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1. 发明专利

JP2008262206A Photoresist composition and method of manufacturing thin film transistor substrate using the same 有权
标题翻译：光电组合物及其制造薄膜晶体管基板的方法
公开(公告)号：JP2008262206A
公开(公告)日：2008-10-30
申请号：JP2008103960
申请日：2008-04-11
申请人： Dongjin Semichem Co Ltd , Samsung Electronics Co Ltd , 三星電子株式会社Samsung Electronics Co.,Ltd. , 東進セミケム株式会社Dongjin Semichem Co.,Ltd.
发明人： PARK JEONG-MIN , JUNG DOO-HEE , LEE HI-KUK , YOUN HYOC-MIN , KOO KI-HYUK
IPC分类号： G03F7/023 , C08G8/04 , G02F1/1343 , G02F1/1368 , G03F7/004 , H01L21/027 , H01L21/28 , H01L21/336 , H01L29/417 , H01L29/786
CPC分类号： G03F7/0382 , H01L21/312 , H01L27/1214 , H01L27/1288
摘要： PROBLEM TO BE SOLVED: To provide a photoresist composition that is superior in heat resistance and adhesiveness.
SOLUTION: The photoresist composition contains a first binder resin, second binder resin, photoacid generator, crosslinking agent, and solvent. The photoresist composition is superior in heat resistance and adhesiveness of a photoresist pattern, so that an aperture ratio of a thin film transistor substrate increases to thereby improve display quality. Accordingly, the photoresist composition is preferably used for four mask processes to manufacture the thin film transistor substrate.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供耐热性和粘合性优异的光致抗蚀剂组合物。光致抗蚀剂组合物含有第一粘合剂树脂，第二粘合剂树脂，光酸产生剂，交联剂和溶剂。光致抗蚀剂组合物的耐热性和光致抗蚀剂图案的粘合性优异，使得薄膜晶体管基板的开口率增加，从而提高显示质量。因此，光致抗蚀剂组合物优选用于制造薄膜晶体管基板的四种掩模工艺。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2007058216A Photoresist composition and method for manufacturing thin film transistor substrate using the same 有权
标题翻译：使用其制造薄膜晶体管基板的光电组合物和方法
公开(公告)号：JP2007058216A
公开(公告)日：2007-03-08
申请号：JP2006224979
申请日：2006-08-22
申请人： Dongjin Semichem Co Ltd , Samsung Electronics Co Ltd , 三星電子株式会社Samsung Electronics Co.,Ltd. , 東進セミケム株式会社Dongjin Semichem Co.,Ltd.
发明人： PARK JEONG-MIN , LEE HI-KUK , YOUN HYOC-MIN , KOO KI-HYUK , KIM BYUNG-UK
IPC分类号： G03F7/023 , G03F7/004 , G03F7/11 , H01L21/027 , H01L21/336 , H01L29/786
CPC分类号： G03F7/0382 , G03F7/105 , H01L21/32139 , H01L29/66765 , H01L29/78669 , Y10S430/106 , Y10S430/114
摘要： PROBLEM TO BE SOLVED: To provide a photoresist composition and a method for manufacturing a thin film transistor substrate by using the photoresist composition. SOLUTION: The photoresist composition includes: 10 to 70 wt.% of a binder resin including a phenol-based polymer; 0.5 to 10 wt.% of a photo-acid generator; 1 to 20 wt.% of a crosslinker; 0.1 to 5.0 wt.% of a dye; and 10 to 80 wt.% of a solvent. The photoresist composition is used for a four-mask manufacturing process of a thin film transistor substrate. The photoresist composition forms a photoresist layer in the process of manufacturing a thin film transistor substrate, and the photoresist layer stably gives a halftone by slit exposure. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供通过使用光致抗蚀剂组合物制备光致抗蚀剂组合物和制造薄膜晶体管基板的方法。光致抗蚀剂组合物包括：10〜70重量％的包含酚类聚合物的粘合剂树脂; 0.5〜10重量％的光酸发生剂; 1〜20重量％的交联剂; 0.1〜5.0重量％的染料; 和10〜80重量％的溶剂。光致抗蚀剂组合物用于薄膜晶体管基板的四掩模制造工艺。光致抗蚀剂组合物在制造薄膜晶体管基板的过程中形成光致抗蚀剂层，并且光致抗蚀剂层通过狭缝曝光稳定地产生半色调。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2007017987A Photoresist composition, method for forming pattern using the photoresist composition, and method for manufacturing thin film transistor display panel using the composition 有权
标题翻译：光电组合物，使用光电组合物形成图案的方法以及使用组合物制造薄膜晶体管显示面板的方法
公开(公告)号：JP2007017987A
公开(公告)日：2007-01-25
申请号：JP2006189573
申请日：2006-07-10
申请人： Dongjin Semichem Co Ltd , Samsung Electronics Co Ltd , 三星電子株式会社Samsung Electronics Co.,Ltd. , 東進セミケム株式会社Dongjin Semichem Co.,Ltd.
发明人： PARK JEONG-MIN , LEE HI-KUK , SHU SHINGO , JEON WOO-SEOK , JUNG DOO-HEE , KIM DONG-MIN , CHOI KI-SIK
IPC分类号： G03F7/022 , G03F7/004 , G03F7/40 , H01L21/027
CPC分类号： G03F7/022 , G03F7/0045
摘要： PROBLEM TO BE SOLVED: To control the amount of a photoresist remaining in a channel region to be uniform and to reduce projections at an end of a semiconductor layer, in relation to a method for forming a pattern using a photoresist composition and to a method for manufacturing a thin film transistor display panel.
SOLUTION: The method for manufacturing a thin film transistor display panel includes steps of: forming a gate line on a substrate; depositing a gate insulating film and a semiconductor layer on the gate line; depositing a data layer on the semiconductor layer; forming a resist film containing a photosensitive compound comprising an alkali-soluble resin and a four-nuclide p-cresol on the data layer; patterning the resist film and subjecting the data layer to first etching using the resist pattern as an etching mask; etching the semiconductor layer using the data layer as an etching mask; reflowing the resist pattern; and subjecting the data layer to second etching using the resist pattern as an etching mask.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了控制残留在沟道区域中的光致抗蚀剂的量是均匀的，并且减少半导体层的端部处的突起，相对于使用光致抗蚀剂组合物形成图案的方法，以及薄膜晶体管显示面板的制造方法。解决方案：薄膜晶体管显示面板的制造方法包括以下步骤：在基板上形成栅极线; 在栅极线上沉积栅极绝缘膜和半导体层; 在半导体层上沉积数据层; 在数据层上形成含有碱溶性树脂和四核素对甲酚的感光性化合物的抗蚀剂膜; 图案化抗蚀剂膜并使用抗蚀剂图案作为蚀刻掩模对数据层进行第一次蚀刻; 使用数据层作为蚀刻掩模蚀刻半导体层; 回流抗蚀剂图案; 并使用抗蚀剂图案作为蚀刻掩模对数据层进行第二蚀刻。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2012252360A Method for manufacturing display substrate 有权
标题翻译：制造显示基板的方法
公开(公告)号：JP2012252360A
公开(公告)日：2012-12-20
申请号：JP2012186731
申请日：2012-08-27
申请人： Samsung Electronics Co Ltd , 三星電子株式会社Samsung Electronics Co.,Ltd.
发明人： JUNG DOO-HEE , PARK JEONG-MIN , MUN KYUNG-SU , YI WUI-KUK , YOUN JOO-AE
IPC分类号： G02F1/1368 , G03F1/00 , G03F1/68 , G09F9/00 , G09F9/30 , H01L21/336 , H01L29/786
CPC分类号： G02F1/13454 , G02F2001/133388 , G02F2001/136236
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a display substrate, for reducing defects due to excessive etching.SOLUTION: The method includes the steps of: applying a photoresist film on a substrate 110, which includes a display area DA having a plurality of unit pixels P defined by signal lines intersecting each other, and includes a peripheral area PA surrounding the display area DA; patterning the photoresist film to form a first pattern portion P1 overlapping the signal lines in the display area DA and a second pattern portion P2 including a plurality of dummy openings DO formed in an area not overlapping the signal lines in the peripheral area PA; forming transparent electrode layers 117a, 117b on the substrate 110 where the first pattern portion P1 and the second pattern portion P2 are formed; and forming pixel electrodes PE corresponding to the unit pixels P and forming dummy electrode DM corresponding to the dummy openings DO, by removing the first pattern portion P1, the second pattern portion P2 and the transparent electrode layers 117a, 117b formed on the first and second pattern portions, with a strip solution.
摘要翻译：要解决的问题：提供一种用于制造显示基板的方法，用于减少由于过度蚀刻引起的缺陷。解决方案：该方法包括以下步骤：在基板110上施加光致抗蚀剂膜，该基板110包括具有由彼此相交的信号线限定的多个单位像素P的显示区域DA，并且包括周边区域PA 显示区域DA; 图案化光致抗蚀剂膜以形成与显示区域DA中的信号线重叠的第一图案部分P1和包括形成在不与周边区域PA中的信号线重叠的区域中的多个虚拟开口DO的第二图案部分P2; 在形成有第一图案部分P1和第二图案部分P2的基板110上形成透明电极层117a，117b; 并且通过去除形成在第一和第二图案上的第一图案部分P1，第二图案部分P2和透明电极层117a，117b，形成与单位像素P相对应的像素电极PE并形成与虚拟开口DO对应的虚拟电极DM 图案部分，带有条状溶液。版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP2008033317A Display substrate, manufacturing method therefor, and mask for manufacturing the display substrate 审中-公开
标题翻译：显示基板，其制造方法和用于制造显示基板的掩模
公开(公告)号：JP2008033317A
公开(公告)日：2008-02-14
申请号：JP2007186874
申请日：2007-07-18
申请人： Samsung Electronics Co Ltd , 三星電子株式会社Samsung Electronics Co.,Ltd.
发明人： JUNG DOO-HEE , PARK JEONG-MIN , MUN KYUNG-SU , LEE HI-KUK , YOUN JOO-AE
IPC分类号： G02F1/1368 , G03F1/00 , G03F1/68 , H01L21/336 , H01L29/786
CPC分类号： G02F1/13454 , G02F2001/133388 , G02F2001/136236
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of a display substrate for reducing defects due to excessive etching, a mask for the manufacturing method, and a display substrate. SOLUTION: The present invention comprises a substrate in which a display area DA and peripheral regions PA1-PA4 surrounding the display region; signal lines that are formed on the substrate, cross each other, and define a plurality of unit pixels on the display region; a thin-film transistor TFT that is connected to the signal line and formed on the unit pixel; a pixel electrode that is formed on the unit pixel and connected electrically to the thin-film transistor; and a dummy open part DM that does not superimpose on the signal line but is arranged in the peripheral region. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供用于减少由于过度蚀刻引起的缺陷的显示基板的制造方法，制造方法用掩模和显示基板。解决方案：本发明包括其中显示区域DA和围绕显示区域的外围区域PA1-PA4的基板; 形成在基板上的信号线彼此交叉并在显示区域上限定多个单位像素; 薄膜晶体管TFT，连接到信号线并形成在单位像素上; 像素电极，其形成在所述单位像素上并与所述薄膜晶体管电连接; 以及不叠加在信号线上但被布置在周边区域中的虚拟开放部分DM。版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2006215538A Photoresist composition, pattern forming method using the same and method for manufacturing thin film transistor display panel 有权
标题翻译：光电组合物，使用其的图案形成方法和制造薄膜晶体管显示面板的方法
公开(公告)号：JP2006215538A
公开(公告)日：2006-08-17
申请号：JP2005380489
申请日：2005-12-28
申请人： Samsung Electronics Co Ltd , Samyang Ems Corp , 三星電子株式会社Samsung Electronics Co.,Ltd. , 株式会社三養イエムエス
发明人： PARK JEONG-MIN , RYU BIZEN , LEE HI-KUK , JEON WOO-SEOK
IPC分类号： G03F7/023 , C08G8/10 , G03F7/004 , G03F7/075 , H01L21/027
CPC分类号： G03F7/0236 , G03F7/0007 , G03F7/0226 , H01L27/1214 , H01L27/1288 , H01L29/458 , H01L29/4908
摘要： PROBLEM TO BE SOLVED: To provide a photoresist composition capable of suppressing cracking in a photoresist film in a photo-etching step, a pattern forming method using the same and a method for manufacturing a thin film transistor display panel.
SOLUTION: The photoresist composition comprises a novolac resin represented by formula (1), a mercapto compound represented by formula (2), a photosensitive agent and a solvent. In formula (1), R
1 -R
4 are each independently H or a 1-6C alkyl and n is an integer of 0-3. In formula (2) R
1 and R
2 are each independently a 1-20C alkyl or allyl.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决的问题：提供能够抑制光蚀刻步骤中的光致抗蚀剂膜中的裂纹的光致抗蚀剂组合物，使用其的图案形成方法和薄膜晶体管显示面板的制造方法。光致抗蚀剂组合物包含由式（1）表示的酚醛清漆树脂，由式（2）表示的巯基化合物，感光剂和溶剂。在式（1）中，R SB 1 -R SB 4各自独立地为H或1-6C烷基，n为0-3的整数。在式（2）中，R SB 1和R SB 2各自独立地为1-20C烷基或烯丙基。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2010020291A Photoresist composition, method of forming metal pattern, and method of manufacturing display substrate using same 审中-公开
标题翻译：光刻胶组合物，形成金属图案的方法以及使用其制造显示衬底的方法
公开(公告)号：JP2010020291A
公开(公告)日：2010-01-28
申请号：JP2009130224
申请日：2009-05-29
申请人： Az Electronic Materials Kk , Azエレクトロニックマテリアルズ株式会社 , Samsung Electronics Co Ltd , 三星電子株式会社Samsung Electronics Co.,Ltd.
发明人： PARK JEONG-MIN , RHEE JUNG SOO , JUNG DOO-HEE , LEE HI-KUK , KANG DEOK-MAN , OH SAE-TAE , SON SANG-WON , KIM YOUNG-JIN
IPC分类号： G03F7/022 , G02F1/1368 , G03F7/004 , G03F7/40 , H01L21/027
CPC分类号： H01L27/1214 , G03F7/0226 , G03F7/40 , H01L21/32139 , H01L27/1288
摘要： PROBLEM TO BE SOLVED: To provide a photoresist composition improved in heat resistance and adhesion, and to provide a method of forming a metal pattern and a method of manufacturing a display substrate by using the photoresist composition. SOLUTION: The photoresist composition includes about 5-50 wt.% of an alkali-soluble resin, about 0.5-30 wt.% of a quinone diazide compound, about 0.1-15 wt.% of a curing agent, and an organic solvent. A clear photoresist pattern is formed by using the photoresist composition to improve the reliability of patterning of a lower film, whereby the reliability of a manufacturing process can be improved. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供改善耐热性和粘附性的光致抗蚀剂组合物，并提供一种形成金属图案的方法和通过使用光致抗蚀剂组合物制造显示基板的方法。光致抗蚀剂组合物包括约5-50重量％的碱溶性树脂，约0.5-30重量％的醌二叠氮化合物，约0.1-15重量％的固化剂，和有机溶剂。通过使用光致抗蚀剂组合物形成清晰的光致抗蚀剂图案，以提高下膜的图案化的可靠性，从而可以提高制造工艺的可靠性。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2009211065A Photoresist composition and method for manufacturing array substrate using the same 有权
标题翻译：光电组合物及使用其制造阵列基板的方法
公开(公告)号：JP2009211065A
公开(公告)日：2009-09-17
申请号：JP2009031082
申请日：2009-02-13
申请人： Samsung Electronics Co Ltd , 三星電子株式会社Samsung Electronics Co.,Ltd.
发明人： PARK JEONG-MIN , JUNG DOO-HEE , LEE HI-KUK , KIM HEIIKU , KIM DONG-MIN
IPC分类号： G03F7/023 , G02F1/1368
CPC分类号： G03F7/0236
摘要： PROBLEM TO BE SOLVED: To provide a photoresist composition and a method of manufacturing an array substrate using the same.
SOLUTION: The photoresist composition contains; (a) a novolac resin prepared from a phenol compound containing m-cresol in an amount of 70-85 wt.%, (b) a diazide compound, and (c) an organic solvent. The photoresist composition improves development contrast between an exposed area and an unexposed area, sensitivity depending on sensitization speed, residual film uniformity of a half-exposed portion and adhesive force to a substrate, and thereby the reliability and productivity of a manufacturing process can be improved.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供光致抗蚀剂组合物和使用其制备阵列基板的方法。光致抗蚀剂组合物包含：（a）由含有70-85重量％的间甲酚的酚化合物制备的酚醛清漆树脂，（b）重氮化合物和（c）有机溶剂。光致抗蚀剂组合物改善了曝光区域和未曝光区域之间的显影对比度，敏感度取决于敏化速度，半曝光部分的残留膜均匀性和对基板的粘附力，从而可以提高制造工艺的可靠性和生产率。版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2011095746A Photoresist composition and method of manufacturing display substrate using the same 审中-公开
标题翻译：光电组合物及使用其制造显示器基板的方法
公开(公告)号：JP2011095746A
公开(公告)日：2011-05-12
申请号：JP2010238319
申请日：2010-10-25
申请人： Dongwoo Fine-Chem Co Ltd , Samsung Electronics Co Ltd , 三星電子株式会社Samsung Electronics Co.,Ltd. , 東友ファインケム株式会社
发明人： PARK JEONG-MIN , RHEE JUNG SOO , CHANG WON-YOUNG , LEE EUN-SANG , YU IN-HO , KIM SEONG-HYEON
IPC分类号： G03F7/004 , C08K5/13 , C08K5/22 , C08L33/00 , C08L61/04 , C08L101/02 , G02F1/1368 , G03F7/023 , H01L21/027
CPC分类号： H01L27/1214 , G03F7/0007 , G03F7/0226 , G03F7/0233 , H01L27/1288 , Y10S438/948
摘要： PROBLEM TO BE SOLVED: To provide a photoresist composition and a method of manufacturing a display substrate using the same. SOLUTION: The photoresist composition includes an alkali-soluble resin, a dissolution inhibitor including a quinone diazide compound, a first additive including a benzene compound, a second additive including an acrylic copolymer, and an organic solvent. Accordingly, heat resistance of a photoresist pattern may be improved, and the photoresist pattern may be readily stripped. As a result, crack is prevented from occurring in the photoresist pattern. COPYRIGHT: (C)2011,JPO&INPIT

10. 发明专利

JP2007128067A Photoresist composition and method for producing thin film transistor substrate using the same 有权
标题翻译：用于制造薄膜晶体管基板的光电组合物和方法
公开(公告)号：JP2007128067A
公开(公告)日：2007-05-24
申请号：JP2006286899
申请日：2006-10-20
申请人： Az Electronic Materials Kk , Azエレクトロニックマテリアルズ株式会社 , Samsung Electronics Co Ltd , 三星電子株式会社Samsung Electronics Co.,Ltd.
发明人： LEE HI-KUK , ZEN YUSO , JUNG DOO-HEE , PARK JEONG-MIN , KYO TOKUMAN , TEI JIEI , CHOI JAE-YOUNG
IPC分类号： G03F7/023 , G02F1/13 , G02F1/1368 , G03F7/004 , G03F7/033 , G03F7/40 , H01L21/027 , H01L21/336 , H01L29/786
CPC分类号： G03F7/0233 , G03F7/0236 , H01L27/1214 , H01L27/1288
摘要： PROBLEM TO BE SOLVED: To provide a photoresist composition and a method for producing a thin film transistor substrate using the photoresist composition. SOLUTION: The photoresist composition contains 100 parts by weight of a mixed resin containing a novolac resin and an acrylic resin and 10-50 parts by weight of a naphthoquinonediazosulfonic ester, wherein the novolac resin has a weight average molecular weight of ≥30,000, and the acrylic resin has a weight average molecular weight of ≥20,000. The content of the acrylic resin is 1-15 wt.% of the total mixed resin. In pattern formation in a process of producing a thin film transistor substrate, the photoresist composition minimizes angle variation of profile by reflow and improves the structural stability of the pattern and the uniformity of residual film thickness, whereby short-circuit of wiring and faulty opening are suppressed. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供光致抗蚀剂组合物和使用该光致抗蚀剂组合物的薄膜晶体管基板的制造方法。光致抗蚀剂组合物含有100重量份的包含酚醛清漆树脂和丙烯酸树脂的混合树脂和10-50重量份的萘醌二叠氮磺酸酯，其中酚醛清漆树脂的重均分子量为≥30,000 丙烯酸树脂的重均分子量≥20,000。丙烯酸树脂的含量为总混合树脂的1-15重量％。在制造薄膜晶体管基板的过程中的图案形成中，光致抗蚀剂组合物通过回流最小化轮廓的角度变化，并且改善了图案的结构稳定性和残留膜厚度的均匀性，由此布线短路和断开抑制。版权所有（C）2007，JPO＆INPIT

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