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1. 发明授权

US07346093B2 DUV light source optical element improvements 有权
标题翻译： DUV光源光学元件改进
公开(公告)号：US07346093B2
公开(公告)日：2008-03-18
申请号：US10808157
申请日：2004-03-23
申请人： Richard L. Sandstrom , John Martin Algots , Joshua C. Brown , Raymond F. Cybulski , John Dunlop , James K. Howey , Richard G. Morton , Xiaojiang Pan , William N. Partlo , Firas F. Putris , Tom A. Watson , Thomas A. Yager
发明人： Richard L. Sandstrom , John Martin Algots , Joshua C. Brown , Raymond F. Cybulski , John Dunlop , James K. Howey , Richard G. Morton , Xiaojiang Pan , William N. Partlo , Firas F. Putris , Tom A. Watson , Thomas A. Yager
IPC分类号： H01S3/08 , H01S3/22
CPC分类号： H01S3/02 , G01J1/429 , G01J9/02 , G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mounting frame, at least one flexure mount fromed in the mounting frame that is flexible having flexure arm attached the flexture to the mounting frame. The apparatus may include a flexure force mechanism having an elongated rod. The force mechanism may pre-stress the flexure. The mirror maybe a grating which includes a substrate with metallic layer formed on the substrate, and a protective coating made of silica formed on the reflective metallic layer. The grating maybe actively tuned using an electro- or magneto-sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge system exposed to deep ultraviolet radiation.
摘要翻译：公开了一种高功率窄带，高重复率激光光源光学改进装置和方法，其具有快速可角度定位的反射镜，其具有镜安装框架，具有与安装框架系数不同的系数的反射光学元件，至少一个弯曲安装座从柔性的安装框架开始，挠曲臂将挠性件附接到安装框架。该装置可以包括具有细长杆的挠曲力机构。力机构可以预应力挠曲。镜子可以是包括在基板上形成有金属层的基板的光栅，以及形成在反射金属层上的由二氧化硅形成的保护涂层。光栅可以使用电磁感应元件或磁敏元件进行主动调谐。可以通过暴露于深紫外线辐射的氢气清除系统来去除反射层中金属的氧化物。

2. 发明授权

US06904073B2 High power deep ultraviolet laser with long life optics 有权
标题翻译：大功率深紫外线激光器，寿命长
公开(公告)号：US06904073B2
公开(公告)日：2005-06-07
申请号：US10384967
申请日：2003-03-08
申请人： Thomas A. Yager , William N. Partio , Richard L. Sandstrom , Xiaojiang Pan , John T. Melchior , John Martin Algots , Matthew Ball , Alexander I. Ershov , Vladimir Fleurov , Walter D. Gillespie , Holger K. Glatzel , Leonard Lublin , Elizabeth Marsh , Richard G. Morton , Richard C. Ujazdowski , David J. Warkentin , R. Kyle Webb
发明人： Thomas A. Yager , William N. Partio , Richard L. Sandstrom , Xiaojiang Pan , John T. Melchior , John Martin Algots , Matthew Ball , Alexander I. Ershov , Vladimir Fleurov , Walter D. Gillespie , Holger K. Glatzel , Leonard Lublin , Elizabeth Marsh , Richard G. Morton , Richard C. Ujazdowski , David J. Warkentin , R. Kyle Webb
IPC分类号： G03F7/20 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems producing a high repetition rate high power output beam. The invention includes solutions to a surface damage problem discovered by Applicants on CaF2 optics located in high pulse intensity sections of the output beam of prototype laser systems. Embodiments include an enclosed and purged beam path with beam pointing control for beam delivery of billions of output laser pulses. Optical components and modules described herein are capable of controlling ultraviolet laser output pulses with wavelength less than 200 nm with average output pulse intensities greater than 1.75×106 Watts/cm2 and with peak intensity or greater 3.5×106 Watts/cm2 for many billions of pulses as compared to prior art components and modules which failed after only a few minutes in these pulse intensities. Techniques and components are disclosed for minimizing the potential for optical damage and for reducing the pulse energy density to less than 100×10−6 J/cm3. Important improvements described in this specification have been grouped into the following subject matter categories: (1) Solution to CaF2 surface damage discovered by Applicants, (2) description of a high power ArF MOPA laser system, (3) description of beam delivery units, (4) polarization considerations (5) a high speed water-cooled auto shutter energy detector module and (6) other improvements.
摘要翻译：本发明提供了用于产生高重复率高功率输出光束的模块化高重复率紫外线气体放电激光器系统的长寿命光学器件。本发明包括由申请人发现的位于原型激光系统的输出光束的高脉冲强度部分中的CaF 2光学器件的表面损伤问题的解决方案。实施例包括用于束传送数十亿个输出激光脉冲的光束指向控制的封闭和清除的光束路径。本文所述的光学部件和模块能够控制波长小于200nm的紫外激光输出脉冲，平均输出脉冲强度大于1.75×6 /瓦/ cm 2，并且与与在这些脉冲强度中仅仅几分钟之后失效的现有技术部件和模块相比，数十亿个脉冲的峰值强度或更大的3.5×10 6 / cm 2 / SUP。公开了用于最小化光学损伤的可能性和将脉冲能量密度降低到小于100×10 -6 / cm 3的技术和部件。本说明书中描述的重要改进已分为以下主题类别：（1）由申请人发现的CaF 2 2表面损伤的解决方案，（2）高功率ArF MOPA激光系统的描述（ 3）光束传输单元的描述，（4）偏振考虑（5）高速水冷自动快门能量检测器模块和（6）其他改进。

3. 发明授权

US06795474B2 Gas discharge laser with improved beam path 失效
标题翻译：气体放电激光器具有改进的光束路径
公开(公告)号：US06795474B2
公开(公告)日：2004-09-21
申请号：US10000991
申请日：2001-11-14
申请人： William N. Partlo , Richard L. Sandstrom , Holzer K. Glatzel , Raymond F. Cybulski , Peter C. Newman , James K. Howey , William G. Hulburd , John T. Melchior , Alex P. Ivaschenko
发明人： William N. Partlo , Richard L. Sandstrom , Holzer K. Glatzel , Raymond F. Cybulski , Peter C. Newman , James K. Howey , William G. Hulburd , John T. Melchior , Alex P. Ivaschenko
IPC分类号： H01S322
CPC分类号： G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： An excimer laser with a purged beam path capable of producing a high quality pulsed laser beam at pulse rates in excess of 2,000 Hz at pulse energies of about 5 mJ or greater. The entire purged beam path through the laser system is sealed to minimize contamination of the beam path. A preferred embodiment comprises a thermally decoupled LNP aperture element to minimize thermal distortions in the LNP. This preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter is provided with a special purge of a compartment exposed to the output laser beam.
摘要翻译：具有清除光束路径的准分子激光器，其能够以大约5mJ或更大的脉冲能量产生超过2000Hz的脉冲速率的高质量脉冲激光束。通过激光系统的整个清除的光束路径被密封以最小化光束路径的污染。优选实施例包括热去耦LNP孔元件以最小化LNP中的热失真。该优选实施例是专门设计为用于集成电路光刻的光源的ArF准分子激光器。改进的波形计提供了暴露于输出激光束的隔室的特殊吹扫。

4. 发明授权

US6128323A Reliable modular production quality narrow-band high REP rate excimer laser 有权
标题翻译：可靠的模块化生产质量窄带高REP率准分子激光器
公开(公告)号：US6128323A
公开(公告)日：2000-10-03
申请号：US157067
申请日：1998-09-18
申请人： David W. Myers , Herve A. Besaucele , Palash P. Das , Thomas P. Duffey , Alexander I. Ershov , Igor V. Fomenkov , Thomas Hofmann , Richard G. Morton , Richard M. Ness , Peter C. Newman , Robert G. Ozarski , Gamaralalage G. Padmabandu , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Paul S. Thompson , Richard C. Ujazdowski , Tom A. Watson , R. Kyle Webb , Paolo Zambon
发明人： David W. Myers , Herve A. Besaucele , Palash P. Das , Thomas P. Duffey , Alexander I. Ershov , Igor V. Fomenkov , Thomas Hofmann , Richard G. Morton , Richard M. Ness , Peter C. Newman , Robert G. Ozarski , Gamaralalage G. Padmabandu , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Paul S. Thompson , Richard C. Ujazdowski , Tom A. Watson , R. Kyle Webb , Paolo Zambon
IPC分类号： G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/041 , H01S3/08 , H01S3/081 , H01S3/097 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/139 , H01S3/225 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/225 , H03K17/80 , H03K3/57 , H01S3/08009 , H01S3/0812 , H01S3/1392 , H01S3/2251 , H01S3/2256
摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses at 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Improvements in the laser chamber permitting the higher pulse rates and improved bandwidth performance include a single upstream preionizer tube and a high efficiency chamber. The chamber is designed for operation at lower fluorine concentration. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.
摘要翻译：本发明提供了一种可靠的模块化生产质量准分子激光器，其能够在2000Hz下产生10mJ激光脉冲，全宽度为一半，最大带宽为约0.6μm或更小。可更换模块包括激光室; 由三个模块组成的脉冲电源系统; 光学谐振器，包括线窄模块和输出耦合器模块; 波形计模块，电气控制模块，冷却水模块和气体控制模块。允许更高脉冲速率和改进的带宽性能的激光室的改进包括单个上游预分解器管和高效室。该室设计用于在较低的氟浓度下运行。在脉冲功率单元中已经提供了重要的改进，以产生更快的上升时间和改进的脉冲能量控制。这些改进包括增加容量的高压电源，具有用于精确电压调整的电压降低电路，改进的换向模块，其从由高压电源充电的电容器产生高电压脉冲，并用脉冲电压放大23次具有由单个四段不锈钢棒组成的次级绕组的非常快速的电压互感器。用于压缩头可饱和电感器的新颖设计大大减少了所需的变压器油的数量，并且几乎消除了过去漏油的可能性。

5. 发明授权

US08379687B2 Gas discharge laser line narrowing module 有权
标题翻译：气体放电激光线变窄模块
公开(公告)号：US08379687B2
公开(公告)日：2013-02-19
申请号：US11173955
申请日：2005-06-30
申请人： Raymond F. Cybulski , Robert A. Bergstedt , William N. Partlo , Richard L. Sandstrom , Gon Wang
发明人： Raymond F. Cybulski , Robert A. Bergstedt , William N. Partlo , Richard L. Sandstrom , Gon Wang
IPC分类号： H01S3/08
CPC分类号： H01S3/03 , H01S3/034 , H01S3/036 , H01S3/1055 , H01S3/225
摘要： A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.
摘要翻译：公开了一种窄气体放电激光系统及其操作方法，其可以包括分散中心波长选择元件; 包括多个折射元件的光束扩展器; 折射元件定位机构，其定位折射元件中的至少一个，以改变激光束在分散中心波长选择元件上的入射角; 分散中心波长选择元件和扩束器中的每一个彼此对准并且至少包含分散中心波长选择元件的壳体; 壳体定位机构相对于气体放电激光系统的光轴定位壳体。色散元件可以包括光栅，并且光束扩展器可以包括多个棱镜。壳体可以包含分散中心波长选择元件和扩束器。壳体定位元件可以包括位置锁定机构。

6. 发明授权

US06778584B1 High power gas discharge laser with helium purged line narrowing unit 有权
标题翻译：大功率气体放电激光器与氦气吹扫线变窄单元
公开(公告)号：US06778584B1
公开(公告)日：2004-08-17
申请号：US09716041
申请日：2000-11-17
申请人： William N. Partlo , Richard L. Sandstrom , Raymond F. Cybulski , Igor V. Fomenkov , Alexander I. Ershov
发明人： William N. Partlo , Richard L. Sandstrom , Raymond F. Cybulski , Igor V. Fomenkov , Alexander I. Ershov
IPC分类号： H01S310
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/0404 , H01S3/041 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： A helium purge for a grating based line narrowing device for minimizing thermal distortions in line narrowed lasers producing high energy laser beams at high repetition rates. Applicants have shown substantial improvement in performance with the uses of helium purge as compared to prior art nitrogen purges. In preferred embodiments a stream of helium gas is directed across the face of the grating. In other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.
摘要翻译：用于基于光栅的线窄化装置的氦气吹扫，用于最大限度地减少线性窄激光器中的热失真，以高重复率产生高能激光束。与现有技术的氮气吹扫相比，申请人已经显示出使用氦吹扫的性能方面的显着改进。在优选实施例中，氦气流被引导穿过光栅的表面。在其它实施例中，减少吹扫气体压力以减少热气体层的光学效应。

7. 发明授权

US07277466B2 High power gas discharge laser with helium purged line narrowing unit 有权
标题翻译：大功率气体放电激光器与氦气吹扫线变窄单元
公开(公告)号：US07277466B2
公开(公告)日：2007-10-02
申请号：US10820261
申请日：2004-04-07
申请人： William N. Partlo , Richard L. Sandstrom , Raymond F. Cybulski , Igor V. Fomenkov , Alexander I. Ershov
发明人： William N. Partlo , Richard L. Sandstrom , Raymond F. Cybulski , Igor V. Fomenkov , Alexander I. Ershov
IPC分类号： H01S3/22 , H01S3/08
CPC分类号： G03F7/70025 , G03F7/70575 , H01S3/027 , H01S3/036 , H01S3/0401 , H01S3/1055 , H01S3/225
摘要： A helium purge for a grating based line narrowing device for minimizing thermal distortions in line narrowed lasers producing high energy laser beams at high repetition rates. Applicants have shown substantial improvement in performance with the use of helium purge as compared to prior art nitrogen purges. In preferred embodiments a stream of helium gas is directed across the face of the grating. In other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.
摘要翻译：用于基于光栅的线窄化装置的氦气吹扫，用于最大限度地减少线性窄激光器中的热失真，以高重复率产生高能激光束。与现有技术的氮气清洗相比，使用氦气吹扫的申请人已经显示出实质性的改善。在优选实施例中，氦气流被引导穿过光栅的表面。在其它实施例中，减少吹扫气体压力以减少热气体层的光学效应。

8. 发明授权

US06882674B2 Four KHz gas discharge laser system 有权
标题翻译：四KHz气体放电激光系统
公开(公告)号：US06882674B2
公开(公告)日：2005-04-19
申请号：US10036676
申请日：2001-12-21
申请人： Christian J. Wittak , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov , Thomas D. Steiger , Jerome A. Emilo , Clay C. Titus , Alex P. Ivaschenko , Paolo Zambon , Gamaralalage G. Padmabandu , Mark S. Branham , Sunjay Phatak , Raymond F. Cybulski
发明人： Christian J. Wittak , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov , Thomas D. Steiger , Jerome A. Emilo , Clay C. Titus , Alex P. Ivaschenko , Paolo Zambon , Gamaralalage G. Padmabandu , Mark S. Branham , Sunjay Phatak , Raymond F. Cybulski
IPC分类号： H01S3/097 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/23 , H01S3/22
CPC分类号： G03F7/70025 , G03F7/70933 , H01S3/0057 , H01S3/036 , H01S3/0385 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供了一种准分子激光器，其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的极限内。在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

9. 发明申请

US20080197297A1 High repetition rate laser produced plasma EUV light source 有权
公开(公告)号：US20080197297A1
公开(公告)日：2008-08-21
申请号：US11471434
申请日：2006-06-20
申请人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , Thomas D. Steiger , John Martin Algots , Norbert Bowering , Robert N. Jacques , Frederick Palenschat , Jun Song
发明人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , Thomas D. Steiger , John Martin Algots , Norbert Bowering , Robert N. Jacques , Frederick Palenschat , Jun Song
IPC分类号： G01J3/10
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

10. 发明授权

US07087914B2 High repetition rate laser produced plasma EUV light source 有权
公开(公告)号：US07087914B2
公开(公告)日：2006-08-08
申请号：US10803526
申请日：2004-03-17
申请人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , John Martin Algots , Robert N. Jacques , Frederick Palenschat , Jun Song
发明人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , John Martin Algots , Robert N. Jacques , Frederick Palenschat , Jun Song
IPC分类号： H01J35/20
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

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