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    • 9. 发明授权
    • Device and method for microstructured plasma treatment
    • 微结构等离子体处理装置及方法
    • US08758697B2
    • 2014-06-24
    • US12996824
    • 2009-06-09
    • Michael ThomasClaus-Peter KlagesAntje Zanker
    • Michael ThomasClaus-Peter KlagesAntje Zanker
    • B01J19/08
    • B29C59/14B29C2059/023H05H1/2406H05H2001/2431
    • The invention relates to a device for the microstructured plasma treatment of a film substrate, especially of a plastic film. Said device comprises a rotatably received cylindrical electrode the surface of which contains or consists of metal, especially chromium, the surface having microstructured depressions, a planar high-voltage electrode the surface of which has a shape complementary to that of the cylindrical electrode and can be arranged on a section of the surface of the cylindrical electrode in a substantially form-fit manner, a transport device for transporting the film substrate to be treated between the surface of the cylindrical electrode and the high-voltage electrode, and a device for feeding a process gas to the surface of the cylindrical electrode and to the interspace between the cylindrical electrode and the high-voltage electrode.
    • 本发明涉及用于薄膜基材,特别是塑料薄膜的微结构等离子体处理的装置。 所述装置包括可旋转接收的圆柱形电极,其表面包含金属,特别是铬,具有微结构凹陷的表面,平坦的高压电极,其表面具有与圆柱形电极的形状互补的形状,并且可以是 以大致成形的方式配置在圆筒形电极的表面的一部分上,用于输送在圆筒形电极的表面和高压电极之间待处理的薄膜基板的输送装置,以及用于输送 处理气体到圆柱形电极的表面和圆柱形电极和高压电极之间的间隙。
    • 10. 发明申请
    • DEVICE AND METHOD FOR MICROSTRUCTURED PLASMA TREATMENT
    • 用于微结构等离子体处理的装置和方法
    • US20110259730A1
    • 2011-10-27
    • US12996824
    • 2009-06-09
    • Michael ThomasClaus-Peter KlagesAntje Zanker
    • Michael ThomasClaus-Peter KlagesAntje Zanker
    • B01J19/08
    • B29C59/14B29C2059/023H05H1/2406H05H2001/2431
    • The invention relates to a device for the microstructured plasma treatment of a film substrate, especially of a plastic film Said device comprises a rotatably received cylindrical electrode the surface of which contains or consists of metal, especially chromium, the surface having microstructured depressions, a planar high-voltage electrode the surface of which has a shape complementary to that of the cylindrical electrode and can be arranged on a section of the surface of the cylindrical electrode in a substantially form-fit manner, a transport device for transporting the film substrate to be treated between the surface of the cylindrical electrode and the high-voltage electrode, and a device for feeding a process gas to the surface of the cylindrical electrode and to the interspace between the cylindrical electrode and the high-voltage electrode.
    • 本发明涉及一种用于薄膜基材,特别是塑料薄膜的微结构等离子体处理的装置。所述装置包括可旋转接收的圆柱形电极,其表面包含金属,特别是铬,具有微结构凹陷的表面,平面 其表面具有与圆柱形电极的形状互补的形状的高电压电极,并且可以基本形状配置在圆柱形电极的表面的一部分上,用于输送膜基材的输送装置为 在圆柱形电极的表面和高压电极之间进行处理,以及用于将工艺气体供给到圆柱形电极的表面以及圆柱形电极和高压电极之间的间隙的装置。