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1. 发明申请

WO2008105989A2 LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：激光生产等离子体光源
公开(公告)号：WO2008105989A2
公开(公告)日：2008-09-04
申请号：PCT/US2008/001349
申请日：2008-02-01
申请人： CYMER, INC. , BYKANOV, Alexander, N. , BOWERING, Norbert, R. , FOMENKOV, Igor, V. , BRANDT, David, C. , ERSHOV, Alexander, I , KHODYKIN, Oleh, V. , PARTLO, William, N.
发明人： BYKANOV, Alexander, N. , BOWERING, Norbert, R. , FOMENKOV, Igor, V. , BRANDT, David, C. , ERSHOV, Alexander, I , KHODYKIN, Oleh, V. , PARTLO, William, N.
IPC分类号： H05H1/24
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70908 , G03F7/70983 , H05G2/003 , H05G2/008
摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic, hi one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
摘要翻译：公开了一种可以包括在等离子体位置处产生等离子体的系统，等离子体产生EUV辐射和离开等离子体的离子的装置。该装置还可以包括一个光学元件，例如多个远离现场距离的多层反射镜，以及设置在等离子体和光学元件之间的流动气体，该气体建立足以在该距离上操作的气体压力， d，以在离子到达光学器件之前将离子能量降低到预选值以下。在一个实施方案中，气体可以包含氢气，并且在特定实施方案中，气体可以包含大于50体积％的氢气。

2. 发明申请

WO2009117048A2 SYSTEM AND METHODS FOR TARGET MATERIAL DELIVERY IN A LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：用于激光产生的等离子体EUV光源中目标材料输送的系统和方法
公开(公告)号：WO2009117048A2
公开(公告)日：2009-09-24
申请号：PCT/US2009/000994
申请日：2009-02-17
申请人： CYMER, INC. , VASCHENKO, Georgiy, O. , BYKANOV, Alexander, N. , BOWERING, Norbert, R. , BRANDT, David, C. , ERSHOV, Alexander, I. , SIMMONS, Rodney, D. , KHODYKIN, Oleh, V. , FOMENKOV, Igor, V.
发明人： VASCHENKO, Georgiy, O. , BYKANOV, Alexander, N. , BOWERING, Norbert, R. , BRANDT, David, C. , ERSHOV, Alexander, I. , SIMMONS, Rodney, D. , KHODYKIN, Oleh, V. , FOMENKOV, Igor, V.
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , H05G2/006 , H05G2/008
摘要： Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
摘要翻译：这里公开的设备可以包括EUV反射光学元件，该EUV反射光学元件具有限定旋转轴线和圆形外围的旋转表面。光学器件可以被定位成相对于水平面以非零角度倾斜轴线，并且在外围投影界定水平面中的区域的情况下建立水平面中的外围的垂直投影。该装置可以进一步包括输送目标材料的系统，该系统具有目标材料释放点，该目标材料释放点位于水平平面中并且位于该区域之外并且由周边投影和生成用于照射目标材料以产生激光束的激光束 EUV排放。

3. 发明申请

WO2009032054A1 GAS MANAGEMENT SYSTEM FOR A LASER-PRODUCED-PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：用于激光生产的等离子体光源的气体管理系统
公开(公告)号：WO2009032054A1
公开(公告)日：2009-03-12
申请号：PCT/US2008/009754
申请日：2008-08-15
申请人： CYMER, INC. , BYKANOV, Alexander, N. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , BRANDT, David, C.
发明人： BYKANOV, Alexander, N. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , BRANDT, David, C.
IPC分类号： G21G4/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and / or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
摘要翻译：本文描述了装置和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如，激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。可以提供泵以迫使气体通过闭环流动路径。可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。

4. 发明申请

WO2007005415A2 LPP EUV LIGHT SOURCE DRIVE LASER SYSTEM 审中-公开
标题翻译： LPP EUV光源驱动激光系统
公开(公告)号：WO2007005415A2
公开(公告)日：2007-01-11
申请号：PCT/US2006/024960
申请日：2006-06-27
申请人： CYMER, INC. , ERSHOV, Alexander, I. , BYKANOV, Alexander, N. , KHODYKN, Oleh , FOMENKOV, Igor, V.
发明人： ERSHOV, Alexander, I. , BYKANOV, Alexander, N. , KHODYKN, Oleh , FOMENKOV, Igor, V.
IPC分类号： G01J1/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/008
摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 µm at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO 2 laser. The drive laser redirecting mechanism may comprise a mirror.
摘要翻译：公开了一种可以包括激光产生的等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。该装置和方法可以包括驱动激光束由具有波长的驱动激光产生，该激光具有如下优点：在有效等离子体产生能量的情况下聚焦在小于约100μm的EUV目标液滴上，如果在所涉及的几何形状的约束条件下聚焦镜头驱动激光器可以包括CO 2激光器。驱动激光重定向机构可以包括镜子。

5. 发明申请

WO2008048415A2 DRIVE LASER DELIVERY SYSTEMS FOR EUV LIGHT SOURCE 审中-公开
标题翻译：用于EUV光源的DRIVE LASER DELIVERY系统
公开(公告)号：WO2008048415A2
公开(公告)日：2008-04-24
申请号：PCT/US2007/020897
申请日：2007-09-27
申请人： CYMER, INC.(A NEVADA CORPORATION) , BYKANOV, Alexander, N. , FOMENKOV, Igor, V. , KHODYKIN, Oleh, V. , ERSHOV, Alexander, I.
发明人： BYKANOV, Alexander, N. , FOMENKOV, Igor, V. , KHODYKIN, Oleh, V. , ERSHOV, Alexander, I.
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , H01S3/0064 , H01S3/073 , H01S3/0805 , H01S3/08054 , H01S3/08059 , H01S3/083 , H01S3/10092 , H01S3/105 , H01S3/1066 , H01S3/115 , H01S3/121 , H01S3/127 , H01S3/2232 , H01S3/2316 , H01S3/2325 , H01S3/2383 , H05G2/008
摘要： An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.
摘要翻译：公开了一种LPP EUV光源，其具有位于等离子体腔室中用于反射其中产生的EUV光的光学器件和激光输入窗口。对于这个方面，EUV光源可以被配置为将光学器件暴露于气体蚀刻剂压力以用于光学清洁，同时窗口暴露于较低的气体蚀刻剂压力以避免窗口涂层劣化。在另一方面，EUV光源可以包括可沿着光束路径定位的目标材料，以参与与光束路径上的光的第一相互作用; 一个光放大器; 以及至少一个光学引导光子，其从第一相互作用中散射到光学放大器中，以在光束路径上产生激光束，用于随后与靶材料相互作用以产生EUV发光等离子体。

6. 发明申请

WO2007146329A3 DRIVE LASER FOR EUV LIGHT SOURCE 审中-公开
公开(公告)号：WO2007146329A3
公开(公告)日：2007-12-21
申请号：PCT/US2007/013862
申请日：2007-06-11
申请人： CYMER, INC. , ERSHOV, Alexander, I. , BYKANOV, Alexander, N. , HOFFMAN, Jerzy, R. , FOMENKOV, Igor, V. , PARTLO, William, N.
发明人： ERSHOV, Alexander, I. , BYKANOV, Alexander, N. , HOFFMAN, Jerzy, R. , FOMENKOV, Igor, V. , PARTLO, William, N.
IPC分类号： H01S4/00 , H01S3/22
摘要： A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (E s, 1 ) and a small signal gain (g o , 1 ); and the second amplifier may have a gain medium characterized by a saturation energy (E s, 2 ) and a small signal gain (g o , 2 ), with (g o , 1 ) > (g o , 2 ) and (E S , 2 ) > (E s, 1 ). In another aspect, a laser oscillator of a laser light source may be a cavity dumped laser oscillator, e.g. a mode-locked laser oscillator, q-switched laser oscillator and may further comprising a temporal pulse stretcher.

7. 发明申请

WO2008088488A1 LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：激光生产等离子体光源
公开(公告)号：WO2008088488A1
公开(公告)日：2008-07-24
申请号：PCT/US2007/024896
申请日：2007-12-04
申请人： CYMER, INC. , HANSSON, Bjorn, A. M. , BYKANOV, Alexander, N. , FOMENKOV, Igor, V. , BRANDT, David, C.
发明人： HANSSON, Bjorn, A. M. , BYKANOV, Alexander, N. , FOMENKOV, Igor, V. , BRANDT, David, C.
IPC分类号： H05G2/00 , G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre- pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.
摘要翻译：公开了一种EUV光源，其可以包括多个目标，例如锡液滴，以及产生预脉冲和主脉冲的系统，其具有用于照射目标以产生扩展目标的预脉冲。该系统还可以包括连续泵浦的激光器装置，其产生具有用于照射扩展目标的主脉冲以产生EUV光脉冲的脉冲的主脉冲。该系统还可以具有在EUV光脉冲的突发期间改变至少一个预脉冲参数的控制器。另外，EUV光源还可以包括测量EUV光脉冲脉冲串内的至少一个EUV光脉冲的强度的仪器，并且向控制器提供反馈信号以在脉冲串期间改变至少一个预脉冲参数 EUV光脉冲以产生具有预选剂量的EUV脉冲的突发。

8. 发明申请

WO2007005414A2 ALTERNATIVE FUELS FOR EUV LIGHT SOURCE 审中-公开
标题翻译： EUV光源替代燃料
公开(公告)号：WO2007005414A2
公开(公告)日：2007-01-11
申请号：PCT/US2006/024959
申请日：2006-06-27
申请人： CYMER, INC. , BOWERING, Norbert, R. , KHODYKIN, Oleh , BYKANOV, Alexander, N. , FOMENKOV, Igor, V.
发明人： BOWERING, Norbert, R. , KHODYKIN, Oleh , BYKANOV, Alexander, N. , FOMENKOV, Igor, V.
IPC分类号： G01J1/00
CPC分类号： H05G2/006 , B82Y10/00 , G21K2201/061 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and / or Indium.
摘要翻译：公开了一种EUV光源，其可以包括具有表面的至少一个光学元件，例如多层收集镜; 产生激光束的激光源; 以及由激光束照射以形成等离子体并发射EUV光的源材料。在一个方面，源材料可以基本上由锡化合物组成，并且可以通过沉积在光学元件上的等离子体形成而产生锡屑，此外，锡化合物可以包括有效地从光学蚀刻沉积的锡的元素元素表面。锡化合物可以包括SnBr4，SnBr2和SnH4。另一方面，EUV光源可以包括由激光束照射以形成等离子体并发射EUV光的熔融源材料，源材料包含锡和至少一种其它金属，例如锡与镓和/或铟。

9. 发明申请

WO2009085094A2 EUV LIGHT SOURCE COMPONENTS AND METHODS FOR PRODUCING, USING AND REFURBISHING SAME 审中-公开
标题翻译： EUV光源组件及其生产，使用和修复方法
公开(公告)号：WO2009085094A2
公开(公告)日：2009-07-09
申请号：PCT/US2008/013416
申请日：2008-12-05
申请人： CYMER, INC. , BOWERING, Norbert, R. , BYKANOV, Alexander, N. , KHODYKIN, Oleh, V. , FOMENKOV, Igor, V
发明人： BOWERING, Norbert, R. , BYKANOV, Alexander, N. , KHODYKIN, Oleh, V. , FOMENKOV, Igor, V
IPC分类号： G01J1/42 , C23C16/22
CPC分类号： G02B5/0891 , B82Y10/00 , G01J1/429 , G03F7/70941 , G03F7/70958 , G03F7/70975 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps / acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps / acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.
摘要翻译：公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。该方法可以包括用具有波长在EUV谱以外的波长的光照射反射镜的至少一部分的步骤/动作，在光已经从反射镜反射之后测量光的至少一部分，并且使用该测量和镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料技术，并沉积覆盖中间材料的多层镜面涂层。

10. 发明申请

WO2009085095A1 DRIVE LASER FOR EUV LIGHT SOURCE 审中-公开
标题翻译：用于EUV光源的驱动激光器
公开(公告)号：WO2009085095A1
公开(公告)日：2009-07-09
申请号：PCT/US2008/013417
申请日：2008-12-05
申请人： CYMER, INC. , ERSHOV, Alexander, I. , HOFFMAN, Jerzy, R. , BOWERING, Norbert, R. , BYKANOV, Alexander, N.
发明人： ERSHOV, Alexander, I. , HOFFMAN, Jerzy, R. , BOWERING, Norbert, R. , BYKANOV, Alexander, N.
IPC分类号： G02F1/35
CPC分类号： H01S3/105 , G03F7/70033 , H01S3/005 , H01S3/115 , H01S3/2232 , H01S3/225 , H01S3/2325 , H01S2301/02 , H05G2/003 , H05G2/008
摘要： A device is described herein which may comprise an oscillator having an oscillator cavity length, L 0 , and defining an oscillator path; and a multi-pass optical amplifier coupled with the oscillator to establish a combined optical cavity including the oscillator path, the combined cavity having a length, L combined , where L combined = (N + x) * L 0 , where "N" is an integer and "x" is a number between 0.4 and 0.6.
摘要翻译：本文描述了一种器件，其可以包括具有振荡器腔长度L0并且限定振荡器路径的振荡器; 和与所述振荡器耦合的多通光放大器以建立包括所述振荡器路径的组合光腔，所述组合腔具有长度L组合，其中L组合=（N + x）* L0，其中“N”是整数， “x”是介于0.4和0.6之间的数字。

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