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81. 发明公开

EP2577706A1 SYSTEME DE DETECTION DE CATHODOLUMINESCENCE SOUPLE ET MICROSCOPE METTANT EN OEUVRE UN TEL SYSTEME 有权转让
标题翻译：具有柔性阴极和显微镜的利用这种系统检测系统
公开(公告)号：EP2577706A1
公开(公告)日：2013-04-10
申请号：EP11723542.4
申请日：2011-04-29
申请人： Centre National de la Recherche Scientifique
发明人： KOCIAK, Mathieu , ZAGONEL, Luiz, Fernando , TENCE, Marcel , MAZZUCCO, Stefano
IPC分类号： H01J37/02 , H01J37/244 , H01J37/256
CPC分类号： H01J37/244 , H01J37/023 , H01J37/228 , H01J37/256 , H01J37/26 , H01J2237/024 , H01J2237/2482
摘要： The invention relates to a cathodoluminescence detection system comprising: a collecting optic (112) collecting light radiation (108) from a sample illuminated by a beam of charged particles and reflecting said radiation (108) onto analysis means, said collecting optic (112) being placed in a chamber, called a vacuum chamber, wherein the pressure is below atmospheric pressure; and means (316) for adapting the light radiation, placed downstream of the collecting optic (112) and designed to adapt said light radiation (108) at the inlet of the analysis means. Said system is characterized in that all or part of the adapting means (316) is placed in an environment where the pressure is higher than the pressure in said vacuum chamber.

82. 发明公开

EP2450936A1 Microscope system, method for operating a charged-particle microscope 有权转让
标题翻译： Mikroskopsystem，Verfahren zum Betreiben einesLadungsträger-Mikroskops
公开(公告)号：EP2450936A1
公开(公告)日：2012-05-09
申请号：EP10014245.4
申请日：2010-11-03
申请人： Carl Zeiss NTS Ltd.
发明人： Bean, Stewart , Rowland, Roger
IPC分类号： H01J37/22 , H01J37/244 , H01J37/26 , G02B21/36
CPC分类号： H01J37/222 , G02B21/367 , H01J37/244 , H01J37/26 , H01J2237/047 , H01J2237/22 , H01J2237/221 , H01J2237/225 , H01J2237/2482 , H01J2237/28
摘要： A method of operating a charged-particle microscope, the method comprising: recording a first image of a first region of an object using the charged-particle microscope in a first setting; recording a second image of a second region of the object using the charged-particle microscope in a second setting, wherein the second setting differs from the first setting with respect to at least one of a kinetic energy of primary charged particles used for imaging, a detector setting used for imaging, a beam current of the primary charged particles used for imaging and a pressure in a measuring chamber of the charged-particle microscope; reading a third image of a third region of the object using the charged-particle microscope, wherein the first and second regions are contained at least partially within the third region; displaying at least a portion of the third image; displaying a representation of the first image at least partly within the displayed third image, wherein the representation of the first image includes a first indicator which is indicative of the first setting; displaying a representation of the second image at least partly within the displayed third image, wherein the representation of the second image includes a second indicator which is indicative of the second setting, and wherein the displayed second indicator is different from the displayed first indicator.
摘要翻译：一种操作带电粒子显微镜的方法，所述方法包括：在第一设置中使用所述带电粒子显微镜记录物体的第一区域的第一图像; 使用所述带电粒子显微镜在第二设定中记录所述物体的第二区域的第二图像，其中所述第二设定与所述第一设定相对于用于成像的初级带电粒子的动能中的至少一个不同，用于成像的检测器设置，用于成像的初级带电粒子的束电流和带电粒子显微镜的测量室中的压力; 使用所述带电粒子显微镜读取所述物体的第三区域的第三图像，其中所述第一和第二区域至少部分地包含在所述第三区域内; 显示所述第三图像的至少一部分; 至少部分地在所显示的第三图像内显示第一图像的表示，其中第一图像的表示包括指示第一设置的第一指示符; 至少部分地在所显示的第三图像内显示第二图像的表示，其中第二图像的表示包括指示第二设置的第二指示符，并且其中所显示的第二指示符不同于所显示的第一指示符。

83. 发明公开

EP2302459A3 Lithography system 审中-公开
公开(公告)号：EP2302459A3
公开(公告)日：2011-04-06
申请号：EP10185252.3
申请日：2003-10-24
申请人： MAPPER LITHOGRAPHY IP B.V.
发明人： Van 't Spijker, Johannes Christiaan , Jager, Remco , Wieland, Marco Jan-Jaco , Kruit, Pieter
IPC分类号： G03F7/20 , H01J37/317
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要： The invention relates to a maskless lithography system for transferring a pattern onto the surface of a target, comprising at least one beam generator for generating a plurality of beamlets, modulation means comprising a plurality of modulators for modulating the magnitude of a beamlet, and a control unit for controlling each of the modulators, wherein the control unit generates and delivers pattern data to said modulation means for controlling the magnitude of each individual beamlet, the control unit comprising at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting said at least one modulated light beam to said modulation means.

84. 发明公开

EP2302457A3 Lithography system 有权转让
标题翻译：石版系统
公开(公告)号：EP2302457A3
公开(公告)日：2011-04-06
申请号：EP10185248.1
申请日：2003-10-24
申请人： MAPPER LITHOGRAPHY IP B.V.
发明人： Van 't Spijker, Johannes Christiaan , Jager, Remco , Wieland, Marco Jan-Jaco , Kruit, Pieter
IPC分类号： G03F7/20 , H01J37/317
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要： The invention relates to a maskless lithography system for transferring a pattern onto the surface of a target, comprising at least one beam generator for generating a plurality of beamlets, modulation means comprising a plurality of modulators for modulating the magnitude of a beamlet, and a control unit for controlling each of the modulators, wherein the control unit generates and delivers pattern data to said modulation means for controlling the magnitude of each individual beamlet, the control unit comprising at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting said at least one modulated light beam to said modulation means.

86. 发明公开

EP1735811A4 METHOD AND SYSTEM FOR ULTRAFAST PHOTOELECTRON MICROSCOPE 有权
标题翻译：方法和系统便于高速光电子显微镜
公开(公告)号：EP1735811A4
公开(公告)日：2009-08-19
申请号：EP05743023
申请日：2005-04-01
申请人： CALIFORNIA INST OF TECHN
发明人： ZEWAIL AHMED , LOBASTOV VLADIMIR
IPC分类号： H01J37/26 , G01N23/04 , H01J37/073
CPC分类号： H01J37/26 , H01J37/065 , H01J37/073 , H01J37/24 , H01J37/243 , H01J37/265 , H01J2237/0432 , H01J2237/06333 , H01J2237/06341 , H01J2237/206 , H01J2237/2065 , H01J2237/24585 , H01J2237/2482 , H01J2237/2803 , H01J2237/2809 , H01J2237/2813 , H01J2237/2855
摘要： An ultrafast system (and methods) for characterizing one or more samples. The system includes a stage assembly, which has a sample to be characterized. The system has a laser source that is capable of emitting an optical pulse of less than 1 ps in duration. The system has a cathode coupled to the laser source. In a specific embodiment, the cathode is capable of emitting an electron pulse less than 1 ps in duration. The system has an electron lens assembly adapted to focus the electron pulse onto the sample disposed on the stage. The system has a detector adapted to capture one or more electrons passing through the sample. The one or more electrons passing through the sample is representative of the structure of the sample. The detector provides a signal (e.g., data signal) associated with the one or more electrons passing through the sample that represents the structure of the sample. The system has a processor coupled to the detector. The processor is adapted to process the data signal associated with the one or more electrons passing through the sample to output information associated with the structure of the sample. The system has an output device coupled to the processor. The output device is adapted to output the information associated with the structure of the sample.

87. 发明公开

EP1202320A3 Method and apparatus for charged particle beam microscopy 有权
标题翻译：带电粒子束显微镜的方法和设备
公开(公告)号：EP1202320A3
公开(公告)日：2007-12-12
申请号：EP01125332.5
申请日：2001-10-26
申请人： Hitachi, Ltd.
发明人： Tsuneta, Ruriko, Hitachi, Ltd., Int. Prop. Gp. , Koguchi, Masanari, Hitachi, Ltd., Int. Prop. Gp. , Nozoe, Mari, Hitachi, Ltd., Int. Prop. Gp. , Fukuda, Muneyuki, Hitachi, Ltd., Int. Prop. Gp. , Sato, Mitsugu, Hitachi, Ltd., Int. Prop. Gp.
IPC分类号： H01J37/28 , H01J37/22
CPC分类号： H01J37/21 , H01J37/226 , H01J37/28 , H01J2237/1501 , H01J2237/216 , H01J2237/2482 , H01J2237/31745 , H01J2237/31749
摘要： By use of charged particle beam images picked up in different conditions, a positional displacement caused by parallax is analyzed, and an optics of an apparatus for charged particle beam microscopy is corrected automatically. An analysis method using phase difference of Fourier transform images and having analytic accuracy lower than that for one pixel is adopted for the displacement analysis. In addition, a degree of coincidence between images calculated in this analysis method is used as a criterion for evaluating the reliability of an analysis result. Since the analysis method based on parallax is low in specimen dependency, the operation range is expanded. In addition, by adopting a high-accuracy displacement analysis method, the apparatus correction accuracy is improved by one digit. A malfunction preventing flow is added using the degree of coincidence as a judgement criterion. Thus, the apparatus can deal with unmanned operation. In addition, the degree of coincidence can be used as a monitor of inspection states or a record of states in an inspection apparatus.
摘要翻译：通过使用在不同条件下拾取的带电粒子束图像，分析由视差引起的位置偏移，并且自动校正用于带电粒子束显微镜的设备的光学器件。采用傅立叶变换图像的相位差，分析精度低于一个像素的分析方法用于位移分析。另外，在该分析方法中计算的图像之间的一致程度被用作评估分析结果的可靠性的标准。由于基于视差的分析方法在样本依赖性方面较低，所以扩大了操作范围。另外，通过采用高精度位移分析方法，装置校正精度提高了一位数。使用重合度作为判断标准添加防止故障的流量。因此，该设备可以处理无人操作。另外，可以将重合度用作检查状态的监视器或检查装置中的状态记录。

88. 发明公开

EP1812945A2 METHOD AND APPARATUS FOR THE AUTOMATED PROCESS OF IN-SITU LIFT-OUT 有权转让
标题翻译：方法和装置用于自动化处理原位暗挖
公开(公告)号：EP1812945A2
公开(公告)日：2007-08-01
申请号：EP05821396.8
申请日：2005-11-03
申请人： Omniprobe, Inc.
发明人： MOORE, Thomas, M. , ZAYKOVA-FELDMAN, Lyudmila
IPC分类号： H01J37/08
CPC分类号： H01J37/302 , B82Y15/00 , G01N1/32 , H01J37/20 , H01J37/22 , H01J37/3056 , H01J2237/20 , H01J2237/202 , H01J2237/204 , H01J2237/206 , H01J2237/208 , H01J2237/2482 , H01J2237/28 , H01J2237/30411 , H01J2237/30472 , H01J2237/31745
摘要： An apparatus for performing automated in-situ lift-out of a sample (150) from a specimen (125) includes a computer (100) having a memory with computer-readable instructions, a stage (120) for a specimen (125) and a nano-manipulator (130). The stage (120) and the nano-manipulator (130) are controlled by motion controllers (110) connected to the computer (100). The nano-manipulator (130) has a probe tip (140) for attachment to samples (150) excised from the specimen (125). The computer-readable instructions include instructions to cause the stage motion controllers (110) and the nano-manipulator motion controllers (110), as well as an ion-beam source (170), to automatically perform in-situ lift-out of a sample (150) from the specimen (125).

89. 发明授权

EP0914669B1 DETECTOR DEVICES 失效
标题翻译：探测设备是
公开(公告)号：EP0914669B1
公开(公告)日：2004-04-28
申请号：EP97928378.5
申请日：1997-06-30
申请人： K E Developments Limited
发明人： COWHAM, Michael, John
IPC分类号： H01J37/244
CPC分类号： H01J37/244 , H01J2237/2443 , H01J2237/2445 , H01J2237/2482
摘要： In a Scanning Electron Microscope (SEM) a spot made from a very narrow beam of electrons (11) is scanned in fine strips across the specimen (18), and an image is built up from the electrons (e) that back-scatter from area of specimen being scanned. To gather these back-scattered electrons it is presently common to employ a scintillator layer on the front face of a light guide that directs the generated light to a photomultiplier tube (23). However, having the scintillator layer on the front face means that the light has to pass through the layer to enter the guide, which necessarily wastes light by absorption within the thickness of layer material; the invention proposes instead that the light guide (22) have on its back side a scintillator layer (34) angled as though to reflect received electrons along the guide to the PMT (23). In this way the PMT is actually 'looking at', and so receiving light directly from the front, or input side, of the scintillator layer, and thus the light emitted by the layer does not need to travel through the layer to get to the PMT, and is therefore not attenuated by that layer - and a detector system of the invention is therefore several, even tens, of times more sensitive than one of the Art.

90. 发明公开

EP1296351A1 CHARGED PARTICLE BEAM INSPECTION APPARATUS AND METHOD FOR FABRICATING DEVICE USING THAT INSPECTION APPARATUS 审中-公开
标题翻译：检查设备的带电粒子和方法的用于制造部件与本次调查DEVICE
公开(公告)号：EP1296351A1
公开(公告)日：2003-03-26
申请号：EP01943833.2
申请日：2001-06-27
申请人： EBARA CORPORATION , Nikon Corporation
发明人： NAKASUJI, Mamoru , NOJI, Nobuharu , SATAKE, Tohru , KIMBA, Toshifumi , SOBUKAWA, Hirosi , YOSHIKAWA, Shoji , KARIMATA, Tsutomu , OOWADA, Shin , SAITO, Mutsumi , HAMASHIMA, Muneki , TAKAGI, Toru
IPC分类号： H01J37/29 , H01J37/244 , H01J37/20 , G01B15/00 , H01L21/66 , G01N23/225
CPC分类号： G03F7/70616 , G01N23/225 , H01J37/05 , H01J37/06 , H01J37/073 , H01J37/075 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/226 , H01J37/244 , H01J37/28 , H01J2237/0435 , H01J2237/057 , H01J2237/06316 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/248 , H01J2237/2482 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical system and introduced through a secondary optical system to a detector. Irradiation of the charged particles is conducted while moving the sample. Irradiation spots of the charged particles are arranged by N rows along a moving direction of the sample and by M columns along a direction perpendicular thereto. Every row of the irradiation spots of the charged particles is shifted successively by a predetermined amount in a direction perpendicular to the moving direction of the sample.

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