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1. 发明申请

WO2010111119A1 REGENERATIVE RING RESONATOR 审中-公开
标题翻译：再生环谐振器
公开(公告)号：WO2010111119A1
公开(公告)日：2010-09-30
申请号：PCT/US2010/027842
申请日：2010-03-18
申请人： CYMER, INC. , YE, Hong , SANDSTROM, Richard, L. , ROKITSKI, Slava , BROWN, Daniel, J. W. , RAFAC, Robert, J.
发明人： YE, Hong , SANDSTROM, Richard, L. , ROKITSKI, Slava , BROWN, Daniel, J. W. , RAFAC, Robert, J.
IPC分类号： H01S3/083
CPC分类号： H01S3/225 , H01S3/02 , H01S3/0804 , H01S3/0805 , H01S3/08059 , H01S3/08072 , H01S3/08081 , H01S3/0835 , H01S3/10092 , H01S3/1053 , H01S3/235 , H01S3/2366
摘要： A laser includes a regenerative ring resonator that includes a discharge chamber having electrodes and a gain medium between the electrodes for producing a laser beam; a partially-reflective optical coupler, and a beam modification optical system in the path of the laser beam, The beam modification optical system transversely expands a profile of the laser beam such that the near field laser beam profile uniformly fills each aperture within the laser and such that the regenerative ring resonator remains either conditionally stable or marginally unstable when operating the laser at powers that induce thermal lenses In optical elements Inside the regenerative ring resonator.
摘要翻译：激光器包括再生环形谐振器，其包括具有电极的放电室和用于产生激光束的电极之间的增益介质; 部分反射光耦合器，以及激光束路径中的光束修改光学系统。光束修改光学系统横向扩展激光束的轮廓，使得近场激光束轮廓均匀地填充激光器内的每个孔径，并且使得当再生环形谐振器内的光学元件引入热透镜的功率下操作激光器时，再生环形谐振器保持条件稳定或边缘不稳定。

2. 发明申请

WO2010059210A3 SYSTEMS AND METHODS FOR DRIVE LASER BEAM DELIVERY IN AN EUV LIGHT SOURCE 审中-公开
公开(公告)号：WO2010059210A3
公开(公告)日：2010-05-27
申请号：PCT/US2009/006186
申请日：2009-11-19
申请人： CYMER, INC. , PARTLO, William, N. , FOMENKOV, Igor, V. , PAXON, Jason, A.
发明人： PARTLO, William, N. , FOMENKOV, Igor, V. , PAXON, Jason, A.
IPC分类号： A61N5/06
摘要： An EUV light source device is described herein which may comprise a laser beam travelling along a beam path, at least a portion of the beam path aligned along a linear axis; a material for interaction with the laser beam at an irradiation site to create an EUV light emitting plasma; a first reflector having a focal point, the first reflector positioned with the focal point on the linear axis, the first reflector receiving laser light along the beam path; and a second reflector receiving laser light reflected by the first reflector and directing the laser light toward the irradiation site.

3. 发明申请

WO2009117048A2 SYSTEM AND METHODS FOR TARGET MATERIAL DELIVERY IN A LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：用于激光产生的等离子体EUV光源中目标材料输送的系统和方法
公开(公告)号：WO2009117048A2
公开(公告)日：2009-09-24
申请号：PCT/US2009/000994
申请日：2009-02-17
申请人： CYMER, INC. , VASCHENKO, Georgiy, O. , BYKANOV, Alexander, N. , BOWERING, Norbert, R. , BRANDT, David, C. , ERSHOV, Alexander, I. , SIMMONS, Rodney, D. , KHODYKIN, Oleh, V. , FOMENKOV, Igor, V.
发明人： VASCHENKO, Georgiy, O. , BYKANOV, Alexander, N. , BOWERING, Norbert, R. , BRANDT, David, C. , ERSHOV, Alexander, I. , SIMMONS, Rodney, D. , KHODYKIN, Oleh, V. , FOMENKOV, Igor, V.
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , H05G2/006 , H05G2/008
摘要： Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
摘要翻译：这里公开的设备可以包括EUV反射光学元件，该EUV反射光学元件具有限定旋转轴线和圆形外围的旋转表面。光学器件可以被定位成相对于水平面以非零角度倾斜轴线，并且在外围投影界定水平面中的区域的情况下建立水平面中的外围的垂直投影。该装置可以进一步包括输送目标材料的系统，该系统具有目标材料释放点，该目标材料释放点位于水平平面中并且位于该区域之外并且由周边投影和生成用于照射目标材料以产生激光束的激光束 EUV排放。

4. 发明申请

WO2009085094A2 EUV LIGHT SOURCE COMPONENTS AND METHODS FOR PRODUCING, USING AND REFURBISHING SAME 审中-公开
标题翻译： EUV光源组件及其生产，使用和修复方法
公开(公告)号：WO2009085094A2
公开(公告)日：2009-07-09
申请号：PCT/US2008/013416
申请日：2008-12-05
申请人： CYMER, INC. , BOWERING, Norbert, R. , BYKANOV, Alexander, N. , KHODYKIN, Oleh, V. , FOMENKOV, Igor, V
发明人： BOWERING, Norbert, R. , BYKANOV, Alexander, N. , KHODYKIN, Oleh, V. , FOMENKOV, Igor, V
IPC分类号： G01J1/42 , C23C16/22
CPC分类号： G02B5/0891 , B82Y10/00 , G01J1/429 , G03F7/70941 , G03F7/70958 , G03F7/70975 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps / acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps / acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.
摘要翻译：公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。该方法可以包括用具有波长在EUV谱以外的波长的光照射反射镜的至少一部分的步骤/动作，在光已经从反射镜反射之后测量光的至少一部分，并且使用该测量和镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料技术，并沉积覆盖中间材料的多层镜面涂层。

5. 发明申请

WO2009032054A1 GAS MANAGEMENT SYSTEM FOR A LASER-PRODUCED-PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：用于激光生产的等离子体光源的气体管理系统
公开(公告)号：WO2009032054A1
公开(公告)日：2009-03-12
申请号：PCT/US2008/009754
申请日：2008-08-15
申请人： CYMER, INC. , BYKANOV, Alexander, N. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , BRANDT, David, C.
发明人： BYKANOV, Alexander, N. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , BRANDT, David, C.
IPC分类号： G21G4/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and / or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
摘要翻译：本文描述了装置和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如，激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。可以提供泵以迫使气体通过闭环流动路径。可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。

6. 发明申请

WO2008020965A2 EUV OPTICS 审中-公开
标题翻译： EUV光学
公开(公告)号：WO2008020965A2
公开(公告)日：2008-02-21
申请号：PCT/US2007/016648
申请日：2007-07-24
申请人： CYMER, INC. , FOMENKOV, Igor, V. , BOWERING, Norbert, R.
发明人： FOMENKOV, Igor, V. , BOWERING, Norbert, R.
IPC分类号： G02B5/08
CPC分类号： G03F7/7015 , G02B5/0891 , G02B7/182 , G21K1/062 , Y10T29/49982
摘要： In a first aspect, a method of fabricating an EUV light source mirror is disclosed which may comprise the acts/steps of providing a plurality of discrete substrates; coating each substrate with a respective multilayer coating; securing the coated substrates in an arrangement wherein each coated substrate is oriented to a common focal point; and thereafter polishing at least one of the multilayer coatings. In another aspect, an optic for use with EUV light is disclosed which may comprise a substrate; a smoothing layer selected from the group of materials consisting of Si, C, Si 3 N 4 , B 4 C, SiC and Cr, the smoothing layer material being deposited using highly energetic deposition conditions ^nd a multilayer dielectric coating. In another aspect, a corrosion resistant, multilayer coating for an EUV mirror may comprise alternating layers of Si and a compound material having nitrogen and a 5th period transition metal.
摘要翻译：在第一方面中，公开了一种制造EUV光源反射镜的方法，其可以包括提供多个离散衬底的动作/步骤; 用各自的多层涂层涂覆每个基材; 将涂覆的基底固定在一种布置中，其中每个涂覆的基底都朝向共同的焦点; 之后抛光至少一个多层涂层。另一方面，公开了一种与EUV光一起使用的光学器件，其可以包括衬底; 选自Si，C，Si 3 N 4，B 4 C，SiC和Cr的材料组中的平滑层，使用高能量沉积条件和多层电介质涂层来沉积平滑层材料。另一方面，用于EUV反射镜的耐腐蚀多层涂层可以包括Si和具有氮和第五周期过渡金属的化合物材料的交替层。

7. 发明申请

WO2007146329A3 DRIVE LASER FOR EUV LIGHT SOURCE 审中-公开
公开(公告)号：WO2007146329A3
公开(公告)日：2007-12-21
申请号：PCT/US2007/013862
申请日：2007-06-11
申请人： CYMER, INC. , ERSHOV, Alexander, I. , BYKANOV, Alexander, N. , HOFFMAN, Jerzy, R. , FOMENKOV, Igor, V. , PARTLO, William, N.
发明人： ERSHOV, Alexander, I. , BYKANOV, Alexander, N. , HOFFMAN, Jerzy, R. , FOMENKOV, Igor, V. , PARTLO, William, N.
IPC分类号： H01S4/00 , H01S3/22
摘要： A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (E s, 1 ) and a small signal gain (g o , 1 ); and the second amplifier may have a gain medium characterized by a saturation energy (E s, 2 ) and a small signal gain (g o , 2 ), with (g o , 1 ) > (g o , 2 ) and (E S , 2 ) > (E s, 1 ). In another aspect, a laser oscillator of a laser light source may be a cavity dumped laser oscillator, e.g. a mode-locked laser oscillator, q-switched laser oscillator and may further comprising a temporal pulse stretcher.

8. 发明申请

WO2007053338A3 SYSTEMS AND METHODS TO SHAPE LASER LIGHT AS A HOMOGENEOUS LINE BEAM FOR INTERACTION WITH A FILM DEPOSITED ON A SUBSTRATE 审中-公开
公开(公告)号：WO2007053338A3
公开(公告)日：2007-05-10
申请号：PCT/US2006/041137
申请日：2006-10-20
申请人： CYMER, INC. , AKINS, Robert, P. , SANDSTROM, Richard, L.
发明人： AKINS, Robert, P. , SANDSTROM, Richard, L.
IPC分类号： H01L21/336
摘要： Systems and methods are disclosed for shaping and homogenizing a laser beam for interaction with a film. The shaping and homogenizing system may include a lens array and a lens that is positioned to receive laser light from the lens array and produce a respective elongated image in a plane for each lens in the lens array. In addition, the system may include a beam stop having an edge that is positioned in the plane, and a moveable mount rotating a lens of the lens array to vary an alignment between one of the elongated images and the beam stop edge.

9. 发明申请

WO2007050458A3 BLISTER RESISTANT OPTICAL COATINGS 审中-公开
公开(公告)号：WO2007050458A3
公开(公告)日：2007-05-03
申请号：PCT/US2006/041053
申请日：2006-10-20
申请人： CYMER, INC. , MELCHIOR, John, T.
发明人： MELCHIOR, John, T.
IPC分类号： B32B15/04 , B32B19/00 , B32B9/00
摘要： An optical coating and method for coating an optical element are disclosed. The optical element substrate may be made of fused silica and the coating may include a non-fluoride adherence layer such as SiO 2 that is deposited on the substrate to overlay and contact a surface of the substrate. The coating may further include a multilayer system having at least one layer of a dielectric fluoride material, the multilayer system overlaying the non-fluoride adherence layer.

10. 发明申请

WO2007038412A2 THERMAL-EXPANSION TOLERANT, PREIONIZER ELECTRODE FOR A GAS DISCHARGE LASER 审中-公开
标题翻译：耐热膨胀剂，气体放电激光用电极
公开(公告)号：WO2007038412A2
公开(公告)日：2007-04-05
申请号：PCT/US2006/037225
申请日：2006-09-25
申请人： CYMER, INC. (A NEVADA CORPORATION) , STEIGER, Thomas, D. , UJAZDOWSKI, Richard, C.
发明人： STEIGER, Thomas, D. , UJAZDOWSKI, Richard, C.
IPC分类号： H01S3/22 , H01S3/03 , H01S3/097 , H01S3/223
CPC分类号： H01S3/09713 , H01S3/036 , H01S3/0384 , H01S3/0385 , H01S3/0388 , H01S3/225
摘要： A corona-discharge type, preionizer assembly for a gas discharge laser is disclosed. The assembly may include an electrode and a hollow, dielectric tube that defines a tube bore. In one aspect, the electrode may include a first elongated conductive member having a first end disposed in the bore of the tube. In addition, the electrode may include a second elongated conductive member having a first end disposed in the bore and spaced from the first end of the first conductive member. For the assembly, the first and second conductive members may be held at a same voltage potential.
摘要翻译：公开了一种用于气体放电激光器的电晕放电型前置电离器组件。组件可以包括限定管孔的电极和中空的电介质管。在一个方面，电极可以包括第一细长导电构件，其具有设置在管孔中的第一端。此外，电极可以包括第二细长导电构件，其具有设置在孔中并与第一导电构件的第一端隔开的第一端。对于组件，第一和第二导电构件可以保持在相同的电压电位。

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