专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2011119952A2 INTEGRATED SYSTEM FOR VAPOR GENERATION AND THIN FILM DEPOSITION 审中-公开
标题翻译：用于蒸汽发生和薄膜沉积的集成系统
公开(公告)号：WO2011119952A2
公开(公告)日：2011-09-29
申请号：PCT/US2011/029987
申请日：2011-03-25
申请人： MSP CORPORATION , LIU, Benjamin, Y.H. , MA, Yamin , DINH, Thuc
发明人： LIU, Benjamin, Y.H. , MA, Yamin , DINH, Thuc
IPC分类号： H01L21/205
CPC分类号： F01K17/04 , Y10T137/0318 , Y10T137/0379 , Y10T137/7761 , Y10T137/8593
摘要： An apparatus and method for generating vapor from a liquid precursor for a thin film deposition on a substrate includes an inlet 130 section in fluid communication with a downstream vaporization chamber 120 section. The inlet 130 section comprises a gas inlet for receiving gas from a gas source 180 through a gas flow sensor 202 and a gas flow control valve 230 and a liquid inlet 150 for receiving liquid from a liquid source 220 through a liquid flow sensor 210 and a liquid flow control valve 230. An electronic controller 600 controls the gas and liquid flow control valves 230 thereby controlling the rates of gas and liquid flow into the inlet 130 section to generate vapor in the downstream vaporization chamber 120 section for thin film deposition on the substrate.
摘要翻译：用于从液体前体产生蒸气的设备和方法用于薄膜沉积在基底上，包括与下游蒸发室120部分流体连通的入口130部分。入口130部分包括气体入口，用于通过气体流量传感器202和气体流量控制阀230从气体源180接收气体，以及用于通过液体流量传感器210从液体源220接收液体的液体入口150和液体流量控制阀230.电子控制器600控制气体和液体流量控制阀230，从而控制进入入口130部分的气体和液体流量的速率，以在下游蒸发室120部分中产生蒸汽，用于在基板上进行薄膜沉积。

2. 发明申请

WO2011119952A3 INTEGRATED SYSTEM FOR VAPOR GENERATION AND THIN FILM DEPOSITION 审中-公开
标题翻译：用于蒸汽发生和薄膜沉积的集成系统
公开(公告)号：WO2011119952A3
公开(公告)日：2012-01-26
申请号：PCT/US2011029987
申请日：2011-03-25
申请人： MSP CORP , LIU BENJAMIN Y H , MA YAMIN , DINH THUC
发明人： LIU BENJAMIN Y H , MA YAMIN , DINH THUC
IPC分类号： H01L21/205
CPC分类号： F01K17/04 , Y10T137/0318 , Y10T137/0379 , Y10T137/7761 , Y10T137/8593
摘要： An apparatus and method for generating vapor from a liquid precursor for a thin film deposition on a substrate includes an inlet 130 section in fluid communication with a downstream vaporization chamber 120 section. The inlet 130 section comprises a gas inlet for receiving gas from a gas source 180 through a gas flow sensor 202 and a gas flow control valve 230 and a liquid inlet 150 for receiving liquid from a liquid source 220 through a liquid flow sensor 210 and a liquid flow control valve 230. An electronic controller 600 controls the gas and liquid flow control valves 230 thereby controlling the rates of gas and liquid flow into the inlet 130 section to generate vapor in the downstream vaporization chamber 120 section for thin film deposition on the substrate.
摘要翻译：用于从液体前体产生蒸气的设备和方法用于薄膜沉积在基底上，包括与下游蒸发室120部分流体连通的入口130部分。入口130部分包括气体入口，用于通过气体流量传感器202和气体流量控制阀230从气体源180接收气体，以及用于通过液体流量传感器210从液体源220接收液体的液体入口150和液体流量控制阀230.电子控制器600控制气体和液体流量控制阀230，从而控制进入入口130部分的气体和液体流量的速率，以在下游蒸发室120部分中产生蒸汽，用于在基板上进行薄膜沉积。

3. 发明申请

WO2011097238A2 FINE DROPLET ATOMIZER FOR LIQUID PRECURSOR VAPORIZATION 审中-公开
标题翻译：用于液体前驱体蒸发的精细滴剂原液
公开(公告)号：WO2011097238A2
公开(公告)日：2011-08-11
申请号：PCT/US2011/023362
申请日：2011-02-01
申请人： MSP CORPORATION , LIU, Benjamin, Y., H. , DINH, Thuc, M. , MA, Yamin
发明人： LIU, Benjamin, Y., H. , DINH, Thuc, M. , MA, Yamin
IPC分类号： H01L21/205
CPC分类号： B05B17/04 , C23C16/4486
摘要： The present disclosure relates to an apparatus 10 and a method for forming a droplet aerosol for vaporization and subsequent thin film deposition on a substrate. The apparatus 10 includes a mechanism to control the rate of liquid flow through the apparatus 10, the mechanism including a piezoelectric actuator 240 to adjust the rate of liquid flow and an atomizing mechanism drawing gas from a compressed gas source 70 such that when the gas source conjoins with the liquid, the liquid is atomized to form droplets suspended in the gas thereby forming a droplet aerosol suitable for subsequent thin film deposition on a substrate. The method includes drawing a gas from a compressed gas source and drawing a liquid from a liquid source. The liquid and gas are conjoined in either a coaxial flow relationship or a radial flow relationship or an angular relationship between radial and coaxial flow wherein the gas engages the liquid to form droplets suitable for vaporization and subsequent thin film deposition on a substrate.
摘要翻译：本公开涉及一种用于形成用于汽化和随后在基板上的薄膜沉积的液滴气溶胶的装置10和方法。装置10包括一个控制流过装置10的液体流速的机构，该机构包括一个调节液体流速的压电致动器240和一个从压缩气体源70抽出气体的雾化机构，与液体结合，液体被雾化以形成悬浮在气体中的液滴，从而形成适用于随后的薄膜沉积在基底上的液滴气溶胶。该方法包括从压缩气体源抽取气体并从液体源抽取液体。液体和气体以同轴流动关系或径向流动关系或径向和同轴流动之间的角度关系相结合，其中气体与液体接合以形成适于汽化的液滴和随后在基底上的薄膜沉积。

4. 发明申请

WO2011097238A3 FINE DROPLET ATOMIZER FOR LIQUID PRECURSOR VAPORIZATION 审中-公开
标题翻译：用于液体前驱体气化的细小液滴雾化器
公开(公告)号：WO2011097238A3
公开(公告)日：2011-12-01
申请号：PCT/US2011023362
申请日：2011-02-01
申请人： MSP CORP , LIU BENJAMIN Y H , DINH THUC M , MA YAMIN
发明人： LIU BENJAMIN Y H , DINH THUC M , MA YAMIN
IPC分类号： H01L21/205
CPC分类号： B05B17/04 , C23C16/4486
摘要： The present disclosure relates to an apparatus 10 and a method for forming a droplet aerosol for vaporization and subsequent thin film deposition on a substrate. The apparatus 10 includes a mechanism to control the rate of liquid flow through the apparatus 10, the mechanism including a piezoelectric actuator 240 to adjust the rate of liquid flow and an atomizing mechanism drawing gas from a compressed gas source 70 such that when the gas source conjoins with the liquid, the liquid is atomized to form droplets suspended in the gas thereby forming a droplet aerosol suitable for subsequent thin film deposition on a substrate. The method includes drawing a gas from a compressed gas source and drawing a liquid from a liquid source. The liquid and gas are conjoined in either a coaxial flow relationship or a radial flow relationship or an angular relationship between radial and coaxial flow wherein the gas engages the liquid to form droplets suitable for vaporization and subsequent thin film deposition on a substrate.
摘要翻译：本公开涉及用于形成用于汽化和随后在基板上的薄膜沉积的微滴气溶胶的设备10和方法。设备10包括控制液体流过装置10的速率的机构，该机构包括用于调节液体流动速率的压电致动器240和雾化机构从压缩气体源70抽取气体，使得当气体源与液体结合时，液体被雾化以形成悬浮在气体中的液滴，由此形成适于随后在基板上的薄膜沉积的液滴气雾剂。该方法包括从压缩气体源抽取气体并从液体源抽取液体。液体和气体以同轴流动关系或径向流动关系或径向和同轴流动之间的角度关系联结，其中气体与液体接合以形成适于汽化和随后在基底上的薄膜沉积的液滴。

5. 发明授权

US06814698B2 Endoscope with flexible light guide having offset distal end 失效
标题翻译：具有柔性光导的内窥镜具有偏移的远端
公开(公告)号：US06814698B2
公开(公告)日：2004-11-09
申请号：US09972812
申请日：2001-10-05
申请人： Thomas Clement Barthel , Scott Allen Sundet , Craig Louis Riedl , Dinh Thuc Ha
发明人： Thomas Clement Barthel , Scott Allen Sundet , Craig Louis Riedl , Dinh Thuc Ha
IPC分类号： A61B100
CPC分类号： A61B1/0051 , A61B1/00165 , A61B1/07
摘要： An optical fiber viewing assembly for an endoscope has a light guide with an elastically flexible portion and a substantially rigid pre-curved distal portion. The viewing assembly is particularly suited for traversing bends of relatively small radii in an endotracheal breathing tube without scraping accumulated biological material from the inner surface of the breathing tube that could collect on the distal end of the light guide and obscure the endoscopic view.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式