki Hirano , Sanae Furuya , Takahiro Dazai , Hiroaki Shimizu , Tsuyoshi Kurosawa , Hideto Nito , Tsuyoshi Nakamura
发明人： Daiju Shiono , Tomoyuki Hirano , Sanae Furuya , Takahiro Dazai , Hiroaki Shimizu , Tsuyoshi Kurosawa , Hideto Nito , Tsuyoshi Nakamura
IPC分类号： G03F7/20 , G03F7/004 , C08F220/22 , C08F214/18
CPC分类号： C08F214/18 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.
摘要翻译：一种浸渍曝光用抗蚀剂组合物，包括：含有具有碱解离基团的结构单元（f1）和由通式（f2-1）表示的结构单元（f2）的含氟聚合物（F）（其中R表示氢原子，低级烷基或卤代低级烷基; W为通式（w-1）〜（w-4）中任一个表示的基团）; 在酸性作用下在碱性显影液中表现出改变的溶解性的碱成分（A）和在曝光时产生酸的酸发生剂组分（B）。

3. 发明授权

US09411224B2 Method of forming resist pattern 有权
标题翻译：形成抗蚀剂图案的方法
公开(公告)号：US09411224B2
公开(公告)日：2016-08-09
申请号：US13467549
申请日：2012-05-09
申请人： Jiro Yokoya , Tsuyoshi Nakamura , Hiroaki Shimizu , Masaru Takeshita , Hideto Nito , Hirokuni Saito
发明人： Jiro Yokoya , Tsuyoshi Nakamura , Hiroaki Shimizu , Masaru Takeshita , Hideto Nito , Hirokuni Saito
IPC分类号： G03F7/22 , G03F7/004 , G03F7/039 , G03F7/20 , G03F7/26 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0397 , G03F7/203 , G03F7/2041 , G03F7/26 , G03F7/38
摘要： A method of forming a resist pattern, including forming a resist film on a substrate using a resist composition comprising a base component that exhibits increased solubility in an alkali developing solution and a photo-base generator component; exposing the resist film; baking the exposed resist film, such that, at an exposed portion thereof, the base generated from the photo-base generator component upon the exposure and an acid provided to the resist film are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the acid provided to the resist film; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern in which the unexposed portion of the resist film has been dissolved and removed.
摘要翻译：一种形成抗蚀剂图案的方法，包括使用包含在碱性显影液中显示出增加的溶解度的基础成分的抗蚀剂组合物和光产生剂组分在基材上形成抗蚀剂膜; 曝光抗蚀膜; 烘烤曝光的抗蚀剂膜，使得在曝光部分，曝光时由光产生器部件产生的基底和提供给抗蚀剂膜的酸被中和，并且在抗蚀剂膜的未曝光部分，碱性成分在碱性显影液中的溶解度通过提供于抗蚀剂膜的酸而增加; 并对抗蚀剂膜进行碱显影，从而形成抗蚀剂膜的未曝光部分已被溶解并除去的负色调抗蚀剂图案。

4. 发明授权

US09005872B2 Resist composition and method of forming resist pattern 有权
标题翻译：抗蚀剂图案的抗蚀剂组成和方法
公开(公告)号：US09005872B2
公开(公告)日：2015-04-14
申请号：US13398555
申请日：2012-02-16
申请人： Hiroaki Shimizu , Sho Abe , Hideto Nito
发明人： Hiroaki Shimizu , Sho Abe , Hideto Nito
IPC分类号： G03F7/004 , G03F7/30 , C07C51/02 , C07C303/32 , C07C309/06 , C07C309/12 , C07C309/19 , G03F7/038 , G03F7/039 , G03F7/20 , G03F7/32
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041 , G03F7/30 , G03F7/325 , Y10S430/12 , Y10S430/122 , Y10S430/123
摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a basic-compound component (C) and an acid-generator component (B) which generates acid upon exposure, the component (B) including a compound represented by formula (b1), and the component (C) including at least one compound represented by formulas (c1) to (c3) (wherein Z1 represents a ring skeleton-containing hydrocarbon group, Q1 represents a divalent linking group containing oxygen, Y1 represents a fluorinated alkylene group, M+ represents an organic cation, R1 represents a fluorinated alkyl group or a hydrocarbon group, L1+ and L2+ represents a sulfonium or an iodonium, Z2 represents a hydrogen atom or a hydrocarbon group, Y2 represents a single bond or a divalent linking group containing no fluorine, R2 represents an organic group, Y3 represents an alkylene group or an arylene group; and Rf represents a fluorine-containing hydrocarbon group).
摘要翻译：一种抗蚀剂组合物，其包含在酸作用下在显影液中溶解度变化的碱成分（A），暴露时产生酸的碱性化合物成分（C）和酸发生剂成分（B），成分（B ）和包含式（c1）〜（c3）所示的至少一种化合物的组分（C）（其中Z1表示含环骨架的烃基，Q1表示二价连接基团含有氧的基团，Y 1表示氟化亚烷基，M +表示有机阳离子，R1表示氟代烷基或烃基，L1 +，L2 +表示锍或碘，Z2表示氢原子或烃基，Y2表示单键或不含氟的二价连接基团，R 2表示有机基团，Y 3表示亚烷基或亚芳基，Rf表示含氟烃基）。

5. 发明申请

US20120094236A1 RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING POLYMERIC COMPOUND 有权
标题翻译：耐冲击接触的耐腐蚀组合物，耐腐蚀图案的形成方法和含氟聚合物
公开(公告)号：US20120094236A1
公开(公告)日：2012-04-19
申请号：US13336131
申请日：2011-12-23
申请人： Daiju SHIONO , Tomoyuki Hirano , Sanae Furuya , Takahiro Dazai , Hiroaki Shimizu , Tsuyoshi Kurosawa , Hideto Nito , Tsuyoshi Nakamura
发明人： Daiju SHIONO , Tomoyuki Hirano , Sanae Furuya , Takahiro Dazai , Hiroaki Shimizu , Tsuyoshi Kurosawa , Hideto Nito , Tsuyoshi Nakamura
IPC分类号： G03F7/20 , G03F7/004 , G03F7/039 , C08F214/18
CPC分类号： C08F214/18 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.
摘要翻译：一种浸渍曝光用抗蚀剂组合物，包括：含有具有碱解离基团的结构单元（f1）和由通式（f2-1）表示的结构单元（f2）的含氟聚合物（F）（其中R表示氢原子，低级烷基或卤代低级烷基; W为通式（w-1）〜（w-4）中任一个表示的基团）; 在酸性作用下在碱性显影液中表现出改变的溶解性的碱成分（A）和在曝光时产生酸的酸发生剂组分（B）。

6. 发明申请

US20130189618A1 METHOD OF FORMING RESIST PATTERN 有权
标题翻译：形成电阻图案的方法
公开(公告)号：US20130189618A1
公开(公告)日：2013-07-25
申请号：US13614017
申请日：2012-09-13
申请人： Jiro Yokoya , Tsuyoshi Nakamura , Hiroaki Shimizu , Hideto Nito
发明人： Jiro Yokoya , Tsuyoshi Nakamura , Hiroaki Shimizu , Hideto Nito
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/20 , G03F7/004 , G03F7/0045 , G03F7/0397 , G03F7/38
摘要： A method of forming a resist pattern, including: step (1) in which a resist composition including a base component, a photobase generator component and an acid supply component is applied to a substrate to form a resist film; step (2) in which the resist film is subjected to exposure without being subjected to prebaking; step (3) in which baking is conducted after step (2), such that, at an exposed portion of the resist film, the base generated from the photobase generator component upon the exposure and an acid derived from the acid supply component are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the action of the acid derived from the acid supply component; and step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern.
摘要翻译：一种形成抗蚀剂图案的方法，包括：步骤（1），其中将包含基底组分，光碱产生剂组分和酸供应组分的抗蚀剂组合物施加到基底上以形成抗蚀剂膜; 步骤（2），其中抗蚀剂膜经受曝光而不经受预烘烤; 步骤（3），其中在步骤（2）之后进行烘烤，使得在抗蚀剂膜的暴露部分，曝光时由光产生剂组分产生的碱和源自酸供应组分的酸被中和，并且在抗蚀剂膜的未曝光部分，通过来自酸供应成分的酸的作用，碱成分在碱性显影液中的溶解度增加; 和步骤（4），其中抗蚀剂膜经受碱显影，从而形成负色调抗蚀剂图案。

7. 发明授权

US08475997B2 Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound 有权
标题翻译：用于浸渍曝光的抗蚀组合物，形成抗蚀图案的方法和含氟聚合物
公开(公告)号：US08475997B2
公开(公告)日：2013-07-02
申请号：US13336131
申请日：2011-12-23
申请人： Daiju Shiono , Tomoyuki Hirano , Sanae Furuya , Takahiro Dazai , Hiroaki Shimizu , Tsuyoshi Kurosawa , Hideto Nito , Tsuyoshi Nakamura
发明人： Daiju Shiono , Tomoyuki Hirano , Sanae Furuya , Takahiro Dazai , Hiroaki Shimizu , Tsuyoshi Kurosawa , Hideto Nito , Tsuyoshi Nakamura
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： C08F214/18 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.
摘要翻译：一种浸渍曝光用抗蚀剂组合物，包括：含有具有碱解离基团的结构单元（f1）和由通式（f2-1）表示的结构单元（f2）的含氟聚合物（F）（其中R表示氢原子，低级烷基或卤代低级烷基; W为通式（w-1）〜（w-4）中任一个表示的基团）; 在酸性作用下在碱性显影液中表现出改变的溶解性的碱成分（A）和在曝光时产生酸的酸发生剂组分（B）。

8. 发明授权

US08968990B2 Method of forming resist pattern 有权
标题翻译：形成抗蚀剂图案的方法
公开(公告)号：US08968990B2
公开(公告)日：2015-03-03
申请号：US13614017
申请日：2012-09-13
申请人： Jiro Yokoya , Tsuyoshi Nakamura , Hiroaki Shimizu , Hideto Nito
发明人： Jiro Yokoya , Tsuyoshi Nakamura , Hiroaki Shimizu , Hideto Nito
IPC分类号： G03F7/26 , G03F7/20 , G03F7/004 , G03F7/38 , G03F7/039
CPC分类号： G03F7/20 , G03F7/004 , G03F7/0045 , G03F7/0397 , G03F7/38
摘要： A method of forming a resist pattern, including: step (1) in which a resist composition including a base component, a photobase generator component and an acid supply component is applied to a substrate to form a resist film; step (2) in which the resist film is subjected to exposure without being subjected to prebaking; step (3) in which baking is conducted after step (2), such that, at an exposed portion of the resist film, the base generated from the photobase generator component upon the exposure and an acid derived from the acid supply component are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the action of the acid derived from the acid supply component; and step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern.
摘要翻译：一种形成抗蚀剂图案的方法，包括：步骤（1），其中将包含基底组分，光碱产生剂组分和酸供应组分的抗蚀剂组合物施加到基底上以形成抗蚀剂膜; 步骤（2），其中抗蚀剂膜经受曝光而不经受预烘烤; 步骤（3），其中在步骤（2）之后进行烘烤，使得在抗蚀剂膜的暴露部分，曝光时由光产生剂组分产生的碱和源自酸供应组分的酸被中和，并且在抗蚀剂膜的未曝光部分，通过来自酸供应成分的酸的作用，碱成分在碱性显影液中的溶解度增加; 和步骤（4），其中抗蚀剂膜经受碱显影，从而形成负色调抗蚀剂图案。

9. 发明申请

US20130017500A1 METHOD OF FORMING RESIST PATTERN 有权
标题翻译：形成电阻图案的方法
公开(公告)号：US20130017500A1
公开(公告)日：2013-01-17
申请号：US13467549
申请日：2012-05-09
申请人： Jiro Yokoya , Tsuyoshi Nakamura , Hiroaki Shimizu , Masaru Takeshita , Hideto Nito , Hirokuni Saito
发明人： Jiro Yokoya , Tsuyoshi Nakamura , Hiroaki Shimizu , Masaru Takeshita , Hideto Nito , Hirokuni Saito
IPC分类号： G03F7/20
CPC分类号： G03F7/0045 , G03F7/0397 , G03F7/203 , G03F7/2041 , G03F7/26 , G03F7/38
摘要： A method of forming a resist pattern, including forming a resist film on a substrate using a resist composition comprising a base component that exhibits increased solubility in an alkali developing solution and a photo-base generator component; exposing the resist film; baking the exposed resist film, such that, at an exposed portion thereof, the base generated from the photo-base generator component upon the exposure and an acid provided to the resist film are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the acid provided to the resist film; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern in which the unexposed portion of the resist film has been dissolved and removed.
摘要翻译：一种形成抗蚀剂图案的方法，包括使用包含在碱性显影液中显示出增加的溶解度的基础成分的抗蚀剂组合物和光产生剂组分在基材上形成抗蚀剂膜; 曝光抗蚀膜; 烘烤曝光的抗蚀剂膜，使得在曝光部分，曝光时由光产生器部件产生的基底和提供给抗蚀剂膜的酸被中和，并且在抗蚀剂膜的未曝光部分，碱性成分在碱性显影液中的溶解度通过提供于抗蚀剂膜的酸而增加; 并对抗蚀剂膜进行碱显影，从而形成抗蚀剂膜的未曝光部分已被溶解并除去的负色调抗蚀剂图案。

10. 发明申请

US20100233626A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：正电阻组合物和形成电阻图案的方法
公开(公告)号：US20100233626A1
公开(公告)日：2010-09-16
申请号：US12721291
申请日：2010-03-10
申请人： Hiroaki Shimizu , Hideto Nito , Junichi Tsuchiya , Takahiro Dazai
发明人： Hiroaki Shimizu , Hideto Nito , Junichi Tsuchiya , Takahiro Dazai
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/2041 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A positive resist composition including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-1) (R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, an acid-generator component (B) and a fluorine-containing polymeric compound (F1) having a structural unit containing a base dissociable group.
摘要翻译：一种正性抗蚀剂组合物，其包含具有由通式（a0-1）表示的结构单元（a0）的聚合化合物（A1）（R表示氢原子，1〜5个碳原子的烷基或卤代烷基1 至5个碳原子，R 2表示二价连接基团，R 3表示在其环骨架中含有-SO 2 - 的环状基团）和衍生自含有酸解离，溶解抑制基团的酸的丙烯酸酯的结构单元（a1） - 发酵剂组分（B）和含有碱解离基团的结构单元的含氟聚合物（F1）。

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