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81. 发明授权

US07712207B2 Method of manufacturing a wrap around shield for a perpendicular write pole using a laminated mask with an endpoint detection layer 有权
标题翻译：使用具有端点检测层的层叠掩模制造用于垂直写入极的环绕屏蔽的方法
公开(公告)号：US07712207B2
公开(公告)日：2010-05-11
申请号：US11615818
申请日：2006-12-22
申请人： Aron Pentek , Yi Zheng , Howard Gordon Zolla
发明人： Aron Pentek , Yi Zheng , Howard Gordon Zolla
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , Y10T29/49021 , Y10T29/49032 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for manufacturing a magnetic write pole and trailing wrap around magnetic shield for use in a perpendicular magnetic data recording system. The method includes the use of a hard mask structure with end point detection material embedded in a hard mask material. The novel hard mask structure provides the mill resistance of a hard mask, with the end point detection advantages of an end point detection layer.
摘要翻译：用于制造用于垂直磁数据记录系统的磁性写入磁极和磁性屏蔽的尾部缠绕的方法。该方法包括使用具有嵌入硬掩模材料中的端点检测材料的硬掩模结构。新颖的硬掩模结构提供了硬掩模的磨机电阻，具有终点检测层的终点检测优点。

82. 发明申请

US20090284867A1 DEVICE HAVING SIDEGAP AND METHOD FOR FABRICATING SAME 有权
标题翻译：具有边界的装置及其制造方法
公开(公告)号：US20090284867A1
公开(公告)日：2009-11-19
申请号：US12120129
申请日：2008-05-13
申请人： Yi Zheng
发明人： Yi Zheng
IPC分类号： G11B5/33 , B05D5/12 , H05H1/24 , H05H1/50 , B44C1/22
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , Y10T29/49041 , Y10T29/49046 , Y10T29/49048 , Y10T29/4906
摘要： A method in one approach includes forming a first layer of a nonmagnetic material over two sides of a structure, the first layer being substantially absent from above a top of the structure; depositing an overlayer of an etchable, nonmagnetic material over the first layer and the top of the structure; and etching the overlayer for substantially removing the overlayer from above the top of the structure, wherein a substantial portion of the overlayer remains along the two sides of the structure after the etching. Additional systems and methods are also presented.
摘要翻译：一种方法包括在结构的两侧形成非磁性材料的第一层，第一层基本上不存在于结构的顶部之上; 在所述结构的第一层和顶部上沉积可蚀刻的非磁性材料的覆层; 并且蚀刻所述覆盖层以从所述结构的顶部上方基本上去除所述覆盖层，其中所述覆盖层的大部分在蚀刻之后沿着所述结构的两侧保持。还介绍了其他系统和方法。

83. 发明授权

US07588884B2 Method for enhancing wafer alignment marks 失效
标题翻译：增强晶圆对准标记的方法
公开(公告)号：US07588884B2
公开(公告)日：2009-09-15
申请号：US10857151
申请日：2004-05-28
申请人： Amanda Baer , Nian-Xiang Sun , Sue Siyang Zhang , Yi Zheng
发明人： Amanda Baer , Nian-Xiang Sun , Sue Siyang Zhang , Yi Zheng
IPC分类号： G03F1/00
CPC分类号： G03F9/7084 , G03F9/7076 , G03F9/708
摘要： A method of enhancing alignment marks defined in a relatively thin layer on a wafer by etching the alignment marks into an underlying alignment mark transfer layer is described. The target area for the alignment marks is prepared by depositing material for the transfer layer. In alternative embodiments an oversized trench is formed in the target area prior to the deposition of the transfer layer. The alignment marks can fabricated in the layer(s) deposited by the existing process or alternatively, the original layers can be removed and replaced with a layer of material selected to have comparable etching properties (definition layer).
摘要翻译：描述了通过将对准标记蚀刻到下面的对准标记转印层中来增强在晶片上相对薄的层中限定的对准标记的方法。通过沉积用于转印层的材料来制备对准标记的目标区域。在替代实施例中，在沉积转移层之前，在目标区域中形成尺寸过大的沟槽。对准标记可以在通过现有工艺沉积的层中制造，或者替代地，原始层可被移除并被选择为具有相当的蚀刻性质（定义层）的材料层替代。

84. 发明授权

US07587811B2 Method for manufacturing a magnetic write head for perpendicular magnetic data recording 失效
标题翻译：用于制造用于垂直磁数据记录的磁写头的方法
公开(公告)号：US07587811B2
公开(公告)日：2009-09-15
申请号：US11411561
申请日：2006-04-25
申请人： Hamid Balamane , Christian Rene Bonhote , Yimin Hsu , Aaron Neuhaus , Aron Pentek , Yi Zheng
发明人： Hamid Balamane , Christian Rene Bonhote , Yimin Hsu , Aaron Neuhaus , Aron Pentek , Yi Zheng
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , Y10T29/49021 , Y10T29/49032 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording having a write pole with a very narrow track width and well controlled critical dimensions. The write pole is formed by depositing an electrically conductive seed layer over a substrate, and then depositing a photo resist layer over the seed layer. The photo resist layer is photolithographically exposed and developed to form an opening or trench in the photoreist layer, the opening defining the pattern of the write pole. A magnetic material is then plated into the opening in the photoresist layer. The photo resist layer can then be removed by a chemical lift off, and portions of the seed layer that are not covered by the write pole can be removed by ion milling.
摘要翻译：一种制造用于垂直磁记录的磁写头的方法，其具有具有非常窄的轨道宽度和良好控制的临界尺寸的写极。写极通过在衬底上沉积导电种子层，然后在种子层上沉积光致抗蚀剂层而形成。光致抗蚀剂层被光刻地曝光和显影以在光致镜层中形成开口或沟槽，该开口限定写入极的图案。然后将磁性材料电镀在光致抗蚀剂层的开口中。然后可以通过化学剥离除去光致抗蚀剂层，并且可以通过离子铣削除去未被写入极覆盖的种子层的部分。

85. 发明授权

US07562437B2 Method of manufacturing a wrap around shield for a perpendicular write pole using a laminated mask 失效
标题翻译：使用层压掩模制造用于垂直写入极的环绕屏蔽的方法
公开(公告)号：US07562437B2
公开(公告)日：2009-07-21
申请号：US11412038
申请日：2006-04-25
申请人： Aron Pentek , Yi Zheng
发明人： Aron Pentek , Yi Zheng
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , G11B5/3163 , Y10T29/49021 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for constructing a magnetic write head for use in perpendicular magnetic recording, the write head having a write pole with a trailing shield that wraps around the write pole. The method allows the trailing shield to be constructed with a very well controlled trailing gap thickness and also allows the write pole to be constructed with a well controlled track width and a straight, flat trailing edge. The method includes depositing a magnetic write pole over a substrate and forming a mask structure over the write pole layer. The mask structure includes an end point detection layer that can be removed by reactive ion etching. An ion mill is performed to form a write pole by removing magnetic write pole material that is not covered by the mask layer. A layer of non-magnetic material is deposited and is ion milled to expose the end point detection layer.
摘要翻译：一种用于构造用于垂直磁记录的磁写头的方法，所述写头具有带有围绕所述写柱的后屏蔽的写极。该方法允许尾部屏蔽件构造得非常好地控制拖尾间隙厚度，并且还允许写极构造具有良好控制的轨道宽度和直的平坦后缘。该方法包括在衬底上沉积磁性写入极，并在写入极层上形成掩模结构。掩模结构包括可以通过反应离子蚀刻去除的端点检测层。通过去除未被掩模层覆盖的磁性写入极材料来执行离子磨以形成写入极。沉积一层非磁性材料，并将其离子研磨以露出终点检测层。

86. 发明申请

US20090152235A1 METHOD OF MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD WITH STEPPED TRAILING MAGNETIC SHIELD WITH ELECTRICAL LAPPING GUIDE CONTROL 有权
标题翻译：使用带电导线控制的步进式磁屏蔽制造全磁性写磁头的方法
公开(公告)号：US20090152235A1
公开(公告)日：2009-06-18
申请号：US11956292
申请日：2007-12-13
申请人： Wen-Chien David Hsiao , Hieu Lam , Vladimir Nikitin , Sue Siyang Zhang , Yi Zheng
发明人： Wen-Chien David Hsiao , Hieu Lam , Vladimir Nikitin , Sue Siyang Zhang , Yi Zheng
IPC分类号： B44C1/22
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , G11B5/3166 , G11B5/3169
摘要： A method for manufacturing a magnetic write head having a stepped trailing shield. The stepped trailing shield is formed by forming a non-magnetic bump over a write pole prior to electroplating a wrap-around magnetic shield. The method allows the location of the front edge of the bump relative to the back edge of the wrap-around shield to be monitored by measuring the electrical resistance of an electrical lapping guide formed concurrently with these features. This concurrent formation of a lapping guide can be used to define the relative location of other features as well, such as the location of a back edge of a wrap-around shield relative to a flare point of a write pole.
摘要翻译：一种用于制造具有阶梯式后挡板的磁写头的方法。在电镀环绕磁屏蔽之前，通过在写入极上形成非磁性凸块来形成阶梯式后屏蔽。该方法允许通过测量与这些特征同时形成的电研磨引导件的电阻来监测凸块的前边缘相对于环绕护罩的后边缘的位置。研磨引导件的这种同时形成也可以用于限定其它特征的相对位置，例如环绕屏蔽件的后边缘相对于写入极点的扩张点的位置。

87. 发明授权

US07541297B2 Method and system for improving dielectric film quality for void free gap fill 有权
标题翻译：改善空隙填隙电介质膜质量的方法和系统
公开(公告)号：US07541297B2
公开(公告)日：2009-06-02
申请号：US11876541
申请日：2007-10-22
申请人： Abhijit Basu Mallick , Jeffrey C. Munro , Linlin Wang , Srinivas D. Nemani , Yi Zheng , Zheng Yuan , Dimitry Lubomirsky , Ellie Y. Yieh
发明人： Abhijit Basu Mallick , Jeffrey C. Munro , Linlin Wang , Srinivas D. Nemani , Yi Zheng , Zheng Yuan , Dimitry Lubomirsky , Ellie Y. Yieh
IPC分类号： H01L21/469 , H01L21/31
CPC分类号： H01L21/31612 , C23C16/045 , C23C16/24 , C23C16/401 , C23C16/56 , H01L21/02126 , H01L21/02164 , H01L21/02274 , H01L21/0228 , H01L21/02337 , H01L21/0234 , H01L21/76837
摘要： A method of forming a silicon oxide layer on a substrate. The method includes providing a substrate and forming a first silicon oxide layer overlying at least a portion of the substrate, the first silicon oxide layer including residual water, hydroxyl groups, and carbon species. The method further includes exposing the first silicon oxide layer to a plurality of silicon-containing species to form a plurality of amorphous silicon components being partially intermixed with the first silicon oxide layer. Additionally, the method includes annealing the first silicon oxide layer partially intermixed with the plurality of amorphous silicon components in an oxidative environment to form a second silicon oxide layer on the substrate. At least a portion of amorphous silicon components are oxidized to become part of the second silicon oxide layer and unreacted residual hydroxyl groups and carbon species in the second silicon oxide layer are substantially removed.
摘要翻译：在基板上形成氧化硅层的方法。该方法包括提供衬底并形成覆盖衬底的至少一部分的第一氧化硅层，第一氧化硅层包括残留的水，羟基和碳类。该方法还包括将第一氧化硅层暴露于多个含硅物质以形成与第一氧化硅层部分混合的多个非晶硅组分。此外，该方法包括在氧化环境中将与多个非晶硅组分部分混合的第一氧化硅层退火以在衬底上形成第二氧化硅层。至少一部分非晶硅组分被氧化成第二氧化硅层的一部分，并且基本上去除了第二氧化硅层中未反应的残余羟基和碳物质。

88. 发明授权

US07449790B2 Methods and systems of enhancing stepper alignment signals and metrology alignment target signals 失效
标题翻译：增强步进对准信号和计量校准目标信号的方法和系统
公开(公告)号：US07449790B2
公开(公告)日：2008-11-11
申请号：US10928466
申请日：2004-08-26
申请人： Yi Zheng , Howard Zolla , Nian-Xiang Sun , Hamid Balamane
发明人： Yi Zheng , Howard Zolla , Nian-Xiang Sun , Hamid Balamane
IPC分类号： H01L23/544
CPC分类号： G03F9/708 , G03F9/7076 , G03F9/7084
摘要： Methods and systems of enhancing stepper alignment signals and metrology alignment target signals. In one embodiment, a plurality of alternating rows comprising a first material of a first height and a second material of a second height are constructed. The first material and the second material are selected to enhance the contrast of the mark when imaged for alignment of photolithographic structures.
摘要翻译：增强步进对准信号和计量校准目标信号的方法和系统。在一个实施例中，构造了包括第一高度的第一材料和第二高度的第二材料的多个交替排。选择第一材料和第二材料以增强对于光刻结构的对准成像时的标记的对比度。

89. 发明授权

US07406066B2 Asynchronous modulation and demodulation for spread spectrum and code-division multiple access communication 失效
标题翻译：用于扩频和码分多址通信的异步调制和解调
公开(公告)号：US07406066B2
公开(公告)日：2008-07-29
申请号：US10684150
申请日：2003-10-09
申请人： Yi Zheng , Aiping Yao
发明人： Yi Zheng , Aiping Yao
IPC分类号： H04B7/216
CPC分类号： H04J13/00 , H04B1/70718 , H04J13/0022 , H04J13/16
摘要： The present invention of the modulation and demondulation removes the carry synchronization requirement for spread spectrum systems and code-division multiple access communication systems. The invention uses the PN codes that are specially selected and asynchronous demodulation procedure. If number of transmitters is limited, the Multiple Access Interference (MAI) due to carry differences of transmitters can be completely cancelled. Using this invention, signal from a desired transmitter can be demodulated and detected from received signals included from other transmitters in multiple access applications, even when the frequencies of transmitters are different from each other and are not synchronized with a receiver. The invention greatly reduces complexities of a wireless system where Code Division Multiple Access (CDMA) or spread spectrum is used. It expands applications of wireless communication. One of the applications is for a CDMA communication for multiple users without a centralized base station.
摘要翻译：调制和解调的本发明消除了扩频系统和码分多址通信系统的进位同步要求。本发明使用特殊选择的PN码和异步解调程序。如果发射机数量有限，则由于发射机的差异导致的多址干扰（MAI）可以被完全取消。使用本发明，即使当发射机的频率彼此不同并且与接收机不同步时，来自所需发射机的信号可以从在多个接入应用中的其他发射机所包含的接收信号中进行解调和检测。本发明大大降低了使用码分多址（CDMA）或扩频的无线系统的复杂性。它扩展了无线通信的应用。其中一个应用是用于没有集中式基站的多个用户的CDMA通信。

90. 发明申请

US20080113090A1 Anti-reflective seed layers for the fabrication of wrap around and trailing shields 失效
标题翻译：抗反射种子层，用于制造包裹和后盾
公开(公告)号：US20080113090A1
公开(公告)日：2008-05-15
申请号：US11595765
申请日：2006-11-10
申请人： Hieu Lam , Patrick Rush Webb , Yi Zheng
发明人： Hieu Lam , Patrick Rush Webb , Yi Zheng
IPC分类号： B05D5/12
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/314 , G11B5/3163 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Methods and structures for the fabrication of wrap around and trailing shield structures are disclosed. Seed layers having anti-reflective properties are utilized, eliminating the need to deposit, then remove, traditional inorganic anti-reflection coatings prior to shield plating.
摘要翻译：公开了用于制造包裹和后挡板结构的方法和结构。利用具有抗反射性能的种子层，消除了在屏蔽电镀之前沉积，然后去除传统的无机抗反射涂层的需要。

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