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1. 发明专利

BR9707327A 未知
公开(公告)号：BR9707327A
公开(公告)日：1999-04-13
申请号：BR9707327
申请日：1997-12-02
申请人： ATSUSHI SUDO , AKIRA IWAMOTO , KAZUO SHIRAISHI , KOICHI WADA , YOSHIMASA SEO , HIROYOSHI NOWATARI , FUMIO SAKAI
发明人： SUDO ATSUSHI , IWAMOTO AKIRA , SHIRAISHI KAZUO , WADA KOICHI , SEO YOSHIMASA , NOWATARI HIROYOSHI , SAKAI FUMIO
IPC分类号： B01J23/88 , B01J8/06 , B01J23/31 , B01J23/887 , C07B61/00 , C07C27/14 , C07C45/35 , C07C47/22 , C07C51/25 , C07C57/05 , B01J27/192
摘要： The present invention concerns a method for producing acrolein and acrylic acid by carrying out vapor phase catalytic oxidation of propylene with molecular oxygen or a gas containing molecular oxygen using a oxidation catalysts comprising Mo, Bi and Fe as an essentially element and a fixed bed multitubular reactor, which comprises a) using a plurality of supported catalysts having different activities, which was obrtained, for example, by different calcination method in the production process of the supported catalysts, b) setting a catalyst layer in a reaction tube, which is formed by dividing it into plural portions in the tube axial direction, and c) arranging the aforementioned plural supported catalysts in such order that the activity becomes high toward the outlet from the inlet of the material gas in the reaction tube axial direction. According to the present invention, the generation of hot spot can be avoided and over oxidation reaction can be avoided and the acrolein and acrylic acid are produced constantly for a prolonged period of time.

2. 发明授权

US5929275A Catalyst and process for producing unsaturated aldehyde and unsaturated acid 失效
标题翻译：用于生产不饱和醛和不饱和酸的催化剂和方法
公开(公告)号：US5929275A
公开(公告)日：1999-07-27
申请号：US853215
申请日：1997-05-09
申请人： Koichi Wada , Akira Iwamoto , Yoshimasa Seo , Atsusi Sudo , Fumio Sakai , Kazuo Shiraishi , Hideaki Miki
发明人： Koichi Wada , Akira Iwamoto , Yoshimasa Seo , Atsusi Sudo , Fumio Sakai , Kazuo Shiraishi , Hideaki Miki
IPC分类号： B01J23/88 , B01J23/887 , B01J35/08 , B01J37/00 , B01J37/02 , C07B61/00 , C07C27/14 , C07C45/35 , C07C45/37 , C07C45/38 , C07C47/22 , C07C51/25 , C07C51/275 , C07C57/05 , C07C51/16 , B01J23/16 , C07C45/32
CPC分类号： C07C45/37 , B01J23/002 , B01J23/8876 , B01J37/0223 , C07C45/35 , C07C51/252 , B01J2523/00
摘要： A catalyst for the production of unsaturated aldehyde and unsaturated acid, obtained by loading a catalytically active component on a carrier and calcining the loaded catalyst, characterized by an average particle diameter of the catalyst of 4 to 16 mm, an average particle diameter of the carrier of 3 to 12 mm, a calcining temperature of 520 to 600.degree. C. and an amount of the catalytically active component loaded on the carrier of 5 to 80% by weight �weight of the catalytically active component)/(weight of the catalytically active component+weight of the carrier+weight of a strength improver)!, and a process for producing unsaturated aldehyde and unsaturated acid with the catalyst.
摘要翻译：用于生产不饱和醛和不饱和酸的催化剂，其通过将催化活性组分负载在载体上并煅烧负载的催化剂而获得，其特征在于催化剂的平均粒径为4至16mm，载体的平均粒径 3至12mm，煅烧温度为520-600℃，负载在载体上的催化活性组分的量为5-80重量％[催化活性组分的重量] /（催化活性组分的重量）组分+载体重量+强度改进剂的重量）]以及用催化剂生产不饱和醛和不饱和酸的方法。

3. 发明授权

US5751404A Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates 失效
标题翻译：曝光装置和方法，其中通过比较入射在标线片台和晶片台参考板上的标记进行对准
公开(公告)号：US5751404A
公开(公告)日：1998-05-12
申请号：US684100
申请日：1996-07-22
申请人： Eiichi Murakami , Fumio Sakai , Shigeyuki Uzawa , Shigeki Ogawa , Tetsuya Mori
发明人： Eiichi Murakami , Fumio Sakai , Shigeyuki Uzawa , Shigeki Ogawa , Tetsuya Mori
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G02B11/00 , G03B27/32 , G03B27/52
CPC分类号： G03F7/70691 , G03F7/70358 , G03F9/7015
摘要： A scanning exposure apparatus includes a first movable stage being movable while carrying a first object thereon, a second movable stage being movable while carrying a second object thereon, a projection optical system for projecting a pattern, a control system serviceable to scan the first and second movable stages in a timed relation and relative to the projection optical system and to project a pattern of the first object onto the second object through the projection optical system, a first reference plate fixedly mounted on the first movable stage, a second reference plate fixedly mounted on the second movable stage, and a detecting system serviceable to scan at least one of the first and second movable stages to detect a relative positional relationship between alignment marks of the first and second reference plates to thereby determine a scan direction of one of the first and second movable stages.
摘要翻译：一种扫描曝光装置，包括：可移动的第一可移动台，其上携带有第一物体;可移动的第二可移动台，其上携带有第二物体;投影光学系统，用于投影图案;可控制的扫描第一和第二物体的控制系统以相对于投影光学系统的定时关系的可移动台阶，并且通过投影光学系统将第一物体的图案投射到第二物体上，固定地安装在第一可移动台上的第一参考板，固定地安装在第二参考板上的第二参考板在第二可移动台上，以及检测系统，其能够扫描第一和第二可移动台中的至少一个，以检测第一和第二参考板的对准标记之间的相对位置关系，从而确定第一和第二可移动台之一的扫描方向和第二可动台。

4. 发明授权

US4952060A Alignment method and a projection exposure apparatus using the same 失效
标题翻译：对准方法和使用其的投影曝光装置
公开(公告)号：US4952060A
公开(公告)日：1990-08-28
申请号：US463886
申请日：1990-01-10
申请人： Hideki Ina , Fumio Sakai , Hitoshi Nakano
发明人： Hideki Ina , Fumio Sakai , Hitoshi Nakano
IPC分类号： H01L21/30 , G03F9/00 , H01L21/027 , H01L21/67 , H01L21/68
CPC分类号： G03F9/7084
摘要： A projection exposure apparatus is disclosed for exposing a semiconductor wafer to a pattern, formed on a reticle, by projection using a projection lens system. The apparatus includes an alignment optical system disposed at a side of the wafer remote from the projection lens system. The alignment optical system is used to detect an alignment mark provided on the wafer, from the back of the wafer. In accordance with the detection, the wafer is moved so that its alignment mark is brought into a predetermined positional relation with the alignment optical system, whereby the reticle and the wafer are relatively aligned. With this arrangement, the wafer alignment mark can be detected without being adversely affected by a resist layer applied to the wafer surface. Thus, the reticle and the wafer can be aligned very accurately.
摘要翻译：公开了一种投影曝光装置，用于通过使用投影透镜系统的投影将半导体晶片暴露于形成在掩模版上的图案。该装置包括配置在远离投影透镜系统的晶片侧的对准光学系统。对准光学系统用于从晶片的背面检测设置在晶片上的对准标记。根据检测，移动晶片使其对准标记与取向光学系统成预定的位置关系，由此标线片和晶片相对对准。利用这种布置，可以检测晶片对准标记，而不受施加到晶片表面的抗蚀剂层的不利影响。因此，可以非常准确地对准标线片和晶片。

5. 发明授权

US4012449A Production of methacrolein and oxidation catalyst used therefor 失效
标题翻译：用于此的甲基丙烯醛和氧化催化剂的生产
公开(公告)号：US4012449A
公开(公告)日：1977-03-15
申请号：US628658
申请日：1975-11-04
申请人： Yoshihisa Shikakura , Fumio Sakai , Hitoshi Shimizu
发明人： Yoshihisa Shikakura , Fumio Sakai , Hitoshi Shimizu
IPC分类号： C07C47/22 , B01J21/02 , B01J23/84 , B01J23/887 , C07B61/00 , C07C45/00 , C07C45/35 , C07C45/37 , C07C67/00 , C07C45/16 , C07C45/02
CPC分类号： C07C45/35 , B01J23/8876 , C07C45/37 , B01J2523/00
摘要： An oxidation catalyst having the general formula:Co.sub.a Fe.sub.b Bi.sub.c B.sub.d Sb.sub.e Ni.sub.f J.sub.g Mo.sub.h O.sub.iin which J represents at least one of the elements potassium, rubidium, and cesium, and the suffixes a, b, c, d, e, f, g, h, and i represent the numbers of cobalt, iron, bismuth, boron, antimony, nickel, J, molybdenum, and oxygen atoms, respectively, when h is 12, a is 1 to 15, b 0.3 to 8, c 0.1 to 7, d 0.1 to 3, e 0.01 to 1, f 0 to 5, g 0 to 1 (exclusive of 0), and i is 38 to 92 and is determined by total valences of other elements. There is also provided a process for manufacturing methacrolein by oxidizing isobutylene and/or tertiary butyl alcohol with molecular oxygen, characterized in that the reaction is carried out in the presence of the catalyst as defined above.
摘要翻译：具有以下通式的氧化催化剂：

6. 发明授权

US08586785B2 Process for producing catalyst for methacrylic acid production and process for producing methacrylic acid 有权
标题翻译：生产甲基丙烯酸催化剂的方法和生产甲基丙烯酸的方法
公开(公告)号：US08586785B2
公开(公告)日：2013-11-19
申请号：US13298645
申请日：2011-11-17
申请人： Atsushi Sudo , Kazuo Shiraishi , Hideki Sugi , Hiroyoshi Nowatari , Fumio Sakai , Tomoaki Kobayashi , Tatsuhiko Kurakami
发明人： Atsushi Sudo , Kazuo Shiraishi , Hideki Sugi , Hiroyoshi Nowatari , Fumio Sakai , Tomoaki Kobayashi , Tatsuhiko Kurakami
IPC分类号： C07C51/16 , B01J27/199 , B01J27/19
CPC分类号： B01J37/0219 , B01J23/002 , B01J27/199 , B01J37/0045 , B01J37/0221 , B01J2523/00 , C07C51/252 , B01J2523/17 , B01J2523/51 , B01J2523/52 , B01J2523/55 , B01J2523/68 , C07C57/04
摘要： An object of the present invention is to provide a process for stably producing a catalyst for methacrylic acid production exhibiting high activity and high performance. The process for producing a catalyst for methacrylic acid production of the invention is characterized in that the water content of the catalyst ingredient powder for use in molding, temperature and humidity of a molding step, humidity and temperature of a baking step are individually controlled in the case where molding is performed by a coating method using an Mo—V—P—Cu-based hetero polyacid as an active ingredient and water or an alcohol and/or an aqueous solution of an alcohol as a binder.
摘要翻译：本发明的目的是提供稳定地生产表现出高活性和高性能的甲基丙烯酸生产催化剂的方法。本发明的甲基丙烯酸制造用催化剂的制造方法的特征在于，在成型步骤中使用的成型用的催化剂成分粉末，成型步骤的温度和湿度，烘烤步骤的湿度和温度的含水量分别控制在通过使用Mo-VP-Cu系杂多酸作为活性成分的涂布方法和水或醇和/或醇的水溶液作为粘合剂进行成型的情况。

7. 发明申请

US20120313293A1 IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD 有权
标题翻译：印刷方法，印刷装置和制品制造方法
公开(公告)号：US20120313293A1
公开(公告)日：2012-12-13
申请号：US13490547
申请日：2012-06-07
申请人： Kohei Wakabayashi , Hideki Matsumoto , Fumio Sakai , Makoto Mizuno
发明人： Kohei Wakabayashi , Hideki Matsumoto , Fumio Sakai , Makoto Mizuno
IPC分类号： B28B1/14 , B28B13/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method of performing an imprint process on each of a plurality of shot regions of a substrate, wherein each shot region includes at least one of at least one valid chip area and at least one invalid chip area, the invalid chip area including an inhibited area in which resin coating is inhibited, the imprint process for a shot region including both the invalid chip area and the valid chip area includes coating the valid chip area of the shot region with the resin, bringing a pattern surface of a mold into contact with the resin, and curing the resin, and in the step of coating, at least the inhibited area of the invalid chip area is not coated with the resin.
摘要翻译：一种对基板的多个拍摄区域中的每一个进行压印处理的方法，其中每个拍摄区域包括至少一个有效芯片区域和至少一个无效芯片区域中的至少一个，所述无效芯片区域包括禁止区域在其中树脂涂层被抑制的情况下，包括无效芯片面积和有效芯片面积的射击区域的压印处理包括用树脂涂覆射出区域的有效芯片面积，使得模具的图案表面与树脂，并固化树脂，并且在涂布步骤中，至少无效芯片区域的禁止区域未被树脂涂覆。

8. 发明申请

US20120065427A1 Process For Producing Catalyst For Methacrylic Acid Production And Process For Producing Methacrylic Acid 有权
标题翻译：用于生产甲基丙烯酸生产催化剂的方法和生产甲基丙烯酸的方法
公开(公告)号：US20120065427A1
公开(公告)日：2012-03-15
申请号：US13298645
申请日：2011-11-17
申请人： Atsushi Sudo , Kazuo Shiraishi , Hideki Sugi , Hiroyoshi Nowatari , Fumio Sakai , Tomoaki Kobayashi , Tatsuhiko Kurakami
发明人： Atsushi Sudo , Kazuo Shiraishi , Hideki Sugi , Hiroyoshi Nowatari , Fumio Sakai , Tomoaki Kobayashi , Tatsuhiko Kurakami
IPC分类号： C07C51/16 , B01J27/199
CPC分类号： B01J37/0219 , B01J23/002 , B01J27/199 , B01J37/0045 , B01J37/0221 , B01J2523/00 , C07C51/252 , B01J2523/17 , B01J2523/51 , B01J2523/52 , B01J2523/55 , B01J2523/68 , C07C57/04
摘要： An object of the present invention is to provide a process for stably producing a catalyst for methacrylic acid production exhibiting high activity and high performance. The process for producing a catalyst for methacrylic acid production of the invention is characterized in that the water content of the catalyst ingredient powder for use in molding, temperature and humidity of a molding step, humidity and temperature of a baking step are individually controlled in the case where molding is performed by a coating method using an Mo—V—P—Cu-based hetero polyacid as an active ingredient and water or an alcohol and/or an aqueous solution of an alcohol as a binder.
摘要翻译：本发明的目的是提供稳定地生产表现出高活性和高性能的甲基丙烯酸生产催化剂的方法。本发明的甲基丙烯酸制造用催化剂的制造方法的特征在于，在成型步骤中使用的成型用的催化剂成分粉末，成型步骤的温度和湿度，烘烤步骤的湿度和温度的含水量分别控制在通过使用Mo-V-P-Cu系杂多酸作为活性成分的涂布法和水或醇和/或醇的水溶液作为粘合剂进行成型的情况。

9. 发明授权

US5774310A Magnetic head and magnetic recording apparatus which prevent generation of a false magnetic head tending to disturb a previously formed magnetic recording track 失效
标题翻译：磁头和磁记录装置，其防止产生假磁头倾向于干扰预先形成的磁记录磁道
公开(公告)号：US5774310A
公开(公告)日：1998-06-30
申请号：US704242
申请日：1996-08-28
申请人： Shigeyoshi Takai , Fumio Sakai
发明人： Shigeyoshi Takai , Fumio Sakai
IPC分类号： G11B5/265 , G11B5/008 , G11B5/127 , G11B5/187 , G11B5/23
CPC分类号： G11B5/1871 , G11B5/008
摘要： In a magnetic head including, a pair of magnetic cores, one of the magnetic cores including a first corner portion, a second corner portion and an end portion between the first and second corner portions, and another one of the magnetic cores including a third corner portion, a fourth corner portion and another end portion between the third and fourth corner portions, the first and third corner portions being opposite to each other, the second and fourth corner portions being opposite to each other, the end portion and the another end portion being opposite to each other, and high-saturation-magnetic-flux-density layers, one of the high-saturation-magnetic-flux-density layers covering the end portion and another one of the high-saturation-magnetic-flux-density layers covering the another end portion, wherein a thickness of the high-saturation-magnetic-flux-density layer on at least one of the first, second, third and fourth corner portions within an important area for preventing a false magnetic head is prevented from being less than 0.5 .mu.m.
摘要翻译：在包括一对磁芯的磁头中，一个磁芯包括第一角部，第二角部和第一和第二角部之间的端部，另一个磁芯包括第三角部第四角部和第三角部与第四角部之间的另一端部，第一和第三角部彼此相对，第二和第四角部彼此相对，端部和另一端部彼此相对的高饱和磁通密度层和高饱和磁通密度层，高饱和磁通密度层中的一个高饱和磁通密度层覆盖端部，另一个高饱和磁通密度层覆盖另一端部，其中在重要区域内的第一，第二，第三和第四角部中的至少一个上的高饱和磁通密度层的厚度用于防止假 e磁头防止小于0.5微米。

10. 发明授权

US5734462A Exposure apparatus and exposure method 失效
标题翻译：曝光装置和曝光方法
公开(公告)号：US5734462A
公开(公告)日：1998-03-31
申请号：US521442
申请日：1995-08-30
申请人： Fumio Sakai
发明人： Fumio Sakai
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42
CPC分类号： G03F9/7003 , G03F7/70425 , G03F7/70433 , G03F7/70458
摘要： An alignment method and apparatus is disclosed wherein, in one exposure process, alignment of a semiconductor substrate may be performed and, while moving the semiconductor substrate in a step-and-repeat manner in relation to shot positions on the semiconductor substrate, a pattern of an original may be printed on the semiconductor substrate at the respective shot position, wherein the one exposure process may be performed while using a plurality of placement data each specifying positions with respect to which the semiconductor substrate is to be positioned during the step-and-repeat motion.
摘要翻译：公开了一种对准方法和装置，其中在一个曝光工艺中，可以执行半导体衬底的对准，并且在半导体衬底相对于半导体衬底上的镜头位置以分步重复的方式移动半导体衬底时，可以在相应的拍摄位置在半导体衬底上印刷原稿，其中可以在使用多个放置数据的同时执行一次曝光处理，该多个放置数据指定在阶梯形放映期间半导体衬底将要被定位的位置，重复运动。

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