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1. 发明授权

US06704695B1 Interactive optical proximity correction design method 失效
标题翻译：交互式光学邻近校正设计方法
公开(公告)号：US06704695B1
公开(公告)日：2004-03-09
申请号：US09354879
申请日：1999-07-16
申请人： Orest Bula , Daniel C. Cole , Edward W. Conrad , William C. Leipold
发明人： Orest Bula , Daniel C. Cole , Edward W. Conrad , William C. Leipold
IPC分类号： G06G748
CPC分类号： G03F1/36
摘要： A method and structure for creating a photomask data set includes inputting a design data set, creating a simulated printed data set by applying a lithography simulation model to chosen levels of the design data set, merging each chosen level of the design data set with each corresponding level of the simulated printed data set in order to produce a merged design data set, applying at least one test to the merged design data set, correcting the design data set based on results of the test to produce a corrected design data set, repeating the creating of the simulated printed data, merging, applying the test and correcting using the corrected design data set until the corrected design data set passes the test, and outputting the corrected design data set as the photomask data set.
摘要翻译：一种用于创建光掩模数据集的方法和结构，包括输入设计数据集，通过将光刻仿真模型应用于设计数据集的选定级别来创建模拟印刷数据集，将每个选定级别的设计数据集与每个相应的水平的模拟印刷数据集合，以便产生合并的设计数据集，对合并的设计数据集应用至少一个测试，基于测试结果校正设计数据集，以产生校正的设计数据集，重复创建模拟打印数据，合并，应用测试并使用校正后的设计数据集进行校正，直到校正后的设计数据集通过测试，并输出校正后的设计数据集作为光掩模数据集。

2. 发明授权

US06667136B2 Method to control nested to isolated line printing 失效
公开(公告)号：US06667136B2
公开(公告)日：2003-12-23
申请号：US10200912
申请日：2002-07-22
申请人： Orest Bula , Daniel C. Cole , Edward W. Conrad , William C. Leipold
发明人： Orest Bula , Daniel C. Cole , Edward W. Conrad , William C. Leipold
IPC分类号： G03F900
CPC分类号： G03F1/50 , G03F1/26
摘要： A method and structure for a photomask that includes a substrate having a first transmittance, a first pattern to be transferred to a photosensitive layer (the first pattern having a second transmittance lower than the first transmittance) and a second pattern having a third transmittance greater than the second transmittance and less than the first transmittance. The second pattern is adjacent at least a portion of the first pattern, and the substrate and the second pattern transmit light substantially in phase.

3. 发明授权

US06373975B1 Error checking of simulated printed images with process window effects included 有权
标题翻译：对包含过程窗口效应的模拟打印图像进行错误检查
公开(公告)号：US06373975B1
公开(公告)日：2002-04-16
申请号：US09237148
申请日：1999-01-25
申请人： Orest Bula , Daniel C. Cole , Edward W. Conrad , William C. Leipold
发明人： Orest Bula , Daniel C. Cole , Edward W. Conrad , William C. Leipold
IPC分类号： G06K900
CPC分类号： G06T7/0006 , G03F1/36 , G06T2207/30148
摘要： A structure and method for checking semiconductor designs for design rule violations includes generating a predicted printed structure (i.e., an ideal image) based on the semiconductor designs, altering the ideal image to include potential manufacturing variations, thereby producing at least two production images representing different manufacturing qualities, and comparing the production images to the design rules to produce an error list.
摘要翻译：用于检查用于设计规则违规的半导体设计的结构和方法包括基于半导体设计产生预测的印刷结构（即，理想图像），改变理想图像以包括潜在的制造变化，由此产生至少两个代表不同的生产图像制造质量，并将生产图像与设计规则进行比较以产生错误列表。

4. 发明授权

US06458493B2 Method to control nested to isolated line printing 失效
标题翻译：控制嵌套到孤立线打印的方法
公开(公告)号：US06458493B2
公开(公告)日：2002-10-01
申请号：US09325945
申请日：1999-06-04
申请人： Orest Bula , Daniel C. Cole , Edward W. Conrad , William C. Leipold
发明人： Orest Bula , Daniel C. Cole , Edward W. Conrad , William C. Leipold
IPC分类号： G03F900
CPC分类号： G03F1/50 , G03F1/26
摘要： A method and structure for a photomask that includes a substrate having a first transmittance, a first pattern to be transferred to a photosensitive layer (the first pattern having a second transmittance lower than the first transmittance) and a second pattern having a third transmittance greater than the second transmittance and less than the first transmittance. The second pattern is adjacent at least a portion of the first pattern, and the substrate and the second pattern transmit light substantially in phase.
摘要翻译：一种光掩模的方法和结构，其包括具有第一透射率的衬底，要转印到感光层的第一图案（具有低于第一透射率的第二透射率的第一图案）和具有第三透射率的第二图案第二透射率和小于第一透射率。第二图案与第一图案的至少一部分相邻，并且基板和第二图案基本上同相地发射光。

5. 发明授权

US06425112B1 Auto correction of error checked simulated printed images 失效
标题翻译：错误的自动校正检查模拟打印的图像
公开(公告)号：US06425112B1
公开(公告)日：2002-07-23
申请号：US09335305
申请日：1999-06-17
申请人： Orest Bula , Daniel C. Cole , Edward W. Conrad , William C. Leipold
发明人： Orest Bula , Daniel C. Cole , Edward W. Conrad , William C. Leipold
IPC分类号： E06F1750
CPC分类号： G03F1/36 , G06F17/5081
摘要： A method and computer system are provided for checking integrated circuit designs for design rule violations. The method may include generating a working design data set, creating a wafer image data set, comparing the wafer image data set to the design rules to produce an error list and automatically altering the working design data set when the comparing indicates a design rule violation. The method further automatically repeats the creating, the comparing and the automatically altering until no design rule violations occur or no solution to the errors exists.
摘要翻译：提供了一种用于检查设计规则违规的集成电路设计的方法和计算机系统。该方法可以包括生成工作设计数据集，创建晶片图像数据集，将晶片图像数据集与设计规则进行比较以产生错误列表，并且当比较指示设计规则违反时自动改变工作设计数据集。该方法进一步自动重复创建，比较和自动更改，直到没有设计规则违规发生或没有解决方案存在错误。

6. 发明授权

US06268908B1 Micro adjustable illumination aperture 失效
标题翻译：微调照明光圈
公开(公告)号：US06268908B1
公开(公告)日：2001-07-31
申请号：US09385907
申请日：1999-08-30
申请人： Orest Bula , Daniel C. Cole , Edward W. Conrad , David Vaclay Horak , Jed Hickory Rankin
发明人： Orest Bula , Daniel C. Cole , Edward W. Conrad , David Vaclay Horak , Jed Hickory Rankin
IPC分类号： G03B2772
CPC分类号： G03F7/70091 , G03F7/70116
摘要： The distribution of ultraviolet light irradiated from an illumination source to optical elements of a projection exposure device is varied by an illumination aperture. The illumination aperture is formed with a plurality of openings which may be opened or closed independently to the passage of irradiating light. The size and shape of the opening formed by the plurality of openings of the illumination aperture is determined according to the particular image to be projected.
摘要翻译：从照明源照射到投影曝光装置的光学元件的紫外线的分布由照明孔径变化。照明孔形成有多个开口，其可以独立于照射光的通过而打开或关闭。根据要投影的特定图像确定由照明孔的多个开口形成的开口的尺寸和形状。

7. 发明授权

US06430733B1 Contextual based groundrule compensation method of mask data set generation 失效
标题翻译：基于上下文的掩模数据集生成的基础补偿方法
公开(公告)号：US06430733B1
公开(公告)日：2002-08-06
申请号：US09296369
申请日：1999-04-22
申请人： John M. Cohn , Daniel C. Cole
发明人： John M. Cohn , Daniel C. Cole
IPC分类号： G06F1750
CPC分类号： G06F17/5081 , G03F1/36
摘要： A structure and method of designing an integrated circuit includes generating at least one device shape, altering the device shape to comply with predetermined rules, forming a first hierarchical level abstraction around the device shape (where the first hierarchical level abstraction represents a perimeter of the device shape), preparing a first hierarchical level arrangement of first hierarchical level abstractions, altering the first hierarchical level arrangement to comply with the predetermined rules, forming a second hierarchical level abstraction around the first hierarchical level arrangement (where the second hierarchical level abstraction represents a perimeter of the first hierarchical level arrangement), preparing a second hierarchical level arrangement of second hierarchical level abstractions, and altering the second hierarchical level arrangement to comply with the predetermined rules.
摘要翻译：设计集成电路的结构和方法包括生成至少一个设备形状，改变设备形状以符合预定规则，围绕设备形状形成第一层级抽象（其中第一层次抽象代表设备的周边）形成），准备第一层级抽象的第一层级布置，改变第一层级布置以符合预定规则，围绕第一层级布置形成第二层级抽象（其中第二层级抽象代表周界的第一层级布置），准备第二层级抽象的第二层级布置，并且改变第二层级布置以符合预定规则。

8. 发明授权

US06387596B2 Method of forming resist images by periodic pattern removal 失效
标题翻译：通过周期性图案去除形成抗蚀剂图像的方法
公开(公告)号：US06387596B2
公开(公告)日：2002-05-14
申请号：US09385929
申请日：1999-08-30
申请人： Daniel C. Cole , Edward W. Conrad , David V. Horak , Randy W. Mann , Paul W. Pastel , Jed H. Rankin , Andrew J. Watts
发明人： Daniel C. Cole , Edward W. Conrad , David V. Horak , Randy W. Mann , Paul W. Pastel , Jed H. Rankin , Andrew J. Watts
IPC分类号： G03F720
CPC分类号： G03F7/70125 , G03F7/203 , G03F7/70466
摘要： The present invention provides a method of forming nested and isolated images in a photosensitive resist. In the disclosed method, the entire surface of the photosensitive resist or selected regions thereof is exposed to a first mask having a set of nested, i.e. repeating pattern or grid images thereon, and then exposed to a second mask in order to remove unwanted portions of the nested image, so as to provide regions of nested and regions of isolated images in said photosensitive resist. The method may also be used to form regions having images in proximity to one another and regions having isolated images by exposing the entire surface of the photosensitive resist to a first mask having repeating patterns, and then removing entire or portions of the repeating patterns by exposure of the photosensitive resist with a second mask.
摘要翻译：本发明提供了一种在光敏抗蚀剂中形成嵌套和分离的图像的方法。在所公开的方法中，光敏抗蚀剂或其选择的区域的整个表面暴露于具有一套嵌套的即第一掩模，即在其上重复图案或网格图像的第一掩模，然后暴露于第二掩模以便去除不需要的部分嵌套图像，以便在所述光敏抗蚀剂中提供嵌套区域和孤立图像区域。该方法还可以用于通过将光敏抗蚀剂的整个表面暴露于具有重复图案的第一掩模，然后通过曝光去除整个或部分重复图案，从而形成具有彼此接近的图像的区域和具有隔离图像的区域的光敏抗蚀剂。

9. 发明授权

US06261724B1 Method of modifying a microchip layout data set to generate a predicted mask printed data set 失效
标题翻译：修改微芯片布局数据集以产生预测的掩模印刷数据集的方法
公开(公告)号：US06261724B1
公开(公告)日：2001-07-17
申请号：US09334367
申请日：1999-06-16
申请人： Orest Bula , Daniel C. Cole , Edward W. Conrad , William C. Leipold , Donald J. Samuels
发明人： Orest Bula , Daniel C. Cole , Edward W. Conrad , William C. Leipold , Donald J. Samuels
IPC分类号： G03F900
CPC分类号： G03F7/70433 , G03F1/36 , G03F7/70441
摘要： A method is presented here that enables one to improve the prediction for the printed structures of circuit patterns in a microchip, thereby potentially aiding in the design of the microchip circuitry. This method comprises the steps of determining, by applying process bias and corner curvature rules to a real mask image, a simulated structure for the mask used in optical projection lithography; and determining, by applying optical and process proximity correction rules to said simulated mask structure, a more accurate prediction for the structures printed on the wafer. Preferably the simulated mask structure is determined by applying a symmetric bias consistent with a mask build process to the real mask image, adjusting predetermined features of the real mask image such as corners or narrow lines, and applying a reverse symmetric bias to the adjusted real mask image.
摘要翻译：这里呈现出一种可以改进对微芯片中电路图案的印刷结构的预测的方法，从而有助于微芯片电路的设计。该方法包括以下步骤：通过将光学投影光刻中使用的掩模的模拟结构应用于实际掩模图像来确定加工偏压和拐角曲率规则; 以及通过对所述模拟掩模结构应用光学和过程接近校正规则来确定印刷在晶片上的结构的更准确的预测。优选地，通过将与掩模构建处理一致的对称偏置应用于真实掩模图像来确定模拟掩模结构，调整真实掩模图像的预定特征，例如拐角或窄线，以及将反向对称偏压施加到经调整的真实掩模图片。

10. 发明授权

US06258490B1 Transmission control mask utilized to reduce foreshortening effects 失效
标题翻译：传输控制面具用于减少缩短效果
公开(公告)号：US06258490B1
公开(公告)日：2001-07-10
申请号：US09350863
申请日：1999-07-09
申请人： Orest Bula , Daniel C. Cole , Edward W. Conrad , William C. Leipold
发明人： Orest Bula , Daniel C. Cole , Edward W. Conrad , William C. Leipold
IPC分类号： G03F900
CPC分类号： G03F1/50 , G03F1/36
摘要： A transmission controlled mask (TCM) for providing effective and accurate printing of images on a semiconductor wafer is defined. The transmission controlled mask (TCM) of the present invention includes opaque regions, clear regions, and transmission controlled (TC) regions, each region have different transmittance for reducing and/or eliminating the foreshortening which occurs in image printing. By employing the TCM of the present invention and adjusting the exposure time, images of lines and holes may be printed correctly with the same mask. The TCM of the present invention comprises a quartz substrate having a carbon layer and a chrome layer deposited on its surface.
摘要翻译：定义了用于在半导体晶片上提供有效和准确的图像打印的传输控制掩模（TCM）。本发明的透射控制掩模（TCM）包括不透明区域，透明区域和透射控制（TC）区域，每个区域具有不同的透射率，用于减少和/或消除在图像打印中发生的缩短。通过采用本发明的TCM并调整曝光时间，可以用相同的掩模正确地印刷线和孔的图像。本发明的TCM包括在其表面上沉积有碳层和铬层的石英基底。

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