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1. 发明申请

WO2009090007A3 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：WO2009090007A3
公开(公告)日：2009-09-24
申请号：PCT/EP2009000049
申请日：2009-01-08
申请人： ZEISS CARL SMT AG , HOEGELE ARTUR
发明人： HOEGELE ARTUR
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70066
摘要： An illumination system of a microlithographic projection exposure apparatus (10) has a pupil plane (54), an object plane (62) and a mask plane (68) in which a mask (16) to be illuminated can be arranged. The illumination system has an optical system (170; 270; 370) consisting of a condenser (60; 160; 260; 360) that produces a Fourier relationship between the pupil plane (54) and the object plane (62). The system further has a field stop objective (66; 166; 266; 366) that optically conjugates the object plane (62) to the mask plane (68). According to the invention the optical system (170; 270; 370) has a negative Petzval sum with an absolute value of less than 0.0032 1/mm and preferably of less than 0.0026 1/mm. This ensures small telecentricity errors and a good pole balance.
摘要翻译：微光刻投影曝光装置（10）的照明系统具有瞳孔平面（54），物平面（62）和掩模平面（68），可以布置要被照射的掩模（16）。所述照明系统具有由在所述瞳孔平面（54）和所述物体平面（62）之间产生傅立叶关系的冷凝器（60; 160; 260; 360）组成的光学系统（170; 270; 370）。系统还具有将物平面（62）与掩模平面（68）光学共轭的场停止物镜（66; 166; 266; 366）。根据本发明，光学系统（170; 270; 370）具有绝对值小于0.00321 / mm，优选小于0.0026l / mm的负Petzval和。这确保了小的远心误差和良好的极平衡。

2. 发明申请

WO2012089581A3 ABBILDUNGSSYSTEM UND ABBILDUNGSVERFAHREN 审中-公开
公开(公告)号：WO2012089581A3
公开(公告)日：2012-07-05
申请号：PCT/EP2011/073584
申请日：2011-12-21
申请人： CARL ZEISS AG , CARL ZEISS MEDITEC AG , PRETORIUS, Marco , SEESSELBERG, Markus , HOEGELE, Artur , NIETEN, Christoph , GEISSLER, Enrico
发明人： PRETORIUS, Marco , SEESSELBERG, Markus , HOEGELE, Artur , NIETEN, Christoph , GEISSLER, Enrico
IPC分类号： G02B21/00 , G02B21/22 , G02B27/00 , G02B21/36
摘要： Es wird bereitgestellt ein Abbildungssystem mit einer Abbildungsoptik (2) zum Abbilden eines Objektes (4) in eine Bildebene, wobei die Abbildungsoptik (2) für eine höhere Schärfentiefe eine optische Komponente (7) enthält, deren Brechkraft änderbar ist und deren optische Wirkung dabei rotationssymmetrisch bleibt.

3. 发明申请

WO2008037496A3 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS WITH IMPROVED IMAGING PROPERTIES AND METHOD FOR IMPROVING THE IMAGING PROPERTIES OF THE PROJECTION OBJECTIVE 审中-公开
公开(公告)号：WO2008037496A3
公开(公告)日：2008-04-03
申请号：PCT/EP2007/008476
申请日：2007-09-28
申请人： CARL ZEISS SMT AG , BECKENBACH, Mariella , RIEF, Klaus , BERTELE, Andreas , SIGEL, Benjamin , BLEIDISTEL, Sascha , HUMMEL, Wolfgang , FROMMEYER, Andreas , GRUNER, Toralf , SCHWAER, Jochen , SCHWAER, Baerbel , SCHLETTERER, Thomas , HOEGELE, Artur , SCHOEPPACH, Armin
发明人： BECKENBACH, Mariella , RIEF, Klaus , BERTELE, Andreas , SIGEL, Benjamin , BLEIDISTEL, Sascha , HUMMEL, Wolfgang , FROMMEYER, Andreas , GRUNER, Toralf , SCHWAER, Jochen , SCHWAER, Baerbel , SCHLETTERER, Thomas , HOEGELE, Artur , SCHOEPPACH, Armin
IPC分类号： G03F7/20 , G02B7/02
摘要： A projection objective for microlithography comprises a plurality of lenses (32, 34, 36, 38, 42) which in each case have a local optical axis (40), a first manipulator (60) with a first actuator (46, 72) and at least one second actuator (48, 74) being assigned to at least one first lens (42) from the plurality of lenses (32, 34, 36, 38). A first force input and/or moment input can be realized by means of the first actuator (46, 72) and a second force input and/or moment input can be realized by means of the second actuator (48, 74), wherein the first force input and/or moment input and the second force input and/or moment input differ with regard to at least one of the parameters: intensity of the force and/or moment input, direction of the force input relative to the local optical axis (40), direction of the moment input relative to a periphery of the first lens (42).

4. 发明申请

WO2012159752A3 MICROSCOPY SYSTEM FOR EYE EXAMINATION AND METHOD FOR OPERATING A MICROSCOPY SYSTEM 审中-公开
标题翻译：观测系统进行眼科检查和一种用于操作观测系统
公开(公告)号：WO2012159752A3
公开(公告)日：2013-04-11
申请号：PCT/EP2012002204
申请日：2012-05-23
申请人： ZEISS CARL MEDITEC AG , HAUGER CHRISTOPH , HOEGELE ARTUR
发明人： HAUGER CHRISTOPH , HOEGELE ARTUR
IPC分类号： A61B3/13 , A61B3/00 , A61B3/117 , A61B19/00 , G02B21/00
CPC分类号： A61B3/1176 , A61B3/0025 , A61B3/132 , A61B90/20 , A61B2090/306 , G02B21/082 , G02B21/22
摘要： The invention relates to a microscopy system for eye examination, comprising an illumination optics that is designed to generate a first illuminating beam path of the illumination optics in order to direct a first part of the illuminating light onto the object plane and to generate a second illuminating beam path of the illumination optics in order to direct a second part of the illuminating light onto the object plane. The illumination optics is also designed such that, for the first and the second illuminating beam path, the following applies respectively: D s sin(alpha)
摘要翻译：眼科检查显微镜系统，包括：被设计为产生照明光学部件的第一照明光束路径引导照明光的第一部分到所述物体面，和以产生所述照明光学系统的第二照明光束路径，照明光对的第二部分的照明光学系统对象水平转向; 其中，所述照明光学系统被进一步配置为使得每个适用于第一和第二照明光束路径：D的罪（阿尔法）

5. 发明申请

WO2008037496A2 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS WITH IMPROVED IMAGING PROPERTIES AND METHOD FOR IMPROVING THE IMAGING PROPERTIES OF THE PROJECTION OBJECTIVE 审中-公开
标题翻译：具有改进成像性能的微型成像设备的投影目标和用于改善投影目标的成像性质的方法
公开(公告)号：WO2008037496A2
公开(公告)日：2008-04-03
申请号：PCT/EP2007008476
申请日：2007-09-28
申请人： ZEISS CARL SMT AG , BECKENBACH MARIELLA , RIEF KLAUS , BERTELE ANDREAS , SIGEL BENJAMIN , BLEIDISTEL SASCHA , HUMMEL WOLFGANG , FROMMEYER ANDREAS , GRUNER TORALF , SCHWAER JOCHEN , SCHWAER BAERBEL , SCHLETTERER THOMAS , HOEGELE ARTUR , SCHOEPPACH ARMIN
发明人： BECKENBACH MARIELLA , RIEF KLAUS , BERTELE ANDREAS , SIGEL BENJAMIN , BLEIDISTEL SASCHA , HUMMEL WOLFGANG , FROMMEYER ANDREAS , GRUNER TORALF , SCHWAER JOCHEN , SCHWAER BAERBEL , SCHLETTERER THOMAS , HOEGELE ARTUR , SCHOEPPACH ARMIN
IPC分类号： G03F7/20
CPC分类号： G03F7/70825 , G02B7/023 , G02B13/14 , G02B27/0068 , G03F7/70058 , G03F7/70266
摘要： A projection objective for microlithography comprises a plurality of lenses (32, 34, 36, 38, 42) which in each case have a local optical axis (40), a first manipulator (60) with a first actuator (46, 72) and at least one second actuator (48, 74) being assigned to at least one first lens (42) from the plurality of lenses (32, 34, 36, 38). A first force input and/or moment input can be realized by means of the first actuator (46, 72) and a second force input and/or moment input can be realized by means of the second actuator (48, 74), wherein the first force input and/or moment input and the second force input and/or moment input differ with regard to at least one of the parameters: intensity of the force and/or moment input, direction of the force input relative to the local optical axis (40), direction of the moment input relative to a periphery of the first lens (42).
摘要翻译：用于微光刻的投影物镜包括多个分别具有局部光轴（40）的透镜（32,34,36,38,42），具有第一致动器（46,72）的第一机械手（60）和至少一个第二致动器（48,74）被分配给来自所述多个透镜（32,34,36,38）中的至少一个第一透镜（42）。借助第一致动器（46,72）可以实现第一力输入和/或力矩输入，并且借助第二致动器（48,74）可以实现第二力输入和/或力矩输入，其中，第一力输入和/或力矩输入以及第二力输入和/或力矩输入相对于至少一个参数不同：力和/或力矩输入的强度，力输入相对于局部光轴的方向（40），所述力矩输入相对于所述第一透镜（42）的周边的方向。

6. 发明申请

WO2012089581A2 IMAGING SYSTEM AND IMAGING METHOD 审中-公开
标题翻译：图像系统和图像处理
公开(公告)号：WO2012089581A2
公开(公告)日：2012-07-05
申请号：PCT/EP2011073584
申请日：2011-12-21
申请人： ZEISS CARL AG , ZEISS CARL MEDITEC AG , PRETORIUS MARCO , SEESSELBERG MARKUS , HOEGELE ARTUR , NIETEN CHRISTOPH , GEISSLER ENRICO
发明人： PRETORIUS MARCO , SEESSELBERG MARKUS , HOEGELE ARTUR , NIETEN CHRISTOPH , GEISSLER ENRICO
IPC分类号： G02B21/00 , G02B21/22 , G02B21/36 , G02B27/00
CPC分类号： G02B21/365 , A61B3/13 , G02B21/0012 , G02B21/22 , G02B21/367 , G02B27/0075
摘要： Disclosed is an imaging system comprising an imaging lens arrangement (2) for representing an object (4) on an image plane. In order to increase the depth of field, said imaging lens arrangement (2) includes an optical component (7), the refractive power of which can be modified and the optical effect of which remains rotationally symmetrical.
摘要翻译：提供了一种成像系统，包括成像光学系统（2）用于在图像平面成像的物体（4），所述成像光学系统（2）用于光学部件的更高的深度（7），其折射光焦度可以改变和它们的光学作用，从而旋转对称仍然存在。

7. 发明申请

WO2011147570A8 DEVICE AND METHOD FOR CATARACT SURGERY 审中-公开
标题翻译：用于诱导手术的装置和方法
公开(公告)号：WO2011147570A8
公开(公告)日：2012-03-08
申请号：PCT/EP2011002608
申请日：2011-05-26
申请人： ZEISS CARL MEDITEC AG , KASCHKE MICHAEL , MONZ LUDWIN , DAMM TOBIAS , MUEHLHOFF DIRK , REIN KARLHEINZ , STOBRAWA GREGOR , DICK MANFRED , KUEHNER MARTIN , HOEGELE ARTUR , REICH MATTHIAS , GREBNER DIETER
发明人： KASCHKE MICHAEL , MONZ LUDWIN , DAMM TOBIAS , MUEHLHOFF DIRK , REIN KARLHEINZ , STOBRAWA GREGOR , DICK MANFRED , KUEHNER MARTIN , HOEGELE ARTUR , REICH MATTHIAS , GREBNER DIETER
IPC分类号： A61F9/007 , A61F9/008
CPC分类号： A61F9/008 , A61B2018/20351 , A61F9/00736 , A61F9/009
摘要： The invention relates to improvements in respect of performing cataract surgery, and the result thereof, by means of a laser system. More particularly, it relates to a device for cataract surgery, comprising a surgical microscope or stereo microscope and a laser source, in which a module, consisting of a laser-coupling/deflecting unit, a laser-scan unit, and a focusing unit, can be attached to the surgical microscope or stereo microscope, in which at least one of these units can selectively be introduced between surgical microscope and eye, and in which the focusing unit can scan a depth-of-focus range of greater than 1 mm.
摘要翻译：本发明涉及通过激光系统进行白内障手术的改进及其结果。更具体地，本发明涉及一种用于白内障手术的装置，包括手术显微镜或立体显微镜和激光源，其中由激光耦合/偏转单元，激光扫描单元和聚焦单元组成的模块，可以附接到手术显微镜或立体显微镜，其中这些单元中的至少一个可以选择性地引入手术显微镜和眼睛之间，并且其中聚焦单元可以扫描大于1mm的深度聚焦范围。

8. 发明申请

WO2009135586A1 ILLUMINATION SYSTEM COMPRISING A FOURIER OPTICAL SYSTEM 审中-公开
标题翻译：包含四光系统的照明系统
公开(公告)号：WO2009135586A1
公开(公告)日：2009-11-12
申请号：PCT/EP2009/002824
申请日：2009-04-17
申请人： CARL ZEISS SMT AG , SCHWAB, Markus , LAYH, Michael , DEGUENTHER, Markus , HOEGELE, Artur
发明人： SCHWAB, Markus , LAYH, Michael , DEGUENTHER, Markus , HOEGELE, Artur
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70075
摘要： An illumination system (190) for a microlithography projection exposure apparatus (100) for illuminating an illumination field (165) with the light from a primary light source (102) has a variably adjustable pupil shaping unit (150) for receiving light from the primary light source (102) and for generating a variably adjustable two-dimensional intensity distribution in a pupil shaping surface (110) of the illumination system. The pupil shaping unit (150) has a Fourier optical system (500) for converting an entrance beam bundle (105) entering through an entrance plane of the Fourier optical system into an exit beam bundle exiting from an exit plane of the Fourier optical system. The Fourier optical system has a focal length f FOS and a structural length L measured between an entrance-side first system surface and an exit-side last system surface along an optical axis and the condition (L/f FOS )
摘要翻译：用于利用来自主光源（102）的光照射照明场（165）的微光刻投影曝光设备（100）的照明系统（190）具有可变调节的瞳孔成形单元（150），用于接收来自主光源光源（102）并且用于在照明系统的光瞳成形表面（110）中产生可变地调节的二维强度分布。瞳孔成形单元（150）具有傅立叶光学系统（500），用于将通过傅立叶光学系统的入射面进入的入射光束束（105）转换成从傅立叶光学系统的出射平面离开的出射光束束。傅立叶光学系统具有焦距fFOS和沿着光轴在入射侧第一系统表面和出射侧最后系统表面之间测量的结构长度L，并且条件（L / fFOS）<1/6成立。

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