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1. 发明申请

US20130292772A1 LAYOUT DESIGNS WITH VIA ROUTING STRUCTURES 有权
标题翻译：通过路由结构进行布局设计
公开(公告)号：US20130292772A1
公开(公告)日：2013-11-07
申请号：US13465129
申请日：2012-05-07
申请人： Yuansheng Ma , Jongwook KYE , Harry LEVINSON , Hidekazu YOSHIDA , Mahbub RASHED
发明人： Yuansheng Ma , Jongwook KYE , Harry LEVINSON , Hidekazu YOSHIDA , Mahbub RASHED
IPC分类号： H01L27/04 , H01L21/283
CPC分类号： H01L21/76895 , H01L23/528 , H01L27/0207 , H01L27/11807 , H01L2027/11875 , H01L2924/0002 , H01L2924/00
摘要： An approach for providing layout designs with via routing structures is disclosed. Embodiments include: providing a gate structure and a diffusion contact on a substrate; providing a gate contact on the gate structure; providing a metal routing structure that does not overlie a portion of the gate contact, the diffusion contact, or a combination thereof; and providing a via routing structure over the portion and under a part of the metal routing structure to couple the gate contact, the diffusion contact, or a combination thereof to the metal routing structure.
摘要翻译：公开了一种通过路由结构提供布局设计的方法。实施例包括：在衬底上提供栅极结构和扩散接触; 在栅极结构上提供栅极接触; 提供不覆盖栅极接触部分，扩散接触部分或其组合的金属布线结构; 以及在金属布线结构的部分和一部分之下提供通孔布线结构，以将栅极接触，扩散接触或其组合耦合到金属布线结构。

2. 发明授权

US06872497B1 Reflective mask for short wavelength lithography 失效
标题翻译：短波长光刻反光掩模
公开(公告)号：US06872497B1
公开(公告)日：2005-03-29
申请号：US10357818
申请日：2003-02-04
申请人： Harry Levinson , Bruno La Fontaine
发明人： Harry Levinson , Bruno La Fontaine
IPC分类号： G03F1/00 , G03F1/14 , G03F9/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/84
摘要： A methodology for forming a reflective mask is disclosed. The mask facilitates accurate pattern transfers as a substantially defect free reflective coating is formed therein. The mask can generally be formed according to four main steps, for example, which include depositing a reflective coating (e.g., formed of multiple layers) over a substrate, patterning and then inspecting for defects a masking material formed over the reflective coating, correcting such defects and finally patterning the reflective coating with the patterned masking material serving as a guide.
摘要翻译：公开了一种用于形成反射掩模的方法。当在其中形成基本上无缺陷的反射涂层时，掩模有助于精确的图案转印。掩模通常可以根据四个主要步骤形成，例如，其包括在衬底上沉积反射涂层（例如，由多层形成），图案化，然后检查在反射涂层上形成的掩模材料的缺陷，校正这种缺陷，并最终用图案化的掩模材料作为引导图案化反射涂层。

3. 发明授权

US06710853B1 Phase grating focus monitor using overlay technique 有权
标题翻译：相位光栅聚焦监测器使用覆盖技术
公开(公告)号：US06710853B1
公开(公告)日：2004-03-23
申请号：US09944795
申请日：2001-08-31
申请人： Bruno La Fontaine , Jongwook Kye , Harry Levinson
发明人： Bruno La Fontaine , Jongwook Kye , Harry Levinson
IPC分类号： G03B2752
CPC分类号： G03F7/70633 , G03F7/70641
摘要： An optical tool includes a tool body that is transparent to light. Pluralities of parallel opaque lines on the body form a first outline in the shape of the square, and a second outline in the shape of a square which is centrally located relative to and within the first-mentioned square. Each pair of adjacent parallel lines has therebetween a first region that allows transmission of light therethrough without changing phase thereof, and a second region alongside the first region that allows transmission of light therethrough while shifting the phase thereof by 90°. The phase shifting and non-phase shifting regions are positioned so that the images of the outlines provided by a lens on an object shit in position a substantial amount as the distance between the lens and the object is changed.
摘要翻译：光学工具包括对光透明的工具主体。身体上多条平行的不透明线条形成了正方形形状的第一轮廓，并且以相对于第一个提及的正方形中心定位的正方形形状的第二轮廓。每对相邻的平行线之间具有允许透过其而不改变其相位的第一区域，以及沿着第一区域的第二区域，其允许透过光而使其相位偏移90°。定位相移和非相移区域，使得当物体上的透镜提供的轮廓的图像在透镜和物体之间的距离改变时大量地位置处于位置。

4. 发明授权

US06696847B1 Photo assisted electrical linewidth measurement method and apparatus 失效
标题翻译：照片辅助电线宽度测量方法和装置
公开(公告)号：US06696847B1
公开(公告)日：2004-02-24
申请号：US09907311
申请日：2001-07-17
申请人： Bruno M. LaFontaine , Jongwook Kye , Harry Levinson
发明人： Bruno M. LaFontaine , Jongwook Kye , Harry Levinson
IPC分类号： G01R31302
CPC分类号： G01R1/24 , G01R31/024
摘要： In the present method of electrically testing the width of a line, a short pulse of laser energy is applied to the line to generate conductive electrons therein. An electrical potential is applied to the line to cause electrons to flow in the line, and current is measured to determine the width of the line.
摘要翻译：在电测试线的宽度的本方法中，将短脉冲的激光能量施加到线以在其中产生导电电子。对线路施加电势以使电子在线路中流动，并且测量电流以确定线路的宽度。

5. 发明授权

US06207966B1 Mark protection with transparent film 有权
标题翻译：标记保护透明膜
公开(公告)号：US06207966B1
公开(公告)日：2001-03-27
申请号：US09205010
申请日：1998-12-04
申请人： Khanh B. Nguyen , Harry Levinson , Richard D. Edwards , Stuart Brown , Paul W. Ackmann
发明人： Khanh B. Nguyen , Harry Levinson , Richard D. Edwards , Stuart Brown , Paul W. Ackmann
IPC分类号： G01B1100
CPC分类号： G03F9/7076 , H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： An alignment mark protection structure (95) is disclosed which is used to ensure an integrity of an alignment scheme for a substrate (50) which is to be subjected to lithographic processing. The alignment mark protection structure (95) comprises the substrate (50) and an alignment mark (52) associated with the substrate (50). The alignment mark (52) reflects an alignment light (208) which is then used to determine an optimum alignment between the substrate (50) and a lithographic mask (214). A cap (100) overlies the alignment mark (52) and is substantially transparent with respect to the alignment light (208). The cap (100) protects the underlying alignment mark (52) from lithographic process-induced damage during processing and thus reduces alignment light noise, thereby improving the alignment between a mask (214) and the substrate (50) and minimizing the registration error associated with overlying layers formed on the substrate (50).
摘要翻译：公开了一种对准标记保护结构（95），其用于确保待经受光刻处理的基板（50）的对准方案的完整性。对准标记保护结构（95）包括衬底（50）和与衬底（50）相关联的对准标记（52）。对准标记（52）反射对准光（208），然后将对准光（208）用于确定基板（50）和光刻掩模（214）之间的最佳对准。盖（100）覆盖对准标记（52），并且相对于对准光（208）基本上是透明的。盖（100）在处理期间保护下面的对准标记（52）免受光刻处理引起的损坏，从而减少对准光噪声，从而改善掩模（214）和基板（50）之间的对准并使与之相关联的注册误差最小化其中覆盖层形成在基底（50）上。

6. 发明授权

US4028408A Novel preparation of trifluoromethylthioacetic acid 失效
标题翻译：三氟代硫代乙酸的新型制备
公开(公告)号：US4028408A
公开(公告)日：1977-06-07
申请号：US677190
申请日：1976-04-15
申请人： Sidney Harry Levinson , Wilford Lee Mendelson
发明人： Sidney Harry Levinson , Wilford Lee Mendelson
IPC分类号： C07B61/00 , B01J27/00 , B01J27/06 , C07C67/00 , C07C313/00 , C07C319/14 , C07C323/12 , C07D501/02 , C07C149/16 , C07C148/00 , C07C153/017
CPC分类号： C07C323/00
摘要： Methods and intermediates are disclosed for the preparation of trifluoromethylthioacetic acid using the reaction of trifluoromethylsulfenyl halides with certain orthoesters.
摘要翻译：公开了使用三氟甲基硫基卤化物与某些原酸酯反应制备三氟甲硫基乙酸的方法和中间体。

7. 发明申请

US20090135390A1 LITHOGRAPHIC ALIGNMENT MARKS 审中-公开
标题翻译：地理对比标记
公开(公告)号：US20090135390A1
公开(公告)日：2009-05-28
申请号：US11944857
申请日：2007-11-26
申请人： Bruno La Fontaine , Obert R. Wood, II , Harry Levinson
发明人： Bruno La Fontaine , Obert R. Wood, II , Harry Levinson
IPC分类号： G03B27/54
CPC分类号： G03F7/70433 , G03F1/42 , G03F7/70125 , G03F9/7076
摘要： Precise and repeatable alignment performance using asymmetric illumination is achieved by properly structuring, as by segmenting, an alignment mark on a reticle of a photolithographic exposure apparatus as a function of the type of asymmetric illumination, thereby improving resolution and repeatability of an alignment mark formed on a target substrate. Embodiments include double exposure techniques using dipole illumination with an angularly segmented alignment mark, e.g., at 45°, such that the first-order diffracted light is sent at 45° from the initial position of the dipole illumination.
摘要翻译：通过在光刻曝光设备的掩模版上分割对准标记，作为不对称照明的类型，通过适当地构造精确和可重复的对准性能来实现，从而提高在不对称照明上形成的对准标记的分辨率和重复性目标基板。实施例包括使用具有角度分段对准标记（例如，45°）的偶极照明的双重曝光技术，使得一次衍射光从偶极照明的初始位置发送45°。

8. 发明授权

US06535280B1 Phase-shift-moiré focus monitor 有权
标题翻译：相移莫尔焦点监视器
公开(公告)号：US06535280B1
公开(公告)日：2003-03-18
申请号：US09944794
申请日：2001-08-31
申请人： Bruno La Fontaine , Jongwook Kye , Harry Levinson
发明人： Bruno La Fontaine , Jongwook Kye , Harry Levinson
IPC分类号： G01J100
CPC分类号： G03F9/7026 , G03F9/7049
摘要： An optical monitor includes a body having a first plurality of parallel, substantially opaque, spaced apart lines thereon, and the second plurality of parallel, substantially opaque, spaced apart lines thereon, with a relatively small angle between the first and second pluralities of lines. A an image of the lines of the first plurality thereof is provided on the semiconductor body, upon relative movement of the monitor toward and away from the semiconductor body, the line images move relative to the semiconductor body. The images of the lines of the second plurality thereof provided on the semiconductor body move in a different manner upon relative movement if the monitor toward and away from the semiconductor body: The moiré fringe formed on the semiconductor body from images of the first and second plurality of lines during such movement is analyzed in order to achieve proper focus of the image on the semiconductor body.
摘要翻译：光学监视器包括主体，其上具有第一多个平行的，基本上不透明的间隔开的线，以及其上的第二多个平行，基本上不透明的间隔开的线，在第一和第二多条线之间具有相对小的角度。当半导体本体上的第一多个的线的图像被设置在半导体本体上时，当监视器朝向和远离半导体主体相对运动时，线图像相对于半导体本体移动。如果监视器朝向和离开半导体主体，则设置在半导体主体上的第二多个的线的图像在相对移动时以不同的方式移动。从第一和第二多个图像的图像形成在半导体主体上的莫尔条纹分析这种移动期间的线，以便在半导体本体上实现图像的适当聚焦。

9. 发明授权

US06515272B1 Method and apparatus for improving signal to noise ratio of an aerial image monitor 失效
标题翻译：用于提高空中图像监视器的信噪比的方法和装置
公开(公告)号：US06515272B1
公开(公告)日：2003-02-04
申请号：US09675534
申请日：2000-09-29
申请人： Bruno La Fontaine , Harry Levinson
发明人： Bruno La Fontaine , Harry Levinson
IPC分类号： H01L2700
CPC分类号： G03F7/70666
摘要： In an image monitoring apparatus, a pulsed-laser signal is modulated at a chosen frequency. The modulated signal is provided to an optical imaging system, the output signal is detected by an aerial image detector, and the signal from the aerial image detector is in turn amplified only at the chosen frequency. The apparatus includes an optical chopper for modulating the pulsed-laser signal, and a lock-in amplifier for amplifying the signal from the aerial image detector.
摘要翻译：在图像监视装置中，以选定的频率调制脉冲激光信号。调制信号被提供给光学成像系统，输出信号由空间图像检测器检测，并且来自空中图像检测器的信号又依次以所选择的频率放大。该装置包括用于调制脉冲激光信号的光斩波器和用于放大来自空中图像检测器的信号的锁定放大器。

10. 发明授权

US6159643A Extreme ultraviolet lithography reflective mask 有权
标题翻译：极紫外光刻反光罩
公开(公告)号：US6159643A
公开(公告)日：2000-12-12
申请号：US258959
申请日：1999-03-01
申请人： Harry Levinson , Khanh B. Nguyen
发明人： Harry Levinson , Khanh B. Nguyen
IPC分类号： G03F1/00 , G03F1/24 , G03F1/60 , G03F9/00
CPC分类号： B82Y40/00 , B82Y10/00 , G03F1/24 , G03F1/60
摘要： A reflective lithography mask (12) includes a pattern-producing portion (200) and a substrate (300) supporting the pattern-producing portion on its top surface. The pattern-producing portion has reflective regions and non-reflective regions corresponding to a desired circuit pattern. The substrate (300) comprises a top layer (306) having a top surface with an optical flatness in the range of at least a quarter-wavelength and a bottom layer (304) having a coefficient of thermal expansion less than about 1.0 ppm/.degree. C. The reflective mask (12) is used in a lithography method to delineate a latent image of a desired circuit pattern (preferably having design rules of 0.18 .mu.m and less) onto a wafer (14) by illuminating the mask (12) with radiation (preferably having a wavelength of 3 nm to 50 nm) so as to reflect radiation from the reflective regions of the mask onto the wafer (14).
摘要翻译：反射光刻掩模（12）包括在其顶表面上支撑图案产生部分的图案产生部分（200）和基底（300）。图案产生部分具有对应于期望的电路图案的反射区域和非反射区域。衬底（300）包括顶层（306），其具有在至少四分之一波长的范围内的光学平坦度的顶表面和具有小于约1.0ppm /℃的热膨胀系数的底层（304）反射掩模（12）以光刻方法用于通过用掩模（12）照射掩模（12）将所需电路图案的潜像（优选具有0.18μm及更小的设计规则）描绘到晶片（14）上。辐射（优选具有3nm至50nm的波长），以便将来自掩模的反射区域的辐射反射到晶片（14）上。

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