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1. 发明授权

US08254661B2 System and method for generating spatial signatures 有权
标题翻译：用于生成空间签名的系统和方法
公开(公告)号：US08254661B2
公开(公告)日：2012-08-28
申请号：US12477061
申请日：2009-06-02
申请人： Ditza Auerbach
发明人： Ditza Auerbach
IPC分类号： G06K9/00
CPC分类号： G06K9/3233 , G01N21/9501 , G06K2209/19 , G06T7/0004 , G06T2207/20016 , G06T2207/30141 , G06T2207/30148
摘要： A system and method for performing spatial signature analysis, the system including a memory unit for storing wafer defect density maps of multiple resolutions, derived from a defect map obtained by an inspection tool; an analyzer for analyzing the wafer defect density maps to identify zones of interest; and a spatial signature generator for generating spatial signatures in response to relations between zones of interest of different density resolution.
摘要翻译：一种用于执行空间签名分析的系统和方法，所述系统包括存储单元，用于存储由检验工具获得的缺陷图导出的多个分辨率的晶片缺陷密度图; 分析器，用于分析晶片缺陷密度图，以识别感兴趣的区域; 以及空间签名生成器，用于响应于不同密度分辨率的感兴趣区域之间的关系产生空间签名。

2. 发明申请

US20130051653A1 System and method for generating spatial signatures 有权
标题翻译：用于生成空间签名的系统和方法
公开(公告)号：US20130051653A1
公开(公告)日：2013-02-28
申请号：US13585730
申请日：2012-08-14
申请人： Ditza Auerbach
发明人： Ditza Auerbach
IPC分类号： G06K9/00
CPC分类号： G06K9/3233 , G01N21/9501 , G06K2209/19 , G06T7/0004 , G06T2207/20016 , G06T2207/30141 , G06T2207/30148
摘要： A system and method for spatial signature analysis, the system includes a memory unit for storing wafer defect density maps of multiple resolutions, derived from a defect map obtained by an inspection tool; an analyzer for analyzing the wafer defect density maps to identify zones of interest; and a spatial signature generator for generating spatial signatures in response relations between zones of interest of different density resolution.
摘要翻译：一种用于空间特征分析的系统和方法，该系统包括存储单元，用于存储由检验工具获得的缺陷图导出的多个分辨率的晶片缺陷密度图; 分析器，用于分析晶片缺陷密度图，以识别感兴趣的区域; 以及用于在不同密度分辨率的感兴趣区域之间的响应关系中生成空间签名的空间签名生成器。

3. 发明专利

IL225421A Method for providing high resolution, high contrast fused mri images 未知
公开(公告)号：IL225421A
公开(公告)日：2017-11-30
申请号：IL22542113
申请日：2013-03-21
申请人： URI RAPOPORT , ASPECT IMAGING LTD , DITZA AUERBACH , ASPECT IMAGING LTD
发明人： URI RAPOPORT , DITZA AUERBACH
IPC分类号： G01V20060101

4. 发明授权

US08553970B2 System and method for generating spatial signatures 有权
标题翻译：用于生成空间签名的系统和方法
公开(公告)号：US08553970B2
公开(公告)日：2013-10-08
申请号：US13585730
申请日：2012-08-14
申请人： Ditza Auerbach
发明人： Ditza Auerbach
IPC分类号： G06K9/00
CPC分类号： G06K9/3233 , G01N21/9501 , G06K2209/19 , G06T7/0004 , G06T2207/20016 , G06T2207/30141 , G06T2207/30148
摘要： A system and method for performing spatial signature analysis, the system including a memory unit for storing wafer defect density maps of multiple resolutions, derived from a defect map obtained by an inspection tool; an analyzer for analyzing the wafer defect density maps to identify zones of interest; and a spatial signature generator for generating spatial signatures in response to relations between zones of interest of different density resolution.
摘要翻译：一种用于执行空间签名分析的系统和方法，所述系统包括存储单元，用于存储由检验工具获得的缺陷图导出的多个分辨率的晶片缺陷密度图; 分析器，用于分析晶片缺陷密度图，以识别感兴趣的区域; 以及空间签名生成器，用于响应于不同密度分辨率的感兴趣区域之间的关系产生空间签名。

5. 发明申请

US20060115143A1 Method for filtering nuisance defects 有权
标题翻译：过滤滋扰缺陷的方法
公开(公告)号：US20060115143A1
公开(公告)日：2006-06-01
申请号：US11287815
申请日：2005-11-28
申请人： Ditza Auerbach
发明人： Ditza Auerbach
IPC分类号： G06K9/00
CPC分类号： G01N21/95607 , G01N2021/8825 , G01N2021/8854 , G01R31/2831 , G06T7/0004 , G06T2207/30148
摘要： A method for inspecting a sample, consisting of receiving a definition of image attributes that are characteristic of defects, and processing an image of the sample so as to identify candidate defects on the sample. The method further includes forming distributions of values of the respective attributes from the candidate defects, and selecting a set of the candidate defects that are characterized by respective candidate attribute values that fall in one or more tails of the distributions. The selected set is presented to a human operator, and respective classifications of the candidate defects in the selected set are received from the operator. A definition of the one or more tails of the distributions is refined responsively to the classifications. The method may be used as a filter to remove false alarms, or nuisances. The method may also be used to categorize the candidate defects into two or more classes.
摘要翻译：一种用于检查样本的方法，包括接收具有缺陷特征的图像属性的定义，以及处理样本的图像，以便识别样本上的候选缺陷。所述方法还包括从所述候选缺陷形成各个属性的值的分布，以及选择一组候选缺陷，所述候选缺陷的特征在于分布在所述分布的一个或多个尾部中的各个候选属性值。所选择的集合被呈现给人类操作者，并且从操作者接收所选集合中候选缺陷的相应分类。分发的一个或多个尾部的定义是响应于分类而精炼的。该方法可以用作过滤器来消除假警报或妨扰。该方法还可用于将候选缺陷分类为两个或更多个类别。

6. 发明专利

IL245185B Motion monitor 未知
公开(公告)号：IL245185B
公开(公告)日：2022-09-01
申请号：IL24518516
申请日：2016-04-18
申请人： BREATHEVISION LTD , DITZA AUERBACH
发明人： DITZA AUERBACH
摘要： A system for monitoring the respiratory activity of a subject, which comprises two or more signal generating elements being inertial sensors, or light emitting elements, applied to the thorax of a subject, for generating signals that are indicative of displacement of the thorax of the subject throughout a predetermined time period; a receiver for receiving the generated signals during breathing motions of the subject; and one or more computing devices in data communication with the receiver, for analyzing the breathing motions. The one or more computing devices is operable to generate, by the two or more signal generating elements, signals that are indicative of displacement of the thorax of the subject, throughout the predetermined time period; calculate the current displacements and relative phases of the signal generating elements throughout the predetermined time period; and calculate, throughout the predetermined time period, the breathing volume from the displacements and the relative phases.

7. 发明专利

IL273112D0 Monitoring system 未知
公开(公告)号：IL273112D0
公开(公告)日：2020-04-30
申请号：IL27311220
申请日：2020-03-05
申请人： DITZA AUERBACH , BREATHEVISION LTD , MENASHE TEREM
发明人： DITZA AUERBACH , MENASHE TEREM
IPC分类号： A61B20060101
摘要： A wearable motion monitoring device including: a housing sized and shaped to be positioned between a body region of a subject and a garment worn by the patient; a marker included in said housing, said marker including at least one light emitter, wherein said light emitter is positioned to emit light from an upper surface of said marker, such that said at least one light emitter is indicative of displacements of said body region; at least one garment holder incorporated in said housing, said holder serves as an anchoring point between said marker and said garment, said garment overlies said marker when anchored by said at least one garment holder.

8. 发明专利

IL245185D0 Motion monitor 未知
公开(公告)号：IL245185D0
公开(公告)日：2016-06-30
申请号：IL24518516
申请日：2016-04-18
申请人： BREATHEVISION LTD , DITZA AUERBACH
IPC分类号： A61B20060101

9. 发明申请

US20150077105A1 METHOD FOR PROVIDING HIGH RESOLUTION, HIGH CONTRAST FUSED MRI IMAGES 有权
标题翻译：用于提供高分辨率，高对比度融合MRI图像的方法
公开(公告)号：US20150077105A1
公开(公告)日：2015-03-19
申请号：US13877553
申请日：2011-10-06
申请人： Uri Rapoport , Ditza Auerbach
发明人： Uri Rapoport , Ditza Auerbach
IPC分类号： G01R33/565 , G01N24/08 , G01R33/38
CPC分类号： G01R33/565 , G01N24/082 , G01N24/085 , G01R33/38 , G01R33/5602 , G01R33/5608 , G06T5/50 , G06T2207/10088 , G06T2207/20221
摘要： This present invention relates to an MRI scanning assembly and a method for fusing MRI images of a target thereby generating and providing high resolution, high contrast fused MRI images. The MRI images of the target are generated by different MRI devices operating at different magnetic field intensities. A method is also described for fusing MRI images generated by an MRI device operating with different operational parameters and operational protocols.
摘要翻译：本发明涉及MRI扫描组件和用于融合目标的MRI图像的方法，从而生成并提供高分辨率，高对比度融合的MRI图像。目标的MRI图像由在不同磁场强度下操作的不同MRI装置产生。还描述了一种用于融合由不同操作参数和操作协议操作的MRI设备生成的MRI图像的方法。

10. 发明申请

US20100076699A1 WAFER DEFECT DETECTION SYSTEM AND METHOD 有权
标题翻译：波形缺陷检测系统及方法
公开(公告)号：US20100076699A1
公开(公告)日：2010-03-25
申请号：US12566448
申请日：2009-09-24
申请人： Ditza Auerbach
发明人： Ditza Auerbach
IPC分类号： G06F19/00 , G01N21/00
CPC分类号： G01N21/9501
摘要： Random defects and repeaters accommodated on a wafer are detected using slice information obtained by scanning a plurality of wafer slices; analyzing defect information using a first set of filters selected to detect random defects, thereby generating a first set of defects per slice, analyzing the defect information using a second set of filters selected to detect repeaters, thereby providing a second set of defects per slice; analyzing a plurality of the second sets of defects per slice using a third set of filters selected to detect repeater families, thereby providing a set of repeaters per wafer; and optionally combining the set of repeaters per wafer with a plurality of the first sets of defects per slice, thereby generating one or more defect maps indicative of random defects and/or repeaters.
摘要翻译：使用通过扫描多个晶片切片获得的切片信息来检测容纳在晶片上的随机缺陷和中继器; 使用被选择用于检测随机缺陷的第一组滤波器来分析缺陷信息，由此产生每个切片的第一组缺陷，使用被选择用于检测中继器的第二组滤波器来分析缺陷信息，从而提供每个切片的第二组缺陷; 使用选择用于检测中继器族的第三组滤波器来分析每个切片的多个第二组缺陷，从而为每个晶片提供一组中继器; 并且可选地将每个晶片的中继器集合与每个切片的多个第一组缺陷组合，从而生成指示随机缺陷和/或中继器的一个或多个缺陷图。

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