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81. 发明授权

US07346093B2 DUV light source optical element improvements 有权
标题翻译： DUV光源光学元件改进
公开(公告)号：US07346093B2
公开(公告)日：2008-03-18
申请号：US10808157
申请日：2004-03-23
申请人： Richard L. Sandstrom , John Martin Algots , Joshua C. Brown , Raymond F. Cybulski , John Dunlop , James K. Howey , Richard G. Morton , Xiaojiang Pan , William N. Partlo , Firas F. Putris , Tom A. Watson , Thomas A. Yager
发明人： Richard L. Sandstrom , John Martin Algots , Joshua C. Brown , Raymond F. Cybulski , John Dunlop , James K. Howey , Richard G. Morton , Xiaojiang Pan , William N. Partlo , Firas F. Putris , Tom A. Watson , Thomas A. Yager
IPC分类号： H01S3/08 , H01S3/22
CPC分类号： H01S3/02 , G01J1/429 , G01J9/02 , G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mounting frame, at least one flexure mount fromed in the mounting frame that is flexible having flexure arm attached the flexture to the mounting frame. The apparatus may include a flexure force mechanism having an elongated rod. The force mechanism may pre-stress the flexure. The mirror maybe a grating which includes a substrate with metallic layer formed on the substrate, and a protective coating made of silica formed on the reflective metallic layer. The grating maybe actively tuned using an electro- or magneto-sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge system exposed to deep ultraviolet radiation.
摘要翻译：公开了一种高功率窄带，高重复率激光光源光学改进装置和方法，其具有快速可角度定位的反射镜，其具有镜安装框架，具有与安装框架系数不同的系数的反射光学元件，至少一个弯曲安装座从柔性的安装框架开始，挠曲臂将挠性件附接到安装框架。该装置可以包括具有细长杆的挠曲力机构。力机构可以预应力挠曲。镜子可以是包括在基板上形成有金属层的基板的光栅，以及形成在反射金属层上的由二氧化硅形成的保护涂层。光栅可以使用电磁感应元件或磁敏元件进行主动调谐。可以通过暴露于深紫外线辐射的氢气清除系统来去除反射层中金属的氧化物。

82. 发明授权

US06532247B2 Laser wavelength control unit with piezoelectric driver 有权
公开(公告)号：US06532247B2
公开(公告)日：2003-03-11
申请号：US09794782
申请日：2001-02-27
申请人： Ronald L. Spangler , Robert N. Jacques , George J. Everage , Stuart L. Anderson , Frederick A. Palenschat , Igor V. Fomenkov , Richard L. Sandstrom , William N. Partlo , John M. Algots , Daniel J. W. Brown
发明人： Ronald L. Spangler , Robert N. Jacques , George J. Everage , Stuart L. Anderson , Frederick A. Palenschat , Igor V. Fomenkov , Richard L. Sandstrom , William N. Partlo , John M. Algots , Daniel J. W. Brown
IPC分类号： H01S322
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to three millisecond and on a very fast time frame of a few microseconds. Techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control and a piezoelectric load cell in combination with the piezoelectric driver to provide the very fast (few microseconds) wavelength control.

83. 发明申请

US20110122901A1 HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：高功率高脉冲重复率气体放电激光系统
公开(公告)号：US20110122901A1
公开(公告)日：2011-05-26
申请号：US13020330
申请日：2011-02-03
申请人： Richard L. Sandstrom , William N. Partlo , Daniel J.W. Brown
发明人： Richard L. Sandstrom , William N. Partlo , Daniel J.W. Brown
IPC分类号： H01S3/10
CPC分类号： H01S3/08009 , H01S3/08031 , H01S3/08059 , H01S3/097 , H01S3/1055
摘要： A method of line narrowing for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses includes selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive surface of a dispersive wavelength selection optic; changing the curvature of the dispersive surface in a first manner that includes imparting a catenary curvature to the dispersive surface; and changing the curvature of the dispersive surface in a second manner that includes imparting a cylindrical curvature to the dispersive surface.
摘要翻译：窄带DUV高功率高重复率气体放电激光器产生输出激光脉冲束脉冲的脉冲串的方法包括为至少部分地由入射角确定的每个脉冲选择至少一个中心波长，所述激光束在所述分散波长选择光学器件的分散表面上包含相应的脉冲; 以第一种方式改变分散表面的曲率，包括向分散表面施加悬链曲率; 并且以第二种方式改变分散表面的曲率，包括向分散表面施加圆柱形曲率。

84. 发明授权

US07087914B2 High repetition rate laser produced plasma EUV light source 有权
公开(公告)号：US07087914B2
公开(公告)日：2006-08-08
申请号：US10803526
申请日：2004-03-17
申请人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , John Martin Algots , Robert N. Jacques , Frederick Palenschat , Jun Song
发明人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , John Martin Algots , Robert N. Jacques , Frederick Palenschat , Jun Song
IPC分类号： H01J35/20
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

85. 发明授权

US06795474B2 Gas discharge laser with improved beam path 失效
标题翻译：气体放电激光器具有改进的光束路径
公开(公告)号：US06795474B2
公开(公告)日：2004-09-21
申请号：US10000991
申请日：2001-11-14
申请人： William N. Partlo , Richard L. Sandstrom , Holzer K. Glatzel , Raymond F. Cybulski , Peter C. Newman , James K. Howey , William G. Hulburd , John T. Melchior , Alex P. Ivaschenko
发明人： William N. Partlo , Richard L. Sandstrom , Holzer K. Glatzel , Raymond F. Cybulski , Peter C. Newman , James K. Howey , William G. Hulburd , John T. Melchior , Alex P. Ivaschenko
IPC分类号： H01S322
CPC分类号： G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： An excimer laser with a purged beam path capable of producing a high quality pulsed laser beam at pulse rates in excess of 2,000 Hz at pulse energies of about 5 mJ or greater. The entire purged beam path through the laser system is sealed to minimize contamination of the beam path. A preferred embodiment comprises a thermally decoupled LNP aperture element to minimize thermal distortions in the LNP. This preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter is provided with a special purge of a compartment exposed to the output laser beam.
摘要翻译：具有清除光束路径的准分子激光器，其能够以大约5mJ或更大的脉冲能量产生超过2000Hz的脉冲速率的高质量脉冲激光束。通过激光系统的整个清除的光束路径被密封以最小化光束路径的污染。优选实施例包括热去耦LNP孔元件以最小化LNP中的热失真。该优选实施例是专门设计为用于集成电路光刻的光源的ArF准分子激光器。改进的波形计提供了暴露于输出激光束的隔室的特殊吹扫。

86. 发明授权

US6058739A Long life fused silica ultraviolet optical elements 有权
标题翻译：长寿命熔融石英紫外线光学元件
公开(公告)号：US6058739A
公开(公告)日：2000-05-09
申请号：US183220
申请日：1998-10-29
申请人： Richard G. Morton , Richard L. Sandstrom , William N. Partlo
发明人： Richard G. Morton , Richard L. Sandstrom , William N. Partlo
IPC分类号： C03B19/14 , C03C23/00 , C03C15/00 , C03B27/012 , C03B32/00 , C03B37/01 , C03B37/018
CPC分类号： C03C23/007 , C03B19/1453 , C03C23/002 , C03C23/0025
摘要： The present invention provides a process for substantially extending the useful life of fused silica elements used in high energy ultraviolet optical systems. The fused silica bulk material is pre-compacted by illuminating it with radiation prior to final mechanical fabrication and polishing to the required final surface figure. When the optical element is subsequently used in a high energy ultraviolet environment, it will continue to be compacted but at a lower effective rate. As a result, the useful life of fused silica optical elements can be increased substantially.In preferred embodiments the fused silica material is precompacted with multiple passes of short-pulse ultraviolet radiation. Multiple passes can reduce precompaction time. In one example useful life of the fused silica is increased from about 150 days to 3.8 years by about 5 days of precompaction.
摘要翻译：本发明提供了用于大量延长在高能紫外光学系统中使用的熔融二氧化硅元件的使用寿命的方法。熔融二氧化硅本体材料通过在最终机械制造和抛光到所需的最终表面图之前用辐射照射来预先压实。当光学元件随后在高能量紫外线环境中使用时，它将继续被压实，但是在较低的有效速率下。结果，能够大幅提高熔融石英光学元件的使用寿命。在优选的实施方案中，熔融二氧化硅材料预先压制多次短脉冲紫外线辐射。多次通过可以减少预压缩时间。在一个实例中，熔融二氧化硅的使用寿命从约150天增加到3.8年，约5天的预压实。

87. 发明授权

US5914974A Method and apparatus for eliminating reflected energy due to stage mismatch in nonlinear magnetic compression modules 失效
标题翻译：用于消除由于非线性磁压缩模块中的阶段失配引起的反射能量的方法和装置
公开(公告)号：US5914974A
公开(公告)日：1999-06-22
申请号：US803890
申请日：1997-02-21
申请人： William N. Partlo , Richard L. Sandstrom , Daniel L. Birx , Richard Mons Ness
发明人： William N. Partlo , Richard L. Sandstrom , Daniel L. Birx , Richard Mons Ness
IPC分类号： H01S3/097 , H01S3/0971 , H01S5/042 , H02M9/04 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： H03K17/80 , H01S3/0971 , H03K3/57 , H01S5/0428
摘要： A high voltage pulse power generating circuit capable of eliminating secondary pulses due to stage mismatch in the stages of its magnetic pulse compressor circuit is disclosed. The pulse generating circuit source comprises a high voltage charge storing element which is periodically discharged into a nonlinear magnetic compressor circuit. A mismatch correction circuit coupled to each stage of the compressor circuit discharges the reflected energy due to stage mismatch and thus eliminates the reflected energy from being launched back into the load. In a preferred embodiment, the pulse power generating circuit of the present invention utilizes a diode and a resistor that is coupled to each stage of the magnetic pulse compressor circuit. Various embodiments are disclosed.
摘要翻译：公开了一种能够消除由于其磁脉冲压缩机电路的阶段中的阶段失配引起的二次脉冲的高压脉冲发生电路。脉冲发生电路源包括周期性地放电到非线性磁压缩机电路中的高电压电荷存储元件。耦合到压缩机电路的每个级的不匹配校正电路由于不匹配而放出反射能量，从而消除反射能量被重新发射回负载。在优选实施例中，本发明的脉冲功率产生电路利用耦合到磁脉冲压缩机电路的各级的二极管和电阻器。公开了各种实施例。

88. 发明申请

US20120092746A1 OSCILLATOR-AMPLIFIER DRIVE LASER WITH SEED PROTECTION FOR AN EUV LIGHT SOURCE 有权
标题翻译：振荡放大器驱动激光器，具有针对EUV光源的保护
公开(公告)号：US20120092746A1
公开(公告)日：2012-04-19
申请号：US13077757
申请日：2011-03-31
申请人： Kai-Chung Hou , Richard L. Sandstrom , William N. Partlo , Daniel J.W. Brown , Igor V. Fomenkov
发明人： Kai-Chung Hou , Richard L. Sandstrom , William N. Partlo , Daniel J.W. Brown , Igor V. Fomenkov
IPC分类号： G02F1/11 , H01S3/00
CPC分类号： H01S3/117 , H01S3/005 , H01S3/0057 , H01S3/0064 , H01S3/076 , H01S3/0812 , H01S3/2232 , H01S3/2383 , H05G2/005 , H05G2/008
摘要： As disclosed herein, in a first aspect, a device may comprise: an oscillator producing a light output on a beam path; a target material for interaction with light on the beam path at an irradiation site; a beam delay on the beam path the beam delay having a beam folding optical arrangement; and a switch positioned along the beam path and interposed between the oscillator and the beam delay; the switch closable to divert at least a portion of light on the beam path from the beam path, the switch having close time, t1 and the beam path having a length, L1, along the path from the switch to the irradiation site; with t1
摘要翻译：如本文所公开的，在第一方面中，一种装置可以包括：在光束路径上产生光输出的振荡器; 用于在照射部位与光束路径上的光相互作用的目标材料; 在光束路径上的光束延迟具有光束折叠光学布置的光束延迟; 以及沿光束路径定位并且介于振荡器和光束延迟之间的开关; 所述开关可关闭以使所述光束路径上的至少一部分光从所述光束路径转移，所述开关具有接近时间t1，并且所述光束路径具有沿着从所述开关到所述照射部位的路径的长度L1; 与t1

89. 发明申请

US20100142582A1 GAS DISCHARGE LASER CHAMBER 有权
标题翻译：气体放电激光室
公开(公告)号：US20100142582A1
公开(公告)日：2010-06-10
申请号：US12603486
申请日：2009-10-21
申请人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Bryan G. Moosman , Tae H. Chung , Thomas P. Duffey , James J. Ferrell , Terance Hilsabeck
发明人： Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Bryan G. Moosman , Tae H. Chung , Thomas P. Duffey , James J. Ferrell , Terance Hilsabeck
IPC分类号： H01S3/038 , H01S3/03
CPC分类号： H01S3/036
摘要： One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.
摘要翻译：所公开的主题的一个方面描述了气体放电激光室。气体放电激光室包括形成在第一电极和第二电极之间的放电区域，用于使气体循环通过放电区域的切向风扇，其中风扇靠近放电区域的输入侧，输入侧隔音板接近到放电区域的输入侧。输入侧声挡板包括消失点前缘，消失点后缘，气流平滑偏移表面，使来自输入侧声挡板的表面的气流与放电区域中的阴极支撑体的输入侧对准，由多个沟槽分开的多个脊，其中所述多个脊和所述多个沟槽与通过所述放电区域的气体流动方向对齐，并且其中所述多个脊具有约0.3和约0.7英寸之间的随机间距。

90. 发明申请

US20080267241A1 Laser system 失效
标题翻译：激光系统
公开(公告)号：US20080267241A1
公开(公告)日：2008-10-30
申请号：US11982152
申请日：2007-10-31
申请人： Daniel J.W. Brown , William N. Partlo , Richard L. Sandstrom
发明人： Daniel J.W. Brown , William N. Partlo , Richard L. Sandstrom
IPC分类号： H01S3/22
CPC分类号： H01S3/2308 , G03F7/70025 , G03F7/70041 , G03F7/7055 , G03F7/70575 , G03F7/70583 , H01S3/005 , H01S3/0057 , H01S3/08036 , H01S3/225 , H01S3/2325 , H01S3/2383
摘要： An apparatus/method which may comprise: a very high power line narrowed lithography laser light source which may comprise: a solid state seed laser system which may comprise: a pre-seed laser providing a pre-seed laser output; a fiber amplifier receiving the pre-seed laser output and providing an amplified seed laser pulse which may comprise: a pulse having a nominal wavelength outside of the DUV range; a frequency converter converting to essentially the wavelength of the amplifier gain medium; a first and a second gas discharge laser amplifier gain medium operating at different repetition rates from that of the seed laser output; a beam divider providing the amplifier gain mediums with output pulses from the seed laser; a beam combiner combining the outputs of each respective amplifier gain medium to provide a laser output light pulse beam having the pulse repetition rate of the solid state seed laser system.
摘要翻译：可以包括：非常高的电力线狭窄的光刻激光光源，其可以包括：固态种子激光系统，其可以包括：提供种子间激光输出的种子间激光; 接收所述种子间激光输出并提供放大的种子激光脉冲的光纤放大器，其可以包括：具有在所述DUV范围之外的标称波长的脉冲; 变换器基本上转换为放大器增益介质的波长; 第一和第二气体放电激光放大器增益介质，与种子激光输出的重复频率不同; 一个分束器，为放大器增益介质提供来自种子激光器的输出脉冲; 组合各个放大器增益介质的输出的光束组合器，以提供具有固态种子激光器系统的脉冲重复率的激光输出光脉冲光束。

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