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    • 1. 发明申请
    • ENERGY SENSORS FOR LIGHT BEAM ALIGNMENT
    • 用于光束对准的能量传感器
    • WO2013028272A1
    • 2013-02-28
    • PCT/US2012/046093
    • 2012-07-10
    • CYMER, INC. ( A NEVADA CORPORATION)GRAHAM, Matthew, R.CHANG, StevenCROUCH, James, H.FOMENKOV, Igor, V.
    • GRAHAM, Matthew, R.CHANG, StevenCROUCH, James, H.FOMENKOV, Igor, V.
    • H05G2/00
    • G03F7/70033H05G2/003H05G2/008
    • An apparatus includes a drive laser system producing an amplified light beam of pulses that travels along a drive axis; a beam delivery system that directs the amplified light beam of pulses toward a target region; a target material delivery system that provides a target mixture containing a target material in the target region; two or more sensors radially separated from a main axis that crosses the target region, the two or more sensors being configured to detect energy of ultraviolet electromagnetic radiation emitted from a plasma state of the target material when the amplified light beam of pulses intersects the target mixture; and a controller that receives the output from the two or more sensors. The controller is configured to estimate a relative radial alignment between the target mixture and the drive axis within the target region based on an analysis of the detected energy.
    • 一种装置包括驱动激光系统,其产生沿驱动轴线行进的放大的脉冲光束; 射束传送系统,其将放大的脉冲光束朝向目标区域引导; 目标材料输送系统,其在目标区域中提供含有靶材料的目标混合物; 两个或更多个传感器与跨越目标区域的主轴径向分离,两个或更多个传感器被配置为当被放大的脉冲光束与目标混合物相交时,检测从目标材料的等离子体状态发射的紫外电磁辐射的能量 ; 以及接收来自两个或更多个传感器的输出的控制器。 控制器被配置为基于对所检测的能量的分析来估计目标混合物和目标区域内的驱动轴之间的相对径向对准。
    • 2. 发明申请
    • ALIGNMENT OF LIGHT SOURCE FOCUS
    • 光源对焦
    • WO2012012267A1
    • 2012-01-26
    • PCT/US2011/044058
    • 2011-07-14
    • CYMER, INC.GRAHAM, Matthew, R.PARTLO, William, N.CHANG, StevenBERGSTEDT, Robert, A.
    • GRAHAM, Matthew, R.PARTLO, William, N.CHANG, StevenBERGSTEDT, Robert, A.
    • A61N5/06
    • H05G2/008G01B11/0608G01B11/26H05G2/003H05G2/005
    • An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber,, a wavefront modification system in the path of the reflected laser beam and between, the target location- and the detection system, and a controller. The -wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location o f the focal plane of the amplified light' beam relative to the target material based on the detected image of the reflected laser beam,
    • 一种极紫外光系统包括:转向系统,其将沿着传播方向传播的放大的光束转向并聚焦在远紫外光室内的目标位置附近的焦平面;检测系统,包括至少一个检测器,其被定位成检测图像 从腔室内的目标材料的至少一部分反射的激光束,在反射激光束的路径中以及目标位置与检测系统之间的波前修改系统以及控制器。 波前修改系统被配置为根据沿着传播方向的目标焦平面位置来修改反射激光束的波前。 控制器包括用于基于检测到的反射激光束的图像来调整放大的光束相对于目标材料的焦平面的位置的逻辑,