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    • 1. 发明申请
    • Method of monitoring a semiconductor manufacturing trend
    • 监控半导体制造趋势的方法
    • US20070013398A1
    • 2007-01-18
    • US11344664
    • 2006-02-01
    • Dieter Rathei
    • Dieter Rathei
    • G01R31/26
    • G01R31/2894G01R31/31718G01R31/318314
    • A parametric parameter is selected, which has an upper specification limit and a lower specification limit. A storage percentile is determined. The storage percentile is equal to a product yield percentage if the number of the set of measurements greater than the upper specification limit exceeds the number of the set of measurements lower than the lower specification limit, and is equal to the product yield percentage subtracted from one hundred percent if the number of the set of measurements less than the lower specification limit exceeds the number of the set of measurements greater than the upper specification limit. A measurement closest to the storage percentile is stored.
    • 选择参数参数,其具有较高的规格限制和较低的规格限制。 确定存储百分位数。 如果大于上限规格限值的测量值的数量超过比较低规格限值低的测量值的数量,则存储百分位数等于产品产量百分比,并且等于从一个 百分之百,如果小于较低规格限值的测量值的数量超过大于上限规格的测量值的数量。 存储最接近存储百分位数的测量。
    • 2. 发明授权
    • Method of monitoring a semiconductor manufacturing trend
    • 监控半导体制造趋势的方法
    • US07524683B2
    • 2009-04-28
    • US11443241
    • 2006-05-30
    • Dieter Rathei
    • Dieter Rathei
    • H01L21/66
    • H01L22/20G05B23/0232
    • A method of monitoring trends in semiconductor processes is provided. Lot values are assigned to each of a set of wafer lots prior to performing semiconductor processes. After at least some of the semiconductor processes, at least some of the wafer lots are tested to generate a set of test data. A degree of scrambling is calculated for the set of wafer lots already tested using the test data: calculating a current scrambling value by subtracting the lot value of a current wafer lot from a maximum lot value of the lot values assigned for the set of wafer lots to yield the current scrambling value; storing the current scrambling value into a set of scrambling values; and determining a current adjusted maximum scrambling value by multiplying a selected multiplier value with a current maximum scrambling value of the set of scrambling values for a selected number of wafer lots.
    • 提供了一种监测半导体工艺趋势的方法。 在执行半导体处理之前,批次值分配给一组晶片批次中的每一个。 在至少一些半导体工艺之后,测试至少一些晶圆批次以产生一组测试数据。 针对已经使用测试数据测试的晶片组的集合计算加扰度:通过从为该组晶片批次分配的批次值的最大批次值中减去当前晶片批次的批次值来计算当前加扰值 产生当前扰频值; 将当前加扰值存储到一组加扰值中; 以及通过将所选择的乘数值与所选数量的晶片批次的所述一组加扰值的当前最大扰频值相乘来确定当前调整的最大扰频值。
    • 3. 发明授权
    • Method of and system for analyzing cells of a memory device
    • 用于分析存储器件单元的方法和系统
    • US07003432B2
    • 2006-02-21
    • US10749460
    • 2003-12-30
    • Joerg WohlfahrtThomas HladschikJens HolzhaeuserDieter Rathei
    • Joerg WohlfahrtThomas HladschikJens HolzhaeuserDieter Rathei
    • G01R31/00G06F19/00
    • G11C29/56G11C29/56008G11C2029/5604
    • A method of analyzing cells of a memory device is disclosed. Generally, a plurality of fail signatures is generated, wherein each fail signature is associated with a type of failure. Voltages according to a plurality of test patterns are applied to nodes of a cell of the memory device. Fail data of the cell for the plurality of patterns is then analyzed, and a fail signature of the cell is determined. A type of failure of the cell based upon the plurality of fail signatures is then determined. A system for analyzing cells of a memory device is also disclosed. The system generally includes a plurality of probes applying different voltages to a cell of the memory device. A control circuit varies the voltages applied to the cell, and compares the failures of the cell as the test voltage applied to the cell is varied to an artificial bit map. Finally, an output device generates an output indicating a type of failure of the cell.
    • 公开了一种分析存储器件的单元的方法。 通常,生成多个故障签名,其中每个故障签名与一种故障相关联。 根据多个测试图案的电压被施加到存储器件的单元的节点。 然后分析多个模式的单元的失败数据,并且确定单元的失败签名。 然后确定基于多个失败签名的小区的一种故障。 还公开了一种用于分析存储器件单元的系统。 该系统通常包括向存储器件的单元施加不同电压的多个探针。 控制电路改变施加到单元的电压,并且当施加到单元的测试电压变化到人造位图时,比较单元的故障。 最后,输出设备生成指示单元故障类型的输出。
    • 4. 发明授权
    • Method of monitoring a semiconductor manufacturing trend
    • 监控半导体制造趋势的方法
    • US07587292B2
    • 2009-09-08
    • US11344664
    • 2006-02-01
    • Dieter Rathei
    • Dieter Rathei
    • G06F19/00G06F17/40
    • G01R31/2894G01R31/31718G01R31/318314
    • A parametric parameter is selected, which has an upper specification limit and a lower specification limit. A storage percentile is determined. The storage percentile is equal to a product yield percentage if the number of the set of measurements greater than the upper specification limit exceeds the number of the set of measurements lower than the lower specification limit, and is equal to the product yield percentage subtracted from one hundred percent if the number of the set of measurements less than the lower specification limit exceeds the number of the set of measurements greater than the upper specification limit. A measurement closest to the storage percentile is stored.
    • 选择参数参数,其具有较高的规格限制和较低的规格限制。 确定存储百分位数。 如果大于上限规格限值的测量值的数量超过比较低规格限值低的测量值的数量,则存储百分位数等于产品产量百分比,并且等于从一个 百分之百,如果小于较低规格限值的测量值的数量超过大于上限规格的测量值的数量。 存储最接近存储百分位数的测量。
    • 6. 发明申请
    • Method of monitoring a semiconductor manufacturing trend
    • 监控半导体制造趋势的方法
    • US20070013399A1
    • 2007-01-18
    • US11345154
    • 2006-02-01
    • Dieter Rathei
    • Dieter Rathei
    • G01R31/26
    • G05B19/41875G05B2219/37224Y02P90/22Y02P90/265
    • A parametric parameter is selected, which has an upper specification limit and a lower specification limit. A storage percentile is determined. The storage percentile is equal to a product yield percentage if the number of the set of measurements greater than the upper specification limit exceeds the number of the set of measurements lower than the lower specification limit, and is equal to the product yield percentage subtracted from one hundred percent if the number of the set of measurements less than the lower specification limit exceeds the number of the set of measurements greater than the upper specification limit. A number of spatial regions on the wafer is designated. A first group of measurements from the set of measurements is obtained for a first spatial region of the spatial regions. A measurement closest to the storage percentile is stored.
    • 选择参数参数,其具有较高的规格限制和较低的规格限制。 确定存储百分位数。 如果大于上限规格限值的测量值的数量超过比较低规格限值低的测量值的数量,则存储百分位数等于产品产量百分比,并且等于从一个 百分之百,如果小于较低规格限值的测量值的数量超过大于上限规格的测量值的数量。 指定晶片上的多个空间区域。 对于空间区域的第一空间区域获得来自该组测量的第一组测量。 存储最接近存储百分位数的测量。
    • 7. 发明申请
    • Method of and system for analyzing cells of a memory device
    • 用于分析存储器件单元的方法和系统
    • US20050149285A1
    • 2005-07-07
    • US10749460
    • 2003-12-30
    • Joerg WohlfahrtThomas HladschikJens HolzhaeuserDieter Rathei
    • Joerg WohlfahrtThomas HladschikJens HolzhaeuserDieter Rathei
    • G06F19/00G11C29/56
    • G11C29/56G11C29/56008G11C2029/5604
    • A method of analyzing cells of a memory device is disclosed. The method generally comprises steps of establishing a plurality of fail signatures, wherein each fail signature is associated with a type of failure. Voltages according to a plurality of test patterns are applied to nodes of a cell of the memory device. Fail data of the cell for the plurality of patterns is then analyzed, and a fail signature of the cell is determined. A type of failure of the cell based upon the plurality of fail signatures is then determined. A system for analyzing cells of a memory device is also disclosed. The system preferably comprises a plurality of probes applying different voltages to a cell of the memory device. A control circuit varies the voltages applied to the cell, and compares the failures of the cell as the test voltage applied to the cell is varied to an artificial bit map. Finally, an output device generates an output indicating a type of failure of the cell.
    • 公开了一种分析存储器件的单元的方法。 该方法通常包括建立多个失败签名的步骤,其中每个故障签名与一种故障相关联。 根据多个测试图案的电压被施加到存储器件的单元的节点。 然后分析多个模式的单元的失败数据,并且确定单元的失败签名。 然后确定基于多个失败签名的小区的一种故障。 还公开了一种用于分析存储器件单元的系统。 该系统优选地包括对存储器件的单元施加不同电压的多个探针。 控制电路改变施加到单元的电压,并且当施加到单元的测试电压变化到人造位图时,比较单元的故障。 最后,输出设备生成指示单元故障类型的输出。
    • 10. 发明授权
    • Method of monitoring a semiconductor manufacturing trend
    • 监控半导体制造趋势的方法
    • US07496478B2
    • 2009-02-24
    • US11345154
    • 2006-02-01
    • Dieter Rathei
    • Dieter Rathei
    • G06F19/00G06F17/40G05B99/00
    • G05B19/41875G05B2219/37224Y02P90/22Y02P90/265
    • A parametric parameter is selected, which has an upper specification limit and a lower specification limit. A storage percentile is determined. The storage percentile is equal to a product yield percentage if the number of the set of measurements greater than the upper specification limit exceeds the number of the set of measurements lower than the lower specification limit, and is equal to the product yield percentage subtracted from one hundred percent if the number of the set of measurements less than the lower specification limit exceeds the number of the set of measurements greater than the upper specification limit. A number of spatial regions on the wafer is designated. A first group of measurements from the set of measurements is obtained for a first spatial region of the spatial regions. A measurement closest to the storage percentile is stored.
    • 选择参数参数,其具有较高的规格限制和较低的规格限制。 确定存储百分位数。 如果大于上限规格限值的测量值的数量超过比较低规格限值低的测量值的数量,则存储百分位数等于产品产量百分比,并且等于从一个 百分之百,如果小于较低规格限值的测量值的数量超过大于上限规格的测量值的数量。 指定晶片上的多个空间区域。 对于空间区域的第一空间区域获得来自该组测量的第一组测量。 存储最接近存储百分位数的测量。