专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

81. 发明授权

US07154928B2 Laser output beam wavefront splitter for bandwidth spectrum control 有权
标题翻译：激光输出光束波前分离器，用于带宽频谱控制
公开(公告)号：US07154928B2
公开(公告)日：2006-12-26
申请号：US10875662
申请日：2004-06-23
申请人： Richard L. Sandstrom , Daniel J. W. Brown , Alexander I. Ershov , Igor V. Fomenkov , William N. Partlo
发明人： Richard L. Sandstrom , Daniel J. W. Brown , Alexander I. Ershov , Igor V. Fomenkov , William N. Partlo
IPC分类号： H01S3/22 , H01S3/223
CPC分类号： H01S3/0812 , G03F7/70025 , G03F7/70575 , H01S3/08059 , H01S3/097 , H01S3/1055 , H01S3/1305
摘要： Apparatus/method providing bandwidth control in narrow band short pulse duration gas discharge laser output light pulse beam producing systems, producing a beam comprising pulses at selected pulse repetition races, e.g., comprising a dispersive bandwidth selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the beam containing the respective pulse on the optic; a tuning mechanism operative to select at least one angle of incidence of the beam containing the respective pulse upon the optic; the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the pulse to return from the optic a laser light pulse comprising a plurality of spatially separated but not temporally separated portions, each having one of at least two different selected center wavelengths.
摘要翻译：在窄带短脉冲持续时间气体放电激光输出光脉冲光束产生系统中提供带宽控制的装置/方法，产生包括选定的脉冲重复轨迹的脉冲的波束，例如包括色散带宽选择光学器件，用于为每个脉冲选择至少一个中心波长至少部分地由在光学元件上包含相应脉冲的光束的入射角确定; 调谐机构，用于选择在光学元件上包含相应脉冲的光束的至少一个入射角; 所述调谐机构包括多个入射角选择元件，每个入射角选择元件限定所述脉冲的不同的空间分离但不是时间上分离的部分的入射角，以从所述光学器件返回包括多个空间分离但不时间分离的部分的激光脉冲每个具有至少两个不同选择的中心波长中的一个。

82. 发明授权

US06757316B2 Four KHz gas discharge laser 有权
标题翻译：四KHz气体放电激光器
公开(公告)号：US06757316B2
公开(公告)日：2004-06-29
申请号：US09854097
申请日：2001-05-11
申请人： Peter C. Newman , Thomas P. Duffey , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Vladimir B. Fleurov , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Xiaojiang J. Pan , Vladimir Kulgeyko , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov
发明人： Peter C. Newman , Thomas P. Duffey , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Vladimir B. Fleurov , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Xiaojiang J. Pan , Vladimir Kulgeyko , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov
IPC分类号： H01S322
CPC分类号： H01S3/225 , G01J1/4257 , G01J3/027 , G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供了一种准分子激光器，其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的极限内。在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

83. 发明授权

US06621846B1 Electric discharge laser with active wavelength chirp correction 有权
标题翻译：具有有源波长啁啾校正的放电激光器
公开(公告)号：US06621846B1
公开(公告)日：2003-09-16
申请号：US09501160
申请日：2000-02-09
申请人： Richard L. Sandstrom , Palash P. Das , George J. Everage , Frederick G. Erie , William N. Partlo , Igor V. Fomenkov
发明人： Richard L. Sandstrom , Palash P. Das , George J. Everage , Frederick G. Erie , William N. Partlo , Igor V. Fomenkov
IPC分类号： H01S322
CPC分类号： H01S3/104 , G03F7/70025 , G03F7/70333 , G03F7/70575 , G03F7/708 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0382 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/225
摘要： Electric discharge laser with active chirp correction. This application discloses techniques for moderating and dispensing these pressure waves. In some lasers small predictable patterns remain which can be substantially corrected with active wavelength control using relatively slow wavelength control instruments of the prior art. In a preferred embodiment a simple learning algorithm is described to allow advance tuning mirror adjustment in anticipation of the learned chirp pattern. Embodiments include stepper motors having very fine adjustments so that size of tuning steps are substantially reduced for more precise tuning. However, complete elimination of wavelength chirp is normally not feasible with structural changes in the laser chamber and advance tuning; therefore, Applicants have developed equipment and techniques for very fast active chirp correction. Improved techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver. In another preferred embodiment chirp correction is made on a pulse-to-pulse basis where the wavelength of one pulse is measured and the wavelength of the next pulse is corrected based on the measurement. This correction technique is able to function at repetition rates as rapid as 2000 Hz and greater.
摘要翻译：具有主动啁啾校正的放电激光器。本申请公开了用于调节和分配这些压力波的技术。在一些激光器中，可以使用现有技术的相对较慢的波长控制装置的主动波长控制基本上校正了小的可预测的图案。在优选实施例中，描述了一种简单的学习算法，以便在预期学习的啁啾模式中允许预调谐镜调节。实施例包括具有非常精细调节的步进电动机，使得调节步骤的尺寸被显着减小以便更精确的调谐。然而，完全消除波长啁啾通常不可行，在激光室的结构变化和提前调谐; 因此，申请人已经开发了用于非常快的主动啁啾校正的设备和技术。改进的技术包括相对较慢的步进电机和非常快的压电驱动器的组合。在另一个优选实施例中，在脉冲对脉冲基础上进行啁啾校正，其中测量一个脉冲的波长，并且基于测量校正下一个脉冲的波长。该校正技术能够以2000Hz及更高的重复速率工作。

84. 发明授权

US06480275B2 High resolution etalon-grating monochromator 有权
标题翻译：高分辨率标准光栅单色仪
公开(公告)号：US06480275B2
公开(公告)日：2002-11-12
申请号：US09772293
申请日：2001-01-29
申请人： Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Scott T. Smith
发明人： Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Scott T. Smith
IPC分类号： G01J318
CPC分类号： G01J3/12 , G01J1/4257 , G01J3/22 , G01J3/26 , G01J9/02
摘要： A high resolution etalon-grating monochromator. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the monochromator and scanning the laser wavelength over a range which includes the monochromator slit wavelength.
摘要翻译：高分辨率标准光栅单色仪。优选的实施例在紫外范围内呈现非常狭窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。表示对应于所选择的标准具条纹的波长的调度光的一部分通过第二狭缝并由光检测器监视。当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。激光束的带宽可以通过激光束的引导部分进入单色仪并且在包括单色器狭缝波长的范围内扫描激光波长而被非常精确地测量。

85. 发明授权

US06442181B1 Extreme repetition rate gas discharge laser 有权
标题翻译：极端重复率气体放电激光
公开(公告)号：US06442181B1
公开(公告)日：2002-08-27
申请号：US09684629
申请日：2000-10-06
申请人： I. Roger Oliver , William N. Partlo , Richard M. Ness , Richard L. Sandstrom , Stuart L. Anderson , Alex P. Ivaschenko , James K. Howey , Vladimir Kulgeyko , Jean-Marc Hueber , Daniel L. Birx
发明人： I. Roger Oliver , William N. Partlo , Richard M. Ness , Richard L. Sandstrom , Stuart L. Anderson , Alex P. Ivaschenko , James K. Howey , Vladimir Kulgeyko , Jean-Marc Hueber , Daniel L. Birx
IPC分类号： H01S310
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/134 , H01S3/22 , H01S3/2207 , H01S3/225 , H03K3/57 , H03K17/80
摘要： A gas discharge laser capable of operating at pulse rates in the range of 4,000 Hz to 6,000 Hz at pulse energies in the range of 5 mJ to 10 mJ or greater. Important improvements over prior art designs include: (1) a laser chamber having a gas flow path with a gradually increasing cross section downstream of the discharge electrodes to permit recovery a large percentage of the pressure drop in the discharge region, (2) a squirrel cage type fan for producing gas velocities through the discharge region of more than 76 m/s and capable of continuous trouble-free operation for several months, (3) a heat exchanger system capable of removing in excess of 16 kw of heat energy from the laser gas (4) a pulse power system capable of providing precisely controlled electrical pulses to the electrodes needed to produce laser pulses at the desired pulse energies in the range of 5 mJ to 10 mJ or greater at pulse repetition rates in the range of 4,000 Hz to 6,000 Hz or greater and (5) a laser beam measurement and control system capable of measuring pulse energy wavelength and bandwidth on a pulse-to-pulse laser with feedback pulse-to-pulse control of pulse energy and wavelength.
摘要翻译：一种气体放电激光器，能够以5mJ至10mJ或更大的脉冲能量在4000Hz至6,000Hz的脉冲频率下工作。与现有技术设计相比，重要的改进包括：（1）具有在放电电极下游具有逐渐增加的横截面的气体流动路径的激光室，以允许在放电区域中恢复大部分的压降，（2）松鼠通过排气区域超过76m / s产生气体速度的笼式风扇，能够连续无故障运行数月，（3）能够从其中除去超过16kw的热能的热交换器系统激光气体（4）脉冲电力系统，能够在脉冲重复频率为4,000Hz时以5mJ至10mJ或更大的范围内以期望的脉冲能量产生激光脉冲所需的电极提供精确控制的电脉冲至6,000Hz以上，（5）激光束测量和控制系统，其能够测量脉冲到脉冲激光器上的脉冲能量波长和带宽，其中反馈脉冲至脉冲控制脉冲能量和波长。

86. 发明授权

US6016325A Magnetic modulator voltage and temperature timing compensation circuit 失效
标题翻译：磁调制器电压和温度定时补偿电路
公开(公告)号：US6016325A
公开(公告)日：2000-01-18
申请号：US69019
申请日：1998-04-27
申请人： Richard M. Ness , William N. Partlo , Richard L. Sandstrom
发明人： Richard M. Ness , William N. Partlo , Richard L. Sandstrom
IPC分类号： H01S3/097 , H01S3/038 , H02M3/00 , H02M3/157 , H03K3/45 , H03K5/13 , H01S3/00
CPC分类号： H03K5/131 , H01S3/038
摘要： An improvement over prior art voltage timing compensation circuits is achieved by incorporating a function generator to provide a more accurate non-linear compensation to pulse timing delay, which is typically a non-linear function of voltage. An improvement over prior art temperature timing compensation circuits is achieved by providing for actual temperature measurements to be made and used to drive the timing compensation circuitry for a more accurate temperature timing compensation than provided by prior art temperature synthesis, while still using a relatively simple compensating circuit. In some embodiments a timing compensation circuit combines both voltage and temperature timing compensation.
摘要翻译：通过结合功能发生器来提供对脉冲定时延迟的更精确的非线性补偿来实现现有技术的电压定时补偿电路的改进，脉冲定时延迟通常是电压的非线性函数。通过提供实际的温度测量来实现对现有技术的温度定时补偿电路的改进，并且用于驱动定时补偿电路以获得比现有技术的温度合成提供的更精确的温度定时补偿，同时仍然使用相对简单的补偿电路。在一些实施例中，定时补偿电路组合电压和温度定时补偿。

87. 发明授权

US5991324A Reliable. modular, production quality narrow-band KRF excimer laser 失效
标题翻译：可靠。模块化，生产质量好的窄带KRF准分子激光器
公开(公告)号：US5991324A
公开(公告)日：1999-11-23
申请号：US41474
申请日：1998-03-11
申请人： David S. Knowles , James H. Azzola , Herve A. Besaucele , Palash P. Das , Alexander I. Ershov , Igor V. Fomenkov , Tibor Juhasz , Robert G. Ozarski , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Richard C. Ujazdowski , Tom A. Watson , Richard M. Ness
发明人： David S. Knowles , James H. Azzola , Herve A. Besaucele , Palash P. Das , Alexander I. Ershov , Igor V. Fomenkov , Tibor Juhasz , Robert G. Ozarski , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Richard C. Ujazdowski , Tom A. Watson , Richard M. Ness
IPC分类号： H01S3/038 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/1055 , H01S3/139 , H01S3/225 , H01S3/22
CPC分类号： G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/1055 , H01S3/225 , H01S3/1392
摘要： A reliable, modular, production quality narrow-band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwidth of about 0.6 pm or less. The present invention is especially suited to long-term round-the-clock operation in the lithographic production of integrated circuits. Improvements over prior art lasers include a single upstream preionizer tube and acoustic baffles. A preferred embodiment includes reduced fluorine concentration, an anode support bar shaped to reduce aerodynamic reaction forces on blower bearings, a modified pulse power system providing faster pulse rise time, an output coupler with substantially increased reflectivity, a line narrowing module with CaF prism beam expanders, a more accurate wavemeter, a laser computer controller programmed with new and improved pulse energy control algorithm.
摘要翻译：一种可靠，模块化，生产质量好的窄带KrF准分子激光器，能够以1000Hz的频率产生10mJ的激光脉冲，带宽约为0.6μm或更小。本发明特别适用于集成电路的平版印刷生产中的长期全天候操作。现有技术的激光器的改进包括单个上游预分解器管和声学挡板。优选的实施例包括减少的氟浓度，阳极支撑杆形状以减小鼓风机轴承上的空气动力反作用力，改进的脉冲电源系统提供更快的脉冲上升时间，输出耦合器具有显着增加的反射率，具有CaF棱镜扩束器的线窄化模块，更准确的波长计，激光计算机控制器编程，具有新的改进的脉冲能量控制算法。

88. 发明授权

US09516730B2 Systems and methods for buffer gas flow stabilization in a laser produced plasma light source 有权
标题翻译：激光产生等离子体光源中缓冲气体流动稳定的系统和方法
公开(公告)号：US09516730B2
公开(公告)日：2016-12-06
申请号：US13156188
申请日：2011-06-08
申请人： Vladimir B. Fleurov , William N. Partlo , Igor V. Fomenkov , Alexander I. Ershov
发明人： Vladimir B. Fleurov , William N. Partlo , Igor V. Fomenkov , Alexander I. Ershov
IPC分类号： G21K5/00 , H05G2/00
CPC分类号： H05G2/005 , H05G2/008
摘要： An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.
摘要翻译：一种极紫外（EUV）光源，包括光学元件，目标材料和沿着光束路径通过所述光学元件以照射所述目标材料的激光束。 EUV光源还包括沿着所述光束路径产生朝向所述目标材料的气流的系统，所述系统具有包围体积和多条气体管线的锥形构件，每条气体管线将气流输送到所述体积中。

89. 发明授权

US09029813B2 Filter for material supply apparatus of an extreme ultraviolet light source 有权
标题翻译：过滤器用于极紫外光源的材料供应装置
公开(公告)号：US09029813B2
公开(公告)日：2015-05-12
申请号：US13112784
申请日：2011-05-20
申请人： Igor V. Fomenkov , William N. Partlo , Georgiy O. Vaschenko , William Oldham
发明人： Igor V. Fomenkov , William N. Partlo , Georgiy O. Vaschenko , William Oldham
IPC分类号： G01J3/10 , B22F3/105 , B01D29/56
CPC分类号： B01D29/56 , B22F3/105 , H05G2/006 , H05G2/008 , H05H1/46
摘要： A filter is used in a target material supply apparatus and includes a sheet having a first flat surface and a second opposing flat surface, and a plurality of through holes. The first flat surface is in fluid communication with a reservoir that holds a target mixture that includes a target material and non-target particles. The through holes extend from the second flat surface and are fluidly coupled at the second flat surface to an orifice of a nozzle. The sheet has a surface area that is exposed to the target mixture, the exposed surface area being at least a factor of one hundred less than an exposed surface area of a sintered filter having an equivalent transverse extent to that of the sheet.
摘要翻译：在目标材料供给装置中使用过滤器，并且包括具有第一平面和第二相对平坦面的片，以及多个通孔。第一平坦表面与储存包含目标材料和非目标颗粒的目标混合物的储存器流体连通。通孔从第二平坦表面延伸并且在第二平坦表面处流体耦合到喷嘴的孔口。片材具有暴露于目标混合物的表面积，暴露的表面积比具有与片材相当的横向程度的烧结过滤器的暴露表面积至少要低一百倍。

90. 发明申请

US20110141865A1 Metrology for Extreme Ultraviolet Light Source 有权
标题翻译：极紫外光源计量
公开(公告)号：US20110141865A1
公开(公告)日：2011-06-16
申请号：US12637961
申请日：2009-12-15
申请人： Vahan Senekerimyan , Nam-Hyong Kim , Robert A. Bergstedt , Igor V. Fomenkov , William N. Partlo
发明人： Vahan Senekerimyan , Nam-Hyong Kim , Robert A. Bergstedt , Igor V. Fomenkov , William N. Partlo
IPC分类号： G11B20/00 , G11B7/00
CPC分类号： G01J1/429 , H05G2/008
摘要： An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location; and a metrology system. The beam delivery system includes converging lens configured and arranged to focus the amplified light beam at the target location. The metrology system includes a light collection system configured to collect a portion of the amplified light beam reflected from the converging lens and a portion of a guide laser beam reflected from the converging lens. The light collection system includes a dichroic optical device configured to optically separate the portions.
摘要翻译：极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 射束传送系统，被配置为接收从驱动激光系统发射的放大光束并将放大的光束引向目标位置; 和计量系统。光束传送系统包括被配置和布置成将被放大的光束聚焦在目标位置处的会聚透镜。测量系统包括：光收集系统，被配置为收集从会聚透镜反射的放大光束的一部分和从会聚透镜反射的一部分引导激光束。光采集系统包括配置为光学地分离这些部分的二向色光学装置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式