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    • 6. 发明授权
    • Method for hydrophobic and oleophobic modification of polymeric materials with atmospheric plasmas
    • 具有大气等离子体的聚合材料疏水和疏油改性的方法
    • US08414980B2
    • 2013-04-09
    • US12545664
    • 2009-08-21
    • Tien-Hsiang HsuehMien-Win WuChi-Fong Ai
    • Tien-Hsiang HsuehMien-Win WuChi-Fong Ai
    • C08J7/18
    • B05D3/142C08J7/18C08J2427/12D06M10/025D06M14/18D06M14/22D06M14/26D06M14/28D06M14/32D06M14/34D06M2200/11D06M2200/12
    • A method of fabricating hydrophobic and oleophobic polymer fabric through two stages of modification using atmospheric plasmas including (a) moving a substrate into an atmospheric plasma area, generating an atmospheric filamentary discharge plasma with a first plasma working gas to obtain a first rough surface of said substrate, (b) exposing plasma treated substrate to air to obtain highly active peroxide on said first rough surface of said substrate, (c) immersing said substrate in a solution of fluorocarbon compound and processing a first stage of graft of a fluorocarbon monomer or oligomer on said substrate to obtain a grafted fluorocarbon monomer or oligomer layer on said first rough surface of said substrate, (d) processing a second stage of graft a fluorocarbon functional group to said grafted fluorocarbon monomer or oligomer layer by generating a carbon tetrafluoride plasma from a second plasma working gas and irradiating said carbon tetrafluoride plasma on said grafted fluorocarbon monomer or oligomer layer; and (e) curing and drying said substrate.
    • 一种通过使用大气等离子体的两个阶段的修饰制造疏水和疏油聚合物织物的方法,包括:(a)将基底移动到大气等离子体区域,用第一等离子体工作气体产生大气丝状放电等离子体,以获得所述 (b)将等离子体处理的基板暴露于空气中以在所述基板的所述第一粗糙表面上获得高活性过氧化物,(c)将所述基材浸入氟碳化合物溶液中,并处理氟碳单体或低聚物的第一接枝段 在所述基板上在所述基板的所述第一粗糙表面上获得接枝的碳氟单体或低聚物层,(d)通过从所述基板上生成碳氟化合物单体或低聚物层, 第二等离子体工作气体,并且在所述接枝的氟碳上照射所述四氟化碳等离子体 单体或低聚物层; 和(e)固化和干燥所述基材。
    • 10. 发明申请
    • RF Hollow Cathode Plasma Generator
    • 射频空心阴极等离子体发生器
    • US20110192348A1
    • 2011-08-11
    • US12701035
    • 2010-02-05
    • Ching-Pei TsengCheng-Chang HsiehChi-Fong AiChia-Cheng LeeDeng-Lain Lin
    • Ching-Pei TsengCheng-Chang HsiehChi-Fong AiChia-Cheng LeeDeng-Lain Lin
    • C23C16/00H05H1/24
    • C23C16/509H01J37/3244H01J37/32596
    • An RF hollow cathode plasma source consists of a vacuum chamber, a pipe, a hollow cathode, at least two compartments, a conduit and input electrodes. The pipe is inserted into the chamber for introducing working gas into the chamber. The hollow cathode is disposed in the chamber and formed with a large number of apertures. At least two compartments are located below the hollow cathode. Each of the compartments includes small apertures for uniformly spreading the working gas into the apertures of the hollow cathode. The conduit is disposed along two sides of the hollow cathode to circulate cooling water around the hollow cathode. The plural input power leads are arranged near the hollow cathode. The input power leads, the pipe and the conduits are connected to the hollow cathode though the electrically-insulated walls of the grounded vacuum chamber.
    • RF空心阴极等离子体源由真空室,管,中空阴极,至少两个隔室,导管和输入电极组成。 将管插入腔室中以将工作气体引入腔室。 中空阴极设置在室中并形成有大量孔。 至少两个隔室位于空心阴极的下面。 每个隔室包括用于将工作气体均匀地分散到中空阴极的孔中的小孔。 导管沿空心阴极的两侧设置,以将冷却水循环在中空阴极周围。 多个输入电源引线设置在中空阴极附近。 输入功率引线,管道和导管通过接地真空室的电绝缘壁连接到空心阴极。