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1. 发明授权

US07573563B2 Exposure apparatus and device manufacturing method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07573563B2
公开(公告)日：2009-08-11
申请号：US11366356
申请日：2006-03-01
申请人： Kenji Yamazoe , Seiji Takeuchi , Akiyoshi Suzuki
发明人： Kenji Yamazoe , Seiji Takeuchi , Akiyoshi Suzuki
IPC分类号： G03B27/72 , G03B27/42 , G03B27/54
CPC分类号： G03F7/7085 , G01J4/04 , G03F7/70058 , G03F7/70566 , G03F7/70591
摘要： An exposure apparatus includes an illumination optical system for illuminating the reticle using the ultraviolet light from the light source, and a polarization measuring unit measuring the polarization state of the ultraviolet light, the polarization measuring unit including an optical unit for providing at least three different phase differences to the ultraviolet light that has passed at least part of the illumination optical system, a polarization element for providing a different transmittance in accordance with a polarization state of the ultraviolet light that has passed the optical unit, and an image pickup device for detecting a light intensity of the ultraviolet light that has passed the polarization element, the polarization measuring unit measuring the polarization state of the ultraviolet light that has passed the at least part of the illumination optical system based on a detection result of the image pickup device.
摘要翻译：曝光装置包括：照明光学系统，其使用来自光源的紫外光照射标线片;以及偏振光测量单元，测量紫外光的偏振状态，所述偏振光测量单元包括用于提供至少三个不同相位的光学单元与通过照明光学系统的至少一部分的紫外线的差异，根据通过光学单元的紫外线的偏振状态提供不同透射率的偏振元件，以及用于检测通过偏振元件的紫外线的光强度，所述偏振光测定单元，根据所述摄像元件的检测结果，测量已经通过所述照明光学系统的至少一部分的紫外线的偏振状态。

2. 发明申请

US20070252968A1 EXPOSURE APPARATUS 失效
标题翻译：曝光装置
公开(公告)号：US20070252968A1
公开(公告)日：2007-11-01
申请号：US11742042
申请日：2007-04-30
申请人： Akinori Ohkubo , Akiyoshi Suzuki
发明人： Akinori Ohkubo , Akiyoshi Suzuki
IPC分类号： G03B27/54
CPC分类号： G03F7/70208 , G03F7/70141 , G03F7/70191
摘要： An exposure apparatus that exposes a pattern of an original onto a substrate includes a condenser optical system configured to split light from a light source into plural rays, to condense the plural rays at different positions on the original, and to make a central part of each of the plural rays that illuminate the original darker than a periphery at the Fourier transform plane with respect to the original, and a projection optical system configured to project the pattern of the original onto the substrate.
摘要翻译：将原稿的图案曝光到基板上的曝光装置包括：聚光器系统，被配置为将来自光源的光分离成多根，将多根光线在原稿的不同位置进行冷凝，并且使各个所述多个光线相对于所述原稿在所述傅里叶变换平面处照亮所述原件比所述周边更暗;以及投影光学系统，其被配置为将所述原稿的图案投影到所述基板上。

3. 发明授权

US07196773B2 Illumination optical system and exposure apparatus using the same 有权
标题翻译：照明光学系统和使用其的曝光装置
公开(公告)号：US07196773B2
公开(公告)日：2007-03-27
申请号：US10538230
申请日：2004-09-10
申请人： Akiyoshi Suzuki
发明人： Akiyoshi Suzuki
IPC分类号： G03B27/72 , G03B27/42 , G03B27/54
CPC分类号： G02B27/0961 , G02B5/32 , G02B27/0905 , G02B27/0927 , G03F7/70108 , G03F7/70158 , G03F7/70566
摘要： An illumination optical system for illuminating an illuminated surface using light from a light source includes a first diffraction optical element upon which the light from the light source is incident, and a second diffraction optical element upon which the light from the light source is incident, wherein the light from the first diffraction optical element forms a first part of an illumination distribution on a predetermined surface that substantially has a Fourier transform relationship with the illuminated surface, and the light from the second diffraction optical element forms a second part of the illumination distribution.
摘要翻译：使用来自光源的光照射照明面的照明光学系统包括：来自光源的光入射的第一衍射光学元件和来自光源的光入射的第二衍射光学元件，其中，来自第一衍射光学元件的光在与被照射面基本上具有傅立叶变换关系的预定表面上形成照明分布的第一部分，并且来自第二衍射光学元件的光形成照明分布的第二部分。

4. 发明授权

US06681844B1 Plate type heat exchanger 失效
标题翻译：板式换热器
公开(公告)号：US06681844B1
公开(公告)日：2004-01-27
申请号：US09806503
申请日：2001-04-13
申请人： Naoyuki Inoue , Toshio Matsubara , Tomoyoshi Irie , Akiyoshi Suzuki , Tomoyuki Uchimura
发明人： Naoyuki Inoue , Toshio Matsubara , Tomoyoshi Irie , Akiyoshi Suzuki , Tomoyuki Uchimura
IPC分类号： F28D900
CPC分类号： F28F3/046 , F25B33/00 , F25B37/00 , F25B39/00 , F28D5/02 , F28D9/0043 , F28D2021/007 , F28D2021/0071 , F28F3/042 , F28F3/044 , F28F3/083 , F28F9/0275 , F28F2250/104
摘要： The present invention relates to a plate type heat exchanger having a heat exchange element composed of two plates for exchanging heat between a fluid flowing inside the heat exchange element and a fluid flowing outside the heat exchange element. In the plate type heat exchanger, the two plates (1) have a plurality of depressions (8), and the depressions are brought into contact with and bonded to each other. Peripheral portions of the plates are sealed to form a space in which a fluid flows and constitute a heat exchange element (2) having opening portions (5, 6) at both ends thereof. The heat exchange elements (2) are piled on and bonded to each other so that the opening portions (5, 6) communicate with each other.
摘要翻译：本发明涉及一种板式热交换器，其具有热交换元件，该热交换元件由在热交换元件内部流动的流体与流过热交换元件的流体之间进行热交换的两个板构成。在板式热交换器中，两个板（1）具有多个凹部（8），并且使凹部彼此接触并接合。板的外围部分被密封以形成流体流动的空间，并且构成在其两端具有开口部分（5,6）的热交换元件（2）。热交换元件（2）彼此堆叠并彼此结合，使得开口部（5,6）彼此连通。

5. 发明授权

US06534242B2 Multiple exposure device formation 有权
标题翻译：多曝光装置形成
公开(公告)号：US06534242B2
公开(公告)日：2003-03-18
申请号：US09783600
申请日：2001-02-15
申请人： Mitsuro Sugita , Akiyoshi Suzuki , Miyoko Kawashima , Kenji Saitoh , Yuichi Iwasaki
发明人： Mitsuro Sugita , Akiyoshi Suzuki , Miyoko Kawashima , Kenji Saitoh , Yuichi Iwasaki
IPC分类号： G03C500
CPC分类号： G03F7/2022 , G03F7/7045 , G03F7/70466
摘要： An exposure method for transferring a device pattern to a resist, wherein the device pattern includes a first element and a second element having a linewidth narrower than the first element. The method includes a first exposure step for exposing the resist by use of an interference fringe, produced by interference of two light beams, through an exposure amount substantially not greater than a threshold of the resist, and a second exposure step for exposing the resist with a light pattern related to the first and second elements. A light component, of the light pattern, related to the first element bears an exposure amount greater than the threshold, a light component, of the light pattern, related to the second element bears an exposure amount not greater than the threshold and is to be combined with light in a portion of the interference fringe, and a sum of the exposure amount of the light component related to the second element and an exposure amount provided by the light in the portion of the interference fringe is greater than the threshold.
摘要翻译：一种用于将器件图案转印到抗蚀剂的曝光方法，其中所述器件图案包括第一元件和具有比所述第一元件窄的线宽的第二元件。该方法包括第一曝光步骤，用于通过使用由两个光束的干涉产生的干涉条纹曝光抗蚀剂，所述干涉条纹通过基本上不大于抗蚀剂阈值的曝光量，以及第二曝光步骤，用于将抗蚀剂与与第一和第二元素相关的光图案。与第一元件相关的光图案的光分量具有大于阈值的曝光量，与第二元件相关的光图案的光分量具有不大于阈值的曝光量，并且为与干涉条纹的一部分中的光结合，并且与第二元素相关的光分量的曝光量与干涉条纹部分中的光提供的曝光量之和大于阈值。

6. 发明授权

US06441886B2 Illumination optical system and exposure apparatus having the same 有权
标题翻译：照明光学系统和具有该光学系统的曝光装置
公开(公告)号：US06441886B2
公开(公告)日：2002-08-27
申请号：US09414437
申请日：1999-10-07
申请人： Akiyoshi Suzuki , Yoshiyuki Sekine
发明人： Akiyoshi Suzuki , Yoshiyuki Sekine
IPC分类号： G03B2772
CPC分类号： G03F7/70091 , G03B27/54
摘要： An illumination optical system for use in an exposure apparatus for projecting a pattern of a mask onto a substrate. The illumination system includes a first beam shape changing optical system for transforming a light, supplied from a light source, into a slit-like light of an oblong shape, and a second beam shape changing optical system for transforming the slit-like light of oblong shape into a slit-like light of an arcuate shape, the second beam shape changing optical system having a prism element. The mask is illuminated with the slit-like light of arcuate shape.
摘要翻译：一种用于曝光装置的照明光学系统，用于将掩模的图案投影到基底上。照明系统包括用于将从光源提供的光转换成长方形的狭缝状光的第一光束形状变化光学系统和用于变换长方形狭缝状光的第二光束形状变化光学系统形成为弧形的狭缝状的光，第二光束形状变化光学系统具有棱镜元件。面罩用弧形的狭缝状光照亮。

7. 发明授权

US06377337B1 Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US06377337B1
公开(公告)日：2002-04-23
申请号：US09299558
申请日：1999-04-27
申请人： Mitsuro Sugita , Akiyoshi Suzuki
发明人： Mitsuro Sugita , Akiyoshi Suzuki
IPC分类号： G03B2754
CPC分类号： G03F7/70216 , G03B27/54 , G03F7/7045
摘要： A projection exposure apparatus, having a multiple exposure mode, for projecting a pattern of a mask onto a wafer. In the apparatus, an illumination system illuminates the mask and a projection system supplies into an optical path a filter which blocks a zero-order light beam of diffracted light projected from the mask. An exposure step in the mode of multiple exposure is performed in a state in which the filter has been supplied into the optical path.
摘要翻译：一种具有多重曝光模式的投影曝光装置，用于将掩模的图案投影到晶片上。在该装置中，照明系统照亮掩模，并且投影系统向光路提供阻挡从掩模投影的衍射光的零级光束的滤光器。在将滤光器提供到光路中的状态下进行多次曝光模式的曝光步骤。

8. 发明授权

US5361122A Autofocusing device and projection exposure apparatus with the same 失效
标题翻译：自动对焦装置和投影曝光装置相同
公开(公告)号：US5361122A
公开(公告)日：1994-11-01
申请号：US11097
申请日：1993-01-29
申请人： Yoshiharu Kataoka , Akiyoshi Suzuki , Yuichi Yamada
发明人： Yoshiharu Kataoka , Akiyoshi Suzuki , Yuichi Yamada
IPC分类号： G03F7/207 , G03F9/00 , G03B27/42
CPC分类号： G03F9/7026
摘要： A focusing method is disclosed wherein a substrate is moved substantially along a focal plane of a projection optical system up to a predetermined station adjacent to the focal plane of the projection optical system and then, at the predetermined station, the surface of the substrate is brought into substantial coincidence with the focal plane of the projection optical system. The method includes the steps of detecting a deviation of the surface of the substrate with respect to the focal plane of the projection optical system, before the substrate, being moved substantially along the focal plane of the projection optical system, is moved up to the predetermined station; and substantially correcting the deviation on the basis of the detection.
摘要翻译：公开了一种聚焦方法，其中基板沿着投影光学系统的焦平面移动直到与投影光学系统的焦平面相邻的预定台，然后在预定的位置，使基板的表面与投影光学系统的焦平面大致一致。该方法包括以下步骤：在基板沿着投影光学系统的焦平面移动之前，检测基板相对于投影光学系统的焦平面的表面的偏差，站; 并且基于检测基本上校正偏差。

9. 发明授权

US5359407A Optical scanning apparatus, surface-state inspection apparatus and exposure apparatus 失效
标题翻译：光学扫描装置，表面状态检查装置和曝光装置
公开(公告)号：US5359407A
公开(公告)日：1994-10-25
申请号：US177189
申请日：1994-01-03
申请人： Akiyoshi Suzuki , Michio Kohno
发明人： Akiyoshi Suzuki , Michio Kohno
IPC分类号： G01B11/30 , G01N21/88 , G01N21/94 , G01N21/956 , G02B26/12 , G03F1/84 , G03F7/20 , H01L21/66
CPC分类号： G01N21/8806 , G02B26/123 , G03F7/70483 , G01N2201/0636
摘要： An optical system is arranged so that a scanning light beam for scanning a first region to be inspected and a scanning light beam for scanning a second region to be inspected are not simultaneously incident upon an object to be inspected. This prevents an adverse influence on the inspection caused by flare light generated when one scanning light beam is incident upon an edge of the object and is received by a light-receiving optical system for the region to be inspected scanned by another scanning light beam. The system includes two polygon mirrors provided as one body in an optical system at a position for projecting the light beams so that the distance between a focus point of the light beam projected on the lower surface of the object and a focus point of the light beam projected on the upper surface of the object in the beam scanning direction is greater than the width of the object in the beam scanning direction. As a result, the two light beams are alternately incident upon the object.
摘要翻译：光学系统被布置成使得用于扫描待检查的第一区域的扫描光束和用于扫描待检查的第二区域的扫描光束不会同时入射到待检查对象上。这防止了当一个扫描光束入射到物体的边缘上并且被受光光学系统接收的由另一个扫描光束进行检查的区域的光束所产生的火炬光引起的检查的不利影响。该系统包括在用于投射光束的位置处的光学系统中作为一体设置的两个多面镜，使得投射在物体的下表面上的光束的焦点与光束的焦点之间的距离投影在物体的上表面上的光束扫描方向大于物体在光束扫描方向上的宽度。结果，两个光束交替地入射到物体上。

10. 发明授权

US5268744A Method of positioning a wafer with respect to a focal plane of an optical system 失效
标题翻译：相对于光学系统的焦平面定位晶片的方法
公开(公告)号：US5268744A
公开(公告)日：1993-12-07
申请号：US680547
申请日：1991-04-04
申请人： Tetsuya Mori , Akiyoshi Suzuki
发明人： Tetsuya Mori , Akiyoshi Suzuki
IPC分类号： G01C3/06 , G03F9/00 , H01L21/027 , H01L21/30 , G01B11/00
CPC分类号： G03F9/7023
摘要： A method of positioning a surface of a wafer with respect to a focal plane of an optical system is disclosed. The method includes: forming an image of a pattern in a first region of a wafer through the optical system; projecting through the optical system a radiation beam to the first region of the wafer and projecting through the optical system a reflection beam from the first region of the wafer onto a predetermined plane; evaluating the formed image to determine the focal plane of the optical system and determining, as a reference position, a position of incidence on the predetermined plane of the reflection beam from the first region of the wafer at a level corresponding to the determined focal plane; projecting a radiation beam to a second region of the wafer and projecting through the optical system a reflection beam from the second region of the wafer onto the predetermined plane; and positioning the second region of the wafer on the determined focal plane of the optical system on the basis of a position of incidence of the reflection beam from the second region of the wafer with respect to the determined reference position.
摘要翻译：公开了一种相对于光学系统的焦平面来定位晶片表面的方法。该方法包括：通过光学系统在晶片的第一区域中形成图案的图像; 通过光学系统将辐射束投射到晶片的第一区域并通过光学系统突出从晶片的第一区域到预定平面的反射光束; 评估所形成的图像以确定所述光学系统的焦平面，并且以与所确定的焦平面相对应的水平确定来自所述晶片的所述第一区域的所述反射光束的预定平面上的入射位置作为参考位置; 将辐射束投影到所述晶片的第二区域并且通过所述光学系统突出从所述晶片的所述第二区域到所述预定平面的反射光束; 并且基于来自晶片的第二区域的反射光束相对于所确定的参考位置的入射位置，将晶片的第二区域定位在光学系统的确定的焦平面上。

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