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1. 发明申请

WO2011119952A3 INTEGRATED SYSTEM FOR VAPOR GENERATION AND THIN FILM DEPOSITION 审中-公开
标题翻译：用于蒸汽发生和薄膜沉积的集成系统
公开(公告)号：WO2011119952A3
公开(公告)日：2012-01-26
申请号：PCT/US2011029987
申请日：2011-03-25
申请人： MSP CORP , LIU BENJAMIN Y H , MA YAMIN , DINH THUC
发明人： LIU BENJAMIN Y H , MA YAMIN , DINH THUC
IPC分类号： H01L21/205
CPC分类号： F01K17/04 , Y10T137/0318 , Y10T137/0379 , Y10T137/7761 , Y10T137/8593
摘要： An apparatus and method for generating vapor from a liquid precursor for a thin film deposition on a substrate includes an inlet 130 section in fluid communication with a downstream vaporization chamber 120 section. The inlet 130 section comprises a gas inlet for receiving gas from a gas source 180 through a gas flow sensor 202 and a gas flow control valve 230 and a liquid inlet 150 for receiving liquid from a liquid source 220 through a liquid flow sensor 210 and a liquid flow control valve 230. An electronic controller 600 controls the gas and liquid flow control valves 230 thereby controlling the rates of gas and liquid flow into the inlet 130 section to generate vapor in the downstream vaporization chamber 120 section for thin film deposition on the substrate.
摘要翻译：用于从液体前体产生蒸气的设备和方法用于薄膜沉积在基底上，包括与下游蒸发室120部分流体连通的入口130部分。入口130部分包括气体入口，用于通过气体流量传感器202和气体流量控制阀230从气体源180接收气体，以及用于通过液体流量传感器210从液体源220接收液体的液体入口150和液体流量控制阀230.电子控制器600控制气体和液体流量控制阀230，从而控制进入入口130部分的气体和液体流量的速率，以在下游蒸发室120部分中产生蒸汽，用于在基板上进行薄膜沉积。

2. 发明申请

WO2011047219A2 METHOD AND APPARATUS FOR COUNTING PARTICLES IN A GAS 审中-公开
标题翻译：天然气中计数颗粒的方法和设备
公开(公告)号：WO2011047219A2
公开(公告)日：2011-04-21
申请号：PCT/US2010052773
申请日：2010-10-15
申请人： MSP CORP , LIU BENJAMIN Y H , DICK WILLIAM D , COLLINS AARON M , ROMAY FRANCISCO J
发明人： LIU BENJAMIN Y H , DICK WILLIAM D , COLLINS AARON M , ROMAY FRANCISCO J
IPC分类号： G01N15/14 , G01N15/10 , G01N21/47
CPC分类号： B05C11/00 , G01N15/065
摘要： The present disclosure describes a method and apparatus (90) for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber (410) with walls (440) that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber resulting in the gas becoming super- saturated with vapor and causing said super- saturated vapor to condense on said particles and form droplets, which are then detected and counted by an optical light-scattering detector (600).
摘要翻译：本公开描述了一种用于通过用蒸气饱和气体并且使气体流过具有壁（440）的腔室（410）来检测气体中的颗粒的方法和装置（90），所述腔室具有温度不同于进入的气体在腔室内产生气体湍流，导致气体变得超过蒸气的饱和，并使所述超饱和蒸气冷凝在所述颗粒上并形成液滴，然后通过光学光散射检测器检测并计数液滴 600）。

3. 发明申请

WO2006044725A3 METHOD AND APPARATUS FOR GENERATING CHARGED PARTICLES 审中-公开
标题翻译：用于产生充电颗粒的方法和装置
公开(公告)号：WO2006044725A3
公开(公告)日：2006-11-09
申请号：PCT/US2005037132
申请日：2005-10-18
申请人： MSP CORP , DICK WILLIAM , LIU BENJAMIN Y H
发明人： DICK WILLIAM , LIU BENJAMIN Y H
IPC分类号： B05D1/06 , B05B5/025
CPC分类号： H01L21/67028 , B05D1/06
摘要： A method for establishing a calibrating standard for wafer inspection includes depositing solid ionized particles of a known size range with an aerosol onto a wafer. The method also includes depositing particles onto a wafer in a deposition chamber by using an aerosol stream and the solid particles suspended in a gas; ionizing the aerosol stream with a negative or positive charge polarity or both by passing the aerosol stream through a non-radioactive ionizer 40 to produce charged particles and supplying such aerosol stream to the deposition chamber. An apparatus 110 for producing charged particles includes an atomizer 10 and a non-radioactive ionizer 40 in fluid communication with each other. The apparatus 110 may also include an electrospray droplet generator for producing an aerosol with dry-solid particles and an ionizer that ionizes the molecules of the gas. The apparatus may also include a generator for generating an aerosol with particles suspended in the gas with a non-radioactive ionizer 40 that ionizes the gas in the aerosol causing the aerosol particles to be charged. The apparatus 110 may further include an electrostatic classifier for classifying the charged particles to a selected size range.
摘要翻译：用于建立晶片检查的校准标准的方法包括将已知尺寸范围的固体离子化颗粒与气溶胶沉积在晶片上。该方法还包括通过使用气溶胶流和悬浮在气体中的固体颗粒将颗粒沉积在沉积室中的晶片上; 通过使气溶胶流通过非放射性电离器40以产生带电粒子并将这种气溶胶流供应到沉积室，使负极或正电荷极性或二者电离气溶胶流。用于产生带电粒子的装置110包括彼此流体连通的雾化器10和非放射性离子发生器40。装置110还可以包括用于产生具有干固体颗粒的气雾剂的电喷雾液滴发生器和使气体分子电离的离子发生器。该装置还可以包括用于产生具有悬浮在气体中的颗粒的气溶胶的发生器，该非放射性离子发生器40使气溶胶中的气体电离，导致气溶胶颗粒被带电。装置110还可以包括用于将带电粒子分类到选定尺寸范围的静电分选机。

4. 发明申请

WO2006029367A3 A PERSONAL MASK TEST SYSTEM 审中-公开
公开(公告)号：WO2006029367A3
公开(公告)日：2006-03-16
申请号：PCT/US2005/032283
申请日：2005-09-09
申请人： MSP CORPORATION , LIU, Benjamin, Y., H. , ROBERTS, Daryl, L.
发明人： LIU, Benjamin, Y., H. , ROBERTS, Daryl, L.
IPC分类号： A62B23/02 , A62B18/02
摘要： A personal mask testing system (PMTS) 10 is of a size of a human hand. The PMTS 10 has several energy efficient features that permit running the PMTS 10 from a battery source within the housing 11. The PMTS 10 also includes a replaceable vapor source.

5. 发明申请

WO2005068682A3 HIGH-PERFORMANCE VAPORIZER FOR LIQUID-PRECURSOR AND MULTI-LIQUID-PRECURSOR VAPORIZATION IN SEMICONDUCTOR THIN FILM DEPOSITION 审中-公开
标题翻译：用于液体前体的高性能蒸发器和半导体薄膜沉积中的多液体前驱体蒸发
公开(公告)号：WO2005068682A3
公开(公告)日：2006-02-23
申请号：PCT/US2004041944
申请日：2004-12-15
申请人： MSP CORP , LIU BENJAMIN Y H , MA YAMIN
发明人： LIU BENJAMIN Y H , MA YAMIN
IPC分类号： B01B1/00 , B05B7/00 , B05B12/14 , C23C16/448
CPC分类号： C23C16/4486 , B01B1/005
摘要： A vaporization system (50, 92, 92a, 92b, 180) for thin film formation and for introducing vapors into a deposition chamber (26, 84, 130) for depositing films onto a semi-conductor surface has a vaporization chamber (52, 116, 192) that is selectively provided with at least two different, that is selectively provided with at least two different, separate, precursor liquids (54A, 54B, 54C, 110A, 110B, 186) carried in a gas stream that may be a single carrier gas, or a selected one of a plurality of carrier gases from gas sources (12, 62A, 62B, 62C, 98A, 98B, 184). When the liquids being introduced are likely to be subject to thermal decomposition from contact with high temperature surfaces, an atomizer (94, 142A, 142B, 154A, 154B, 182) is used at the inlet of the vaporization chamber (52, 116, 192) to provide an aerosol to the vaporization chamber (52, 116, 192) from one or more individual carrier gases from gas sources 12, 62A, 62B, 62C, 98A, 98B for simultaneous or sequential introduction into the vaporization chamber (52, 116, 192). The vaporization chamber (52, 116, 192) may be designed to insure complete vaporization by incorporating a recirculating gas flow through heated passageways (198, 124, 202, 212) before the vaporized gas/vapor mixture exits the vaporization chamber (52, 116, 192).
摘要翻译：用于薄膜形成和用于将蒸气引入用于将膜沉积到半导体表面上的沉积室（26,84,130）中的蒸发系统（50,92,92a，92b，180）具有蒸发室（52,116 ，192），其被选择性地设置有至少两个不同的，其被选择性地设置有携带在气流中的至少两种不同的分离的前体液体（54A，54B，54C，110A，110B，186）载气或来自气体源（12,62A，62B，62C，98A，98B，184）的多种载气中的选定的一种。当引入的液体可能经受与高温表面接触的热分解时，在蒸发室（52,116,192）的入口处使用雾化器（94,142A，142B，154A，154B，182））以从气源12,62A，62B，62C，98A，98B的一种或多种单独的载气提供气化至气化室（52,116,192），以同时或顺序地引入蒸发室（52,116），192）。蒸发室（52,116,192）可以被设计成通过在蒸发的气体/蒸汽混合物离开蒸发室（52,116）之前通过加热通道（198,124,202,212）并入再循环气体流来确保完全蒸发，192）。

6. 发明申请

WO2011097238A2 FINE DROPLET ATOMIZER FOR LIQUID PRECURSOR VAPORIZATION 审中-公开
标题翻译：用于液体前驱体蒸发的精细滴剂原液
公开(公告)号：WO2011097238A2
公开(公告)日：2011-08-11
申请号：PCT/US2011/023362
申请日：2011-02-01
申请人： MSP CORPORATION , LIU, Benjamin, Y., H. , DINH, Thuc, M. , MA, Yamin
发明人： LIU, Benjamin, Y., H. , DINH, Thuc, M. , MA, Yamin
IPC分类号： H01L21/205
CPC分类号： B05B17/04 , C23C16/4486
摘要： The present disclosure relates to an apparatus 10 and a method for forming a droplet aerosol for vaporization and subsequent thin film deposition on a substrate. The apparatus 10 includes a mechanism to control the rate of liquid flow through the apparatus 10, the mechanism including a piezoelectric actuator 240 to adjust the rate of liquid flow and an atomizing mechanism drawing gas from a compressed gas source 70 such that when the gas source conjoins with the liquid, the liquid is atomized to form droplets suspended in the gas thereby forming a droplet aerosol suitable for subsequent thin film deposition on a substrate. The method includes drawing a gas from a compressed gas source and drawing a liquid from a liquid source. The liquid and gas are conjoined in either a coaxial flow relationship or a radial flow relationship or an angular relationship between radial and coaxial flow wherein the gas engages the liquid to form droplets suitable for vaporization and subsequent thin film deposition on a substrate.
摘要翻译：本公开涉及一种用于形成用于汽化和随后在基板上的薄膜沉积的液滴气溶胶的装置10和方法。装置10包括一个控制流过装置10的液体流速的机构，该机构包括一个调节液体流速的压电致动器240和一个从压缩气体源70抽出气体的雾化机构，与液体结合，液体被雾化以形成悬浮在气体中的液滴，从而形成适用于随后的薄膜沉积在基底上的液滴气溶胶。该方法包括从压缩气体源抽取气体并从液体源抽取液体。液体和气体以同轴流动关系或径向流动关系或径向和同轴流动之间的角度关系相结合，其中气体与液体接合以形成适于汽化的液滴和随后在基底上的薄膜沉积。

7. 发明申请

WO2006098792A3 HIGH ACCURACY VAPOR GENERATION AND DELIVERY FOR THIN FILM DEPOSITION 审中-公开
标题翻译：高精度蒸汽发生和输送薄膜沉积
公开(公告)号：WO2006098792A3
公开(公告)日：2009-02-12
申请号：PCT/US2005047613
申请日：2005-12-30
申请人： MSP CORP , LIU BENJAMIN Y H , MA YAMIN
发明人： LIU BENJAMIN Y H , MA YAMIN
IPC分类号： C23C16/00 , C23C16/448
CPC分类号： C23C16/4486 , C23C16/4481 , C23C16/45502 , C23C16/45512 , C23C16/45525 , C23C16/45582 , C23C16/45585 , C23C16/45587 , C23C16/52
摘要： The present invention involves injecting a liquid and gas into a vapor holding chamber (30) held at a sufficiently high temperature to insure all the liquid injected is vaporize and held in the chamber (30) as a vapor. The gas/vapor mixture is then delivered to the deposition chamber (70) in which the deposition substrate (72) is held.
摘要翻译：本发明涉及将液体和气体注入到保持在足够高的温度下的蒸气保持室（30）中，以确保喷射的所有液体蒸发并作为蒸汽保持在室（30）中。然后将气体/蒸汽混合物输送到其中保持沉积基板（72）的沉积室（70）。

8. 发明申请

WO2007062242A3 HIGH STABILITY AND HIGH CAPACITY PRECURSOR VAPOR GENERATION FOR THIN FILM DEPOSITION 审中-公开
标题翻译：用于薄膜沉积的高稳定性和高容量前驱体蒸汽发生
公开(公告)号：WO2007062242A3
公开(公告)日：2007-10-25
申请号：PCT/US2006045512
申请日：2006-11-28
申请人： MSP CORP , LIU BENJAMIN Y H
发明人： LIU BENJAMIN Y H
IPC分类号： B01D47/00
CPC分类号： C23C16/4482 , C23C16/4481
摘要： An apparatus for vaporizing a liquid for subsequent thin film deposition on a substrate. The apparatus comprises a housing with an inlet and an outlet and a liquid reservoir. A mechanism controls the liquid level in the reservoir to a substantially constant level. A gas flow passageway extends along side a porous metal wall with interstitial spaces for containing liquid from the reservoir and with a package for a carrier gas to flow along side the porous metal wall, forming a gas/vapor mixture suitable for thin film deposition.
摘要翻译：一种用于蒸发液体以用于随后的薄膜沉积在基底上的装置。该装置包括具有入口和出口以及液体储存器的壳体。机构将储存器中的液位控制到基本恒定的水平。气体流动通道沿多孔金属壁一侧延伸，其间隙空间用于容纳来自储存器的液体，并具有用于载气的包装，以沿着多孔金属壁一侧流动，形成适于薄膜沉积的气体/蒸汽混合物。

9. 发明申请

WO2006029367A2 A PERSONAL MASK TEST SYSTEM 审中-公开
标题翻译：个人面膜测试系统
公开(公告)号：WO2006029367A2
公开(公告)日：2006-03-16
申请号：PCT/US2005032283
申请日：2005-09-09
申请人： MSP CORP , LIU BENJAMIN Y H , ROBERTS DARYL L
发明人： LIU BENJAMIN Y H , ROBERTS DARYL L
IPC分类号： A62B23/02 , A62B18/02
CPC分类号： A62B27/00
摘要： A personal mask testing system (PMTS) 10 is of a size of a human hand. The PMTS 10 has several energy efficient features that permit running the PMTS 10 from a battery source within the housing 11. The PMTS 10 also includes a replaceable vapor source.
摘要翻译：个人面具测试系统（PMTS）10具有人手大小。 PMTS 10具有允许从壳体11内的电池源运行PMTS 10的若干节能特征.PMTS 10还包括可更换蒸汽源。

10. 发明申请

WO2011097238A3 FINE DROPLET ATOMIZER FOR LIQUID PRECURSOR VAPORIZATION 审中-公开
标题翻译：用于液体前驱体气化的细小液滴雾化器
公开(公告)号：WO2011097238A3
公开(公告)日：2011-12-01
申请号：PCT/US2011023362
申请日：2011-02-01
申请人： MSP CORP , LIU BENJAMIN Y H , DINH THUC M , MA YAMIN
发明人： LIU BENJAMIN Y H , DINH THUC M , MA YAMIN
IPC分类号： H01L21/205
CPC分类号： B05B17/04 , C23C16/4486
摘要： The present disclosure relates to an apparatus 10 and a method for forming a droplet aerosol for vaporization and subsequent thin film deposition on a substrate. The apparatus 10 includes a mechanism to control the rate of liquid flow through the apparatus 10, the mechanism including a piezoelectric actuator 240 to adjust the rate of liquid flow and an atomizing mechanism drawing gas from a compressed gas source 70 such that when the gas source conjoins with the liquid, the liquid is atomized to form droplets suspended in the gas thereby forming a droplet aerosol suitable for subsequent thin film deposition on a substrate. The method includes drawing a gas from a compressed gas source and drawing a liquid from a liquid source. The liquid and gas are conjoined in either a coaxial flow relationship or a radial flow relationship or an angular relationship between radial and coaxial flow wherein the gas engages the liquid to form droplets suitable for vaporization and subsequent thin film deposition on a substrate.
摘要翻译：本公开涉及用于形成用于汽化和随后在基板上的薄膜沉积的微滴气溶胶的设备10和方法。设备10包括控制液体流过装置10的速率的机构，该机构包括用于调节液体流动速率的压电致动器240和雾化机构从压缩气体源70抽取气体，使得当气体源与液体结合时，液体被雾化以形成悬浮在气体中的液滴，由此形成适于随后在基板上的薄膜沉积的液滴气雾剂。该方法包括从压缩气体源抽取气体并从液体源抽取液体。液体和气体以同轴流动关系或径向流动关系或径向和同轴流动之间的角度关系联结，其中气体与液体接合以形成适于汽化和随后在基底上的薄膜沉积的液滴。

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