专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20130344438A1 PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE 有权
标题翻译：光电发生器，光电元件，涂覆基板和形成电子器件的方法
公开(公告)号：US20130344438A1
公开(公告)日：2013-12-26
申请号：US13925926
申请日：2013-06-25
申请人： Emad AQAD , Irvinder KAUR , Cong LIU , Cheng-bai XU , Mingqi LI , Gregory P. PROKOPOWICZ
发明人： Emad AQAD , Irvinder KAUR , Cong LIU , Cheng-bai XU , Mingqi LI , Gregory P. PROKOPOWICZ
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/004 , G03F7/0045 , G03F7/0395 , G03F7/20
摘要： A photoacid generator has the formula (I): wherein R1, R2, R3, L1, L2, L3 X, Z+, a, b, c, d, p, q, and r, are defined herein. A photoresist comprises the photoacid generator, and a coated article comprises the photoresist. The photoresist can be used to form an electronic device.
摘要翻译：光酸产生剂具有式（I）：其中R1，R2，R3，L1，L2，L3X，Z +，a，b，c，d，p，q和r在本文中定义。光致抗蚀剂包括光致酸产生剂，并且涂覆制品包括光致抗蚀剂。光致抗蚀剂可用于形成电子器件。

2. 发明申请

US20100323294A1 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME 有权
标题翻译：光电发生器和包含相同的光电元件
公开(公告)号：US20100323294A1
公开(公告)日：2010-12-23
申请号：US12820331
申请日：2010-06-22
申请人： Mingqi LI , Cheng-Bai XU , Emad AQAD , Cong LIU
发明人： Mingqi LI , Cheng-Bai XU , Emad AQAD , Cong LIU
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397
摘要： This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise a multi cyclic lactone moiety.
摘要翻译：本发明涉及包含这些化合物的新的光酸产生剂化合物和光致抗蚀剂组合物。特别地，本发明涉及包含多环内酯部分的光酸产生剂化合物。

3. 发明申请

US20120129108A1 BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME 有权
标题翻译：基础反应光电发生器和包含它的光电子器件
公开(公告)号：US20120129108A1
公开(公告)日：2012-05-24
申请号：US13296949
申请日：2011-11-15
申请人： Emad AQAD , Mingqi LI , Cheng-Bai XU , Deyan WANG , Cong LIU , Joon Seok OH , Shintaro YAMADA
发明人： Emad AQAD , Mingqi LI , Cheng-Bai XU , Deyan WANG , Cong LIU , Joon Seok OH , Shintaro YAMADA
IPC分类号： G03F7/20 , C08G75/00 , C07C309/19
CPC分类号： C07C381/12 , C07C63/72 , C07C303/32 , C07C309/04 , C07C309/06 , C07C309/08 , C07C309/12 , C07C309/17 , C07C309/19 , C07C309/20 , C07C309/23 , C07C309/24 , C07C2602/42 , C08F220/22 , C08F228/02 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041 , G03F7/38
摘要： This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise base-cleavable groups.
摘要翻译：本发明涉及包含这些化合物的新的光酸产生剂化合物和光致抗蚀剂组合物。特别地，本发明涉及包含可碱基裂解基团的光酸产生剂化合物。

4. 发明申请

US20110250538A1 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME 有权
标题翻译：光电发生器和包含相同的光电元件
公开(公告)号：US20110250538A1
公开(公告)日：2011-10-13
申请号：US12965368
申请日：2010-12-10
申请人： Mingqi LI , Emad AQAD , Cong LIU , Joseph MATTIA , Cheng-Bai XU , George G. BARCLAY
发明人： Mingqi LI , Emad AQAD , Cong LIU , Joseph MATTIA , Cheng-Bai XU , George G. BARCLAY
IPC分类号： G03F7/004 , C07J9/00 , C07D493/18 , G03F7/20 , C07D333/46
CPC分类号： G03F7/0045 , C07C303/32 , C07C309/06 , C07C309/12 , C07C321/30 , C07C381/12 , C07C2603/74 , C07D333/46 , C07D335/02 , C07D337/04 , C07D493/20 , C07J31/006 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397
摘要： New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.
摘要翻译：提供了新的方法用于合成光酸产生剂化合物（“PAG”），新的光酸产生剂化合物和包含这种PAG化合物的光致抗蚀剂组合物。在特定方面，提供含锍（S +）光酸产生剂和合成锍光酸发生剂的方法。

5. 发明申请

US20120156595A1 COMPOSITIONS COMPRISING SUGAR COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY 审中-公开
标题翻译：包含糖成分的组合物和光刻胶的方法
公开(公告)号：US20120156595A1
公开(公告)日：2012-06-21
申请号：US13297261
申请日：2011-11-15
申请人： Joon-Seok OH , Deyan WANG , Cong LIU , Mingqi LI , Chunyi WU , Cheng-Bai XU
发明人： Joon-Seok OH , Deyan WANG , Cong LIU , Mingqi LI , Chunyi WU , Cheng-Bai XU
IPC分类号： G03F7/20 , G03F1/00 , G03F7/004
CPC分类号： G03F7/0392 , G03F7/0382 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sugar substitution. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
摘要翻译：提供了可用于浸没式光刻的新的光致抗蚀剂组合物。本发明优选的光致抗蚀剂组合物包含一种或多种具有糖替代的材料。本发明的特别优选的光致抗蚀剂可以在浸没光刻处理期间将抗蚀剂材料的浸出降低到与抗蚀剂层接触的浸没流体中。

6. 发明申请

US20120122030A1 COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY 审中-公开
标题翻译：包含基础反应成分的组合物和光刻胶的方法
公开(公告)号：US20120122030A1
公开(公告)日：2012-05-17
申请号：US13297258
申请日：2011-11-15
申请人： Deyan WANG , Cong LIU , Mingqi LI , Joon Seok OH , Cheng-Bai XU , Doris H. KANG , Clark H. CUMMINS , Matthias S. OBER
发明人： Deyan WANG , Cong LIU , Mingqi LI , Joon Seok OH , Cheng-Bai XU , Doris H. KANG , Clark H. CUMMINS , Matthias S. OBER
IPC分类号： G03F7/20 , G03B27/52 , G03F7/004
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that comprise one or more base reactive groups and (i) one or more polar groups distinct from the base reactive groups, and/or (ii) at least one of the base reactive groups is a non-perfluorinated base reactive group. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
摘要翻译：提供了可用于浸没式光刻的新的光致抗蚀剂组合物。本发明优选的光致抗蚀剂组合物包含一种或多种包含一种或多种碱性反应性基团的材料，和（i）与碱性反应性基团不同的一种或多种极性基团，和/或（ii）至少一种碱性反应性基团是非全氟化碱反应性基团。本发明的特别优选的光致抗蚀剂可以在浸没光刻处理期间将抗蚀剂材料的浸出降低到与抗蚀剂层接触的浸没流体中。

7. 发明申请

US20110039206A1 NOVEL RESINS AND PHOTORESIST COMPOSITIONS COMPRISING SAME 审中-公开
标题翻译：新型树脂和包含相同的光刻胶组合物
公开(公告)号：US20110039206A1
公开(公告)日：2011-02-17
申请号：US12782466
申请日：2010-05-18
申请人： Cong LIU , Cheng-Bai Xu
发明人： Cong LIU , Cheng-Bai Xu
IPC分类号： G03F7/004 , G03F7/20 , C07C69/54 , C08F18/02
CPC分类号： G03F7/0397
摘要： Provided are new resins that comprise multi-ring, aromatic and/or multi-cyclic ester unit which preferably are photoacid-labile. Also provided are chemically-amplified positive photoresist that comprise such resins as well as multi-ring, aromatic and/or multi-cyclic ester monomers.
摘要翻译：提供了包含多环，芳族和/或多环酯单元的新树脂，其优选是光致酸不稳定的。还提供了包含这种树脂以及多环，芳族和/或多环酯单体的化学放大正性光致抗蚀剂。

8. 发明申请

US20110250542A1 SULFONYL PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME 有权
标题翻译： SULFONYL光电发生器和包含它的光电子器件
公开(公告)号：US20110250542A1
公开(公告)日：2011-10-13
申请号：US12968130
申请日：2010-12-14
申请人： Cong LIU , Cheng-Bai XU
发明人： Cong LIU , Cheng-Bai XU
IPC分类号： G03F7/20 , C07C69/74
CPC分类号： G03F7/0045 , C07C309/17 , C07C311/48 , C07C313/04 , C07C321/28 , C07C381/12 , C07C2603/74 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/162 , G03F7/20 , G03F7/30 , G03F7/322
摘要： New bis(sulfonyl)imide and tri(sulfonyl)methide photoacid generator compounds (“PAGs”) are provided as well as photoresist compositions that comprise such PAG compounds.
摘要翻译：提供新的双（磺酰基）酰亚胺和三（磺酰基）甲基化光致酸发生剂化合物（“PAG”）以及包含这种PAG化合物的光致抗蚀剂组合物。

9. 发明申请

US20130033391A1 MULTIPLYING DIGITAL-TO-ANALOG CONVERTERS AND PIPELINE ANALOG-TO-DIGITAL CONVERTER USING THE SAME 有权
标题翻译：使用数字模拟转换器和管道模拟数字转换器
公开(公告)号：US20130033391A1
公开(公告)日：2013-02-07
申请号：US13567777
申请日：2012-08-06
申请人： Cong LIU , Yu-Kai CHOU
发明人： Cong LIU , Yu-Kai CHOU
IPC分类号： H03M1/66
CPC分类号： H03M1/804 , H03M1/164
摘要： A multiplying digital-to-analog converter (MDAC) is provided. The MDAC includes a sub DAC decoding circuit, a capacitor-switch circuit, and an operation amplifier circuit. The capacitor-switch circuit includes at least two sampling capacitor sets which are coupled in parallel. The number of sampling capacitors in one of the sampling capacitor sets is larger than or equal to two. Each sampling capacitor set is coupled to an analog-signal input quantity through a sampling switch and to a corresponding output terminal of the sub DAC decoding circuit through a decoding switch. The sub DAC decoding circuit decodes a digital quantity and outputs a corresponding analog signal at each output terminal, such that the corresponding analog signals are applied to the respective sampling capacitor sets through the decoding switches and summed by the respective sampling capacitor sets to obtain an analog-signal quantity corresponding to the digital quantity.
摘要翻译：提供了一个倍增的数模转换器（MDAC）。 MDAC包括子DAC解码电路，电容器开关电路和运算放大器电路。电容器开关电路包括并联耦合的至少两个采样电容器组。一个采样电容器组中的采样电容器的数量大于或等于2。每个采样电容器组通过采样开关耦合到模拟信号输入量，并通过解码开关耦合到子DAC解码电路的相应输出端。子DAC解码电路解码数字量并在每个输出端输出相应的模拟信号，使得相应的模拟信号通过解码开关施加到相应的采样电容器组，并由相应的采样电容器组相加，以获得模拟 - 与数字量对应的信号量。

10. 发明申请

US20130038483A1 ANALOG-TO-DIGITAL CONVERTERS AND PIPELINE ANALOG-TO-DIGITAL CONVERTERS 有权
标题翻译：模拟数字转换器和管道模拟数字转换器
公开(公告)号：US20130038483A1
公开(公告)日：2013-02-14
申请号：US13584348
申请日：2012-08-13
申请人： Cong LIU , Yu-Kai CHOU
发明人： Cong LIU , Yu-Kai CHOU
IPC分类号： H03M1/38
CPC分类号： H03M1/147 , H03M1/14 , H03M1/164
摘要： An analog-to-digital converter is provided. The analog-to-digital converter includes a sampling-voltage providing circuit, a first comparison circuit, a second comparison circuit, and an encoder circuit. The sampling-voltage providing circuit provides a group of first comparison voltages and a group of second comparison voltages. The first comparison circuit performs a first comparison operation to an analog-signal input quantity according to the group of first comparison voltages to generate a first comparison digital quantity. The second comparison circuit selects second comparison voltages among the group of second comparison voltages according to the first comparison digital quantity and performs a second comparison operation to the analog-signal input quantity according to the selected second comparison voltages to generate a second comparison digital quantity. The encoder circuit encodes the first comparison digital quantity and the second comparison digital quantity and generates a digital quantity corresponding to the analog-signal input quantity.
摘要翻译：提供了一个模拟 - 数字转换器。模数转换器包括采样电压提供电路，第一比较电路，第二比较电路和编码器电路。采样电压提供电路提供一组第一比较电压和一组第二比较电压。第一比较电路根据第一比较电压组对模拟信号输入量执行第一比较操作，以产生第一比较数字量。第二比较电路根据第一比较数字量选择第二比较电压组中的第二比较电压，并根据所选择的第二比较电压对模拟信号输入量进行第二比较操作，以产生第二比较数字量。编码器电路对第一比较数字量和第二比较数字量进行编码，并产生与模拟信号输入量对应的数字量。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式