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1. 发明授权

US5914974A Method and apparatus for eliminating reflected energy due to stage mismatch in nonlinear magnetic compression modules 失效
标题翻译：用于消除由于非线性磁压缩模块中的阶段失配引起的反射能量的方法和装置
公开(公告)号：US5914974A
公开(公告)日：1999-06-22
申请号：US803890
申请日：1997-02-21
申请人： William N. Partlo , Richard L. Sandstrom , Daniel L. Birx , Richard Mons Ness
发明人： William N. Partlo , Richard L. Sandstrom , Daniel L. Birx , Richard Mons Ness
IPC分类号： H01S3/097 , H01S3/0971 , H01S5/042 , H02M9/04 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： H03K17/80 , H01S3/0971 , H03K3/57 , H01S5/0428
摘要： A high voltage pulse power generating circuit capable of eliminating secondary pulses due to stage mismatch in the stages of its magnetic pulse compressor circuit is disclosed. The pulse generating circuit source comprises a high voltage charge storing element which is periodically discharged into a nonlinear magnetic compressor circuit. A mismatch correction circuit coupled to each stage of the compressor circuit discharges the reflected energy due to stage mismatch and thus eliminates the reflected energy from being launched back into the load. In a preferred embodiment, the pulse power generating circuit of the present invention utilizes a diode and a resistor that is coupled to each stage of the magnetic pulse compressor circuit. Various embodiments are disclosed.
摘要翻译：公开了一种能够消除由于其磁脉冲压缩机电路的阶段中的阶段失配引起的二次脉冲的高压脉冲发生电路。脉冲发生电路源包括周期性地放电到非线性磁压缩机电路中的高电压电荷存储元件。耦合到压缩机电路的每个级的不匹配校正电路由于不匹配而放出反射能量，从而消除反射能量被重新发射回负载。在优选实施例中，本发明的脉冲功率产生电路利用耦合到磁脉冲压缩机电路的各级的二极管和电阻器。公开了各种实施例。

2. 发明授权

US06586757B2 Plasma focus light source with active and buffer gas control 失效
公开(公告)号：US06586757B2
公开(公告)日：2003-07-01
申请号：US09875719
申请日：2001-06-06
申请人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , Richard M. Ness , Daniel L. Birx late of , Richard L. Sandstrom , John E. Rauch
发明人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , Richard M. Ness , Daniel L. Birx late of , Richard L. Sandstrom , John E. Rauch
IPC分类号： H01J3520
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70908 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater. Gas flows in the vacuum chamber are controlled to assure desired concentration of active gas in the discharge region and to minimize active gas concentration in the beam path downstream of the pinch region. In a preferred embodiment, active gas is injected downstream of the pinch region and exhausted axially through the center of the anode. In another preferred embodiment a laser beam generates metal vapor at a location close to but downstream of the pinch region and the vapor is exhausted axially through the anode.

3. 发明授权

US06442181B1 Extreme repetition rate gas discharge laser 有权
标题翻译：极端重复率气体放电激光
公开(公告)号：US06442181B1
公开(公告)日：2002-08-27
申请号：US09684629
申请日：2000-10-06
申请人： I. Roger Oliver , William N. Partlo , Richard M. Ness , Richard L. Sandstrom , Stuart L. Anderson , Alex P. Ivaschenko , James K. Howey , Vladimir Kulgeyko , Jean-Marc Hueber , Daniel L. Birx
发明人： I. Roger Oliver , William N. Partlo , Richard M. Ness , Richard L. Sandstrom , Stuart L. Anderson , Alex P. Ivaschenko , James K. Howey , Vladimir Kulgeyko , Jean-Marc Hueber , Daniel L. Birx
IPC分类号： H01S310
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/134 , H01S3/22 , H01S3/2207 , H01S3/225 , H03K3/57 , H03K17/80
摘要： A gas discharge laser capable of operating at pulse rates in the range of 4,000 Hz to 6,000 Hz at pulse energies in the range of 5 mJ to 10 mJ or greater. Important improvements over prior art designs include: (1) a laser chamber having a gas flow path with a gradually increasing cross section downstream of the discharge electrodes to permit recovery a large percentage of the pressure drop in the discharge region, (2) a squirrel cage type fan for producing gas velocities through the discharge region of more than 76 m/s and capable of continuous trouble-free operation for several months, (3) a heat exchanger system capable of removing in excess of 16 kw of heat energy from the laser gas (4) a pulse power system capable of providing precisely controlled electrical pulses to the electrodes needed to produce laser pulses at the desired pulse energies in the range of 5 mJ to 10 mJ or greater at pulse repetition rates in the range of 4,000 Hz to 6,000 Hz or greater and (5) a laser beam measurement and control system capable of measuring pulse energy wavelength and bandwidth on a pulse-to-pulse laser with feedback pulse-to-pulse control of pulse energy and wavelength.
摘要翻译：一种气体放电激光器，能够以5mJ至10mJ或更大的脉冲能量在4000Hz至6,000Hz的脉冲频率下工作。与现有技术设计相比，重要的改进包括：（1）具有在放电电极下游具有逐渐增加的横截面的气体流动路径的激光室，以允许在放电区域中恢复大部分的压降，（2）松鼠通过排气区域超过76m / s产生气体速度的笼式风扇，能够连续无故障运行数月，（3）能够从其中除去超过16kw的热能的热交换器系统激光气体（4）脉冲电力系统，能够在脉冲重复频率为4,000Hz时以5mJ至10mJ或更大的范围内以期望的脉冲能量产生激光脉冲所需的电极提供精确控制的电脉冲至6,000Hz以上，（5）激光束测量和控制系统，其能够测量脉冲到脉冲激光器上的脉冲能量波长和带宽，其中反馈脉冲至脉冲控制脉冲能量和波长。

4. 发明授权

US06566668B2 Plasma focus light source with tandem ellipsoidal mirror units 有权
公开(公告)号：US06566668B2
公开(公告)日：2003-05-20
申请号：US09875721
申请日：2001-06-06
申请人： John E. Rauch , William N. Partlo , Igor V. Fomenkov , Richard M. Ness , Daniel L. Birx , Richard L. Sandstrom , Stephan T. Melnychuk
发明人： John E. Rauch , William N. Partlo , Igor V. Fomenkov , Richard M. Ness , Daniel L. Birx , Richard L. Sandstrom , Stephan T. Melnychuk
IPC分类号： H05H104
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater.

5. 发明授权

US06452199B1 Plasma focus high energy photon source with blast shield 失效
标题翻译：等离子体聚焦高能光子源与防风罩
公开(公告)号：US06452199B1
公开(公告)日：2002-09-17
申请号：US09442582
申请日：1999-11-18
申请人： William N. Partlo , Igor V. Fomenkov , Daniel L. Birx
发明人： William N. Partlo , Igor V. Fomenkov , Daniel L. Birx
IPC分类号： G21G400
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the active gas. A blast shield positioned just beyond the location of the high density pinch provides a physical barrier which confines the pinch limiting its axial elongation. A small port is provided in the blast shield that permits the radiation but not the plasma to pass through the shield. In a preferred embodiment a surface of the shield facing the plasma is dome-shaped.
摘要翻译：高能光子源。一对等离子体夹紧电极位于真空室中。该室包含工作气体，其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。脉冲电源以足够高的电压提供电脉冲，以在电极之间产生放电，以在工作气体中产生非常高温度，高密度的等离子体夹持，从而在活性气体的谱线处提供辐射。位于刚刚超出高密度夹点位置的防爆罩提供了限制其限制其轴向伸长的夹紧的物理屏障。防爆罩中设有一个允许辐射而不是等离子体通过防护罩的小型端口。在优选实施例中，面向等离子体的屏蔽的表面是圆顶形的。

6. 发明授权

US6028872A High pulse rate pulse power system with resonant power supply 有权
标题翻译：高脉冲脉冲电源系统具有谐振电源
公开(公告)号：US6028872A
公开(公告)日：2000-02-22
申请号：US211825
申请日：1998-12-15
申请人： William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
发明人： William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
IPC分类号： G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/097 , H01S3/0971 , H01S3/225 , H02M9/02 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/097 , H01S3/0971 , H01S3/225 , H03K17/80 , H03K3/57 , H01S3/09702
摘要： A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated resonant power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 2000 charges per second.
摘要翻译：用于以2000Hz或更高的速率提供受控高能电脉冲的高脉冲脉冲电源。源包括一个包括充电电容器，固态开关和限流电感器的脉冲发生电路。在脉冲发生电路中产生的脉冲在至少两个脉冲压缩电路中被压缩，并且升压脉冲变压器将峰值电压增加到至少12000伏特。提供了一种非常快速的调节谐振电源，用于在小于400微秒内对充电电容器充电，并且包括编程处理器的脉冲控制系统以至少的速率控制充电电容器的充电至小于约百分之一的精度 2000次每秒收费。

7. 发明授权

US06566667B1 Plasma focus light source with improved pulse power system 失效
标题翻译：等离子聚焦光源具有改进的脉冲电源系统
公开(公告)号：US06566667B1
公开(公告)日：2003-05-20
申请号：US09690084
申请日：2000-10-16
申请人： William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Daniel L. Birx
发明人： William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Daniel L. Birx
IPC分类号： H05H134
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially with the anode on the axis. The anode is preferably hollow and the active gas is introduced through the anode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. Preferred embodiments present optimization of capacitance values, anode length and shape and preferred active gas delivery systems are disclosed. Preferred embodiments also include a pulse power system comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer. A heat pipe cooling system is described for cooling the central anode.
摘要翻译：高能光子源。一对等离子体夹紧电极位于真空室中。该室包含工作气体，其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。脉冲电源在电压足够高的电压下提供电脉冲，以在电极之间产生放电，以在工作气体中产生非常高温度，高密度的等离子体夹持，从而在源或活性气体的光谱线处提供辐射。优选地，电极与轴上的阳极同轴地配置。阳极优选是中空的，并且活性气体通过阳极引入。这允许对光谱线源进行优化和缓冲气体的单独优化。本发明优选的实施例公开了电容值的优化，阳极长度和形状以及优选的活性气体输送系统。优选实施例还包括脉冲功率系统，其包括充电电容器和包括脉冲变压器的磁压缩电路。描述了用于冷却中央阳极的热管冷却系统。

8. 发明授权

US06240112B1 High pulse rate pulse power system with liquid cooling 有权
标题翻译：高脉冲脉冲电源系统具有液体冷却功能
公开(公告)号：US06240112B1
公开(公告)日：2001-05-29
申请号：US09470288
申请日：1999-12-22
申请人： William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
发明人： William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
IPC分类号： H01S304
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80
摘要： A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 4000 charges per second. In a preferred embodiment capable of operating at pulse rates of 2000 to 4000 Hz or greater, water cooling of the saturable inductors is provided.
摘要翻译：用于以2000Hz或更高的速率提供受控高能电脉冲的高脉冲脉冲电源。源包括一个包括充电电容器，固态开关和限流电感器的脉冲发生电路。在脉冲发生电路中产生的脉冲在至少两个脉冲压缩电路中被压缩，并且升压脉冲变压器将峰值电压增加到至少12000伏特。提供了一种非常快速的调节电源，用于在小于400微秒内为充电电容器充电，并且包括编程的处理器的脉冲控制系统以至少4000的速率控制充电电容器的充电，精度小于约百分之一每秒收费在能够以2000至4000Hz或更大的脉冲速率操作的优选实施例中，提供可饱和电感器的水冷却。

9. 发明授权

US5940421A Current reversal prevention circuit for a pulsed gas discharge laser 失效
标题翻译：用于脉冲气体放电激光器的电流反转防止电路
公开(公告)号：US5940421A
公开(公告)日：1999-08-17
申请号：US990848
申请日：1997-12-15
申请人： William N. Partlo , Daniel L. Birx , Richard M. Ness
发明人： William N. Partlo , Daniel L. Birx , Richard M. Ness
IPC分类号： G03F7/20 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： G03F7/70483 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/097 , H03K17/80 , H03K3/57 , H01S3/225
摘要： A simple, novel pulse power circuit is described, which improves the net coupling efficiency of a pulse power system used to drive a gas discharge laser, and minimizes current reversal and electrode erosion. The circuit, in accordance with an embodiment of the present invention, incorporates a saturable inductor. Contrary to conventional saturable inductor configurations, in which the saturable inductor is either not saturated or is presaturated in a reverse direction, in the present circuit the saturable inductor is presaturated in the forward direction.The saturable inductor is inserted between the final stage capacitor of a pulse power circuit and a gas discharge load, where it allows forward current but effectively blocks reverse current through the load. Elimination of reverse discharge current reduces electrode erosion and improves discharge chamber life.
摘要翻译：描述了一种简单的新颖的脉冲功率电路，其提高用于驱动气体放电激光器的脉冲电源系统的净耦合效率，并且最小化电流反转和电极侵蚀。根据本发明的实施例的电路结合有可饱和电感器。与传统的可饱和电感器配置相反，其中饱和电感器不饱和或在相反方向上预饱和，在本电路中，可饱和电感器在正向方向上预饱和。饱和电感器插入在脉冲电源电路的最终级电容器和气体放电负载之间，其中它允许正向电流，但是有效地阻止通过负载的反向电流。消除反向放电电流可以减少电极腐蚀并改善放电室寿命。

10. 发明授权

US6064072A Plasma focus high energy photon source 有权
标题翻译：等离子体聚焦高能光子源
公开(公告)号：US6064072A
公开(公告)日：2000-05-16
申请号：US268243
申请日：1999-03-15
申请人： William N. Partlo , Igor V. Fomenkov , Daniel L. Birx
发明人： William N. Partlo , Igor V. Fomenkov , Daniel L. Birx
IPC分类号： G03F7/20 , H05G2/00 , H01J35/20
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. A working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltage high enough to create electrical discharge between the electrodes to produce very high temperature, high density plasma pinch in the working gas providing radiation at the spectral line of the active gas. An external reflection radiation collector-director collects radiation produced in the plasma pinches and directs the radiation in a desired direction. In a preferred embodiment the active gas is lithium and the buffer gas is helium and the radiation-collector is coated with the material used for the electrodes. A good choice for the material is tungsten. In a second preferred embodiment the buffer gas is argon and lithium gas is produced by vaporization of solid lithium located in a hole along the axis of the central electrode of a coaxial electrode configuration.
摘要翻译：高能光子源。一对等离子体夹紧电极位于真空室中。一种工作气体，其包括贵金属缓冲气体和选择用于提供所需光谱线的活性气体。脉冲电源提供足够高电压的电脉冲，以在电极之间产生放电，以在工作气体中产生非常高温度，高密度的等离子体夹紧，从而在活性气体的谱线处提供辐射。外部反射辐射收集器 - 导向器收集在等离子体夹中产生的辐射，并将辐射引导到期望的方向。在一个优选的实施方案中，活性气体是锂，缓冲气体是氦气，辐射收集器涂覆有用于电极的材料。材料的一个不错的选择是钨。在第二优选实施例中，缓冲气体是氩气，并且通过沿着同轴电极构造的中心电极的轴的孔中的固体锂的汽化来产生锂气体。

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