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81. 发明授权

US06671034B1 Microfabrication of pattern imprinting 失效
标题翻译：图案压印的微加工
公开(公告)号：US06671034B1
公开(公告)日：2003-12-30
申请号：US09301311
申请日：1999-04-29
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Tohru Satake , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Tohru Satake , Yotaro Hatamura , Masayuki Nakao
IPC分类号： G03B2754
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/50 , G03F7/0002 , G03F7/2014
摘要： The object of the present invention IS to provide an optical imprinting apparatus and method for producing a two-dimensional pattern, having line widths less than the wavelength of an exposure light. The evarnescent (proximity) field effect is adopted to realize the apparatus and method. An optical imprinting apparatus comprises: a container in which light is enclosed therein; an exposure-mask having a proximity field exposure pattern firmly fixed to a section of said container for exposing said exposure pattern on a photo-sensitive material through an evanescent field by said light enclosed therein; and a light source for supplying said light in said container.
摘要翻译：本发明的目的是提供一种用于产生具有小于曝光光的波长的线宽的二维图案的光学压印装置和方法。采用实现（邻近）场效应实现装置和方法。一种光学压印设备包括：容纳在其中的光; 曝光掩模，其具有牢固地固定在所述容器的一部分上的接近场曝光图案，用于通过所述光包围在所述光敏材料上的所述光衰弱场曝光所述曝光图案; 以及用于将所述光提供在所述容器中的光源。

82. 发明授权

US07115354B2 Microfabrication of pattern imprinting 失效
标题翻译：图案压印的微加工
公开(公告)号：US07115354B2
公开(公告)日：2006-10-03
申请号：US10699873
申请日：2003-11-04
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Tohru Satake , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Tohru Satake , Yotaro Hatamura , Masayuki Nakao
IPC分类号： G01F9/00 , G03C5/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/50 , G03F7/0002 , G03F7/2014
摘要： An optical imprinting apparatus, and a method for producing a two-dimensional pattern, have line widths less than the wavelength of an exposure light. The evanescent (proximity) field effect is adopted to realize the apparatus and method. An optical imprinting apparatus comprises a container in which light is enclosed, an exposure-mask having a proximity field exposure pattern firmly fixed to a section of the container for exposing the exposure pattern on a photo-sensitive material through an evanescent field by the light enclosed therein; and a light source for supplying the light in the container.
摘要翻译：光学压印装置和二维图案的制造方法的线宽小于曝光光的波长。采用ev逝（邻近）场效应实现装置和方法。一种光学压印装置包括一个封闭光的容器，曝光掩模具有牢固地固定在容器的一部分上的接近场曝光图案，用于通过光封闭的曝光场曝光在感光材料上的消光场其中以及用于将光提供到容器中的光源。

83. 发明授权

US08624182B2 Electro-optical inspection apparatus and method with dust or particle collection function 有权
标题翻译：电光检测装置及方法，具有灰尘或颗粒收集功能
公开(公告)号：US08624182B2
公开(公告)日：2014-01-07
申请号：US13195927
申请日：2011-08-02
申请人： Kenji Watanabe , Masahiro Hatakeyama , Yoshihiko Naito , Tatsuya Kohama , Kenji Terao , Takeshi Murakami , Takehide Hayashi , Kiwamu Tsukamoto , Hiroshi Sobukawa , Norio Kimura
发明人： Kenji Watanabe , Masahiro Hatakeyama , Yoshihiko Naito , Tatsuya Kohama , Kenji Terao , Takeshi Murakami , Takehide Hayashi , Kiwamu Tsukamoto , Hiroshi Sobukawa , Norio Kimura
IPC分类号： H01J37/244 , H01J37/285 , H01J37/29
CPC分类号： H01J37/22 , H01J37/265 , H01J37/29 , H01J2237/004 , H01J2237/022 , H01J2237/24495 , H01J2237/24564 , H01J2237/2817
摘要： An electro-optical inspection apparatus prevents adhesion of dust or particles to a sample surface, wherein a stage on which a sample is placed is disposed inside a vacuum chamber that can be evacuated, and a dust collecting electrode is disposed to surround a periphery of the sample. The dust collecting electrode is applied with a voltage having the same polarity as a voltage applied to the sample and an absolute value that is the same or larger than an absolute value of the voltage. Because dust or particles adhere to the dust collecting electrode, adhesion of the dust or particles to the sample surface can be reduced. Instead of using the dust collecting electrode, it is possible to form a recess on a wall of the vacuum chamber, or to dispose on the wall a metal plate having a mesh structure to which a predetermined voltage is applied.
摘要翻译：电光检查装置防止灰尘或颗粒附着到样品表面，其中放置样品的阶段设置在可以抽真空的真空室内，并且集尘电极被设置成围绕样品。集尘电极施加与施加到样品的电压极性相同的电压，绝对值等于或大于电压的绝对值。由于灰尘或颗粒附着在集尘电极上，所以可以减少灰尘或颗粒附着到样品表面。代替使用集尘电极，可以在真空室的壁上形成凹部，或者在壁上设置具有施加了预定电压的网状结构的金属板。

84. 发明授权

US08497476B2 Inspection device 有权
标题翻译：检查装置
公开(公告)号：US08497476B2
公开(公告)日：2013-07-30
申请号：US13420731
申请日：2012-03-15
申请人： Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Yoshihiko Naito , Yasushi Toma , Tsutomu Karimata , Takehide Hayashi , Kiwamu Tsukamoto , Tatsuya Kohama , Noboru Kobayashi
发明人： Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Yoshihiko Naito , Yasushi Toma , Tsutomu Karimata , Takehide Hayashi , Kiwamu Tsukamoto , Tatsuya Kohama , Noboru Kobayashi
IPC分类号： G01N23/225
CPC分类号： H01J37/073 , G01N23/22 , G01N23/223 , G01N23/2251 , G01N2223/611 , H01J1/34 , H01J37/09 , H01J37/10 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/265 , H01J37/28 , H01J37/29 , H01J2237/0048 , H01J2237/022 , H01J2237/032 , H01J2237/038 , H01J2237/045 , H01J2237/0458 , H01J2237/0473 , H01J2237/0492 , H01J2237/061 , H01J2237/06333 , H01J2237/166 , H01J2237/186 , H01J2237/2002 , H01J2237/2007 , H01J2237/2008 , H01J2237/2448 , H01J2237/2482 , H01J2237/2485 , H01J2237/2817 , H01J2237/2855 , H01J2237/2857
摘要： An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.
摘要翻译：用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

85. 发明授权

US09194826B2 Electron beam apparatus and sample observation method using the same 有权
标题翻译：电子束装置和使用其的样品观察方法
公开(公告)号：US09194826B2
公开(公告)日：2015-11-24
申请号：US12103354
申请日：2008-04-15
申请人： Toru Kaga , Kenji Terao , Masahiro Hatakeyama , Kenji Watanabe , Yoshihiko Naito , Takeshi Murakami , Norio Kimura
发明人： Toru Kaga , Kenji Terao , Masahiro Hatakeyama , Kenji Watanabe , Yoshihiko Naito , Takeshi Murakami , Norio Kimura
IPC分类号： G21K5/04 , G01N23/203 , G01N23/225 , H01J37/28
CPC分类号： G01N23/203 , G01N23/2251 , G01N2223/6116 , H01J37/28 , H01J2237/004 , H01J2237/022 , H01J2237/2446 , H01J2237/2817
摘要： The electron beam apparatus is provided with a stage for mounting a sample thereon, a primary optical system for generating an electron beam having an irradiation area and irradiating the electron beam onto the sample, a secondary optical system for detecting electrons which have been generated through the irradiation of the electron beam onto the sample and have acquired structural information of the sample and acquiring an image of the sample about a viewing area and an irradiation area changing section for changing the position of the irradiation area with respect to the viewing area.
摘要翻译：电子束装置设置有用于在其上安装样品的载物台，用于产生具有照射区域并将电子束照射到样品上的电子束的主光学系统，用于检测通过将电子束照射到样品上并获取样品的结构信息并获取关于观察区域的样品的图像和用于改变照射区域相对于观察区域的位置的照射区域改变部分。

86. 发明授权

US08937283B2 Specimen observation method and device using secondary emission electron and mirror electron detection 有权
标题翻译：使用二次发射电子和镜电子检测的样本观察方法和装置
公开(公告)号：US08937283B2
公开(公告)日：2015-01-20
申请号：US12937145
申请日：2009-04-10
申请人： Masahiro Hatakeyama , Takeshi Murakami , Yoshihiko Naito , Kenji Terao , Norio Kimura , Kenji Watanabe
发明人： Masahiro Hatakeyama , Takeshi Murakami , Yoshihiko Naito , Kenji Terao , Norio Kimura , Kenji Watanabe
IPC分类号： H01J37/29 , H01J37/28 , H01J37/244 , H01L21/66
CPC分类号： H01J37/28 , H01J37/22 , H01J37/244 , H01J37/29 , H01J2237/24475 , H01J2237/24585 , H01J2237/24592 , H01J2237/2805 , H01J2237/2806 , H01J2237/2817 , H01L22/12
摘要： A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and have obtained information on the specimen by the electron beam irradiation; and generating an image of the specimen from the detected electrons to be observed. The electron beam irradiation comprises irradiating the specimen with the electron beam with a landing energy set in a transition region between a secondary emission electron region in which secondary emission electrons are detected and a mirror electron region in which mirror electrons are detected, thereby causing the secondary emission electrons and the mirror electrons to be mixed as the electrons to be observed. The detection of the electrons to be observed comprises performing the detection in a state where the secondary emission electrons and the mirror electrons are mixed. Observation and inspection can be quickly carried out for a fine foreign material and pattern of 100 nm or less.
摘要翻译：提供了一种技术，其能够提高在未经常被注意的能量区域中使用电子束观察样本的能力。该样本观察方法包括：用电子束照射样本; 检测已经产生的待观察的电子，并通过电子束照射获得关于样品的信息; 以及从所检测的电子产生待观察的样本的图像。电子束照射包括用电子束照射样本，其中在其中检测到二次发射电子的二次发射电子区域和其中检测到反射镜电子的镜电子区域之间的过渡区域中设置的着陆能量，从而使次级发射电子和镜电子作为待观察的电子进行混合。要观察的电子的检测包括在二次发射电子和镜电子混合的状态下进行检测。对于100nm以下的细小异物和图案，可以快速进行观察和检查。

87. 发明申请

US20120235036A1 INSPECTION DEVICE 有权
标题翻译：检查装置
公开(公告)号：US20120235036A1
公开(公告)日：2012-09-20
申请号：US13420731
申请日：2012-03-15
申请人： Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Yoshihiko Naito , Yasushi Toma , Tsutomu Karimata , Takehide Hayashi , Kiwamu Tsukamoto , Tatsuya Kohama , Noboru Kobayashi
发明人： Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Yoshihiko Naito , Yasushi Toma , Tsutomu Karimata , Takehide Hayashi , Kiwamu Tsukamoto , Tatsuya Kohama , Noboru Kobayashi
IPC分类号： G01N23/225
CPC分类号： H01J37/073 , G01N23/22 , G01N23/223 , G01N23/2251 , G01N2223/611 , H01J1/34 , H01J37/09 , H01J37/10 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/265 , H01J37/28 , H01J37/29 , H01J2237/0048 , H01J2237/022 , H01J2237/032 , H01J2237/038 , H01J2237/045 , H01J2237/0458 , H01J2237/0473 , H01J2237/0492 , H01J2237/061 , H01J2237/06333 , H01J2237/166 , H01J2237/186 , H01J2237/2002 , H01J2237/2007 , H01J2237/2008 , H01J2237/2448 , H01J2237/2482 , H01J2237/2485 , H01J2237/2817 , H01J2237/2855 , H01J2237/2857
摘要： An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.
摘要翻译：用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

88. 发明授权

US07829853B2 Sample surface observation method 有权
标题翻译：样品表面观察法
公开(公告)号：US07829853B2
公开(公告)日：2010-11-09
申请号：US12244139
申请日：2008-10-02
申请人： Kenji Watanabe , Masahiro Hatakeyama , Yoshihiko Naito , Kenji Terao
发明人： Kenji Watanabe , Masahiro Hatakeyama , Yoshihiko Naito , Kenji Terao
IPC分类号： G01N23/00 , G01N23/225 , H01J37/26
CPC分类号： G01N23/2251
摘要： A surface of a sample is observed by acquiring an image of the surface of the sample. An electron beam I irradiated onto the surface of the sample in which wiring including an insulation material and an electrically conductive material is formed. Electrons that acquired structure information regarding a structure of the surface of the sample are detected. An image of the surface of the sample is acquired by a result of the detection of electrons. The surface of the sample is observed using the acquired image of the surface of the sample. The electron beam is irradiated onto the surface of the sample in a state where a brightness of the insulation material and a brightness of the electrically conductive material in the image of the surface of the sample are set equal to each other.
摘要翻译：通过获取样品表面的图像来观察样品的表面。辐射到样品表面上的电子束I，其中形成了包括绝缘材料和导电材料的布线。检测获取关于样品表面结构的结构信息的电子。通过电子检测的结果获得样品表面的图像。使用获取的样品表面的图像观察样品的表面。在将样品表面的图像中的绝缘材料的亮度和导电材料的亮度设定为相等的状态下，将电子束照射在样品的表面上。

89. 发明申请

US20110155905A1 SPECIMEN OBSERVATION METHOD AND DEVICE, AND INSPECTION METHOD AND DEVICE USING THE METHOD AND DEVICE 有权
标题翻译：标本观察方法和装置，以及使用方法和装置的检查方法和装置
公开(公告)号：US20110155905A1
公开(公告)日：2011-06-30
申请号：US12937145
申请日：2009-04-10
申请人： Masahiro Hatakeyama , Takeshi Murakami , Yoshihiko Naito , Kenji Terao , Norio Kimura , Kenji Watanabe
发明人： Masahiro Hatakeyama , Takeshi Murakami , Yoshihiko Naito , Kenji Terao , Norio Kimura , Kenji Watanabe
IPC分类号： G01N23/225 , G01N23/00
CPC分类号： H01J37/28 , H01J37/22 , H01J37/244 , H01J37/29 , H01J2237/24475 , H01J2237/24585 , H01J2237/24592 , H01J2237/2805 , H01J2237/2806 , H01J2237/2817 , H01L22/12
摘要： A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and have obtained information on the specimen by the electron beam irradiation; and generating an image of the specimen from the detected electrons to be observed. The electron beam irradiation comprises irradiating the specimen with the electron beam with a landing energy set in a transition region between a secondary emission electron region in which secondary emission electrons are detected and a mirror electron region in which mirror electrons are detected, thereby causing the secondary emission electrons and the mirror electrons to be mixed as the electrons to be observed. The detection of the electrons to be observed comprises performing the detection in a state where the secondary emission electrons and the mirror electrons are mixed. Observation and inspection can be quickly carried out for a fine foreign material and pattern of 100 nm or less.
摘要翻译：提供了一种技术，其能够提高在未经常被注意的能量区域中使用电子束观察样本的能力。该样本观察方法包括：用电子束照射样本; 检测已经产生的待观察的电子，并通过电子束照射获得关于样品的信息; 以及从所检测的电子产生待观察的样本的图像。电子束照射包括用电子束照射样本，其中在其中检测到二次发射电子的二次发射电子区域和其中检测到反射镜电子的镜电子区域之间的过渡区域中设置的着陆能量，从而使次级发射电子和镜电子作为待观察的电子进行混合。要观察的电子的检测包括在二次发射电子和镜电子混合的状态下进行检测。对于100nm以下的细小异物和图案，可以快速进行观察和检查。

90. 发明授权

US5998097A Fabrication method employing energy beam source 失效
标题翻译：采用能量束源的制造方法
公开(公告)号：US5998097A
公开(公告)日：1999-12-07
申请号：US300844
申请日：1999-04-28
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Yotaro Hatamura , Masayuki Nakao
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Yotaro Hatamura , Masayuki Nakao
IPC分类号： H01J37/305 , H01J37/317 , H05H3/02 , G03C5/00 , G21K5/10
CPC分类号： H05H3/02 , H01J37/3053 , H01J37/3178
摘要： An energy beam source is used in micro-fabrication tasks, such as fabrication of specific patterns, in-situ bonding, repair, connection and disconnection of electrical paths, applicable to semiconductor devices and other micro-sized circuits in integrated circuits. The beam source is made compact so that several sources can be located inside a vacuum vessel and in conjunction with micro-manipulators or micro-movement stages operated under light or an electron microscope. The beam source is provided with at least three electrodes, and by applying a selected voltage, i.e., high frequency voltage, direct current voltage and ground voltage, on each the three electrodes in association with film-forming substance(s), virtually any type of deposit can be formed at any location of a workpiece. Different types of particle beams, such as positive and negative ion beams, a highspeed neutral atomic beam, a radical particle beam, an electron beam can be produced from the beam source by judicious choice of operating-parameters and the film-forming material which may be a process gas or an applied coating. By using the beam source and the method of deposit forming presented, virtually any type of fabrication task can be carried out on any surface and any location of a workpiece in a three-dimensional space.
摘要翻译：能量束源用于微加工任务，例如制造特定图案，原位粘合，修复，连接和断开电路径，适用于集成电路中的半导体器件和其他微型尺寸电路。光束源是紧凑的，使得几个源可以位于真空容器内并且与在微光或电子显微镜下操作的微操纵器或微移动台结合。光束源设置有至少三个电极，并且通过在与成膜物质相关联的三个电极上的每一个上施加选择的电压，即高频电压，直流电压和接地电压，实际上任何类型的沉积物可以形成在工件的任何位置。可以通过明智地选择操作参数和成膜材料，从光束源产生不同类型的粒子束，例如正离子束和负离子束，高速中性原子束，自由基粒子束，电子束，作为工艺气体或涂覆涂层。通过使用光束源和沉积物形成方法，几乎任何类型的制造任务都可以在三维空间中的工件的任何表面和任何位置上进行。

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