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    • 4. 发明专利
    • Pattern forming method
    • 图案形成方法
    • JP2010113356A
    • 2010-05-20
    • JP2009253372
    • 2009-11-04
    • Dongjin Semichem Co Ltd東進セミケム株式会社Dongjin Semichem Co.,Ltd.
    • KIM DONG-MINLEE WON YOUNGLEE KI MANKIM SUNG KICHOI KI SIKJA-GARU YUNKIM JEONG WONBYEON CHEOL KISHIN JAE HOBYUN JA-FUN
    • G03F7/095G03F7/023G03F7/26H01L21/027
    • PROBLEM TO BE SOLVED: To provide a pattern forming method for stably forming a profile of an undercut feature suitable for a special process such as a lift-off process by using a positive photoresist composition having an adjustable sensitization speed.
      SOLUTION: The present invention relates to a pattern forming method for a display element for forming a profile of an undercut feature applicable to a lift-off process. The profile of an undercut feature can be easily formed upon forming a multilayer photoresist, by using a polymer compound having a specified structure and controlling the sensitization speed to be rapid. Thereby, it is applicable to the lift-off process, and even a thick pattern can be formed. Since an etching process can be omitted in the process, process simplification can be achieved.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供一种图案形成方法,用于通过使用具有可调节的致敏速度的正性光致抗蚀剂组合物来稳定地形成适合于特殊工艺(例如剥离处理)的底切特征的轮廓。 解决方案:本发明涉及一种用于形成可应用于剥离过程的底切特征的轮廓的显示元件的图案形成方法。 通过使用具有特定结构的高分子化合物和敏化速度快速控制,可以容易地在形成多层光致抗蚀剂时形成底切特征的轮廓。 由此,可以适用于剥离处理,也可以形成厚的图案。 由于在该过程中可以省略蚀刻工艺,因此可以实现工艺简化。 版权所有(C)2010,JPO&INPIT