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81. 发明授权

US07745787B2 Electron beam device 有权
标题翻译：电子束装置
公开(公告)号：US07745787B2
公开(公告)日：2010-06-29
申请号：US12071152
申请日：2008-02-15
申请人： Chisato Kamiya , Masahiro Akatsu , Mitsugu Sato
发明人： Chisato Kamiya , Masahiro Akatsu , Mitsugu Sato
IPC分类号： H01J37/28 , H01J37/244
CPC分类号： H01J37/28 , H01J37/244
摘要： Disclosed here is a high resolution scanning electron microscope having an in-lens type objective lens. The microscope is structured so as to detect transmission electrons scattering at wide angles to observe high contrast STEM images according to each sample and purpose.A dark-field detector is disposed closely to the objective lens magnetic pole. The microscope is provided with means for moving the dark-field detector along a light axis so as to control the scattering angle of each detected dark-field signal.
摘要翻译：这里公开了具有透镜式物镜的高分辨率扫描电子显微镜。显微镜被构造成检测以广角散射的透射电子，以根据每个样品和目的观察高对比度STEM图像。暗场检测器靠近物镜磁极设置。显微镜具有用于沿着光轴移动暗视场检测器的装置，以便控制每个检测到的暗场信号的散射角。

82. 发明申请

US20090050805A1 SCANNING ELECTRON MICROSCOPE 有权
标题翻译：扫描电子显微镜
公开(公告)号：US20090050805A1
公开(公告)日：2009-02-26
申请号：US12250763
申请日：2008-10-14
申请人： Hirohiko Kitsuki , Kazuo Aoki , Mitsugu Sato
发明人： Hirohiko Kitsuki , Kazuo Aoki , Mitsugu Sato
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J37/04 , H01J37/263 , H01J2237/21 , H01J2237/2487 , H01J2237/2809
摘要： A scanning electron microscope for digitally processing an image signal to secure the largest focal depth and the best resolution in accordance with the magnification for observation is disclosed. The angle of aperture of an optical system having a plurality of convergence lenses is changed by changing the convergence lenses and the hole diameter of a diaphragm. The angle α of aperture of the electron beam is changed in accordance with the visual field range corresponding to a single pixel, i.e. what is called the pixel size.
摘要翻译：公开了一种用于数字处理图像信号以确保最大焦深和根据观察放大率的最佳分辨率的扫描电子显微镜。具有多个会聚透镜的光学系统的光圈角度通过改变会聚透镜和光阑的孔径而改变。根据与单个像素对应的视场范围，即所谓的像素大小，改变电子束的孔径的角度α。

83. 发明申请

US20080272300A1 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US20080272300A1
公开(公告)日：2008-11-06
申请号：US12155347
申请日：2008-06-03
申请人： Yuko Sasaki , Mitsugu Sato
发明人： Yuko Sasaki , Mitsugu Sato
IPC分类号： G01N23/00
CPC分类号： H01J37/265 , G01N23/2251 , H01J2237/043 , H01J2237/049 , H01J2237/28
摘要： When conditions for an electron gun mainly represented by extraction voltage V1 and accelerating voltage V0 are changed, a charged particle beam is once focused on a fixed position by means of a condenser lens and a virtual cathode position is calculated from a lens excitation of the condenser lens at that time and the mechanical positional relation of the electron gun to set an optical condition. For more accurate setting of the optical condition, a deflecting electrode device is provided at a crossover position of the condenser lens and a voltage is applied to the deflecting electrode device at a constant period so as to control the lens excitation of the condenser lens such that the amount of movement of an image is minimized on an image display unit such as CRT.
摘要翻译：当主要由提取电压V 1和加速电压V 0表示的电子枪的条件改变时，通过聚光透镜将带电粒子束一次聚焦在固定位置，并且从透镜激发计算虚拟阴极位置此时的聚光透镜和电子枪的机械位置关系来设定光学条件。为了更精确地设置光学条件，在聚光透镜的交叉位置处设置偏转电极装置，并且将电压以恒定周期施加到偏转电极装置，以便控制聚光透镜的透镜激发，使得在诸如CRT的图像显示单元上图像的移动量最小化。

84. 发明授权

US07442929B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US07442929B2
公开(公告)日：2008-10-28
申请号：US11397812
申请日：2006-04-05
申请人： Hirohiko Kitsuki , Kazuo Aoki , Mitsugu Sato
发明人： Hirohiko Kitsuki , Kazuo Aoki , Mitsugu Sato
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J37/04 , H01J37/263 , H01J2237/21 , H01J2237/2487 , H01J2237/2809
摘要： A scanning electron microscope for digitally processing an image signal to secure the largest focal depth and the best resolution in accordance with the magnification for observation is disclosed. The angle of aperture of an optical system having a plurality of convergence lenses is changed by changing the convergence lenses and the hole diameter of a diaphragm. The angle α of aperture of the electron beam is changed in accordance with the visual field range corresponding to a single pixel, i.e. what is called the pixel size.
摘要翻译：公开了一种用于数字处理图像信号以确保最大焦深和根据观察放大率的最佳分辨率的扫描电子显微镜。具有多个会聚透镜的光学系统的光圈角度通过改变会聚透镜和光阑的孔径而改变。根据与单个像素对应的视场范围，即所谓的像素大小，改变电子束的孔径的角度α。

85. 发明申请

US20080237465A1 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US20080237465A1
公开(公告)日：2008-10-02
申请号：US12073948
申请日：2008-03-12
申请人： Michio Hatano , Takashi Ohshima , Mitsugu Sato
发明人： Michio Hatano , Takashi Ohshima , Mitsugu Sato
IPC分类号： G01N23/02
CPC分类号： G01N23/225 , H01J37/244 , H01J2237/2446 , H01J2237/24485 , H01J2237/28
摘要： A scanning electron microscope can discriminate secondary particles in a desired energy region by band-pass and detect the secondary particles with a high yield point. Even when a lens 23 is disposed on an electron source side of an objective lens 18, and a primary electron beam forms any optical system on the electron gun side of the lens, the lens operates the primary electron beam to be converged to a convergent point 24 that is a specific position. A detection ExB 16 that supplies a field that affects the locus of the secondary particles that are generated from a specimen 2 is disposed at the convergent point 24 of the primary electron beam so as to lead only the secondary particles in a specific energy range to a detection unit 13. Because a position to which the field that affects the locus of the secondary particles is supplied is the convergent point of the primary electron beam 19, it is possible to lead only the secondary particles of the desired energy to the detection unit without enlarging the aberration of the primary electron beam 19 and also to effectively conduct the band-pass discrimination of the energy. As a result, the signal electrons according to an observation object can be discriminated and detected.
摘要翻译：扫描电子显微镜可以通过带通来区分所需能量区域中的二次粒子，并以高屈服点检测二次粒子。即使当透镜23设置在物镜18的电子源侧，并且一次电子束在透镜的电子枪侧形成任何光学系统时，该透镜操作一次电子束以收敛到会聚点 24这是一个具体的位置。提供影响从样本2产生的二次粒子的轨迹的场的检测ExB 16设置在一次电子束的会聚点24处，以便仅将二次粒子在特定能量范围内引导到检测单元13。由于施加影响次级粒子的轨迹的场的位置是一次电子束19的会聚点，所以只能将所需能量的二次粒子引导到检测单元，而不会增大像差一次电子束19并且还有效地进行能量的带通辨别。结果，可以区分和检测根据观察对象的信号电子。

86. 发明授权

US07348559B2 Defect inspection and charged particle beam apparatus 有权
标题翻译：缺陷检查和带电粒子束装置
公开(公告)号：US07348559B2
公开(公告)日：2008-03-25
申请号：US11498125
申请日：2006-08-03
申请人： Toshihide Agemura , Mitsugu Sato
发明人： Toshihide Agemura , Mitsugu Sato
IPC分类号： G01N23/00
CPC分类号： G01R31/307 , G01N23/2251 , H01J37/28 , H01J2237/15 , H01J2237/24564 , H01J2237/24592 , H01J2237/2487 , H01J2237/28 , H01J2237/2817
摘要： In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
摘要翻译：在将包含精细电路线图案的样本的电特性的多个探针与带电粒子束装置组合的缺陷检查装置中，带电粒子束装置即使图像偏移为±75，也降低了分辨率的劣化妈妈还是更多缺陷检查装置具有与图像移位功能相关联的CAD导航功能。 CAD导航功能在用于处理带电粒子束图像的图像处理单元和用于存储关于电路线图案的信息的存储器之间的通信中使用用于将图像移位移动量转换为DUT阶段移动量的坐标。缺陷检查为用户提供了显着提高的可用性。

87. 发明申请

US20060289755A1 Electron microscope application apparatus and sample inspection method 失效
公开(公告)号：US20060289755A1
公开(公告)日：2006-12-28
申请号：US11442566
申请日：2006-05-30
申请人： Hikaru Koyama , Hiroshi Makino , Mitsugu Sato
发明人： Hikaru Koyama , Hiroshi Makino , Mitsugu Sato
IPC分类号： G21K7/00
CPC分类号： H01J37/026 , H01J2237/0042 , H01J2237/0047 , H01J2237/2817
摘要： A charge control electrode emitting photoelectrons is disposed just above a wafer (sample) in parallel thereto, and the electrode has a through hole so that ultraviolet light can be irradiated to the wafer through the charge control electrode. Specifically, a metal plate which is formed in mesh or includes one or plural holes is used as the charge control electrode. By disposing the charge control electrode just above the sample in parallel thereto, when negative voltage is applied to the electrode, electric field approximately perpendicular to the wafer is generated. Therefore, photoelectrons are efficiently absorbed in the wafer. Also, by using the charge control electrode having approximately the same size as that of the wafer, charges on a whole surface of the wafer can be removed collectively and uniformly. Therefore, time required for the process can be reduced.

88. 发明申请

US20060284093A1 Electron beam device 有权
公开(公告)号：US20060284093A1
公开(公告)日：2006-12-21
申请号：US11499640
申请日：2006-08-07
申请人： Chisato Kamiya , Masahiro Akatsu , Mitsugu Sato
发明人： Chisato Kamiya , Masahiro Akatsu , Mitsugu Sato
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/244
摘要： Disclosed here is a high resolution scanning electron microscope having an in-lens type objective lens. The microscope is structured so as to detect transmission electrons scattering at wide angles to observe high contrast STEM images according to each sample and purpose. A dark-field detector is disposed closely to the objective lens magnetic pole. The microscope is provided with means for moving the dark-field detector along a light axis so as to control the scattering angle of each detected dark-field signal.

89. 发明申请

US20060151697A1 Charged particle beam equipment and charged particle microscopy 有权
标题翻译：带电粒子束设备和带电粒子显微镜
公开(公告)号：US20060151697A1
公开(公告)日：2006-07-13
申请号：US11302323
申请日：2005-12-14
申请人： Hiromi Inada , Mitsugu Sato , Atsushi Takane
发明人： Hiromi Inada , Mitsugu Sato , Atsushi Takane
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/222 , H01J37/265 , H01J2237/223 , H01J2237/2826 , H01J2237/3045
摘要： On the basis of a displacement of the field of view before and after a deflection of a charged particle beam, extracted from a first specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by a predetermined amount by a beam deflector in an image in which a specimen image is captured at a first magnification calibrated by using a specimen enlarged image of a specimen as a magnification standard, and also a displacement of the field of view before and after a deflection of the charged particle beam, extracted from a second specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by the predetermined amount by the beam deflector in an image in which a specimen image is captured at a second magnification, the second magnification is calibrated.
摘要翻译：基于从包括通过使带电粒子束偏转预定量而记录的视野的位移的第一标本图像提取的带电粒子束的偏转之前和之后的视场位移的基础上，通过在通过使用样本的样本放大图像作为放大标准校准的第一倍率捕获样本图像的图像中的光束偏转器，以及在充电的偏转之前和之后的视场位移从第二标本图像中提取出的粒子束，包括通过使带电粒子束在第二放大倍数下拍摄样本图像的图像中的光束偏转器偏转预定量而记录的视野的位移，校准第二放大倍数。

90. 发明申请

US20060071166A1 Charged particle beam apparatus and dimension measuring method 有权
标题翻译：带电粒子束装置和尺寸测量方法
公开(公告)号：US20060071166A1
公开(公告)日：2006-04-06
申请号：US11242129
申请日：2005-10-04
申请人： Mitsugu Sato , Katsuhiko Sakai , Atsushi Takane , Yoshihiko Nakayama
发明人： Mitsugu Sato , Katsuhiko Sakai , Atsushi Takane , Yoshihiko Nakayama
IPC分类号： G21K7/00
CPC分类号： H01J37/244 , H01J37/21 , H01J37/222 , H01J37/28 , H01J2237/21 , H01J2237/221 , H01J2237/24578 , H01J2237/24592 , H01J2237/2816 , H01J2237/2817
摘要： There is provided a charged particle beam apparatus which allows implementation of a high-reliability and high-accuracy dimension measurement even if height differences exist on the surface of a sample. The charged particle beam apparatus includes the following configuration components: An acquisition unit for acquiring a plurality of SEM images whose focus widths are varied in correspondence with the focal depths, a determination unit for determining, from the plurality of SEM images acquired, a SEM image for which the image sharpness degree of the partial domain including a dimension-measuring domain becomes the maximum value, and a measurement unit for measuring the dimension of the predetermined domain from the SEM image whose image sharpness degree is the maximum value.
摘要翻译：提供了一种带电粒子束装置，即使在样品的表面上存在高差也允许实现高可靠性和高精度尺寸测量。带电粒子束装置包括以下配置部件：用于获取与焦点深度相对应的聚焦宽度变化的多个SEM图像的获取单元，确定单元，用于从所获取的多个SEM图像中确定SEM图像包括尺寸测量区域的部分域的图像清晰度变为最大值;以及测量单元，用于从图像锐度度为最大值的SEM图像测量预定域的尺寸。

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