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1. 发明授权

US5929275A Catalyst and process for producing unsaturated aldehyde and unsaturated acid 失效
标题翻译：用于生产不饱和醛和不饱和酸的催化剂和方法
公开(公告)号：US5929275A
公开(公告)日：1999-07-27
申请号：US853215
申请日：1997-05-09
申请人： Koichi Wada , Akira Iwamoto , Yoshimasa Seo , Atsusi Sudo , Fumio Sakai , Kazuo Shiraishi , Hideaki Miki
发明人： Koichi Wada , Akira Iwamoto , Yoshimasa Seo , Atsusi Sudo , Fumio Sakai , Kazuo Shiraishi , Hideaki Miki
IPC分类号： B01J23/88 , B01J23/887 , B01J35/08 , B01J37/00 , B01J37/02 , C07B61/00 , C07C27/14 , C07C45/35 , C07C45/37 , C07C45/38 , C07C47/22 , C07C51/25 , C07C51/275 , C07C57/05 , C07C51/16 , B01J23/16 , C07C45/32
CPC分类号： C07C45/37 , B01J23/002 , B01J23/8876 , B01J37/0223 , C07C45/35 , C07C51/252 , B01J2523/00
摘要： A catalyst for the production of unsaturated aldehyde and unsaturated acid, obtained by loading a catalytically active component on a carrier and calcining the loaded catalyst, characterized by an average particle diameter of the catalyst of 4 to 16 mm, an average particle diameter of the carrier of 3 to 12 mm, a calcining temperature of 520 to 600.degree. C. and an amount of the catalytically active component loaded on the carrier of 5 to 80% by weight �weight of the catalytically active component)/(weight of the catalytically active component+weight of the carrier+weight of a strength improver)!, and a process for producing unsaturated aldehyde and unsaturated acid with the catalyst.
摘要翻译：用于生产不饱和醛和不饱和酸的催化剂，其通过将催化活性组分负载在载体上并煅烧负载的催化剂而获得，其特征在于催化剂的平均粒径为4至16mm，载体的平均粒径 3至12mm，煅烧温度为520-600℃，负载在载体上的催化活性组分的量为5-80重量％[催化活性组分的重量] /（催化活性组分的重量）组分+载体重量+强度改进剂的重量）]以及用催化剂生产不饱和醛和不饱和酸的方法。

2. 发明授权

US6028220A Producing acrolein and acrylic acid using a supported dual activity molybdenum, iron, and bismuth based catalyst in a fixed bed multitubular reactor 失效
标题翻译：在固定床多管反应器中使用支撑的双活性钼，铁和铋基催化剂生产丙烯醛和丙烯酸
公开(公告)号：US6028220A
公开(公告)日：2000-02-22
申请号：US117461
申请日：1998-07-28
申请人： Koichi Wada , Yoshimasa Seo , Akira Iwamoto , Atsushi Sudo , Fumio Sakai , Kazuo Shiraishi , Hiroyoshi Nowatari
发明人： Koichi Wada , Yoshimasa Seo , Akira Iwamoto , Atsushi Sudo , Fumio Sakai , Kazuo Shiraishi , Hiroyoshi Nowatari
IPC分类号： B01J23/88 , B01J8/06 , B01J23/31 , B01J23/887 , C07B61/00 , C07C27/14 , C07C45/35 , C07C47/22 , C07C51/25 , C07C57/05 , C07C205/00 , C07C51/16
CPC分类号： C07C45/35 , B01J23/002 , B01J23/31 , B01J23/8876 , B01J8/06 , C07C51/252 , B01J2208/025 , B01J2523/00
摘要： The present invention concerns a method for producing acrolein and acrylic acid by carrying out vapor phase catalytic oxidation of propylene with molecular oxygen or a gas containing molecular oxygen using a oxidation catalysts comprising Mo, Bi and Fe as an essentially element and a fixed bed multitubular reactor, which comprisesa) using a plurality of supported catalysts having different activities, which was obtained, for example, by different calcination method in the production process of the supported catalysts,b) setting a catalyst layer in a reaction tube, which is formed by dividing it into plural portions in the tube axial direction, andc) arranging the aforementioned plural supported catalysts in such order that the activity becomes high toward the outlet from the inlet of the material gas in the reaction tube axial direction.According to the present invention, the generation of hot spot can be avoided and over oxidation reaction can be avoided and the acrolein and acrylic acid are produced constantly for a prolonged period of time.
摘要翻译： PCT No.PCT / JP97 / 04402 Sec。 371日期：1998年7月28日 102（e）日期1998年7月28日PCT 1997年12月2日PCT PCT。第WO98 / 24746号公报日期1998年6月11日本发明涉及通过使用包含Mo，Bi和Fe作为基本元素的氧化催化剂，通过用分子氧或含有分子氧的气体进行丙烯的气相催化氧化来生产丙烯醛和丙烯酸的方法，一种固定床多管反应器，其包括a）使用多种活性不同的负载催化剂，其通过例如在负载型催化剂的制备方法中通过不同的煅烧方法获得，b）将催化剂层设置在反应管通过在管轴方向上分成多个部分而形成，以及c）按照反应管轴向从原料气体的入口出口的活性变高的顺序排列上述多个负载型催化剂。根据本发明，可以避免产生热点，可以避免过度氧化反应，并且持续长时间地生产丙烯醛和丙烯酸。

3. 发明授权

US5959143A Catalysts and process for the preparation thereof 失效
标题翻译：催化剂及其制备方法
公开(公告)号：US5959143A
公开(公告)日：1999-09-28
申请号：US737028
申请日：1996-10-30
申请人： Hideki Sugi , Fumio Sakai , Koichi Wada , Kazuo Shiraishi , Toshitake Kojima , Atsushi Umejima , Yoshimasa Seo
发明人： Hideki Sugi , Fumio Sakai , Koichi Wada , Kazuo Shiraishi , Toshitake Kojima , Atsushi Umejima , Yoshimasa Seo
IPC分类号： B01J23/88 , B01J23/00 , B01J23/887 , B01J35/00 , B01J37/00 , B01J37/02 , C07B61/00 , C07C51/25 , C07C57/055 , C07C51/235 , B01J23/22
CPC分类号： B01J37/0045 , B01J23/002 , B01J23/8877 , B01J35/002 , B01J35/1009 , B01J35/108 , C07C51/252 , B01J2523/00 , B01J37/0236
摘要： A catalyst having a high activity and mechanical strength and a process for preparing it are provided. The catalyst comprises molybdenum, vanadium, copper and antimony as essential components. The peak in X-ray diffractometry of the catalytically active component with Cu--K.alpha. line is largest at 22.2.+-.0.30.degree. (2.theta.).
摘要翻译： PCT No.PCT / JP96 / 00506 Sec。 371日期1996年10月30日 102（e）1996年10月30日PCT PCT 1996年3月1日PCT公布。公开号WO96 / 27437 日本1996年9月12日提供具有高活性和机械强度的催化剂及其制备方法。催化剂包括钼，钒，铜和锑作为必需组分。具有Cu-Kα线的催化活性组分的X射线衍射峰值在22.2±0.30°（2θ）处最大。

4. 发明授权

US08586785B2 Process for producing catalyst for methacrylic acid production and process for producing methacrylic acid 有权
标题翻译：生产甲基丙烯酸催化剂的方法和生产甲基丙烯酸的方法
公开(公告)号：US08586785B2
公开(公告)日：2013-11-19
申请号：US13298645
申请日：2011-11-17
申请人： Atsushi Sudo , Kazuo Shiraishi , Hideki Sugi , Hiroyoshi Nowatari , Fumio Sakai , Tomoaki Kobayashi , Tatsuhiko Kurakami
发明人： Atsushi Sudo , Kazuo Shiraishi , Hideki Sugi , Hiroyoshi Nowatari , Fumio Sakai , Tomoaki Kobayashi , Tatsuhiko Kurakami
IPC分类号： C07C51/16 , B01J27/199 , B01J27/19
CPC分类号： B01J37/0219 , B01J23/002 , B01J27/199 , B01J37/0045 , B01J37/0221 , B01J2523/00 , C07C51/252 , B01J2523/17 , B01J2523/51 , B01J2523/52 , B01J2523/55 , B01J2523/68 , C07C57/04
摘要： An object of the present invention is to provide a process for stably producing a catalyst for methacrylic acid production exhibiting high activity and high performance. The process for producing a catalyst for methacrylic acid production of the invention is characterized in that the water content of the catalyst ingredient powder for use in molding, temperature and humidity of a molding step, humidity and temperature of a baking step are individually controlled in the case where molding is performed by a coating method using an Mo—V—P—Cu-based hetero polyacid as an active ingredient and water or an alcohol and/or an aqueous solution of an alcohol as a binder.
摘要翻译：本发明的目的是提供稳定地生产表现出高活性和高性能的甲基丙烯酸生产催化剂的方法。本发明的甲基丙烯酸制造用催化剂的制造方法的特征在于，在成型步骤中使用的成型用的催化剂成分粉末，成型步骤的温度和湿度，烘烤步骤的湿度和温度的含水量分别控制在通过使用Mo-VP-Cu系杂多酸作为活性成分的涂布方法和水或醇和/或醇的水溶液作为粘合剂进行成型的情况。

5. 发明申请

US20120065427A1 Process For Producing Catalyst For Methacrylic Acid Production And Process For Producing Methacrylic Acid 有权
标题翻译：用于生产甲基丙烯酸生产催化剂的方法和生产甲基丙烯酸的方法
公开(公告)号：US20120065427A1
公开(公告)日：2012-03-15
申请号：US13298645
申请日：2011-11-17
申请人： Atsushi Sudo , Kazuo Shiraishi , Hideki Sugi , Hiroyoshi Nowatari , Fumio Sakai , Tomoaki Kobayashi , Tatsuhiko Kurakami
发明人： Atsushi Sudo , Kazuo Shiraishi , Hideki Sugi , Hiroyoshi Nowatari , Fumio Sakai , Tomoaki Kobayashi , Tatsuhiko Kurakami
IPC分类号： C07C51/16 , B01J27/199
CPC分类号： B01J37/0219 , B01J23/002 , B01J27/199 , B01J37/0045 , B01J37/0221 , B01J2523/00 , C07C51/252 , B01J2523/17 , B01J2523/51 , B01J2523/52 , B01J2523/55 , B01J2523/68 , C07C57/04
摘要： An object of the present invention is to provide a process for stably producing a catalyst for methacrylic acid production exhibiting high activity and high performance. The process for producing a catalyst for methacrylic acid production of the invention is characterized in that the water content of the catalyst ingredient powder for use in molding, temperature and humidity of a molding step, humidity and temperature of a baking step are individually controlled in the case where molding is performed by a coating method using an Mo—V—P—Cu-based hetero polyacid as an active ingredient and water or an alcohol and/or an aqueous solution of an alcohol as a binder.
摘要翻译：本发明的目的是提供稳定地生产表现出高活性和高性能的甲基丙烯酸生产催化剂的方法。本发明的甲基丙烯酸制造用催化剂的制造方法的特征在于，在成型步骤中使用的成型用的催化剂成分粉末，成型步骤的温度和湿度，烘烤步骤的湿度和温度的含水量分别控制在通过使用Mo-V-P-Cu系杂多酸作为活性成分的涂布法和水或醇和/或醇的水溶液作为粘合剂进行成型的情况。

6. 发明授权

US09387607B2 Imprint apparatus, imprint method, and method for producing device 有权
标题翻译：印刷装置，印刷方法及其制造方法
公开(公告)号：US09387607B2
公开(公告)日：2016-07-12
申请号：US13451925
申请日：2012-04-20
申请人： Hideki Matsumoto , Fumio Sakai
发明人： Hideki Matsumoto , Fumio Sakai
IPC分类号： G03F7/00 , B29C37/00 , B29C43/02 , B29C43/56 , B29C59/02 , B29L31/00
CPC分类号： B29C37/0003 , B29C43/021 , B29C43/56 , B29C59/02 , B29C59/026 , B29C2059/023 , B29L2031/757 , G03F7/0002
摘要： An imprint apparatus for transferring a pattern to an imprint material using a mold includes a substrate holding mechanism and a control unit. The substrate holding mechanism is configured to be divided into a plurality of areas, capable of varying an attracting force for attracting the substrate in each of the areas and to hold the substrate. The control unit is configured to, when a plurality of shots is formed on the substrate, control an imprint operation of transferring the pattern to the plurality of shots which are not adjacent to one another, makes the attracting force in the area of the substrate holding mechanism corresponding to the shot to which the pattern is transferred among the plurality of areas smaller than the attracting force at the time of the imprint operation and suck the substrate.
摘要翻译：使用模具将图案转印到压印材料的压印装置包括基板保持机构和控制单元。基板保持机构被构造成被分成多个区域，能够改变吸引每个区域中的基板的吸引力并保持基板。控制单元被配置为当在基板上形成多个拍摄时，控制将图案转印到彼此不相邻的多个拍摄中的印记操作，使得在基板保持的区域中的吸引力对应于在压印操作时小于吸引力的多个区域中的图案转印的图像的机构，并吸附基板。

7. 发明申请

US20060258701A1 Novel 2-pyridinecarboxamide derivatives 有权
标题翻译：新型2-吡啶甲酰胺衍生物
公开(公告)号：US20060258701A1
公开(公告)日：2006-11-16
申请号：US10545424
申请日：2004-02-13
申请人： Morihiro Mitsuya , Makoto Bamba , Fumio Sakai , Hitomi Watanabe , Yasuhiro Sasaki , Teruyuki Nishimura , Jun-ichi Eiki
发明人： Morihiro Mitsuya , Makoto Bamba , Fumio Sakai , Hitomi Watanabe , Yasuhiro Sasaki , Teruyuki Nishimura , Jun-ichi Eiki
IPC分类号： A61K31/4745 , A61K31/444 , A61K31/4439 , C07D498/02 , C07D417/14
CPC分类号： C07D471/04 , C07D417/14
摘要： The present invention relates to a compound which has a glucokinase-activating effect and is useful as a therapeutic agent for diabetes mellitus, being represented by a formula (I): [wherein X1 represents a nitrogen atom, sulfur atom, oxygen atom or the like; R1 represents a 6- to 10-membered aryl group, 5- to 7-membered heteroaryl group or the like; D represents an oxygen atom or sulfur atom; R and R3 are the same or different, each representing a hydrogen atom, lower alkyl group or the like; a formula (II) represents an optionally substituted 5- to 7-membered heteroaryl group or the like; a formula (III) represents a monocyclic or bicyclic heteroaryl group] or a pharmaceutically acceptable salt thereof.
摘要翻译：本发明涉及具有葡糖激酶活化作用并可用作糖尿病治疗剂的化合物，其由式（I）表示：其中X 1表示氮原子，硫原子，氧原子等; R 1表示6至10元芳基，5至7元杂芳基等; D表示氧原子或硫原子; R和R 3相同或不同，各自表示氢原子，低级烷基等; 式（II）表示任选取代的5〜7元杂芳基等; 式（III）表示单环或双环杂芳基]或其药学上可接受的盐。

8. 发明授权

US09880463B2 Imprint method, imprint apparatus, and article manufacturing method 有权
公开(公告)号：US09880463B2
公开(公告)日：2018-01-30
申请号：US13490547
申请日：2012-06-07
申请人： Kohei Wakabayashi , Hideki Matsumoto , Fumio Sakai , Makoto Mizuno
发明人： Kohei Wakabayashi , Hideki Matsumoto , Fumio Sakai , Makoto Mizuno
IPC分类号： B28B1/14 , B28B13/02 , G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method of performing an imprint process on each of a plurality of shot regions of a substrate, wherein each shot region includes at least one of at least one valid chip area and at least one invalid chip area, the invalid chip area including an inhibited area in which resin coating is inhibited, the imprint process for a shot region including both the invalid chip area and the valid chip area includes coating the valid chip area of the shot region with the resin, bringing a pattern surface of a mold into contact with the resin, and curing the resin, and in the step of coating, at least the inhibited area of the invalid chip area is not coated with the resin.

9. 发明授权

US5751404A Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates 失效
标题翻译：曝光装置和方法，其中通过比较入射在标线片台和晶片台参考板上的标记进行对准
公开(公告)号：US5751404A
公开(公告)日：1998-05-12
申请号：US684100
申请日：1996-07-22
申请人： Eiichi Murakami , Fumio Sakai , Shigeyuki Uzawa , Shigeki Ogawa , Tetsuya Mori
发明人： Eiichi Murakami , Fumio Sakai , Shigeyuki Uzawa , Shigeki Ogawa , Tetsuya Mori
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G02B11/00 , G03B27/32 , G03B27/52
CPC分类号： G03F7/70691 , G03F7/70358 , G03F9/7015
摘要： A scanning exposure apparatus includes a first movable stage being movable while carrying a first object thereon, a second movable stage being movable while carrying a second object thereon, a projection optical system for projecting a pattern, a control system serviceable to scan the first and second movable stages in a timed relation and relative to the projection optical system and to project a pattern of the first object onto the second object through the projection optical system, a first reference plate fixedly mounted on the first movable stage, a second reference plate fixedly mounted on the second movable stage, and a detecting system serviceable to scan at least one of the first and second movable stages to detect a relative positional relationship between alignment marks of the first and second reference plates to thereby determine a scan direction of one of the first and second movable stages.
摘要翻译：一种扫描曝光装置，包括：可移动的第一可移动台，其上携带有第一物体;可移动的第二可移动台，其上携带有第二物体;投影光学系统，用于投影图案;可控制的扫描第一和第二物体的控制系统以相对于投影光学系统的定时关系的可移动台阶，并且通过投影光学系统将第一物体的图案投射到第二物体上，固定地安装在第一可移动台上的第一参考板，固定地安装在第二参考板上的第二参考板在第二可移动台上，以及检测系统，其能够扫描第一和第二可移动台中的至少一个，以检测第一和第二参考板的对准标记之间的相对位置关系，从而确定第一和第二可移动台之一的扫描方向和第二可动台。

10. 发明授权

US4952060A Alignment method and a projection exposure apparatus using the same 失效
标题翻译：对准方法和使用其的投影曝光装置
公开(公告)号：US4952060A
公开(公告)日：1990-08-28
申请号：US463886
申请日：1990-01-10
申请人： Hideki Ina , Fumio Sakai , Hitoshi Nakano
发明人： Hideki Ina , Fumio Sakai , Hitoshi Nakano
IPC分类号： H01L21/30 , G03F9/00 , H01L21/027 , H01L21/67 , H01L21/68
CPC分类号： G03F9/7084
摘要： A projection exposure apparatus is disclosed for exposing a semiconductor wafer to a pattern, formed on a reticle, by projection using a projection lens system. The apparatus includes an alignment optical system disposed at a side of the wafer remote from the projection lens system. The alignment optical system is used to detect an alignment mark provided on the wafer, from the back of the wafer. In accordance with the detection, the wafer is moved so that its alignment mark is brought into a predetermined positional relation with the alignment optical system, whereby the reticle and the wafer are relatively aligned. With this arrangement, the wafer alignment mark can be detected without being adversely affected by a resist layer applied to the wafer surface. Thus, the reticle and the wafer can be aligned very accurately.
摘要翻译：公开了一种投影曝光装置，用于通过使用投影透镜系统的投影将半导体晶片暴露于形成在掩模版上的图案。该装置包括配置在远离投影透镜系统的晶片侧的对准光学系统。对准光学系统用于从晶片的背面检测设置在晶片上的对准标记。根据检测，移动晶片使其对准标记与取向光学系统成预定的位置关系，由此标线片和晶片相对对准。利用这种布置，可以检测晶片对准标记，而不受施加到晶片表面的抗蚀剂层的不利影响。因此，可以非常准确地对准标线片和晶片。

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