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    • 6. 发明授权
    • MuGFET switch
    • MuGFET开关
    • US08492796B2
    • 2013-07-23
    • US11685346
    • 2007-03-13
    • Gerhard Knoblinger
    • Gerhard Knoblinger
    • H01L27/118H01L27/148
    • H01L29/785H01L27/1211
    • An electronic circuit on a semiconductor substrate having isolated multiple field effect transistor circuit blocks is disclosed. In some embodiment, an apparatus includes a substrate, a first semiconductor circuit formed above the substrate, a second semiconductor circuit formed above the substrate, and a MuGFET device overlying the substrate and electrically coupled to the first semiconductor circuit and the second semiconductor circuit, wherein the MuGFET device provides a signal path between the first semiconductor circuit and the second semiconductor circuit in response to an input signal.
    • 公开了具有隔离的多个场效应晶体管电路块的半导体衬底上的电子电路。 在一些实施例中,一种装置包括衬底,形成在衬底上方的第一半导体电路,形成在衬底上方的第二半导体电路以及覆盖衬底并电耦合到第一半导体电路和第二半导体电路的MuGFET器件,其中 MuGFET器件响应于输入信号在第一半导体电路和第二半导体电路之间提供信号路径。
    • 9. 发明授权
    • Method for producing a thyristor
    • 晶闸管的制造方法
    • US08450156B2
    • 2013-05-28
    • US13481969
    • 2012-05-29
    • Harald GossnerThomas SchulzChristian RussGerhard Knoblinger
    • Harald GossnerThomas SchulzChristian RussGerhard Knoblinger
    • H01L21/332
    • H01L29/78624H01L21/26586H01L21/84H01L27/0262H01L27/1203H01L29/66393H01L29/7436H01L29/78696H01L2924/0002H01L2924/00
    • In a method for producing a thyristor, first and second connection regions are formed on or above a substrate; the first connection region is doped with dopant atoms of a first conductivity type and the second connection region is doped with dopant atoms of a second conductivity type; first and second body regions are formed between the connection regions, wherein the first body region is formed between the first connection region and second body region, and the second body region is formed between the first body region and second connection region; the first body region is doped with dopant atoms of the second conductivity type and the second body region is doped with dopant atoms of the first conductivity type, wherein the dopant atoms are in each case introduced into the respective body region using a Vt implantation method; a gate region is formed on or above the body regions.
    • 在晶闸管的制造方法中,在基板上或上方形成有第一和第二连接区域, 第一连接区域掺杂有第一导电类型的掺杂剂原子,并且第二连接区域掺杂有第二导电类型的掺杂剂原子; 第一和第二体区域形成在连接区域之间,其中第一体区形成在第一连接区域和第二体区域之间,第二体区域形成在第一体区域和第二连接区域之间; 所述第一体区掺杂有所述第二导电类型的掺杂剂原子,并且所述第二体区掺杂有所述第一导电类型的掺杂剂原子,其中所述掺杂剂原子在每种情况下使用Vt注入方法引入相应的体区; 在身体区域上或上方形成栅极区域。